JP2006187707A - Two-fluid nozzle for cleaning and cleaning method and apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a two-fluid nozzle for cleaning which enables an attempt of reducing the amount of a high-pressure gas used while retaining advantages of high cleaning effect and efficiency and very little damage on articles. <P>SOLUTION: The two-fluid nozzle spraying a liquid mist flow from a spraying outlet to impact the flow on an article to be cleaned and has a gas-liquid mixing section mixing a high-pressure gas with a high-pressure liquid to form liquid mist, a gas-introducing section introducing a high-pressure gas into the gas-liquid mixing section, a liquid-introducing section introducing a high-pressure liquid into the gas-liquid mixing section and an acceleration tube section having a passage from the gas-liquid mixing section to the spraying outlet within the tube section and imparting a momentum to the liquid mist within the passage to form a liquid mist flow. A spiral protrusion extending spirally in the longitudinal direction of the passage is formed on the inside wall of the passage within the acceleration tube. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a two-fluid nozzle for cleaning, and more specifically, removes foreign particles adhering to electronic components in the process of manufacturing various electronic components such as semiconductor wafers, glass substrates for liquid crystal displays, and glass substrates for plasma displays. The present invention relates to a two-fluid nozzle for cleaning used for cleaning. The present invention also relates to a cleaning method and a cleaning apparatus using the two-fluid nozzle for cleaning.

  In general, in the process of manufacturing an electronic component, foreign particles generated in the manufacturing process may adhere to the product, resulting in a decrease in manufacturing yield. As a method for avoiding such a problem, it is common knowledge to add a cleaning process for removing foreign particles adhering to the product at the main points of the manufacturing process. In general, foreign particles adhering to a product are firmly fixed on the product surface due to the presence of potential energy between the product surface and the foreign particles. Therefore, a certain external force is applied to the foreign particles in the cleaning process for removing this. Need to be peeled off from the product surface. In general, a chemical or mechanical method is used to apply such an external force. As a mechanical method, water washing using a high-pressure jet spray, ultrasonic cleaning using ultrasonic vibration, or brushing is used. Scrub cleaning using a wide range is widely used. In recent years, in addition to these various cleaning methods, two-fluid cleaning using a liquid mist in which high-pressure liquid and gas are mixed has been attempted (see, for example, Patent Document 1 and Patent Document 2).

  The cleaning method by spraying with a high pressure jet pressurizes pure water to about 10 to 20 MPa with a pressure pump and injects it from a high pressure nozzle. Although the cleaning effect is excellent, there are many problems. One is that the load on the pressurization pump is so large that the parts used in the pressurization pump are likely to deteriorate, resulting in a large running cost for maintenance. is there. Further, the high-pressure pump device itself is increased in size and requires a large installation space, and another problem is that pure water is charged because static electricity exceeding 1 kV is generated during nozzle injection. For this reason, as a countermeasure against this, a carbon dioxide generator is required to increase the electrical conductivity of pure water, and the price of the entire system is considerably high. Further, there is a problem that the nozzle cost is high because the nozzle tip is frequently worn due to high pressure injection and static electricity, and the nozzles are frequently replaced.

  Ultrasonic cleaning is widely used, but the cleaning effect and cleaning efficiency are insufficient, and damage to the product is large. In recent years, emphasis has been placed on cleaning efficiency, and a single-wafer type continuous production method has been adopted. However, this process is premised on short-time treatment, and a sufficient cleaning effect is not obtained by short-time ultrasonic cleaning. . In addition, it is known that micro bubbles are generated by ultrasonic waves, but vibrates vigorously at the same time as they are generated, and product damage is likely to occur due to this vibration shock.

  Scrub cleaning using a brush directly applies an external force to the foreign matter with the brush, so the effect of removing the foreign matter at the portion where the brush is in contact is great, but on the other hand, the probability of the brush coming into contact with small foreign matter of 1 μm or less is low and difficult to remove There is a point. Furthermore, there is a possibility that the product is scratched by the foreign matter taken in the brush, and there is a problem that it is difficult to apply to a product having a circuit. Furthermore, since the brush is gradually worn out in the process of use, it is necessary to adjust the brush height and manage the brush itself, which makes the management complicated.

Two-fluid cleaning is excellent in cleaning effect and cleaning efficiency, requires almost no maintenance, and has very little product damage. Therefore, it has come to be used as a comprehensive cleaning method. The problem is that the amount of high-pressure gas used is large, and the running cost of the high-pressure gas increases accordingly, and in the case of high-pressure air, incidental equipment such as a compressor that generates high-pressure air is expensive.
JP-A-6-104304 JP 7-245282 A

  Two-fluid cleaning is excellent in cleaning effect and cleaning efficiency, requires almost no maintenance, and has very little product damage. Therefore, it has been used as a comprehensive cleaning method. The problem is that the amount of high-pressure gas used is high, so the running cost of high-pressure gas is high. In the case of high-pressure air, the cost of incidental equipment such as compressors that generate this is higher than other methods. is there. An object of the present invention is to provide a two-fluid cleaning nozzle capable of reducing the amount of high-pressure gas used while maintaining the advantages of cleaning effect and cleaning efficiency and maintaining the advantage of extremely low product damage. There is.

The present invention relates to the following two fluid nozzles for cleaning (1) to (5).
(1) A two-fluid nozzle for cleaning that ejects a liquid mist flow from an outlet and collides with an object to be cleaned,
A gas-liquid mixing section that mixes high-pressure gas and high-pressure liquid to form liquid mist,
A gas introduction part for introducing a high-pressure gas into the gas-liquid mixing part,
A liquid introduction part for introducing a high-pressure liquid into the gas-liquid mixing part; and
It has a flow path from the gas-liquid mixing part to the jet outlet inside, it has an acceleration pipe part that gives momentum to the liquid mist in the flow path to form a liquid mist flow, and it is on the inner wall of the flow path in the acceleration pipe part A two-fluid nozzle for cleaning, wherein spiral ridges extending spirally in the length direction of the flow passage are provided.

(2) The two-fluid nozzle for cleaning according to (1), wherein the spiral angle of the spiral protrusion is 20 to 80 degrees.
(3) The two-fluid nozzle for cleaning according to (1) or (2), wherein the height of the spiral protrusion is 0.05 to 1 mm.
(4) The two-fluid nozzle for cleaning according to any one of (1) to (3), wherein the spiral protrusion has a tapered cross section having a taper angle of 20 to 80 degrees.
(5) The lengthwise cross section of the flow passage on the inner wall of the flow passage forms irregularities due to the spiral protrusions, and the width of the bottom of the concave portion and the width of the top of the convex portion are 0.1 to 2 mm, respectively. (2) The two-fluid nozzle for cleaning according to any one of (1) to (4).

The present invention also relates to the following cleaning method (6) using the cleaning two-fluid nozzle of the present invention.
(6) A method for cleaning an object to be cleaned using the cleaning two-fluid nozzle according to any one of (1) to (5) above, wherein a high-pressure gas and a high-pressure liquid are used in the cleaning two-fluid nozzle. A high-pressure gas is supplied to the gas introduction unit and a high-pressure liquid is simultaneously supplied to the liquid introduction unit so that the liquid mist is formed simultaneously with the gas-liquid mixing unit, and the liquid mist passes through the flow passage in the acceleration pipe unit. A cleaning method in which a liquid mist flow formed by the above is ejected from an ejection port to collide with an object to be cleaned.

Moreover, this invention relates to the washing | cleaning apparatus of following (7) which has the 2 fluid nozzle for washing | cleaning of said invention.
(7) The cleaning two-fluid nozzle described in any one of (1) to (5) above, a gas supply means for supplying a high-pressure gas to the gas introduction part of the cleaning two-fluid nozzle, and the liquid introduction of the cleaning two-fluid nozzle Liquid supply means for supplying high-pressure liquid to the section, and holding the two-fluid cleaning nozzle and the object to be cleaned at a position where the liquid mist flow ejected from the two-fluid cleaning nozzle collides with the object to be cleaned Cleaning device having means.

  In the two-fluid nozzle for cleaning according to the present invention, a high-pressure gas and a high-pressure liquid are introduced from separate paths, and the gas and liquid are mixed in a gas-liquid mixing section to be divided into fine particles. In this case, the nozzle that has spiral ridges that extend spirally on the inner wall of the flow passage of the accelerating pipe has the same gas consumption as that of the conventional non-spiral nozzle. A degree of foreign matter removal can be achieved. Further, the liquid fine particle size is further refined from 40-50 μm to 20-30 μm of the conventional nozzle, and at the same time, the speed is doubled from 100 m / s to 200 m / s.

  In addition, even if the consumption of high-pressure gas is reduced to about half that of the conventional nozzle, a foreign matter removal rate of 95% or more, which is the same as that of the conventional nozzle, can be realized. In this case, the cost of incidental equipment such as a compressor can be significantly reduced. We have already explained that 2-fluid cleaning is superior in terms of cleaning power and cleaning efficiency, requires almost no maintenance, has very little damage to objects to be cleaned, and is a comprehensive cleaning method. According to the present invention, since the high pressure gas consumption, which is the only problem that can be said to be the only problem, has been solved, it can be said that the present invention has been greatly improved economically.

  FIG. 1 schematically shows a system diagram of one embodiment of the cleaning method of the present invention using the cleaning two-fluid nozzle of the present invention. While relatively moving the cleaning two-fluid nozzle 2 and the object to be cleaned 3 in the cleaning chamber 1, a high-pressure gas is supplied to the cleaning two-fluid nozzle 2 from a pipe 4 and a high-pressure liquid is supplied from a pipe 5. Supply gas and high pressure liquid. The high-pressure gas is supplied from the pipe 4 to the gas introduction part of the cleaning two-fluid nozzle 2, and the high-pressure liquid is simultaneously supplied from the pipe 5 to the liquid introduction part of the cleaning two-fluid nozzle. Inside the cleaning two-fluid nozzle 2, these are mixed to divide the liquid into fine liquid mists, and the liquid mist is given a momentum in the direction toward the object to be cleaned 3, and the tip of the cleaning two-fluid nozzle is ejected. A liquid mist flow 6 is ejected from the outlet. The ejected liquid mist flow 6 is made to collide with the object 3 to be cleaned, and the foreign matter adhering to the object 3 to be cleaned is removed and cleaned. In this embodiment, in order to perform cleaning appropriately, valves 7 and 7 are respectively provided in a part of the path of the pipe 4 for supplying high-pressure gas and the pipe 5 for supplying high-pressure liquid. The control system 8 opens and closes the valves 7 and 7 synchronized with the relative movement of the two-fluid nozzle 2 and the object 3 to be cleaned. Furthermore, it is desirable to add a drain 9 for recovering the gas and liquid ejected into the cleaning chamber 1.

  The two-fluid nozzle 2 for cleaning according to the present invention has a structure as shown in FIG. 2 as an example of a sectional view, and FIG. The cleaning two-fluid nozzle 2 includes a gas introduction unit 101B for introducing a high-pressure gas and a introduction unit 101 having a liquid introduction unit 101A for introducing a high-pressure liquid, and the introduced gas and liquid are mixed to form liquid fine particles. The gas-liquid mixing unit 102 for forming the liquid mist and the accelerating tube unit 103 for imparting a momentum to the liquid mist to form a liquid mist flow. In the gas-liquid mixing unit 102, a mixing chamber 108 is provided in the nozzle body. The liquid introduction unit 101A includes a liquid channel 105 that penetrates the nozzle body from the liquid supply port 104 to the mixing chamber 108, and the gas introduction unit 101B includes a gas channel that penetrates the nozzle body from the gas supply port 106 to the mixing chamber 108. 107. The gas channel 107 is branched into four channels on the way from the gas supply port 106 to the mixing chamber 108. Although branching is preferable in terms of improving the mixing of gas and liquid, it is not essential and the number of branches is not particularly limited. The accelerating tube portion 103 has a flow passage 109 passing through the nozzle body from the mixing chamber 108 to the jet port 111 inside. On the inner wall of the flow passage 109, a spiral ridge extending in a spiral shape in the length direction of the flow passage 109 is provided.

  The high-pressure liquid is introduced from the liquid supply port 104 into the mixing chamber 108 via the liquid channel 105. At the same time, high-pressure gas is introduced into the mixing chamber 108 from the gas supply port 106 through the gas flow path 107. In the mixing chamber 108, the introduced high-pressure gas collides with the high-pressure liquid, the liquid is refined, and a liquid mist including a large number of liquid fine particles is formed. The liquid mist containing the liquid fine particles is ejected from the mixing chamber 108 to the flow passage 109 in the accelerating pipe portion 103, accelerated in the flow passage 109, and given a momentum in the direction toward the object to be cleaned. A liquid mist flow 110 that travels in a spiral shape is formed by the strip, and is ejected from the ejection port 111 toward the object to be cleaned. FIG. 4 shows an external view of the ejection of the liquid mist flow 110 from the cleaning two-fluid nozzle 2 of the present invention, and the liquid mist flow 110 ejected from the ejection port 111 at the tip of the acceleration tube 103 is a specific one. It shows a tendency to spread with a solid angle.

  The shape of the ejected liquid mist flow 110 can be controlled by changing the shape of the ejection port 111, and as shown in FIG. The shape of the spout 111 seen from the direction of the arrow B in FIG. In such a case, a circular spray pattern 202 can be obtained. Further, in order to flatten the shape of the ejected liquid mist flow 110, the shape of the ejection port 111 seen from the direction of the arrow B in FIG. In such a case, a flat spray pattern 204 can be obtained. Selection of such a pattern can be arbitrarily controlled according to the purpose of cleaning.

  The formation of liquid fine particles requires an appropriate flow rate of liquid and gas, and in order to achieve an appropriate flow rate, it is necessary to pressurize and supply the liquid and gas to the cleaning two-fluid nozzle 2.

  The gas and liquid pressures suitable for the two-fluid nozzle for cleaning and the cleaning method of the present invention are the gas pressure obtained by adding 200 kPa to 900 kPa to atmospheric pressure, and the liquid pressure is 200 kPa to 900 kPa to atmospheric pressure. It is desirable to add. More preferably, the pressures of the gas and the liquid are those obtained by adding 300 kPa to 600 kPa to the atmospheric pressure. The lower limit of the pressure is determined because the detergency decreases, and the upper limit is determined because the consumption of gas and liquid required for cleaning increases.

  The flow rates of the gas and the liquid obtained from such a pressure are each preferably 20 to 200 liters / minute, more preferably 30 to 150 liters / minute, and the liquid flow rate is preferably 0.1 to liters / minute. 2 to 5 liters / minute is desirable, and 0.3 to 2 liters / minute is more preferable. The lower limit of the flow rate is determined because the cleaning power decreases, and the upper limit is determined because the consumption of gas and liquid required for cleaning increases.

  Since the average particle diameter of the liquid fine particles in the liquid mist obtained from such pressure and flow rate is in the range of 20 to 200 μm, and the average flow velocity of the liquid fine particles ejected from the ejection port 111 is 30 to 300 m / sec. is there. As described above, since the kinetic energy at which the high-speed liquid fine particles collide with the object to be cleaned is sufficient to remove the foreign matter adhering to the object to be cleaned, a very effective cleaning power can be obtained.

  In order to obtain the above effective cleaning power, it is necessary to devise the shape of the flow passage of the acceleration pipe portion 103. In the present invention, the length direction of the flow passage is formed on the inner wall of the flow passage in the acceleration pipe portion. Are provided with spiral ridges extending in a spiral shape. FIG. 8 is a partially enlarged view of a portion surrounded by a dotted line of a cross section of the cleaning two-fluid nozzle shown in FIG. 7 (the same mode as the cleaning two-fluid nozzle of FIG. 2). As shown in FIGS. 7 and 8, by forming spiral ridges on the inner wall of the flow passage 109, the average particle size of the liquid fine particles is further refined from the state in the mixing chamber 108, and the ejection speed is accelerated. It is valid.

Volume of the mixing chamber is different depending on the type of the object to be cleaned and the removal target is not particularly limited, when the electronic component and the article to be cleaned, usually, is preferably 1 cm ³ to 5 cm ^3, 1.5 cm More preferably, it is ³ to ³ cm ³ .

  The cross section of the flow passage in the accelerating tube portion is preferably circular, and its size varies depending on the object to be cleaned, the type of object to be removed, and the like, and there is no particular limitation. When an electronic component is an object to be cleaned, the diameter of the flow path is preferably φ0.5 mm to φ5 mm, more preferably φ1 mm to φ3 mm, and the length of the flow path is 3 mm to 60 mm. It is preferably 5 mm to 30 mm. The passage is preferably a straight passage. The shape of the spiral ridge formed on the inner wall of the flow passage is such that the longitudinal cross section of the flow passage on the inner wall of the flow passage is V-shaped, quadrangular, trapezoidal, the top of the V-shape, or the corner of the quadrilateral or trapezoid There are no particular restrictions on the shape with the mark. When the cross section is trapezoidal, the cross section in the length direction of the inner wall of the flow passage forms irregularities. The spiral angle of the spiral protrusion is preferably 20 to 80 degrees, more preferably 30 to 60 degrees. Here, the spiral angle of the spiral ridge means an inclination angle of a tangent on one side of the bottom of the spiral ridge with respect to the central axis in the length direction of the flow passage. The height of the spiral protrusion is preferably 0.05 to 1 mm, and more preferably 0.2 to 0.5 mm. Moreover, it is preferable that the said cross section of a spiral protrusion is a taper-shaped cross section whose taper angle is 20-80 degree | times, and it is more preferable that it is a taper-shaped cross section of 30-60 degree | times. For example, when the cross section is trapezoidal, the lengthwise cross section of the inner wall of the flow passage forms irregularities, and the width of the bottom of the recess and the width of the top of the protrusion are each preferably 0.1 to 2 mm. More preferably, it is 3 to 0.8 mm.

  The spiral-shaped spiral angle of 20 to 80 degrees on the inner wall of the flow passage of the accelerating pipe portion is a particularly effective range for miniaturization and speeding up of liquid fine particles, and the effect tends to be remarkably reduced outside this range. For other spiral protrusion heights of 0.005 to 1 mm, taper shape angles of 20 to 80 degrees, recess bottom width and protrusion top width of 0.1 to 2 mm, these ranges are finer liquid particles, This is particularly effective for speeding up, and the effect tends to be remarkably reduced outside these ranges.

  In order for the liquid mist flow containing such high-speed liquid fine particles to reach the cleaning object effectively, the cross-sectional shape of the liquid fine particles in the liquid mist flow ejected from the ejection port 111 is circular or elliptical, and the liquid mist flow It is desirable that the apex angle of the fan-shaped spray shape ejected from the jet outlet 111 is 30 to 90 degrees.

  It is preferable that the cross-sectional shape of the liquid fine particles is a circle or an ellipse, because the entire surface of the object to be cleaned having a large area can be easily swept by the liquid mist flow that collides with the object to be cleaned. On the other hand, if the apex angle of the fan-shaped spray shape is smaller than the lower limit of the above range, the area of the liquid fine particles colliding with the object to be cleaned becomes too small, and it takes too much time for cleaning, resulting in poor economic efficiency. On the other hand, if this angle is larger than the upper limit of the above range, the distance from the jet outlet to the specific cleaning object becomes too long, and the proportion of the fine particles in which the liquid fine particles are decelerated in the atmosphere and the cleaning power decreases is large. It will be inferior in economic efficiency.

  A similar problem occurs with respect to the distance between the jet outlet and the object to be cleaned. From the economical viewpoint, in the cleaning method of the present invention, the distance between the jet outlet and the object to be cleaned is preferably 10 to 100 mm, and more preferably 20 to 50 mm.

  The type of gas used in the cleaning method of the present invention is not particularly limited as long as it is a pressurized gas, but pressurized air, nitrogen gas, carbon dioxide gas, argon gas and the like are preferable. Air is mainly advantageous from the economical point of view, and nitrogen gas is easy to obtain a high-purity gas that does not contain impurities, so it is safe when combined with flammable liquids to prevent contamination and its nonflammability. Carbon dioxide gas is advantageous from the viewpoint of static electricity prevention because it dissolves in water and increases electrical conductivity.

  The type of liquid used in the cleaning method of the present invention is not particularly limited as long as it is a pressurized liquid, but pressurized pure water, a cleaning solution in which a chemical is dissolved, an organic solvent, and the like are preferable. Pure water is advantageous mainly from the viewpoint of economy and from the viewpoint of preventing contamination because high-purity pure water that does not contain impurities can be obtained easily. Cleaning liquids that dissolve various chemicals are suitable for cleaning with pure water. It is suitable when a reaction is desired to be used together. The organic solvent is suitable when it is desired to use the solvent dissolving power in addition to the cleaning action for the purpose of removing the resist.

  Examples of the gas supply means used in the cleaning apparatus of the present invention, that is, means for supplying a high-pressure gas to the gas introduction part of the cleaning two-fluid nozzle of the present invention include an oil-free screw compressor and two cleaning fluids The structure which consists of the piping used as the flow path of the high voltage | pressure gas between the gas introduction parts of a nozzle, and the valve | bulb provided in a part of piping path | route is mentioned. The liquid supply means, that is, means for supplying a high-pressure liquid to the liquid introduction portion of the cleaning two-fluid nozzle of the present invention includes, for example, a vortex turbine pump and the liquid introduction portion of the two-fluid cleaning nozzle. The structure which consists of the pipe | tube used as the flow path of this high-pressure liquid, and the valve | bulb provided in a part of path | route of piping is mentioned.

  The holding means used in the cleaning apparatus of the present invention, that is, means for holding the cleaning two-fluid nozzle and the object to be cleaned at a position where the liquid mist flow ejected from the cleaning two-fluid nozzle collides with the object to be cleaned. The two-fluid nozzle for cleaning and the object to be cleaned are preferably held while being relatively moved. By holding both of them to be relatively movable, it is possible to efficiently clean a large-area object to be cleaned or a plurality of objects to be cleaned. As an example of the holding means, there may be mentioned one constituted by a nozzle holder for fixing the cleaning two-fluid nozzle at a fixed position and a roller transport mechanism having a plurality of rollers arranged in parallel for transporting the object to be cleaned.

  Examples of the constituent material of the liquid contact portion of the flow path including the two-fluid nozzle for cleaning and the pipe of the cleaning device of the present invention include iron-based alloys such as Ti and stainless steel, ceramics, quartz, and polymer materials. This material should be selected economically from the viewpoint of mechanical strength that can withstand high pressure and prevention of contamination of the object to be cleaned by melting the material itself, and stainless steel is suitable for providing inexpensive piping and nozzles. Polymer materials typified by fluorine resin, polyimide, PEEK and the like are suitable for providing a low contamination nozzle that does not elute metal ions. Of course, other metal materials, polymer materials, ceramics, etc. can be used.

  In order to perform the cleaning efficiently by driving the two-fluid nozzle for cleaning according to the present invention, a valve is provided in a part of the pipe for supplying high-pressure gas and the pipe for supplying high-pressure liquid. It is preferable to supply gas and liquid to the nozzle only.

  Further, the opening and closing of the valve needs to be driven and cleaned only when the position to be cleaned is arranged on the front surface of the nozzle in synchronization with the relative movement of the object to be cleaned and the nozzle. In the absence of such a control system, the cleaning efficiency is significantly reduced with respect to the amount of gas and liquid consumed.

  In the cleaning method and the cleaning apparatus of the present invention, a plurality of nozzles can be used in combination. For a relatively large object to be cleaned, a plurality of nozzles are simultaneously driven to shorten the cleaning time. May be desirable.

  In the cleaning apparatus of the present invention, it is further desirable to add a drain for recovering the gas and liquid ejected into the cleaning chamber. By using the drain, the inside of the cleaning chamber becomes a negative pressure, and the gas liquid can be prevented from leaking to an undesired portion.

An example of the embodiment of the present invention will be described below with reference to FIG.
FIG. 9 is a perspective view showing a part of a cleaning apparatus suitable for using the cleaning two-fluid nozzle 301 of the present invention having the structure shown in FIG. A plurality of cleaning two-fluid nozzles 301 are linearly arranged and fixed to the nozzle holder 303 and arranged above the substrate 302, so that the wide substrate 302 can be efficiently cleaned. Further, the substrate 302 can be moved in one direction using the roller transport mechanism 304.

  High-pressure air and high-pressure pure water are supplied to the cleaning two-fluid nozzle 301, and a liquid mist flow formed in the cleaning two-fluid nozzle 301 is sprayed onto the substrate 302 like a spray pattern 305, to the substrate 302. Adhering foreign particles can be removed.

  With the cleaning device of FIG. 9, the pressure of air and pure water supplied to the cleaning two-fluid nozzle 301 was systematically changed to try to evaluate the cleaning power.

The experimental conditions at the time of evaluation were that about 20,000 fixed type spacers having an average particle diameter of 3 μm were dispersed on a 300 × 400 mm glass substrate, heated at 150 ° C. for 15 minutes to be fixed, and then cooled to room temperature. This is obtained from the result of cleaning with the nozzle-substrate distance of 40 mm of the two-fluid nozzle for cleaning while moving the nozzle at a relative speed of 20 mm / s. The nozzle specifications at this time are such that the volume of the mixing chamber is 2.2 cm ³ , the length of the flow path of the accelerating tube is 20 mm, the diameter of the flow path is φ2 mm, and the material is stainless steel. The relationship between cleaning power and gas consumption was compared between the case where spiral ridges were formed on the inner wall of the flow passage and the case where spiral ridges were not formed. The only difference between them is whether or not spiral ridges are formed, and the other structures and shapes are exactly the same. The specifications of the spiral ridge at this time are shown in FIGS. 7 and 8, in which the spiral angle of the entire spiral is 45 degrees, the height h of the spiral ridge is 0.6 mm, and the taper angle of the spiral ridge is 45 degrees. The width a of the bottom of the concave portion and the width b of the top of the convex portion were each 0.5 mm.

  The evaluation method is a comparison between high-pressure gas consumption and non-spiral ridge nozzles that can achieve a removal rate of 95% due to the relationship between high-pressure gas consumption and spacer removal rate, which is a measure of cleaning power. did. 500 kPa air was used as the high-pressure gas to be supplied, and 500 kPa pure water was used as the high-pressure liquid to be supplied. As a result, as shown in FIG. 10, the consumption of high-pressure gas at which a removal rate of 95% is obtained is 75 liters / minute for the spiral ridge nozzle, and 150 liters / minute for the non-spiral ridge nozzle, It was found that the nozzle with the spiral ridge can obtain the same foreign matter removal rate as that of the conventional non-spiral ridge nozzle even when the gas consumption is about half.

  As a result of the above cleaning, in the present invention, in the case where the spiral ribs are formed on the inner wall portion of the accelerating pipe portion flow passage of the cleaning two-fluid nozzle, the gas flow rate is less than half with the foreign matter removal rate being 95% or more. It can be seen that the problem of the two-fluid cleaning method, that is, the high gas running cost and the high cost of incidental equipment such as a compressor can be solved.

  Furthermore, when comparing the size and speed of the liquid fine particles ejected from the spiral shaped nozzle and the non-spiral nozzle under cleaning conditions that can achieve a foreign matter removal rate of 95%, the conventional non-spiral nozzle has a fine particle diameter of 40 to 50 μm. The spiral nozzle of the present invention had a fine particle diameter of 20 to 30 μm and a speed of 200 m / s. It can be seen that the liquid fine particles ejected from the spiral-shaped nozzle are further refined and the speed is doubled. In general, it is known that the cleaning power is proportional to the fine particle velocity. Even if the gas consumption is reduced to about half, the removal rate of foreign particles equal to or higher than that of conventional nozzles can be obtained. It can be said that

The figure which showed the washing | cleaning method of this invention typically with the systematic diagram. Sectional drawing of the 2 fluid nozzle for washing | cleaning of 1 aspect of this invention. Sectional drawing of the AA 'part of FIG. The perspective view which shows the external appearance of a mode that a liquid mist flow ejects from the 2 fluid nozzle for washing | cleaning of 1 aspect of this invention. The top view which shows an example of the jet nozzle shape of the acceleration pipe part of the 2 fluid nozzle of 1 aspect of this invention, and a spray pattern. The top view which shows an example of the jet nozzle shape of the acceleration pipe part of the 2 fluid nozzle of 1 aspect of this invention, and a spray pattern. Sectional drawing of the 2 fluid nozzle for washing | cleaning of 1 aspect of this invention. The elements on larger scale of the part enclosed with the dotted line of FIG. The perspective view which shows a mode that it wash | cleans using the washing | cleaning apparatus of 1 aspect of this invention. The figure which showed the relationship between the 2 fluid nozzle for washing | cleaning of this invention, the spacer removal rate of a conventional product, and gas consumption.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Cleaning chamber 2 ... Cleaning 2 fluid nozzle 3 ... Object to be cleaned 4 ... Pipe supplying gas 5 ... Pipe supplying liquid 6 ... Liquid mist flow 7 ... Valve 8 ... Control system 9 ... Drain 101 ... Introduction part 101A DESCRIPTION OF SYMBOLS Liquid introduction part 101B ... Gas introduction part 102 ... Mixing part 103 ... Acceleration pipe part 104 ... Liquid supply port 105 ... Liquid flow path 106 ... Gas supply port 107 ... Gas flow path 108 ... Mixing chamber 109 ... Flow path in acceleration pipe part DESCRIPTION OF SYMBOLS 110 ... Liquid mist flow 111 ... Jet nozzle 201 ... Accelerator pipe jet shape 202 ... Spray pattern 203 ... Accelerator pipe jet nozzle shape 204 ... Spray pattern 301 ... Cleaning 2 fluid nozzle 302 ... Substrate 303 ... Nozzle holder 304 ... Conveyance roller 305 ... Spray pattern

Claims (7)

A two-fluid nozzle for cleaning that ejects a liquid mist flow from a jet outlet and collides with an object to be cleaned,
A gas-liquid mixing section that mixes high-pressure gas and high-pressure liquid to form liquid mist,
A gas introduction part for introducing a high-pressure gas into the gas-liquid mixing part,
A liquid introduction part for introducing a high-pressure liquid into the gas-liquid mixing part; and
It has a flow path from the gas-liquid mixing part to the jet outlet inside, it has an acceleration pipe part that gives momentum to the liquid mist in the flow path to form a liquid mist flow, and it is on the inner wall of the flow path in the acceleration pipe part A two-fluid nozzle for cleaning, wherein spiral ridges extending spirally in the length direction of the flow passage are provided.   The two-fluid nozzle for cleaning according to claim 1, wherein the spiral angle of the spiral protrusion is 20 to 80 degrees.   The two-fluid nozzle for cleaning according to claim 1 or 2, wherein the height of the spiral protrusion is 0.05 to 1 mm.   The two-fluid nozzle for cleaning according to any one of claims 1 to 3, wherein the spiral protrusion has a tapered cross section having a taper angle of 20 to 80 degrees.   The spiral ridges form irregularities in the cross-section in the length direction of the flow passage on the inner wall of the flow passage, and the width of the bottom of the concave portion and the width of the top of the convex portion are 0.1 to 2 mm, respectively. The two-fluid nozzle for cleaning according to any one of claims 1 to 4.   A method for cleaning an object to be cleaned using the cleaning two-fluid nozzle according to any one of claims 1 to 5, wherein a high-pressure gas and a high-pressure liquid are simultaneously supplied to a gas-liquid mixing portion of the cleaning two-fluid nozzle. A liquid formed by supplying a high-pressure gas to the gas introduction part and a high-pressure liquid to the liquid introduction part at the same time so that a liquid mist is formed by being introduced, and the liquid mist passes through the flow passage in the acceleration pipe part. A cleaning method in which a mist flow is ejected from a jet outlet and collides with an object to be cleaned. The two-fluid nozzle for cleaning according to any one of claims 1 to 5, a gas supply means for supplying a high-pressure gas to a gas introducing portion of the two-fluid nozzle for cleaning, and a high-pressure liquid for a liquid introducing portion of the two-fluid nozzle for cleaning. A cleaning apparatus having liquid supply means for supplying, and holding means for holding the cleaning two-fluid nozzle and the object to be cleaned at a position where the liquid mist flow ejected from the cleaning two-fluid nozzle collides with the object to be cleaned.

Images