WO2014198093A1

WO2014198093A1 - Gas/liquid mixing device and cleaning apparatus

Info

Publication number: WO2014198093A1
Application number: PCT/CN2013/084185
Authority: WO
Inventors: 翁铭廷; 郭知广; 张毅; 程大富; 尹希磊
Original assignee: 京东方科技集团股份有限公司; 合肥鑫晟光电科技有限公司
Priority date: 2013-06-09
Filing date: 2013-09-25
Publication date: 2014-12-18
Also published as: CN103301761A; CN103301761B

Abstract

Provided are a gas/liquid mixing device for a cleaning apparatus and a cleaning apparatus comprising the gas/liquid mixing device. The gas/liquid mixing device comprises a mixing chamber (11), and a high-temperature gas channel (8a) and a high-temperature liquid channel (7a) respectively connected to the mixing chamber (11); the gas outputted via the high-temperature gas channel (8a) is mixed with the high-temperature liquid outputted via the high-temperature liquid channel (7a) in the mixing chamber (11) to produce a mixed fluid, the high-temperature gas channel (8a) comprising at least two high-temperature gas channels (8a1, 8a2) having different output flows. By providing high-temperature gas channels (8a1, 8a2) having different output flows, the gas/liquid mixing device utilizes a first high-temperature gas channel (8a1) having a larger flow to quickly input high-temperature gas, and utilizes a second high-temperature gas channel (8a2) having a smaller flow to accurately control the proportion of the high-temperature gas mixed into the high-temperature liquid.

Description

Gas-liquid mixing device and cleaning device

The present invention relates to the technical field of a display device manufacturing process, and in particular to a gas-liquid mixing device for a cleaning device and a cleaning device including the gas-liquid mixing device. Background technique

Thin Film Transistor Liquid Crystal Display (TFT-LCD) is widely used in TVs, mobile phones, etc. due to its advantages of stable picture, vivid image, radiation elimination, space saving and energy saving. Among electronic products such as displays, it has occupied a dominant position in the field of flat display. Compared with liquid crystal display panels, Organic Light Emission Diode (OLED) display panels have attracted more and more attention from display technology developers due to their faster response speed, higher contrast ratio and wider viewing angle.

In the process of preparing the LCD display panel and the 0LED display panel, if there is foreign matter or dirt on the substrate, many products are defective. Therefore, the cleaning device is widely used in various aspects of the preparation process. In the prior art, the main wet cleaning method is usually water washing at room temperature. A common method in the normal temperature water washing is the pure water washing method. The pure water washing mainly uses the impact force of the high pressure water flow to perform a hard washing, which is very effective for the removal of inorganic foreign matter or large organic matter foreign matter.

However, with the continuous development of display technology, in order to further improve the quality of the display device and the yield of the product, the requirements for the cleaning ability are increasingly improved during the preparation process of the LCD display panel and the OLED display panel, especially for small polymers. The removal of foreign matter and the need for fine cleaning are more prominent. The cleaning equipment of the prior art has been unable to effectively cope with the above requirements; and the emergence of the hot cleaning technology has undoubtedly become the preferred solution to solve this problem, but so far, in the process of preparing the LCD display panel and the OLED display panel Cleaning of the substrate, there is no forming hot cleaning equipment. Summary of the invention

(1) Technical problems to be solved The object of the present invention is to provide a gas-liquid mixing device for a cleaning device which can realize rapid input of high-temperature gas and ensure the accuracy of control, and provides technical support for improving the cleaning ability of the cleaning device;

Further, the present invention provides a cleaning apparatus which uses the above-described gas-liquid mixing device to mix a high temperature liquid and a high temperature gas to thermally clean the surface of the substrate by using the formed high temperature mixed fluid, and is used for improving the efficiency of cleaning the substrate and Improve the effect of cleaning the substrate.

(ii) Technical solutions

The technical scheme of the present invention is as follows:

A gas-liquid mixing device for a cleaning device, comprising a mixing chamber and a high temperature gas passage and a high temperature liquid passage respectively connected to the mixing chamber, a gas outputted through the high temperature gas passage and a gas output through the high temperature liquid passage The high temperature liquid is mixed in the mixing chamber to form a mixed fluid, wherein the high temperature gas passage includes at least two high temperature gas passages having different output flows.

The temperature range of the high-temperature liquid or the high-temperature mixed fluid referred to herein is higher than the temperature of the normal temperature cleaning in the prior art, and the upper limit of the temperature range is not particularly limited as long as it meets the requirements for the cleaning target such as the panel and its components. The temperature range of the components of the class does not cause damage.

Preferably, the high temperature gas passage includes a first high temperature gas passage and a second high temperature gas passage, the output end of the first high temperature gas passage is provided with a millimeter gas outlet, and the output end of the second high temperature gas passage is provided with Micron gas outlet.

Preferably, each of the first high temperature gas passage and the second high temperature gas passage is provided with a control valve for shutting off and opening the high temperature gas passage.

Preferably, a pressurized hot gas passage communicating with the mixing chamber is further provided, and pressurized hot gas is introduced into the mixing chamber through the pressurized hot gas passage.

Preferably, the gas-liquid mixing device comprises a temperature compensation mechanism.

Preferably, the temperature compensation mechanism includes a main heating unit disposed on the high temperature liquid passage, and the main heating unit is configured to raise the temperature of the high temperature liquid to a preset temperature. Further preferably, the main heating unit is disposed on an outer wall of the high temperature liquid passage; the high temperature gas passage is parallel to the high temperature liquid passage and disposed at the high temperature liquid Inside the channel of the channel.

Preferably, the temperature compensating mechanism includes a compensating heating unit provided for the mixing chamber, the compensating heating unit for maintaining the temperature of the mixed fluid within a specific range.

Preferably, the temperature compensation mechanism further includes: a first temperature sensor coupled to the high temperature liquid channel, configured to collect temperature information of the high temperature liquid; and a second temperature sensor coupled to the mixing chamber, configured to Collecting temperature information of the mixed fluid; and the controller, the controller adjusts the power of the main heating unit according to the temperature information collected by the first temperature sensor, and adjusts the power of the compensation heating unit according to the temperature information collected by the second temperature sensor .

The present invention also provides a cleaning apparatus comprising any one of the above-described gas-liquid mixing devices and a mixed fluid ejecting device that can be ejected to a surface of a washing target via the mixed fluid ejecting device.

Preferably, the gas-liquid mixing device is integrated with the mixed fluid ejection device.

Preferably, the mixed fluid ejection device comprises a plurality of sets of nozzles, at least one set of nozzles are sprayed in a first direction, and at least another set of nozzles are sprayed in a second direction, the first direction being angled with the sprayed surface The angle formed by the second direction and the injection surface is complementary to each other.

Preferably, the cleaning device further includes a nozzle control unit and a foreign object detecting unit and a cleaning dead angle database communicably coupled to the nozzle control unit, each set of nozzles being connected to the nozzle control unit, wherein the nozzle control unit is The foreign matter distribution information detected by the foreign matter detecting unit and the cleaning dead angle information in the cleaning dead angle database select the ejection direction for the foreign matter and activate the corresponding nozzle.

(3) Beneficial effects

The gas-liquid mixing device of the cleaning device provided by the invention realizes rapid input of high-temperature gas by using a high-temperature gas passage with a large flow rate by using a high-temperature gas passage with different flow rates, and precisely controls the mixing to the second high-temperature gas passage with a small flow rate to The proportion of high temperature gas in a high temperature liquid. Further, the cleaning device provided by the present invention provides a gas-liquid mixing device, and introduces a high-temperature liquid and a high-temperature gas into the gas-liquid mixing device, and the high temperature The gas and the high temperature liquid are mixed in the gas-liquid mixing device to form a high-temperature mixed fluid, and the mixed fluid is sprayed to the surface of the cleaning target via the mixed fluid spraying device, and the high-temperature mixed fluid increases the solubility and fluidity of the foreign matter, and utilizes the high-pressure impact of the mixed fluid. The force and the impact of gas bubble blasting thoroughly clean the cleaning target, greatly improving the effect of substrate cleaning, reducing the time for substrate cleaning, and improving the efficiency of substrate cleaning. DRAWINGS

1 is a schematic structural view of a cleaning device in Embodiment 1 of the present invention;

2 is a schematic structural view of a gas-liquid mixing device of the cleaning device of FIG. 1; FIG. 3 is a schematic structural view of an embodiment of the cleaning device of the second embodiment of the present invention; Schematic diagram of the implementation;

Figure 5 is a front structural view of the mixing fluid spraying device of the cleaning device of Figure 4; Figure 6 is a side structural view of the mixing fluid spraying device of the cleaning device of Figure 4; Figure 7 is a configuration of the temperature compensation mechanism of the second embodiment of the present invention Figure 8 is a schematic structural view of a cleaning target and a mixed fluid ejection device according to a third embodiment of the present invention;

Figure 9 is a partially enlarged schematic view of a region A on the cleaning target of Figure 8; Figure 10 is a schematic block diagram showing the configuration of a nozzle control mechanism of the mixed fluid ejection device in the third embodiment of the present invention.

Reference numerals in the figure: 1: liquid container; 2a, 2: mixed fluid injection device; 3: cleaning target; 4: high pressure liquid pump; 5: liquid heater; 6: gas heater; 7a, 7: high temperature liquid 8a, 8: high temperature gas passage; 8al: first high temperature gas passage; 8a2: second high temperature gas passage; 9: nozzle; 10: pressurized hot gas passage; 11: mixing chamber; 12: control valve; Millimeter gas outlet; 14: micron gas outlet; 20: temperature compensation mechanism; 21: main heating unit; 22: main heating terminal; 23: compensation heating unit; 24: compensation heating terminal; 31: first group nozzle; : second set of nozzles; 33: third set of nozzles; 34: cleaning dead angles. detailed description The specific embodiments of the present invention are further described below in conjunction with the accompanying drawings and embodiments. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention. Throughout the drawings and the description throughout the specification, the same reference numerals refer to the same parts. The drawings are not necessarily to scale,

Embodiment 1

In this embodiment, a cleaning apparatus is provided, the cleaning apparatus comprising a gas-liquid mixing device. As shown in FIG. 1, the cleaning apparatus provided in this embodiment mainly comprises a liquid container 1, a liquid heater 5, a high pressure liquid pump 4, a gas heater 6, a gas-liquid mixing device, and a mixed fluid spraying device 2a; The liquid in the liquid container 1 becomes a high-temperature liquid under the heating of the liquid heater 5, and the high-temperature liquid is pumped into the gas-liquid mixing device by the high-pressure liquid pump 4; the gas supplied from the gas source (not shown) is The gas heater 6 is heated to become a high temperature gas and is sent to the gas-liquid mixing device. However, it should be understood that it is not necessary to use the gas heater 6 to heat the gas supplied from the gas source, that is, the gas delivered to the gas-liquid mixing device may be a high temperature gas or a normal temperature gas. The gas-liquid mixing device includes a mixing chamber 11 and a gas-liquid passage that communicates with the mixing chamber 11. The high-temperature liquid and gas output from the gas-liquid passage are mixed in the mixing chamber 1 1 of the gas-liquid mixing device to form a high-temperature mixed fluid. The gas-liquid mixing device is in communication with the mixed fluid ejecting device 2a, and the high-temperature mixed fluid is ejected to the surface of the cleaning target 3 via the mixed fluid ejecting device 2a, and the high-temperature mixed fluid first preheats the surface of the cleaning target 3, increasing the solubility of the foreign matter. And the fluidity, and then the surface of the cleaning target 3 is thoroughly cleaned by the high-pressure impact force of the mixed fluid and the impact force of the gas bubble blasting, thereby greatly improving the effect of the substrate cleaning, reducing the time for cleaning the substrate, and improving the time. The efficiency of substrate cleaning. Preferably, the temperature of the high temperature liquid or the high temperature fluid referred to in the present application ranges from 40 Ό or more, and the upper limit of the temperature range is not particularly limited as long as it does not meet the requirements such as the panel and its components as cleaning targets. The temperature range that causes damage can be.

In this embodiment, the gas-liquid mixing device mainly includes a mixing chamber 1 1 and a gas-liquid passage connected to the mixing chamber 11 . As shown in Fig. 2, the gas-liquid passage includes a high-temperature gas passage 8a and a high-temperature liquid passage 7a; a high-temperature liquid passage 7a for inputting a high-temperature liquid, and a high-temperature gas passage 8a for inputting a high-temperature gas, in order to facilitate control of a high temperature mixed into the high-temperature liquid The ratio of the gas, the high-temperature gas passages of different flows in the present invention, that is, including at least Two high temperature gas passages whose output flows are different from each other. In the present embodiment, the two high-temperature gas channels respectively output high-temperature gases different in flow rate from each other as an example. In the embodiment, the high-temperature gas channel includes a first high-temperature gas channel 8a1 and a second high-temperature gas channel 8a2, and the first high temperature. The flow rate of the high-temperature gas is different between the gas passage 8al and the second high-temperature gas passage 8a2, wherein the flow rate of the high-temperature gas outputted by the first high-temperature gas passage 8a1 is large, so that the high-temperature gas can be quickly input by the first high-temperature gas passage 8al in the initial stage. Thereafter, the first high temperature gas passage 8a is closed, and the proportion of the high temperature gas mixed into the high temperature liquid is precisely controlled by the second high temperature gas passage 8a2 having a small flow rate. For example, a specific implementation may be: providing a millimeter-scale gas outlet 13 at the output end of the first high-temperature gas passage 8a1 and a micro-scale gas outlet at the output end of the second high-temperature gas passage 8a2.

14. The use of two high-temperature gas channels with different output flow levels enables fast input of high-temperature gas and precise control.

In order to more precisely control the proportion of the high temperature gas mixed into the high temperature liquid, in the embodiment, the control valve 12 for shutting off and opening the high temperature gas passage is also provided on the high temperature gas passage; the control valve 12 may be a solenoid valve or a pneumatic valve. Etc. In the present embodiment, the control valve 12 is preferably a solenoid valve. The solenoid valve can be combined with different circuits to achieve the desired control, and the accuracy and flexibility of the control can be effectively ensured.

Long-term research and practical work have shown that in order to achieve excellent foreign matter or dirty cleaning effect, in the gas-liquid mixing process, it is necessary to maintain a certain pressure in the gas-liquid mixing device, enhance the impact force of the high-temperature mixed fluid and gas bubble blasting. The impact force; for example, the gas pressure in the gas-liquid mixing device may be 0-3 standard atmospheres (101.325 kPa); in this embodiment, the gas pressure in the gas-liquid mixing device is 1-3 standard atmospheres, The cleaning effect is the best.

In the gas-liquid mixing process, the temperature of the high-temperature gas and the high-temperature liquid is high, and a corrosive gas such as ozone may be used. Therefore, the material of the gas-liquid mixing device needs not only high temperature resistance but also corrosion resistance; In the embodiment, the whole gas-liquid mixing device is prepared by using high-quality stainless steel material, for example, SUS 304, SUS 304 has good corrosion resistance, heat resistance, low temperature strength and mechanical properties; such a material selection method is compatible with C0 ₂ , Compressed dry air (Compres sed Dry Air, CDA) and a variety of gases such as nitrogen provide flexibility in the choice of gas source. Referring again to FIG. 2, in the present embodiment, a pressurized hot gas passage 10 communicating with the mixing chamber 11 is provided for the gas-liquid mixing device, and a specific temperature increase is introduced into the mixing chamber 1 through the pressurized hot gas passage 10. Pressurizing the hot gas, pressurizing the mixing chamber 11 of the gas-liquid mixing device by using the pressurized hot gas, thereby increasing the impact force of the mixed fluid and/or the impact force of the gas bubble blasting by the high pressure, and also utilizing the pressurized hot gas. Increasing the temperature of the high temperature liquid compensates to some extent the heat lost during the transfer of the high temperature liquid from the liquid container 1 to the gas-liquid mixing device.

Embodiment 2

In the gas-liquid mixing device and the cleaning device provided in the first embodiment, in the process of transporting the high-temperature liquid from the liquid container to the gas-liquid mixing device, heat loss is inevitable, so that it is difficult to accurately measure the temperature of the high-temperature liquid. Control, resulting in insufficient temperature of the mixed fluid after mixing, reducing the cleaning effect of the cleaning equipment. In this embodiment, a temperature compensation mechanism is provided in the gas-liquid mixing device, and the temperature compensation mechanism compensates for the heat lost in the process of transporting the high-temperature liquid from the liquid container to the gas-liquid mixing device, thereby improving the cleaning device. Cleaning effect.

In this embodiment, the implementation of the temperature compensation mechanism described above is as shown in FIG. 3, and a temperature compensation mechanism is provided for the gas-liquid mixing device, the temperature compensation mechanism includes a main heating unit 21 disposed for the high temperature liquid passage and for the mixing chamber 1 1 provided compensation heating unit 23; main heating unit 21 is used to raise the temperature of the high temperature liquid to a preset temperature, and the compensation heating unit 23 is used to mix the high temperature liquid with the high temperature gas to form a mixed fluid entering the mixed fluid injection device Before 2a, its temperature is maintained within a certain temperature range to avoid heat loss.

Further, in order to avoid heat loss of the high-temperature mixed fluid during the process of entering the mixed fluid spraying device, the present embodiment may also preferably integrate the gas-liquid mixing device and the mixed fluid ejection device into one body, as shown in FIG. Reference numeral 2 denotes a mixed fluid ejecting apparatus in which a gas-liquid mixing device is integrated, and the gas-liquid mixing device integrated in the mixed fluid ejecting apparatus 2 according to the present embodiment further includes a temperature compensating mechanism 20. Specifically, a front structural view and a side structural view of the mixed fluid ejection device 2 of FIG. 4 are respectively shown in FIGS. 5 and 6. As shown in FIGS. 5 and 6, the mixing chamber 11 is disposed inside the main body of the mixed fluid spraying device 2, and the temperature compensating mechanism 20 is disposed at a high level. The main heating unit 21 on the outer wall of the warm liquid passage 以及 and the compensation heating unit 23 provided for the mixing chamber 11; the main heating portion of the main heating unit 21 is the main heating terminal 22, and the main heating unit 21 is used for the high temperature liquid The temperature is raised to a preset temperature, the main heating portion of the compensation heating unit 23 is the compensation heating terminal 24, and the compensation heating terminal 24 of the compensation heating unit 23 is in the form of a sheet (which may also be a mesh or other shape for facilitating heat dissipation) distributed in the mixture. The internal cavity or the cavity structure of the chamber 1 is mainly used for mixing the high-temperature liquid and the high-temperature gas to form a mixed fluid before the nozzle 9 of the mixed fluid spraying device 2, and the temperature is maintained within a certain temperature range to avoid heat. Loss. The above temperature range may be set to locrc or may be set to exceed ioo °c depending on the material characteristics of the object to be cleaned. When the temperature exceeds ioo °c, the mixing chamber entering the interior of the body of the mixed fluid spraying device can be made

The high temperature liquid in 1 1 is rapidly vaporized under the action of ultra-high temperature heating, and is in the form of superheated steam under the action of the input high-temperature gas, directly enters the nozzle 9 and is sprayed onto the surface of the cleaning target 3 to better realize Preheating the surface of the cleaning target for better high temperature cleaning.

In this embodiment, as shown in FIG. 5 and FIG. 6, as an example, the high temperature liquid passage Ί and the high temperature gas passage 8 are both in the shape of a pipe, and the main heating terminal 22 of the main heating unit 21 is disposed on the outer wall of the high temperature liquid passage 7; The high temperature gas passage 8 is parallel to the high temperature liquid passage 7 and disposed inside the passage of the high temperature liquid passage 7, so that in addition to the heating action of the main heating unit 21, the high temperature gas introduced from the high temperature gas passage 8 also acts on the high temperature liquid. The heating effect increases the speed of compensating for the temperature of the high temperature liquid while avoiding the white loss of the heat of the high temperature gas.

In order to achieve precise control of the temperature compensation mechanism compensation temperature, a first temperature sensor coupled to the high temperature liquid channel and a second temperature sensor coupled to the mixing chamber are also disposed in the embodiment. The coupling mentioned here can be either a contact connection or a non-contact connection. Any existing coupling method is feasible as long as the temperature sensor can sense the temperature of the sensing target. The main heating unit, the first temperature sensor, the compensation heating unit, and the second temperature sensor are all connected to the controller, as shown in FIG. The first temperature sensor and the second temperature sensor can communicate temperature information to the controller. The controller can transmit control signals to the main heating unit and the compensation heating unit. For example, the first temperature sensor collects temperature information of the high temperature liquid and sends the collected temperature information to the controller, the controller root Receiving a control signal to the main heating unit to adjust the power of the main heating unit according to the temperature information collected by the first temperature sensor, the second temperature sensor collecting the temperature information of the high temperature mixed fluid and transmitting the collected temperature information to the controller, the controller according to The temperature information collected by the second temperature sensor sends a control signal to the compensation heating unit to adjust the power of the compensation heating unit. The above controller is preferably a programmable controller (Programmable Log ic

Control ler , PLC ) , the PLC stores the preset heating temperature value of the main heating unit and compensates the heating temperature range of the heating unit. Of course, the above controllers can also be replaced by other programmable logic devices, such as a central processing unit (CPU) or a digital signal processor (DSP).

Embodiment 3

In this embodiment, the cleaning target 3 of the cleaning device is mainly a substrate moving relative to the mixed fluid ejection device as shown in FIG. 8, and the moving direction of the substrate is shown by the direction of the arrow in the figure; FIG. 9 is the substrate in FIG. A partial enlarged view of the area A; it can be clearly seen that since the inherent process forms an uneven shape on the surface of the substrate of the LCD display panel or the OLED display panel, a lot of cleaning corners which are not easily cleaned in the illustration are generated. 34, this will inevitably affect the cleaning effect of the cleaning equipment. In this embodiment, based on the cleaning device provided in the first embodiment or the second embodiment, the high-temperature cleaning is performed without using a single fixed-angle mixed fluid injection, but the multi-angle mixed fluid injection is used for high-temperature cleaning. Specifically, each of the nozzles of the mixed fluid ejection device may be a cluster type nozzle having a certain injection direction, and the mixed fluid injection can be performed in accordance with the set injection angle. The mixed fluid ejection device of the present embodiment includes a plurality of sets of nozzles, wherein at least one of the sets of nozzles is disposed to be sprayed in a first direction, for example, such that the spray direction of at least one set of nozzles moves with the cleaning target indicated by the arrow in FIG. The direction is an acute angle. And at least another set of nozzles are arranged to be sprayed in the second direction, for example, such that the spray direction of at least one other set of nozzles is at an obtuse angle to the direction of movement of the cleaning target. Such multi-angle jetting enables thorough cleaning of all cleaning corners and further improves the cleaning performance of the cleaning equipment. Illustratively, as shown in Figure 8, the mixed fluid ejection device comprises three rows of nozzles, the first row of nozzles being a first set of nozzles 31, the second row of nozzles being a second set of nozzles 32, and the second row of nozzles being a third set of nozzles The nozzles 33, the jet directions of the first group of nozzles 31 and the second group of nozzles 32 are complementary to the angle of movement of the cleaning target 3, for example, the jet direction of the first group of nozzles 31. The angle formed by the injection surface is 135 degrees, the angle of the injection direction of the second group of nozzles 32 is 45 degrees, the angle of the first injection direction and the injection surface, and the second injection direction and the ejection surface. The angles formed are complementary to each other. Further, the ejection direction of the third group of nozzles 33 is perpendicular to the ejection surface for pre-cleaning the cleaning target 3. The nozzle in this embodiment may be a conventional circular nozzle, or may be a slit-shaped nozzle or a nozzle of other forms. In this embodiment, there is no special requirement for the shape of the nozzle.

In order to facilitate the selection of the spray angle of the nozzle, precise cleaning of the foreign matter is realized, and waste of resources is avoided. In this embodiment, a nozzle control unit is also provided, each of which is connected to the nozzle control unit and receives a control signal from the nozzle control unit. The nozzle control unit is also communicably coupled to the foreign object detecting unit and the cleaning dead angle database, respectively, and receives information from the foreign matter detecting unit and the cleaning dead angle database. The above-described arrangement constitutes the nozzle control mechanism of the mixed fluid ejecting apparatus of the present embodiment, and its specific configuration block diagram is as shown in FIG. The foreign matter detecting unit is configured to obtain the foreign matter distribution information of the cleaning target surface before cleaning, and the cleaning dead angle information of the cleaning target is pre-stored in the cleaning dead angle database, and the nozzle control unit according to the foreign matter distribution information detected by the foreign matter detecting unit and the cleaning dead angle database Clean the dead angle information Select the spray direction and activate the corresponding nozzle. The foreign matter detecting unit is preferably a self-powered optical detection device (AOI), and the AO I device can quickly and reliably detect foreign matter or other dirt existing on the substrate.

It should be noted that, in the above embodiment, two liquid container and liquid heater are taken as an example. However, those skilled in the art should understand that one or more liquid containers and liquid heating may also be used. The present invention is implemented to implement the present invention.

The above embodiments are merely illustrative of the present invention and are not to be construed as limiting the scope of the invention, and various modifications and changes can be made without departing from the spirit and scope of the invention. Equivalent technical solutions are also within the scope of protection of the present invention.

Claims

Rights request

1. A gas-liquid mixing device for cleaning equipment, comprising a mixing chamber and a high-temperature gas channel and a high-temperature liquid channel respectively connected to the mixing chamber. The gas output through the high-temperature gas channel is the same as the gas output through the high-temperature liquid channel. The output high-temperature liquid is mixed in the mixing chamber to form a mixed fluid, wherein the high-temperature gas channel includes at least two high-temperature gas channels with different output flow rates.

2. The gas-liquid mixing device according to claim 1, wherein the high-temperature gas channel includes a first high-temperature gas channel and a second high-temperature gas channel, and the output end of the first high-temperature gas channel is provided with a millimeter-level Gas outlet, the output end of the second high-temperature gas channel is provided with a micron-scale gas outlet.

3. The gas-liquid mixing device according to claim 2, wherein each of the first high-temperature gas channel and the second high-temperature gas channel is provided with a switch for closing and opening the high-temperature gas channel. control valve.

4. The gas-liquid mixing device according to any one of claims 1 to 3, further comprising a pressurized hot gas channel connected to the mixing chamber, through which the pressurized hot gas channel enters the mixing chamber. Pour in pressurized hot air.

5. The gas-liquid mixing device according to any one of claims 1 to 3, characterized in that the gas-liquid mixing device further includes a temperature compensation mechanism.

6. The gas-liquid mixing device according to claim 5, characterized in that the temperature compensation mechanism includes a main heating unit provided for the high-temperature liquid channel, the main heating unit is used to raise the temperature of the high-temperature liquid to Preset temperature.

7. The gas-liquid mixing device according to claim 5, wherein the temperature compensation mechanism includes a compensation heating unit provided for the mixing chamber, and the compensation heating unit Thermal units are used to maintain the temperature of the mixed fluid within a specific range.

8. The gas-liquid mixing device according to claim 6, characterized in that, the main heating unit is arranged on the outer wall of the high-temperature liquid channel; the high-temperature gas channel is parallel to the high-temperature liquid channel and is arranged on the outer wall of the high-temperature liquid channel. Inside the channel of a high-temperature liquid channel.

9. The gas-liquid mixing device according to any one of claims 6 to 8, characterized in that the temperature compensation mechanism further includes: a first temperature sensor coupled to the high-temperature liquid channel for collecting high-temperature liquid temperature information; a second temperature sensor coupled to the mixing chamber, used to collect temperature information of the mixed fluid; and a controller, the controller adjusts the main heating unit according to the temperature information collected by the first temperature sensor The power of the compensation heating unit is adjusted according to the temperature information collected by the second temperature sensor.

10. A cleaning equipment, characterized in that it includes a gas-liquid mixing device and a mixed fluid injection device according to any one of claims 1 to 9, and the mixed fluid can be injected to the cleaning target through the mixed fluid injection device. s surface.

11. The cleaning equipment according to claim 10, characterized in that the gas-liquid mixing device and the mixed fluid injection device are integrated into one body.

12. The cleaning equipment according to claim 10 or 11, characterized in that the mixed fluid injection device includes multiple groups of nozzles, at least one group of nozzles sprays in a first direction, and at least another group of nozzles sprays in a second direction. When spraying is performed, the angle formed by the first direction and the spray surface and the angle formed by the second direction and the spray surface are complementary angles to each other.

13. The cleaning equipment according to claim 12, further comprising a nozzle control unit and a foreign matter detection unit and a cleaning dead spot database communicatively coupled to the nozzle control unit, and each group of nozzles is connected to the nozzle control unit , the nozzle control unit detects foreign matter distribution information and cleaning dead-angle data based on the foreign matter detection unit. Use the cleaning dead spot information in the library to select the spray direction for foreign matter and enable the corresponding nozzle