CN202052719U

CN202052719U - Spray slit-type substrate cleaning device

Info

Publication number: CN202052719U
Application number: CN2011200652539U
Authority: CN
Inventors: 龚棉英; 李玟澄
Original assignee: Manz Taiwan Ltd
Current assignee: Manz Taiwan Ltd
Priority date: 2011-03-14
Filing date: 2011-03-14
Publication date: 2011-11-30
Anticipated expiration: 2021-03-14

Abstract

The utility model provides a spray slit-type substrate cleaning device which comprises an atomization device. The atomization device is internally provided with a first fluid chamber, a second fluid chamber, a shunt chamber and an atomizing chamber at least, wherein the first fluid chamber and the second fluid chamber are separated, are not communicated and are respectively arranged on the atomizing chamber; the first fluid chamber is provided with at least one gas injection part which can be connected with a gas supply pipe; a first flow passage is arranged between the first fluid chamber and the atomizing chamber; the second fluid chamber is provided with at least one liquid injection part which can be connected with a liquid supply pipe; a second flow passage is arranged between the second fluid chamber and the shunt chamber; a plurality of shunt holes are arranged between the shunt chamber and the atomizing chamber; the bottom end of the atomizing chamber is communicated with a discharge passage; and an outlet at the bottom end of the discharge passage is adopted as a spray outlet.

Description

The base plate cleaning device of spraying slit

Technical field

The utility model relates to a kind of base plate cleaning device, relates in particular to a kind of with evenly also comprehensive atomizing of two-fluid, to promote the aerosol base plate cleaning device of board cleaning efficient.

Background technology

Thin film transistor (TFT) (LCD), substrate on the flat-panel monitor such as Plasmia indicating panel and electroluminescent display is a kind of parts that need high-accuracy processing, before substrate carries out processing procedure or after handling, must carry out this manufacturing process for cleaning, manufacturing process for cleaning cleans substrate surface, for example handle processing procedure by soup, flushing (rinse) processing procedure and drying process are formed, in manufacturing process for cleaning, for eliminating particle and pollutant and when utilizing cleaning fluid that substrate is handled, in order to improve cleansing power, proposed in cleaning fluid to mix the dry air (Clean dry air) of cleaning and generated two-fluid, and impacted twin-fluid nozzle for cleaning substrate (hereinafter referred to as two-fluid spray nozzle) with foam (bubble) form after the two-fluid that generates amplified to substrate surface.

The publication number that please refer to TaiWan, China is the twin-fluid nozzle for cleaning substrate of 200906210 patent of invention, consult Fig. 1, be the generalized section of twin-fluid nozzle for cleaning substrate, it includes first resettlement section 100 and second resettlement section 200 that is used for accommodating respectively mutually different fluid; Be used to transfer the first passage 110 of the first fluid that is contained in this first resettlement section 100, be formed with first jet 111 that sprays this first fluid in its end; Be used to transfer the second channel 210 of second fluid that is contained in this second resettlement section 200, be formed with second jet 211 that sprays this second fluid in its end; Two-fluid discharge portion 400, the fluid that is sprayed by this first jet 111 and second jet 211 mixes mutually and the two-fluid that generates to be used to discharge; And the guide portion 212 that is formed at the leading section of this second jet 211, guide to this first jet 111 with the injection direction of this second fluid of being used for spraying by this second jet 211.

Yet the shortcoming of prior art is can't produce uniform two-fluid when liquid and air mix always; and has a spacing between first jet and second jet; the liquid that part is not also atomized directly falls on the substrate; the size of therefore mixing the back two-fluid can't be fully by micronize; cause cleaning efficiency to reduce; influence the processing of successive process, therefore need a kind of atomizing effect good to promote a kind of aerosol base plate cleaning device of board cleaning efficient.

The utility model content

Main purpose of the present utility model provides a kind of base plate cleaning device of the slit of spraying, it is in order to produce the two-phase fluid of atomizing form, and the two-phase fluid of the form that will atomize is sprayed on the substrate that desire cleans, and promoting the cleanliness factor of substrate, and then assists in successive process and handles.

For reaching above-mentioned purpose, concrete technological means of the present utility model includes an atomising device, at least has a first fluid chamber within this atomising device, one second fluid chamber, one diffluence room and an atomizing chamber, this first fluid chamber is provided with for separation with this second fluid chamber and is not communicated with mutually, this first fluid chamber and second fluid chamber all are located on this atomizing chamber, this first fluid chamber has at least one gas injection portion, this at least one gas injection portion can connect and establish a gas supply pipe, be provided with a first-class passage between this first fluid chamber and this atomizing chamber, this second fluid chamber has at least one liquid injection portion, this at least one liquid injection portion can connect and establish a feed tube for liquid, be provided with one second circulation road between this second fluid chamber and this diffluence room, wherein be provided with a plurality of tap holes between this diffluence room and this atomizing chamber, the bottom of this atomizing chamber then is communicated in a passing away, and the bottom outlet of this passing away is an ejiction opening.

The utility model can effectively solve the shortcoming of prior art, makes the injection uniformity more unified, and then promotes the cleanliness factor of substrate, to promote the product fine rate.

Description of drawings

Fig. 1 is the generalized section of the twin-fluid nozzle for cleaning substrate of prior art.

Fig. 2 is the structural representation of the base plate cleaning device of spraying slit of the present utility model.

The specific embodiment

Those skilled in the art below cooperate Figure of description and element numbers that embodiment of the present utility model is done more detailed description, so that can implement after studying this specification carefully according to this.

Consult Fig. 2, be the structural representation of the base plate cleaning device of spraying slit of the present utility model.The utility model includes an atomising device 1, this atomising device 1 has a first fluid chamber 11, one second fluid chamber 13, a diffluence room 15 and an atomizing chamber 17, this first fluid chamber 11 is provided with for separation with this second fluid chamber 13 and is not communicated with, the first fluid chamber 11 and second fluid chamber 13 all are located at the top of this atomizing chamber 17, so the fluid within the first fluid chamber 11 and second fluid chamber 13 can reach down among this atomizing chamber 17.

This first fluid chamber 11 has at least one gas injection portion 111, this gas injection portion 111 can connect and establish a gas supply pipe (scheming not shown), has a first-class passage 113 between this first fluid chamber 11 and this atomizing chamber 17, wherein between this first fluid chamber 11 and this atomizing chamber 17 at least one mid-chamber 115 can be set further, this mid-chamber 115 is connected with this first-class passage 113, these mid-chamber 115 air feed flow back to and revolve wherein, to increase the pressure and the flow of air-flow.

This second fluid chamber 13 has at least one liquid injection portion 131, this liquid injection portion 131 can connect and establish a feed tube for liquid (scheming not shown), be provided with one second circulation road 133 between this second fluid chamber 13 and this diffluence room 15, wherein be provided with a plurality of small tap holes (scheming not shown) between this diffluence room 15 and this atomizing chamber 17, the hole size of described tap hole is not limited, allow the gas will be as long as can satisfy by the back size of atomization of water current of tap hole (scheming not shown), the bottom of this atomizing chamber 17 then is communicated in a passing away 19, and the bottom outlet of this passing away 19 is an ejiction opening 191.

When gas and liquid all are input to the first fluid chamber 11 and second fluid chamber 13 via gas injection portion 111 and liquid injection portion 131, wherein gas can arrive to atomizing chamber 17 with mid-chamber 115 by first-class passage 113, liquid is then successively by second circulation road 133 and diffluence room 15, liquid in diffluence room 15 is split into a plurality of refinement current through described tap hole, described refinement current are subjected to gas to impact the formation mist attitude with mixing the back, last mist attitude two-phase flow cognition evenly is sprayed on the substrate via passing away 19 from ejiction opening 191, the utility model is shunted fluid and the mist attitudeization by elder generation within atomising device 1, make and spray the two-phase fluid of atomizing fully from atomising device 1, therefore on substrate, produce situations such as micro-bubble or shock wave, and significantly promote and spray the uniformity, make the cleaning efficiency of substrate significantly promote, help successive process to handle, and then promote the product yield.

The above only is in order to explain preferred embodiment of the present utility model; be not that attempt is done any pro forma restriction to the utility model according to this; therefore; all have in that identical creation spirit is following do relevant any modification of the present utility model or change, all must be included in the category of the utility model intention protection.

Claims

1. the base plate cleaning device of the slit of spraying, it is characterized in that, include an atomising device, at least has a first fluid chamber within this atomising device, one second fluid chamber, one diffluence room and an atomizing chamber, this first fluid chamber is provided with for separation with this second fluid chamber and is not communicated with mutually, this first fluid chamber and second fluid chamber all are located on this atomizing chamber, this first fluid chamber has at least one gas injection portion, this at least one gas injection portion can connect and establish a gas supply pipe, be provided with a first-class passage between this first fluid chamber and this atomizing chamber, this second fluid chamber has at least one liquid injection portion, this at least one liquid injection portion can connect and establish a feed tube for liquid, be provided with one second circulation road between this second fluid chamber and this diffluence room, wherein be provided with a plurality of tap holes between this diffluence room and this atomizing chamber, the bottom of this atomizing chamber then is communicated in a passing away, and the bottom outlet of this passing away is an ejiction opening.

2. the base plate cleaning device of spraying slit as claimed in claim 1, it is characterized in that, described atomising device further is provided with a mid-chamber, and this mid-chamber is between this first fluid chamber and this atomizing chamber, and this mid-chamber is connected with this first-class passage.