CN201744919U - 预热研磨垫的研磨机台 - Google Patents
预热研磨垫的研磨机台 Download PDFInfo
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- CN201744919U CN201744919U CN2010202483634U CN201020248363U CN201744919U CN 201744919 U CN201744919 U CN 201744919U CN 2010202483634 U CN2010202483634 U CN 2010202483634U CN 201020248363 U CN201020248363 U CN 201020248363U CN 201744919 U CN201744919 U CN 201744919U
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CN2010202483634U CN201744919U (zh) | 2010-06-25 | 2010-06-25 | 预热研磨垫的研磨机台 |
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CN2010202483634U CN201744919U (zh) | 2010-06-25 | 2010-06-25 | 预热研磨垫的研磨机台 |
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CN201744919U true CN201744919U (zh) | 2011-02-16 |
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CN2010202483634U Expired - Fee Related CN201744919U (zh) | 2010-06-25 | 2010-06-25 | 预热研磨垫的研磨机台 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102419603A (zh) * | 2011-05-26 | 2012-04-18 | 上海华力微电子有限公司 | 一种化学机械研磨过程中研磨垫的温度控制系统 |
US10160090B2 (en) | 2015-11-12 | 2018-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Chemical mechanical polishing method |
CN111546228A (zh) * | 2020-05-14 | 2020-08-18 | 长江存储科技有限责任公司 | 一种研磨垫温度控制方法、装置及研磨设备 |
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2010
- 2010-06-25 CN CN2010202483634U patent/CN201744919U/zh not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102419603A (zh) * | 2011-05-26 | 2012-04-18 | 上海华力微电子有限公司 | 一种化学机械研磨过程中研磨垫的温度控制系统 |
US10160090B2 (en) | 2015-11-12 | 2018-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Chemical mechanical polishing method |
CN111546228A (zh) * | 2020-05-14 | 2020-08-18 | 长江存储科技有限责任公司 | 一种研磨垫温度控制方法、装置及研磨设备 |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20121108 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING |
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TR01 | Transfer of patent right |
Effective date of registration: 20121108 Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110216 Termination date: 20180625 |
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CF01 | Termination of patent right due to non-payment of annual fee |