CN1946873B - 基板拱顶转动机构 - Google Patents

基板拱顶转动机构 Download PDF

Info

Publication number
CN1946873B
CN1946873B CN2005800131933A CN200580013193A CN1946873B CN 1946873 B CN1946873 B CN 1946873B CN 2005800131933 A CN2005800131933 A CN 2005800131933A CN 200580013193 A CN200580013193 A CN 200580013193A CN 1946873 B CN1946873 B CN 1946873B
Authority
CN
China
Prior art keywords
substrate
vault
side gear
dome
rotating mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2005800131933A
Other languages
English (en)
Chinese (zh)
Other versions
CN1946873A (zh
Inventor
布施丰
阿部辰弥
泷本昌行
小室弘之
青名端一仁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Shinku Co Ltd
Original Assignee
Showa Shinku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Shinku Co Ltd filed Critical Showa Shinku Co Ltd
Publication of CN1946873A publication Critical patent/CN1946873A/zh
Application granted granted Critical
Publication of CN1946873B publication Critical patent/CN1946873B/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CN2005800131933A 2004-06-25 2005-01-24 基板拱顶转动机构 Expired - Fee Related CN1946873B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004187285A JP4002959B2 (ja) 2004-06-25 2004-06-25 基板ドーム回転機構
JP187285/2004 2004-06-25
PCT/JP2005/000851 WO2006001095A1 (ja) 2004-06-25 2005-01-24 基板ドーム回転機構

Publications (2)

Publication Number Publication Date
CN1946873A CN1946873A (zh) 2007-04-11
CN1946873B true CN1946873B (zh) 2010-09-29

Family

ID=35776645

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005800131933A Expired - Fee Related CN1946873B (zh) 2004-06-25 2005-01-24 基板拱顶转动机构

Country Status (4)

Country Link
JP (1) JP4002959B2 (https=)
KR (1) KR100855174B1 (https=)
CN (1) CN1946873B (https=)
WO (1) WO2006001095A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008138276A (ja) * 2006-12-05 2008-06-19 Tsukishima Kikai Co Ltd 真空成膜装置
CN104651795B (zh) * 2015-03-10 2017-01-11 丹阳市鼎新机械设备有限公司 一种镜片真空镀膜机用旋转台
JP6019310B1 (ja) * 2015-04-16 2016-11-02 ナルックス株式会社 蒸着装置及び蒸着装置による成膜工程を含む製造方法
EP3840012A1 (en) * 2019-12-20 2021-06-23 Essilor International Optimized crucible assembly and method for physical vapor deposition

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2853267B2 (ja) * 1990-05-25 1999-02-03 本田技研工業株式会社 ３組の遊星歯車列を用いた一体遊星歯車変速機
JPH0754286Y2 (ja) * 1990-06-27 1995-12-18 関西日本電気株式会社 蒸着用プラネタ
KR960013625B1 (ko) * 1992-12-22 1996-10-10 재단법인 한국전자통신연구소 진공 열증착장치
JPH0835065A (ja) * 1994-07-22 1996-02-06 Murata Mfg Co Ltd 真空成膜装置
US6294025B1 (en) * 1996-11-01 2001-09-25 THEVA DüNNSCHICHTTECHNIK GMBH Device for producing oxidic thin films
JP4482972B2 (ja) * 1999-09-08 2010-06-16 株式会社昭和真空 光学薄膜製造装置

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2001-73136A 2001.03.21
JP特开平8-35065A 1996.02.06

Also Published As

Publication number Publication date
JP4002959B2 (ja) 2007-11-07
CN1946873A (zh) 2007-04-11
KR100855174B1 (ko) 2008-08-29
KR20070024518A (ko) 2007-03-02
JP2006009082A (ja) 2006-01-12
WO2006001095A1 (ja) 2006-01-05

Similar Documents

Publication Publication Date Title
CN115161611B (zh) 一种镀膜系统
KR101665197B1 (ko) 성막 장치
KR20010020987A (ko) 기판처리장치
CN1946873B (zh) 基板拱顶转动机构
US7371285B2 (en) Motorized chamber lid
JP2007243060A (ja) 気相成長装置
US20100230273A1 (en) Film forming apparatus and film forming method
TW201546386A (zh) 可搬型旋轉裝置及成膜裝置
JP2013242215A (ja) 水晶発振式膜厚計
JP2006128561A (ja) 基板回転機構およびそれを備えた成膜装置
JP3070158B2 (ja) 薄膜気相成長装置のサセプタ回転支持構造
JP7306845B2 (ja) 真空ポンプ、及び、真空ポンプ構成部品
US20150285303A1 (en) Machining apparatus for machining end face of tapered roller and grinding wheel body
KR100734109B1 (ko) 지그 장치 및 이를 포함하는 증착장치
JP2006009082A5 (https=)
KR20170021327A (ko) 회전기구 및 이 회전기구를 구비한 막두께 모니터
DK154350B (da) Apparat til beskikning af fordampere i paadampningsanlaeg
KR101513192B1 (ko) 성막장치
CN220827454U (zh) 镀膜室及镀膜设备
FI120630B (fi) Menetelmä jauhimen terityksen asentamiseksi tai vaihtamiseksi
CN210826289U (zh) 一种便于拆卸的退火炉用传动辊装置
EP4300029A1 (en) Measuring device for measuring a thickness of a film of material deposited on a substrate and film deposition apparatus with at least one such measuring device
CN223373211U (zh) 一种工件装载架
CN217917043U (zh) 一种内衬纸压花辊装置
JP7212662B2 (ja) 搬送装置、成膜装置、成膜方法および電子デバイスの製造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20100929

Termination date: 20140124