CN201476761U - White light interference three-dimensional outline measuring instrument - Google Patents

White light interference three-dimensional outline measuring instrument Download PDF

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Publication number
CN201476761U
CN201476761U CN2009201755906U CN200920175590U CN201476761U CN 201476761 U CN201476761 U CN 201476761U CN 2009201755906 U CN2009201755906 U CN 2009201755906U CN 200920175590 U CN200920175590 U CN 200920175590U CN 201476761 U CN201476761 U CN 201476761U
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China
Prior art keywords
worktable
interference microscope
instrument
white light
interference
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Expired - Fee Related
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CN2009201755906U
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Chinese (zh)
Inventor
罗先照
胡志强
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SUZHOU HZS-NANOSURF NANOTECHNOLOGY Co Ltd
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SUZHOU HZS-NANOSURF NANOTECHNOLOGY Co Ltd
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Abstract

The utility model relates to a white light interference three-dimensional outline measuring instrument for upgrading an interference microscope, comprising a quakeproof platform, an instrument main machine, an electronic controller and a computer which are arranged on the upper surface of the quakeproof platform, wherein the instrument main machine comprises a 6JA interference microscope, a CCD photographing, holographic diffraction grating measuring device and a bracket seat and a co-baseplate moving X-Y worktable is arranged on the upper surface of the bracket seat and the holographic diffraction grating measuring device is arranged at the left side of the upper surface of the co-baseplate moving X-Y worktable and a vertical movement driving device is arranged at the right side of the upper surface of the co-baseplate moving X-Y worktable and a vertical movement worktable seat is arranged on the upper surface of the vertical movement driving device and the 6JA interference microscope is arranged over the vertical movement worktable seat. The beneficial effects of the utility model are that: the three-dimensional surface topography feature with RZ of 0.001-2.0 Mum is accurately measured and the product not only has inheritance, but also satisfies the development requirement for engineering project surface measurement and the white light interference three-dimensional outline measuring instrument is an ideal surface non-contact measuring instrument.

Description

The white light interference instrument for measuring three-dimensional profile that is used for the interference microscope upgrading
Technical field
The utility model relates to a kind of white light interference instrument for measuring three-dimensional profile that is used for the interference microscope upgrading.
Background technology
Interference microscope be mainly used in measure R z be 0.032-0.8 μ m ( -
Figure G2009201755906D00012
) engineering surface roughness, highly less groove and step dimension etc., from the middle of last century is the key instrument of the high-grade surfaceness of non-cpntact measurement so far always, and the 6JA interference microscope that the optical instrument factory, Shanghai produces is the major product on the home market.But along with technology rapid development such as microelectronics, super-fine processing and biotechnologys, require the surperficial pattern of true reflection and other function of surface feature etc., the data that traditional interference microscope is surveyed are too simple, measurement range is little, and measuring error is big, efficiency of measurement is low, can not adapt to new request of national standard.
The utility model content
The purpose of this utility model provides a kind of white light interference instrument for measuring three-dimensional profile that is used for the interference microscope upgrading, too simple to overcome the data that traditional interference microscope surveyed, measurement range is little, and measuring error is big, efficiency of measurement is low, can not adapt to the deficiency that new national standard requires.
The purpose of this utility model is to be achieved through the following technical solutions:
A kind of white light interference instrument for measuring three-dimensional profile that is used for the interference microscope upgrading, comprise shockproof platform, the upper surface of described shockproof platform is provided with instrument host, electronic controller and computing machine, between instrument host and the electronic controller, all be connected between electronic controller and the computing machine by lead, described instrument host comprises the 6JA interference microscope, CCD (charge-coupled image sensor) shooting, holographic diffraction grating measuring apparatus and carrier base, the upper surface of carrier base is provided with co-baseplane motion X-Y worktable, the left side of co-baseplane motion X-Y worktable upper surface is provided with the holographic diffraction grating measuring apparatus, the right side of co-baseplane motion X-Y worktable upper surface is provided with the perpendicular displacement drive unit, the upper surface of perpendicular displacement drive unit is provided with the perpendicular displacement table rest, the perpendicular displacement table rest comprises metering diffraction grating and piezoelectric ceramics, piezoelectric ceramics is connected with the perpendicular displacement table rest by flexible hinge, be provided with the 6JA interference microscope directly over the perpendicular displacement table rest, the sidewall of 6JA interference microscope is provided with the CCD shooting.
The beneficial effects of the utility model are: traditional 6JA interference microscope is equipped with nanometer metering, driving, CCD shooting, computer technology and powerful software systems, accurately measure R z is the 3 d surface topography feature of 0.001-2.0 μ m, be mainly used to measure two, three-dimensional surface roughness, step, groove height and surface profile size etc., the existing inheritance of product, can satisfy the demand for development that engineering surface is measured again, be a kind of desirable surperficial non-contact measuring device.
Description of drawings
With reference to the accompanying drawings the utility model is described in further detail below.
Fig. 1 is the inner structure synoptic diagram of the instrument host of the described a kind of white light interference instrument for measuring three-dimensional profile that is used for interference microscope upgrading of the utility model embodiment;
Fig. 2 is the described a kind of fundamental diagram that is used for the white light interference instrument for measuring three-dimensional profile of interference microscope upgrading of the utility model embodiment.
Among the figure:
1, shockproof platform; 2, instrument host; 3, electronic controller; 4, computing machine; 5,6JA interference microscope; 6, CCD shooting; 7, holographic diffraction grating measuring apparatus; 8, carrier base; 9, co-baseplane motion X-Y worktable; 10, perpendicular displacement drive unit; 11, perpendicular displacement table rest; 12, metering diffraction grating; 13, piezoelectric ceramics; 14, flexible hinge.
Embodiment
Shown in Fig. 1-2, the described a kind of white light interference instrument for measuring three-dimensional profile that is used for the interference microscope upgrading of the utility model embodiment, comprise shockproof platform 1, the upper surface of described shockproof platform 1 is provided with instrument host 2, electronic controller 3 and computing machine 4, between instrument host 2 and the electronic controller 3, all be connected between electronic controller 3 and the computing machine 4 by lead, described instrument host 2 comprises 6JA interference microscope 5, CCD shooting 6, holographic diffraction grating measuring apparatus 7 and carrier base 8, the upper surface of carrier base 8 is provided with co-baseplane motion X-Y worktable 9, the left side of co-baseplane motion X-Y worktable 9 upper surfaces is provided with holographic diffraction grating measuring apparatus 7, the right side of co-baseplane motion X-Y worktable 9 upper surfaces is provided with perpendicular displacement drive unit 10, the upper surface of perpendicular displacement drive unit 10 is provided with perpendicular displacement table rest 11, perpendicular displacement table rest 11 comprises metering diffraction grating 12 and piezoelectric ceramics 13, piezoelectric ceramics 13 is connected with perpendicular displacement table rest 11 by flexible hinge 14, be provided with 6JA interference microscope 5 directly over the perpendicular displacement table rest 11, the sidewall of 6JA interference microscope 5 is provided with CCD shooting 6.
When concrete the use, instrument host 2 and electronic controller 3 are connected with computing machine 4 and are placed on the shockproof platform 1, testing sample is placed on the perpendicular displacement table rest 11, perpendicular displacement table rest 11 is equidistantly driven by piezoelectric ceramics 13 nanoscales, interference fringe moves thereupon, white-light fringe is obtained by improved 6JA interference microscope 5, the interference image of CCD shooting 6 each moved further of record, by electronic controller 3 operations, holographic diffraction grating measuring apparatus 7 is each step displacement of record accurately, handles through 4 pairs of all images of computing machine.Can obtain the three-dimensional appearance figure on surface, carry out analyzing and processing by analyzing software system again.
Above the utility model is implemented the described white light interference instrument for measuring three-dimensional profile that is used for the interference microscope upgrading, traditional 6JA interference microscope is upgraded to instrument for measuring three-dimensional profile, keep the artificial reading of former microscope, evaluation function, can obtain two-dimensional parameter and curve by single image, its perpendicular displacement amount is by the diffraction grating interferometry, and worktable has the large range high precision feature.The described white light interference instrument for measuring three-dimensional profile that is used for the interference microscope upgrading, accurately measure R z is the 3 d surface topography feature of 0.001-2.0 μ m, be mainly used to measure two, three-dimensional surface roughness, step, groove height and surface profile size etc., conventional interference microscope measurement range is little to overcome, measuring error big, measure the low deficiency of benefit, the existing inheritance of product, can satisfy the demand for development that engineering surface is measured again, be a kind of desirable surperficial non-contact measuring device.

Claims (3)

1. one kind is used for the white light interference instrument for measuring three-dimensional profile that interference microscope is upgraded, comprise shockproof platform (1), the upper surface of described shockproof platform (1) is provided with instrument host (2), electronic controller (3) and computing machine (4), between instrument host (2) and the electronic controller (3), all be connected between electronic controller (3) and the computing machine (4) by lead, it is characterized in that: described instrument host (2) comprises 6JA interference microscope (5), CCD make a video recording (6), holographic diffraction grating measuring apparatus (7) and carrier base (8), the upper surface of carrier base (8) is provided with co-baseplane motion X-Y worktable (9), the left side of co-baseplane motion X-Y worktable (9) upper surface is provided with holographic diffraction grating measuring apparatus (7), and the right side of co-baseplane motion X-Y worktable (9) upper surface is provided with perpendicular displacement drive unit (10).
2. the white light interference instrument for measuring three-dimensional profile that is used for the interference microscope upgrading according to claim 1, it is characterized in that: the upper surface of described perpendicular displacement drive unit (10) is provided with perpendicular displacement table rest (11).
3. the white light interference instrument for measuring three-dimensional profile that is used for the interference microscope upgrading according to claim 1 and 2, it is characterized in that: described perpendicular displacement table rest (11) comprises metering diffraction grating (12) and piezoelectric ceramics (13), piezoelectric ceramics (13) is connected with perpendicular displacement table rest (11) by flexible hinge (14), be provided with 6JA interference microscope (5) directly over the perpendicular displacement table rest (11), the sidewall of 6JA interference microscope (5) is provided with CCD shooting (6).
CN2009201755906U 2009-08-24 2009-08-24 White light interference three-dimensional outline measuring instrument Expired - Fee Related CN201476761U (en)

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Application Number Priority Date Filing Date Title
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012155688A1 (en) * 2011-05-18 2012-11-22 天津大学 Optical free surface 3d profile high-precision non-contact measurement method and device
CN103697832A (en) * 2013-12-30 2014-04-02 镇江超纳仪器有限公司(中外合资) Method of vertical white light scanning interference open-loop control
CN105783771A (en) * 2016-03-04 2016-07-20 镇江超纳仪器有限公司(中外合资) Method through white-light interference vertical scanning method nonlinear open-loop scanning
CN109031636A (en) * 2018-09-11 2018-12-18 中国科学院长春光学精密机械与物理研究所 A kind of digital holographic microscope with variable-resolution
CN111947571A (en) * 2020-07-16 2020-11-17 深圳市中图仪器股份有限公司 Micro-force measuring type three-dimensional comprehensive thread measuring machine measuring head and measuring method thereof
CN112833812A (en) * 2019-11-22 2021-05-25 卡尔蔡司显微镜有限责任公司 Measuring device for testing a sample and method for determining a height map of a sample

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012155688A1 (en) * 2011-05-18 2012-11-22 天津大学 Optical free surface 3d profile high-precision non-contact measurement method and device
CN103697832A (en) * 2013-12-30 2014-04-02 镇江超纳仪器有限公司(中外合资) Method of vertical white light scanning interference open-loop control
CN103697832B (en) * 2013-12-30 2016-05-25 镇江超纳仪器有限公司(中外合资) A kind of method of white light interference vertical scanning open loop control
CN105783771A (en) * 2016-03-04 2016-07-20 镇江超纳仪器有限公司(中外合资) Method through white-light interference vertical scanning method nonlinear open-loop scanning
CN105783771B (en) * 2016-03-04 2018-09-28 镇江超纳仪器有限公司(中外合资) The method of white light interference vertical scanning method non-linear open-loop scanning
CN109031636A (en) * 2018-09-11 2018-12-18 中国科学院长春光学精密机械与物理研究所 A kind of digital holographic microscope with variable-resolution
CN112833812A (en) * 2019-11-22 2021-05-25 卡尔蔡司显微镜有限责任公司 Measuring device for testing a sample and method for determining a height map of a sample
CN112833812B (en) * 2019-11-22 2023-07-18 卡尔蔡司显微镜有限责任公司 Measuring instrument for testing a sample and method for determining a height map of a sample
CN111947571A (en) * 2020-07-16 2020-11-17 深圳市中图仪器股份有限公司 Micro-force measuring type three-dimensional comprehensive thread measuring machine measuring head and measuring method thereof
CN111947571B (en) * 2020-07-16 2021-08-31 深圳市中图仪器股份有限公司 Micro-force measuring type three-dimensional comprehensive thread measuring machine measuring head and measuring method thereof

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C17 Cessation of patent right
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Granted publication date: 20100519

Termination date: 20130824