CN1970300A - 在喷墨打印头喷嘴板的表面上形成疏水性涂层的方法 - Google Patents
在喷墨打印头喷嘴板的表面上形成疏水性涂层的方法 Download PDFInfo
- Publication number
- CN1970300A CN1970300A CNA200610105417XA CN200610105417A CN1970300A CN 1970300 A CN1970300 A CN 1970300A CN A200610105417X A CNA200610105417X A CN A200610105417XA CN 200610105417 A CN200610105417 A CN 200610105417A CN 1970300 A CN1970300 A CN 1970300A
- Authority
- CN
- China
- Prior art keywords
- nozzle
- hydrophobic coating
- nozzle plate
- film
- polymeric layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002209 hydrophobic effect Effects 0.000 title claims abstract description 57
- 238000000034 method Methods 0.000 title claims abstract description 47
- 239000011247 coating layer Substances 0.000 title abstract 4
- 239000002184 metal Substances 0.000 claims abstract description 46
- 229910052751 metal Inorganic materials 0.000 claims abstract description 46
- 239000010410 layer Substances 0.000 claims abstract description 39
- 238000007747 plating Methods 0.000 claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims description 53
- 238000000576 coating method Methods 0.000 claims description 53
- 239000013047 polymeric layer Substances 0.000 claims description 35
- 229920000642 polymer Polymers 0.000 claims description 12
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 229920002120 photoresistant polymer Polymers 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 3
- KUCOHFSKRZZVRO-UHFFFAOYSA-N terephthalaldehyde Chemical compound O=CC1=CC=C(C=O)C=C1 KUCOHFSKRZZVRO-UHFFFAOYSA-N 0.000 claims description 3
- 208000034189 Sclerosis Diseases 0.000 claims description 2
- 230000008569 process Effects 0.000 claims description 2
- 239000000976 ink Substances 0.000 description 53
- 239000005864 Sulphur Substances 0.000 description 8
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- -1 sulphur compound Chemical class 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000012190 activator Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000004078 waterproofing Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1606—Coating the nozzle area or the ink chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1643—Manufacturing processes thin film formation thin film formation by plating
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Description
Claims (16)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR113498/05 | 2005-11-25 | ||
KR1020050113498A KR20070055129A (ko) | 2005-11-25 | 2005-11-25 | 잉크젯 프린트헤드의 노즐 플레이트 표면에 소수성코팅막을 형성하는 방법 |
KR1020050124379A KR101257837B1 (ko) | 2005-12-16 | 2005-12-16 | 잉크젯 프린트헤드의 노즐 플레이트 표면에 소수성코팅막을 형성하는 방법 |
KR124379/05 | 2005-12-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1970300A true CN1970300A (zh) | 2007-05-30 |
CN1970300B CN1970300B (zh) | 2010-06-23 |
Family
ID=38111398
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200610105417XA Expired - Fee Related CN1970300B (zh) | 2005-11-25 | 2006-07-06 | 在喷墨打印头喷嘴板的表面上形成疏水性涂层的方法 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR20070055129A (zh) |
CN (1) | CN1970300B (zh) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102642404A (zh) * | 2006-12-01 | 2012-08-22 | 富士胶卷迪马蒂克斯股份有限公司 | 在流体喷射器上的非润湿涂层 |
CN104228337A (zh) * | 2013-06-20 | 2014-12-24 | 珠海纳思达企业管理有限公司 | 液体喷射头和液体喷射装置 |
CN104669795A (zh) * | 2013-11-29 | 2015-06-03 | 佳能株式会社 | 液体排出头的制造方法 |
CN106183420A (zh) * | 2016-08-04 | 2016-12-07 | 纳晶科技股份有限公司 | 一种液体喷头、用于液体喷头的喷嘴板及该喷嘴板的制作方法 |
CN106914393A (zh) * | 2015-12-28 | 2017-07-04 | 意法半导体股份有限公司 | 用于半导体基板的表面处理的方法 |
CN107856417A (zh) * | 2014-12-22 | 2018-03-30 | 意法半导体股份有限公司 | 用于半导体衬底的表面处理的方法 |
CN109807028A (zh) * | 2019-03-28 | 2019-05-28 | 信利光电股份有限公司 | 一种改善狭缝涂布头上光阻结晶的方法 |
CN111158222A (zh) * | 2018-11-08 | 2020-05-15 | 三星电子株式会社 | 化学物质供应结构和具有其的显影设备 |
CN113059912A (zh) * | 2021-03-25 | 2021-07-02 | 苏州印科杰特半导体科技有限公司 | 一种防止墨水溢出的多层聚合物喷墨腔室及其制作工艺 |
CN114126878A (zh) * | 2019-07-30 | 2022-03-01 | 惠普发展公司,有限责任合伙企业 | 均匀的打印头表面涂层 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0113639D0 (en) * | 2001-06-05 | 2001-07-25 | Xaar Technology Ltd | Nozzle plate for droplet deposition apparatus |
-
2005
- 2005-11-25 KR KR1020050113498A patent/KR20070055129A/ko not_active Application Discontinuation
-
2006
- 2006-07-06 CN CN200610105417XA patent/CN1970300B/zh not_active Expired - Fee Related
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102642404B (zh) * | 2006-12-01 | 2015-10-28 | 富士胶卷迪马蒂克斯股份有限公司 | 在流体喷射器上的非润湿涂层 |
CN102642404A (zh) * | 2006-12-01 | 2012-08-22 | 富士胶卷迪马蒂克斯股份有限公司 | 在流体喷射器上的非润湿涂层 |
CN104228337A (zh) * | 2013-06-20 | 2014-12-24 | 珠海纳思达企业管理有限公司 | 液体喷射头和液体喷射装置 |
CN104669795A (zh) * | 2013-11-29 | 2015-06-03 | 佳能株式会社 | 液体排出头的制造方法 |
US9919526B2 (en) | 2013-11-29 | 2018-03-20 | Canon Kabushiki Kaisha | Method for manufacturing liquid discharge head |
CN107856417A (zh) * | 2014-12-22 | 2018-03-30 | 意法半导体股份有限公司 | 用于半导体衬底的表面处理的方法 |
CN107856417B (zh) * | 2014-12-22 | 2019-12-24 | 意法半导体股份有限公司 | 用于半导体衬底的表面处理的方法 |
CN106914393A (zh) * | 2015-12-28 | 2017-07-04 | 意法半导体股份有限公司 | 用于半导体基板的表面处理的方法 |
CN106183420A (zh) * | 2016-08-04 | 2016-12-07 | 纳晶科技股份有限公司 | 一种液体喷头、用于液体喷头的喷嘴板及该喷嘴板的制作方法 |
CN111158222A (zh) * | 2018-11-08 | 2020-05-15 | 三星电子株式会社 | 化学物质供应结构和具有其的显影设备 |
CN109807028A (zh) * | 2019-03-28 | 2019-05-28 | 信利光电股份有限公司 | 一种改善狭缝涂布头上光阻结晶的方法 |
CN114126878A (zh) * | 2019-07-30 | 2022-03-01 | 惠普发展公司,有限责任合伙企业 | 均匀的打印头表面涂层 |
US11691423B2 (en) | 2019-07-30 | 2023-07-04 | Hewlett-Packard Development Company, L.P. | Uniform print head surface coating |
US11780226B2 (en) | 2019-07-30 | 2023-10-10 | Hewlett-Packard Development Company, L.P. | Fluid ejection devices |
CN114126878B (zh) * | 2019-07-30 | 2023-10-31 | 惠普发展公司,有限责任合伙企业 | 均匀的打印头表面涂层 |
CN113059912A (zh) * | 2021-03-25 | 2021-07-02 | 苏州印科杰特半导体科技有限公司 | 一种防止墨水溢出的多层聚合物喷墨腔室及其制作工艺 |
Also Published As
Publication number | Publication date |
---|---|
CN1970300B (zh) | 2010-06-23 |
KR20070055129A (ko) | 2007-05-30 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: SAMSUNG ELECTRONICS CO., LTD. Free format text: FORMER OWNER: SAMSUNG ELECTRONICS CO., LTD Effective date: 20100409 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20100409 Address after: Gyeonggi Do, South Korea Applicant after: Samsung Electro-Mechanics Co., Ltd. Address before: Gyeonggi Do, South Korea Applicant before: Samsung Electronics Co., Ltd. |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100623 Termination date: 20140706 |
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EXPY | Termination of patent right or utility model |