CN1903683B - Substrate processing device and method - Google Patents
Substrate processing device and method Download PDFInfo
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- CN1903683B CN1903683B CN2006101074629A CN200610107462A CN1903683B CN 1903683 B CN1903683 B CN 1903683B CN 2006101074629 A CN2006101074629 A CN 2006101074629A CN 200610107462 A CN200610107462 A CN 200610107462A CN 1903683 B CN1903683 B CN 1903683B
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- substrate
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- inclination
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67796—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations with angular orientation of workpieces
Abstract
The invention provides an apparatus for processing a substrate with a reduced installation space capable of supplying the substrate and conveying out the same at the same place. The apparatus comprises an apparatus body 1; a conveyance roller provided on the apparatus body for conveying a substrate while tilting the same at a predetermined angle; a processor 3 for processing a substrate conveyed by the conveyance roller; an upper conveyance unit 4 provided on the upper part of the apparatus body for conveying a substrate, in an opposite direction to a conveyance direction where the substrate is conveyed, tilted in a horizontal state of the substrate; and a tilt delivery unit 61 provided at least at one end of the apparatus body for lowering the substrate once receiving the substrate conveyed horizontally by the upper conveyance unit, and simultaneously delivering the substrate to the conveyance roller while tilting the substrate at a predetermined angle.
Description
Technical field
The present invention relates to a kind of substrate board treatment and processing method that substrate is tilted to carry, handle with predetermined angular on one side on one side.
Background technology
Be formed with circuit pattern being used on the glass substrate of liquid crystal indicator.In order on substrate, to form circuit pattern, adopted lithographic printing (lithographie) operation.Like known ground, the lithographic printing operation is on aforesaid substrate, to apply protective film, through the mask that is formed with circuit pattern to this protective film irradiates light.
Then, through repeatedly repeating following operation, be about to protective film not irradiates light part or removed by the postradiation part of light; To removing of substrate the part of protective film carry out etching; It is a succession of after etching, to remove protective film etc., thus, on aforesaid substrate, forms circuit pattern.
In so lithographic printing operation; Have at the conditioning fluids such as stripper that utilize developer solution, etching solution on the aforesaid substrate or after etching, remove protective film substrate is carried out treatment procedures; And utilize operation that rinsing liquid cleans etc., needing to adhere to remain in the drying process that the rinsing liquid on the substrate is removed after the cleaning.
, substrate was being carried out under the situation of above-mentioned a succession of processing the conveying roller of aforesaid substrate through axis horizontal is provided with in the past; Be transported to processing process chamber separately successively with horizontality; And utilize conditioning fluid to handle at this, after processing, spray pressure gas and carry out dried.
But, be used in the glass substrate of liquid crystal indicator, have recently and maximize and the tendency of slimming.For this reason, when the horizontal feed substrate, the bending deformation of the substrate between the conveying roller is big, can be created in the processing of respectively handling in the process chamber and be difficult to the problem of on the whole plate face of substrate, evenly carrying out.
In addition, when substrate became big, the conveying axis that is provided with the conveying roller of carrying this substrate can be elongated.And because substrate becomes big, the conditioning fluid of on substrate, supplying with increases, and is applied to the processing liquid measure on the load counterpart substrate on the above-mentioned conveying axis and becomes big, and thus, the deflection of conveying axis increases.For this reason, the deflection of conveying axis makes substrate also can produce deflection, can not carry out uniform treatment.
At this, in order to prevent that when utilizing the conditioning fluid treatment substrate aforesaid substrate is considered substrate with regulation angle of inclination, the for example angle tilt conveying of 75 degree because of the weight deflection of conditioning fluid.If conveying substrate obliquely, then conditioning fluid can not reside on the plate face of substrate, but flows sleekly downwards from the top, thereby can prevent the substrate deflection that the weight because of conditioning fluid produces.
, under the situation of substrate being carried out continuously multiple processing such as soup processing, rinsing liquid processing and dried, processing equipment has the structure that a plurality of process chambers that substrate carried out successively multiple processing are separated to form with becoming row.
A plurality of process chambers become the length of the processing equipment that row are provided with bigger.In the case, substrate is supplied with from length direction one end of processing equipment, in this device, after conveying and the processing, discharges from the length direction other end.The substrate of discharging from the length direction other end of processing equipment is joined to next operation.Therefore, must carry out supply and discharge respectively at length direction one end and the other end of processing equipment, so operability is relatively poor to the substrate of stating processing equipment.
Therefore; In order to improve operability; Consideration is disposed the conveyer and the processing equipment of substrate with paralleling; To be reproduced on the above-mentioned conveyer from the substrate that an end of processing equipment is supplied with and handled, discharges from the length direction other end, and send back to length direction one end of processing equipment by this conveyer, next operation is given in handing-over.
If make length direction one end from processing equipment is supplied with, handled length direction one end that the substrate of discharging from the length direction other end back turns back to processing equipment at this processing equipment; Then can carry out the handing-over of metacoxal plate to next operation supplied with and handled to the substrate of processing equipment, therefore can improve operability in same position.
But,, therefore, must guarantee to be used to be provided with the private space of conveyer owing to must dispose conveyer with processing equipment with paralleling.For this reason, the space requirement in the dust free room keeps and the cooresponding surplus of above-mentioned conveyer, has reduced space utilization efficient.
Summary of the invention
The present invention provides a kind of substrate board treatment and processing method, under the situation of substrate being carried with the angle of inclination of regulation and handling, does not need unnecessary space, can carry out supply and discharge to the substrate of apparatus body in same position.
A kind of substrate board treatment of the present invention, Yi Bian substrate is carried with predetermined angular obliquely, Yi Bian handle, it comprises: apparatus body; The slope conveyor structure is arranged on this apparatus body, and aforesaid substrate is carried with predetermined angular obliquely; Processing mechanism is to being handled by this slope conveyor structure substrate conveying; The top conveying mechanism is arranged at the top of said apparatus main body, under the on even keel, carry aforesaid substrate with the reversing sense of the throughput direction of above-mentioned slope conveyor structure; And the first inclination connecting mechanism, be arranged at least one end of said apparatus main body, during the aforesaid substrate accepting to carry, tilt to predetermined angular when this substrate is descended, and above-mentioned slope conveyor structure is given in handing-over by above-mentioned top conveying mechanism on even keel; The said apparatus main body is split into a plurality of processing units, and each processing unit can be divided into: handling part has the part of above-mentioned processing mechanism and above-mentioned slope conveyor structure; The top delivery section has the part of the above-mentioned top conveying mechanism on the top that is arranged on this handling part; And equipment portion, be arranged on the bottom of above-mentioned handling part, have the control setup of the supply of the container of supplying with the conditioning fluid that is used for treatment substrate and pump and control and treatment liquid.
A kind of substrate processing method using same of the present invention; On one side substrate is carried with predetermined angular obliquely through processing equipment; Handle on one side; It comprises: supply with aforesaid substrate from the length direction middle part of above-mentioned processing equipment, carry the operation of aforesaid substrate under the on even keel towards the length direction one end along continuous straight runs of above-mentioned processing equipment; Make with horizontality when the length direction one end substrate conveying of above-mentioned processing equipment descends, be inclined to the operation of afore mentioned rules angle; The substrate that will be inclined to predetermined angular is on one side carried towards the other end from length direction one end of above-mentioned processing equipment, Yi Bian carry out treatment procedures; The substrate that is processed is turned back to the operation of level from the angle of inclination of regulation; Make the substrate of the level of turning back to rise to the operation of the height identical with the height of carrying along above-mentioned horizontal direction; And the substrate that will rise to the height identical with above-mentioned horizontal direction carries towards an end along continuous straight runs from the other end of said apparatus main body, the operation of in the way of the length direction of above-mentioned processing equipment, discharging.
The invention effect
According to the present invention; Because the substrate of horizontal feed is tilted when descending; To carrying with horizontal feed direction in the opposite direction and handling, therefore need conveyer be set in the side of apparatus body, can carry out the supply of substrate and transport at same position.For this reason, do not need unnecessary space, just can carry out the processing of substrate expeditiously.
Description of drawings
Fig. 1 is the block diagram of schematic configuration of the processing equipment of an embodiment of the present invention.
Fig. 2 is the front view of above-mentioned processing equipment.
Fig. 3 is the birds-eye view of above-mentioned processing equipment.
Fig. 4 is the exploded perspective view of processing unit.
Fig. 5 is the lateral plan of level handing-over unit.
Fig. 6 is the front view of level handing-over unit.
Fig. 7 is the lateral plan of inclination handing-over unit.
Fig. 8 is the front view of inclination handing-over unit.
Fig. 9 is the figure of the handling part inner structure of expression processing unit.
Figure 10 is the birds-eye view of the processing equipment of expression another embodiment of the present invention.
The specific embodiment
Below, with reference to description of drawings embodiment of the present invention.
Fig. 1 to Fig. 9 illustrates first embodiment of the present invention, and Fig. 1 is the block diagram of the schematic configuration of expression processing equipment of the present invention, and Fig. 2 is a front view, and Fig. 3 is a birds-eye view.Above-mentioned processing equipment has apparatus body 1, and this apparatus body 1 is with divided a plurality of processing units, in this embodiment be first to the 5th processing unit 1A～1E can connect into with decomposing one row and constitute.
As shown in Figure 4, each processing unit 1A～1E has support 2.In the front of this support 2, keeping box-type handling part 3 with the angle tilt ground of stipulating.Above-mentioned support 2 be provided with top delivery section 4 above the handling part 3.Width two ends in above-mentioned support 2 lower ends can be provided with tabular a pair of leg 5 with decomposing.Through this leg 5, side forms spatial portion 6 below above-mentioned support 2.
Taken in equipment portion 9 at above-mentioned spatial portion 6; The equipment such as control setup that to supply with container, the pump of conditioning fluid in this equipment portion 9 or be used to control supply were put at framework 8 in 7 years, and this conditioning fluid is the soup, rinsing liquid of the processing of the substrate W that is used for carrying out like the back at above-mentioned handling part 3 etc. saidly.That is, each processing unit 1A～1E is divided into handling part 3, top delivery section 4 and equipment portion 9 these three parts of being positioned at above-below direction through below handling part 3, form spatial portion 6 with leg 5 supporting brackets 2.
The processing equipment of said structure can not only be divided into a plurality of processing unit 1A～1E, and each processing unit may be partitioned into handling part 3, top delivery section 4 and equipment portion 9.Therefore,, under the situation, not only can be decomposed into a plurality of processing unit 1A～1E when carrying etc., can also each processing unit 1A～1E be divided into handling part 3, top delivery section 4 and equipment portion 9 and handle even under the situation that processing equipment maximizes.
That is, be not only the length dimension and the height dimension of the apparatus body 1 of processing equipment and also dispose with diminishing, therefore, when being loaded into the loading platform of truck, can not exceed Limited height, can transport.
Above-mentioned handling part 3 has the casing 12 that can be provided with lid 11 in front as illustrated in fig. 4 with opening and closing.This casing 12 is with the angle of regulation, for example remain on the above-mentioned support 2 with respect to the angle tilt ground of perpendicular line with 75 degree, is formed with slot 13 that the angle tilt ground substrate conveying W with 75 degree is passed through (illustrate a side) in the two sides of Width.
In the inside of above-mentioned casing 12, as shown in Figure 9, be provided with a plurality of conveying axis 15 (only illustrating) that constitute the slope conveyor structure with predetermined distance at the Width of casing 12.On this conveying axis 15, be provided with a plurality of rotatable conveying rollers 14 with predetermined distance at direction of principal axis.The upper and lower side of above-mentioned conveying axis 15 rotatably is supported through bearing 16, and axis is by with above-mentioned slot 13 identical inclined at inclination angles.
In above-mentioned casing 12, import substrate W from above-mentioned slot 13 with being described below.Through being arranged at the conveying roller 14 on the above-mentioned conveying axis 15, be directed to the substrate W in the casing 12 non-designs face, be that the back side is supported.Lower end driven rolls 17 supportings of this substrate W.This driven roller 17 is arranged at an end of axle drive shaft 18.This axle drive shaft 18 rotatably is supported through bearing 19a, and is rotated driving by drive source 19.
Thus, the back side is transferred the substrate W of roller 14 supportings, 17 supportings of lower end driven rolls, carries with the angle tilt of 75 degree to the 5th processing unit 1E from the above-mentioned first processing unit 1A through this driven roller 17 with being described below.
In addition, can above-mentioned conveying roller 14 be fixed on the conveying axis 15, and this conveying axis 15 is rotated driving, thereby substrate W is carried with above-mentioned driven roller 17, perhaps, also can be not drive driven roller 17, only drives conveying roller 14 and come conveying substrate W.
Manage throughout in the casing 12 of unit 1A～1E, be provided with processing mechanism 20 mutually opposed to each other with the front surface of angle tilt substrate conveying W with 75 degree.One side is with the angle tilt conveying substrate W of 75 degree, on one side by above-mentioned processing mechanism 20 processing front surfaces.
The processing mechanism 20 that is provided with at first, second processing unit 1A, 1B is to spray for example first, second soup processing mechanism of soup such as stripper, etching solution successively to substrate W, the 3rd, the to manage the processing mechanism 20 that unit 1C, 1D be provided with everywhere are the rinsing processing mechanisms of spraying rinsing liquid respectively to the substrate W that handles through soup.The processing mechanism 20 that is provided with at the 5th processing unit 1E is to carry out dry dried mechanism through the substrate W of rinsing processing jet gas.
Therefore, substrate W is transported to the 5th processing unit 1E after being supplied to the first processing unit 1A, thus, can carry out soup processing, rinsing processing and dried successively.
As shown in Figure 4, above-mentioned top delivery section 4 has flat base portion 21, and being provided with axis at this base portion 21 with predetermined distance is level and a plurality of conveying axis 23 that have conveying roller 22, can be driven in rotation through not shown drive source.Base portion 21 is covered with by removable cover 24.
The top delivery section 4 of first processing unit to the, five processing unit 1A～1E is configured to row on the top of apparatus body 1, constitutes the top conveying mechanism that substrate W is carried to horizontal direction with horizontality.In addition, from the 5th processing unit 1E to the first processing unit 1A conveying substrate W.That is, towards be the direction conveying substrate W in the opposite direction that conveying roller 17 is carried through being located at slope conveyor structure on the above-mentioned handling part 3.
In length direction one end of said apparatus main body 1, i.e. the 5th processing unit 1E side, be provided with level handing-over unit 31 as horizontal connecting mechanism.This level handing-over unit 31 has like Fig. 5 and framework 32 shown in Figure 6.Formed top delivery section 33 on the top of this framework 32.In this top delivery section 33 a plurality of conveying axis 35 with conveying roller 34 are being set, the length direction quadrature of the axis of this conveying axis 35 and apparatus body 1 and rotatable, and be rotated driving by not shown drive source.Shown in Fig. 6, an end of top delivery section 33 becomes the supply unit 36 with horizontality supplying substrate W, and the other end becomes the portion that transports 37 that sees off by above-mentioned conveying roller 34 substrate conveying W.
Supply with and transport the substrate W that portion 37 sees off from above-mentioned from above-mentioned supply unit 36 by not shown robot etc., be admitted to the top delivery section 4 of the 5th processing unit 1E with horizontality.Be admitted to the substrate W of the top delivery section 4 of the 5th processing unit 1E, the top delivery section 4 through each processing unit is transferred to processing unit 1 with horizontality successively as described above.
Be provided with support 41 in above-mentioned framework 32 inside.As illustrated in fig. 6, on this support 41 through a pair of clutch shaft bearing 42 rotatably mounted pivot 43.At the both ends of this pivot 43, be provided with second bearing 44.A pair of second bearing 44 is installed in the both ends of the prescribed direction middle part below the flat posture converting member 45.
A plurality of bolsters 47 with anvil roll 46 rotatably are being set on above-mentioned posture converting member 45, the axis edge of this bolster 47 and the direction of the orthogonal axe of above-mentioned pivot 43, and be rotated driving by not shown drive source.One end of the length direction on above-mentioned posture converting member 45 is provided with overhang bracket roller 48 as illustrated in fig. 5, the plate face quadrature of the rotation axis of this overhang bracket roller 48 and above-mentioned posture converting member 45.
In above-mentioned second bearing 44 the other end in the outer part of the ratio of above-mentioned posture converting member 45, pivotal joint an end of the connecting rod 51 that constitutes posture switching mechanism 50.The other end pivotal joint of this connecting rod 51 is on movable body 52.This movable body 52 is supported on a pair of linear guide 53 movably.This linear guide 53 is set on the above-mentioned support 41 along the vertical direction.
Above-mentioned movable body 52 is threaded with screw rod 53.Be rotated driving by 55 pairs of these screw rods 54 of drive source.If screw rod 54 is driven in rotation, then according to its hand of rotation, above-mentioned movable body 52 property guide 53 up-and-down movements along the line.
When above-mentioned movable body 52 was in lowering position, above-mentioned posture converting member 45 became horizontality shown in solid line among Fig. 5.When rotate above-mentioned screw rod 54 from this state, when ascent direction drove, above-mentioned posture converting member 45 tilted to become predetermined angular shown in long and short dash line Fig. 5, promptly 75 spends from horizontality with above-mentioned movable body 52.
The back side of the substrate W that above-mentioned posture converting member 45 utilizes the anvil roll 46 that is provided with in the above, accept with the angle of inclination of 75 degree to see off from the handling part 3 of the 5th processing unit 1E.At this moment, the lower end of substrate W is accepted by overhang bracket roller 48.
The posture converting member 45 of having accepted substrate W is driven in rotation to horizontality.That is, the unit of level handing-over on one side 31 is accepted to carry the substrate W that handles the back, sees off from the 5th processing unit 1E on one side with the angle of 75 degree through each processing unit 1A～1E, converts its angle into level from 75 angles of inclination spent.
In the length direction other end of said apparatus main body 1, the i.e. first processing unit 1A side, be provided with inclination handing-over unit 61 as the inclination connecting mechanism.This inclination handing-over unit 61 is received in the substrate W that is transported by on even keel in the above-mentioned delivery section 4, when this substrate W is descended, is inclined to the angle of 75 degree, and the handling part 3 of the above-mentioned first processing unit 1A is given in handing-over.
That is, above-mentioned inclination handing-over unit 61 has framework 62 like Fig. 7 and shown in Figure 8.In this framework 62, be provided with movable body 63 up and down.Movable body 63 is up and down driven at above-below direction through driver train 64 up and down.
But above-mentioned driver train 64 up and down has the support unit 65 on the side that is arranged at above-mentioned support body 63 up and down.This support unit 65 combines with the linear guide 66 that is provided with along the vertical direction slidably.
On a side of above-mentioned framework 62, be provided with nut 67.This nut 67 is threaded with axis screw rod 68 along the vertical direction.Screw rod 68 is rotated driving through 69 pairs of these screw rods 68 of drive source that are arranged at screw rod 68 lower ends.Thus, above-mentioned movable body 63 is up and down driven in above-mentioned framework 62 along the vertical direction.
As shown in Figure 8, on above-mentioned up and down movable body 63 through a pair of clutch shaft bearing 75 rotatably mounted pivot 76.Be provided with second bearing 77 at the both ends of this pivot 76.A pair of second bearing 77 is installed in as the prescribed direction middle part below the posture converting member of support 78.
On above-mentioned posture converting member 78, rotatably be provided with a plurality of bolsters 81 with anvil roll 79, the axis of this bolster 81 along with the direction of the orthogonal axe of above-mentioned pivot 76, and be rotated driving by not shown drive source.As shown in Figure 7, an end of the length direction on above-mentioned posture converting member 78 is provided with the anvil roll 82 of the plate face quadrature of rotation axis and above-mentioned posture converting member 78.
In above-mentioned second bearing 77 of the ratio of above-mentioned posture converting member 78 the other end side in the outer part, pivotal joint an end of the connecting rod 84 that constitutes posture switching mechanism 85.The other end pivotal joint of this connecting rod 84 is on support unit 86.This support unit 86 is supported on the linear guide 87 movably.This linear guide 87 is set on the above-mentioned movable body 63 up and down along the vertical direction.
Above-mentioned support unit 86 is threaded with screw rod 88.This screw rod 88 is rotated driving by drive source 89.If screw rod 88 is driven in rotation, then according to its hand of rotation, above-mentioned support unit 86 moves up and down along above-mentioned linear guide 87.
When above-mentioned support unit 86 was in lowering position, above-mentioned posture converting member 78 became horizontality shown in solid line among Fig. 7.When rotate from this state above-mentioned screw rod 88 with above-mentioned support unit 86 when ascent direction drives, above-mentioned posture converting member 78 tilts to become predetermined angular shown in long and short dash line Fig. 7, promptly 75 spends from horizontality.
Posture converting member 78 is kept horizontality through posture mapping device 85 shown in solid line among Fig. 7, and is driven to the hoisting position shown in the long and short dash line among this figure through driver train 64 up and down.The posture converting member 78 that is driven to hoisting position is positioned at the height identical with the top delivery section of the first processing unit 1A 4.
Thus, be transported to the substrate W of the top delivery section 4 of the first processing unit 1A with horizontality, join to being located at the anvil roll 79 on the above-mentioned posture converting member 78 from the top delivery section 4 of the 5th processing unit 1E.
When posture converting member 78 receives substrate W; Driver train 64 work up and down make this posture converting member 78 begin to descend, and link with its decline; Posture switching mechanism 85 is worked, and posture converting member 78 is tilted to the angle of 75 degree from horizontality.
Tilt to the substrate W of 75 degree angles, its back side is by anvil roll 79 supportings of above-mentioned posture converting member 78, and its lower end is by 82 supportings of overhang bracket roller.Then, the bolster 81 that is provided with above-mentioned anvil roll 79 is driven in rotation, and thus aforesaid substrate W is sent into the above-mentioned first processing unit 1A from above-mentioned inclination handing-over unit 61.
The work of treatment of the substrate W that processing equipment through said structure carries out then, is described.
Untreated substrate W is fed into the supply unit 36 of the top delivery section 33 of level handing-over unit 31 through not shown robot etc.The substrate W that is supplied to above-mentioned delivery section 33 sees off from transporting portion 37 through the conveying roller 34 that is arranged on this top delivery section 33, is sent to the top delivery section 4 of the 5th processing unit 1E.
Be fed to the substrate W of the top delivery section 4 of the 5th processing unit 1E, top delivery section 4 along continuous straight runs of managing unit 1D～1E with horizontality throughout are transferred, and give handing-over unit 61 from top delivery section 4 handing-over of the first processing unit 1A.
That is, tilt in the handing-over unit 61, its posture converting member 78 rises with horizontality, on the height identical with the top delivery section of the above-mentioned first processing unit 1A 4, waits for.Thereby, be transported to the substrate W of the top delivery section 4 of the first processing unit 1A, give the anvil roll 79 of above-mentioned posture converting member 78 from these top delivery section 4 handing-over.
When posture converting member 78 receives substrate W; 64 actions of driver train up and down of above-mentioned inclination handing-over unit 61 descend above-mentioned posture transform component 78, simultaneously; Posture switching mechanism 85 actions make above-mentioned posture converting member 78 tilt to the angle of 75 degree from horizontality.
During to handling part 3 handing-over of this processing unit 1A, can utilize above-mentioned posture converting member 78 to carry out decline and the inclination of substrate W simultaneously from the top delivery section 4 of the first processing unit 1A substrate W through the handing-over unit 61 that tilts.Therefore, compare when tilting, can shorten the productive temp time with the decline of carrying out substrate W respectively.
Carry the substrate W that is supplied to the first processing unit 1A to the 5th processing unit 1E from the first processing unit 1A.In the process of conveying substrate W, carry out predetermined process successively by the processing mechanism 20 of each processing unit 1A～1E.
That is, carry out soup at first, second processing unit 1A, 1B and handle, the 3rd, the manage the rinsing processing that unit 1C, 1D carry out the rinsing soup everywhere.Then, remove dried at the 5th processing unit 1E attached to the rinsing liquid on the substrate W.
The substrate W that has carried out dried at the 5th processing unit 1E is joined feedwater usual friendship order unit 31.That is, the posture transform component 45 of level handing-over unit 31 is waited under the state of 75 degree angles that tilts.Thus, the back side of the substrate W that sees off from the 5th processing unit 1E is by anvil roll 46 supportings of above-mentioned posture converting member 45.
When posture converting member 45 received substrate W, drive source 55 work of posture switching mechanism 50 drove movable body 52 to descent direction.Thus, above-mentioned posture converting member 45 converts posture into horizontality from heeling condition through connecting rod 51.Then, posture converts the substrate W of level into by not shown taking-ups such as robot, and next operation is given in handing-over.
So; Processing equipment according to this embodiment; Untreated substrate W is transferred at top delivery section 4 on even keels of the 5th processing unit to the first processing unit 1E～1A that is arranged at apparatus body 1 top, and handing-over gives the posture converting member 78 of handing-over unit 61.Then, when descending with this posture converting member 78, angles are spent in inclination 75, supply with the handling part 3 of the first processing unit 1A.
Under the bevelled state, on one side towards with through the direction in the opposite direction of top delivery section 4 horizontal feed, promptly carried the substrate W of 75 degree to the 5th processing unit 1E from the first processing unit 1A, managing the unit throughout carries out predetermined process on one side.
Promptly; For substrate W is carried out predetermined process, the transport path of this substrate W is set at: the end top of the apparatus body 1 shown in the arrow X from Fig. 2 is supplied with, while the other end descend tilt after; Carry from the other end towards an end on one side, handle on one side; And, shown in the arrow Y of this figure, discharge from other end on even keel.That is, the side view of the transport path of substrate W roughly becomes " コ " font.
Therefore, can an end utilization of apparatus body 1 for example the robot of a handing-over usefulness carry out to the supply of the substrate W of apparatus body 1 with see off, therefore, can improve operability and realize effective utilization of equipment.
And, through top top delivery section 4 is set at apparatus body 1, can guarantee that side view is the transport path of the substrate W of " コ " font roughly.Therefore, except the space of setting device main body 1, do not need more space, thereby can effectively utilize the space of dust free room.
Be transported to the substrate W of the other end of apparatus body 1 by top delivery section 4 on even keels, descend simultaneously and tilts through the handing-over unit 51 that tilts, handing-over is to the first processing unit 1A.
Therefore, compare when tilting, not only can shorten the required time of handing-over with the decline of carrying out substrate W respectively, and, only utilize handing-over unit 61 just can carry out decline and the inclination of substrate W, so miniaturization that can implement device.
In an above-mentioned embodiment; End at apparatus body 1 is provided with level handing-over unit 31; Be provided with handing-over unit 61 at the other end,, carry to the other end from an end supplying substrate of apparatus body 1; After the transport path that is " コ " font in side view is turned back, see off from an end of apparatus body 1.
In addition, processing equipment shown in Figure 10 is, the first handing-over unit 61A that tilts is set in the end of the first processing unit 1A side of apparatus body 1, and the second handing-over unit 61B that tilts is set in the end of the 5th processing unit 1E side.Inclination handing-over unit 61 shown in these first handing-over unit 61A, the second handing-over unit 61B and the above-mentioned embodiment has same structure.
On the other hand, shown in the arrow S among this figure, utilize the untreated substrate W of top delivery section 4 supplies from the 3rd processing unit 1C such as robot.Supply with the substrate W of the top delivery section 4 of the 3rd processing unit 1C; On even keel is carried to the first processing unit 1A, gives the posture converting member of waiting for horizontality in the hoisting position of the first inclination handing-over unit 61A 78 from top delivery section 4 handing-over of this first processing unit 1A.
The posture converting member 78 of having accepted substrate W tilts while descending, and makes substrate W inclination 75 degree angles, and the handling part 4 of the first processing unit 1A is given in handing-over.Carry the substrate W of the handling part 4 be supplied to the first processing unit 1A towards the 5th processing unit 1E, in this course of conveying, carry out predetermined process.
At the substrate W that the 5th processing unit 1E has carried out processing, quilt is joined gives the posture converting member 78 of spending the lowering position wait of angles in the inclination 75 of the second inclination handing-over unit 61B.Accepted the posture converting member 78 of substrate W, risen while rotate to horizontal direction from heeling condition.
Be held the substrate W on the posture converting member 78 that becomes level in hoisting position; Be transported to the top delivery section of the 3rd processing unit 1C from the top delivery section 4 of the 5th processing unit 1E; At this, shown in the arrow O among this figure, transport by not shown robot etc.
Promptly; In this embodiment; Through being provided with handing-over unit 61A, 61B respectively at the end of apparatus body 1 and the other end, the top delivery section 4 that can be arranged on the 3rd processing unit 1C in the top delivery section 4 on apparatus body 1 top, that be positioned at middle part is carried out the supply of substrate W and is seen off enough one-tenth one row.
Promptly; End at the length direction of apparatus body 1 can not guarantee to transport under the situation such as operational space of substrate W to this apparatus body 1 supplying substrate W or from this apparatus body 1; Can be in the same position of the side of the length direction middle part of apparatus body 1, this apparatus body 1 is carried out the supply of substrate W and transports.
In addition, in embodiment shown in Figure 10, also can be; Supply with untreated substrate W from the top of inclination supply unit 61B, on above-mentioned delivery section 4, carry, and join to the first inclination supply unit 61A with horizontality; Then, substrate W is tilted behind 75 degree, after in first handling part to the, five handling parts 3, carrying successively and handling; Convert posture into level at the second inclination supply unit 61B; When being positioned at this position or when converting level into, it being risen simultaneously, and see off from this hoisting position.
In an above-mentioned embodiment; End at apparatus body is provided with level handing-over unit; Untreated substrate is joined the top delivery section to the 5th processing unit 1E via the top delivery section of this level handing-over unit; But also can be substrate directly to be supplied with the top delivery section of the 5th processing unit 1E.
Claims (6)
1. substrate board treatment, on one side substrate is carried with predetermined angular obliquely, handle on one side, it is characterized in that, comprising:
Apparatus body;
The slope conveyor structure is arranged on this apparatus body, and aforesaid substrate is carried with predetermined angular obliquely;
Processing mechanism is to being handled by this slope conveyor structure substrate conveying;
The top conveying mechanism is arranged at the top of said apparatus main body, under the on even keel, carry aforesaid substrate with the reversing sense of the throughput direction of above-mentioned slope conveyor structure; And
The first inclination connecting mechanism is arranged at least one end of said apparatus main body, during the aforesaid substrate accepting to be carried by above-mentioned top conveying mechanism on even keel, tilt to predetermined angular when this substrate is descended, and above-mentioned slope conveyor structure is given in handing-over;
The said apparatus main body is split into a plurality of processing units, and each processing unit can be divided into: handling part has the part of above-mentioned processing mechanism and above-mentioned slope conveyor structure; The top delivery section has the part of the above-mentioned top conveying mechanism on the top that is arranged on this handling part; And equipment portion, be arranged on the bottom of above-mentioned handling part, have the control setup of the supply of the container of supplying with the conditioning fluid that is used for treatment substrate and pump and control and treatment liquid.
2. substrate board treatment as claimed in claim 1 is characterized in that,
The other end in the said apparatus main body is provided with horizontal connecting mechanism; This horizontal connecting mechanism is being accepted to be joined with the angle of inclination of regulation by the above-mentioned first inclination connecting mechanism behind the substrate that has carried out to above-mentioned slope conveyor structure and by above-mentioned processing mechanism handling, and converts this substrate into level from the angle of inclination of regulation.
3. substrate board treatment as claimed in claim 1 is characterized in that,
The other end in the said apparatus main body is provided with the second inclination connecting mechanism; This second inclination connecting mechanism is being accepted to be joined with the angle of inclination of regulation by the above-mentioned first inclination connecting mechanism behind the substrate that has carried out to above-mentioned slope conveyor structure and by above-mentioned processing mechanism handling; When the angle of inclination that makes this substrate from regulation converts level into, make this substrate rise to the position that can join to above-mentioned top conveying mechanism.
4. substrate board treatment as claimed in claim 3 is characterized in that,
Above-mentioned top conveying mechanism is arranged on the total length of length direction of said apparatus main body;
The length direction middle part of conveying mechanism is supplied with aforesaid substrate from above-mentioned top; After aforesaid substrate is transported to behind the above-mentioned first inclination connecting mechanism that above-mentioned slope conveyor structure is given in handing-over and handled by above-mentioned handling part; Join to above-mentioned top conveying mechanism from the above-mentioned second inclination connecting mechanism, and discharge from the length direction middle part of this top conveying mechanism.
5. substrate board treatment as claimed in claim 3 is characterized in that,
The above-mentioned first inclination connecting mechanism and the second inclination connecting mechanism comprise:
Support has the anvil roll of accepting aforesaid substrate;
Movable body up and down, rotatably mounted this support, and driven on above-below direction through driver train up and down; And
Rotary drive mechanism is arranged on this up and down on the movable body, and above-mentioned support is rotated to the state of horizontal state and inclination predetermined angular.
6. a substrate processing method using same is carried substrate with predetermined angular through processing equipment on one side obliquely,, it is characterized in that having Yi Bian handle:
Supply with aforesaid substrate from the length direction middle part of above-mentioned processing equipment, carry the operation of aforesaid substrate under the on even keel towards the length direction one end along continuous straight runs of above-mentioned processing equipment;
Make with horizontality when the length direction one end substrate conveying of above-mentioned processing equipment descends, be inclined to the operation of afore mentioned rules angle;
The substrate that will be inclined to predetermined angular is on one side carried towards the other end from length direction one end of above-mentioned processing equipment, Yi Bian carry out treatment procedures;
The substrate that is processed is turned back to the operation of level from the angle of inclination of regulation;
Make the substrate of the level of turning back to rise to the operation of the height identical with the height of carrying along above-mentioned horizontal direction; And
The substrate that rises to the height identical with above-mentioned horizontal direction is carried the operation of in the way of the length direction of above-mentioned processing equipment, discharging towards an end along continuous straight runs from the other end of said apparatus main body.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005214583A JP4643384B2 (en) | 2005-07-25 | 2005-07-25 | Substrate processing apparatus and processing method |
| JP214583/2005 | 2005-07-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1903683A CN1903683A (en) | 2007-01-31 |
| CN1903683B true CN1903683B (en) | 2012-04-11 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2006101074629A Expired - Fee Related CN1903683B (en) | 2005-07-25 | 2006-07-25 | Substrate processing device and method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4643384B2 (en) |
| KR (1) | KR101340422B1 (en) |
| CN (1) | CN1903683B (en) |
| TW (1) | TWI459491B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4685618B2 (en) * | 2005-12-13 | 2011-05-18 | 芝浦メカトロニクス株式会社 | Substrate processing equipment |
| KR100865767B1 (en) * | 2007-03-15 | 2008-10-28 | 우진선행기술 주식회사 | Device for slimming of plate and method for slimming of plate |
| CN101531465B (en) * | 2009-04-01 | 2010-12-29 | 上海多林化工科技有限公司 | Automatic frosting production line of flat glass |
| JP4992137B1 (en) * | 2011-10-15 | 2012-08-08 | 株式会社Ａｋシステム | Equipment for handling plate-like materials |
| TWI611465B (en) * | 2013-07-03 | 2018-01-11 | 應用材料股份有限公司 | Reactor gas panel common exhaust |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000049206A (en) * | 1998-07-28 | 2000-02-18 | Dainippon Screen Mfg Co Ltd | Substrate treating apparatus |
| JP2004140336A (en) * | 2002-08-19 | 2004-05-13 | Sumitomo Precision Prod Co Ltd | Lift type substrate treatment apparatus and substrate treatment system equipped with the same |
| CN1506286A (en) * | 2002-10-31 | 2004-06-23 | 三星康宁精密琉璃株式会社 | Conveyor system for glass base plate |
| JP2004349475A (en) * | 2003-05-22 | 2004-12-09 | Shibaura Mechatronics Corp | Processor, transporting device and processing method for substrate |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100500171B1 (en) | 2003-06-19 | 2005-07-07 | 주식회사 디엠에스 | Apparatus for tilting transfering works and the method of the same, and the method for treatment of works |
-
2005
- 2005-07-25 JP JP2005214583A patent/JP4643384B2/en not_active Expired - Fee Related
-
2006
- 2006-07-12 TW TW095125429A patent/TWI459491B/en not_active IP Right Cessation
- 2006-07-24 KR KR1020060069073A patent/KR101340422B1/en active IP Right Grant
- 2006-07-25 CN CN2006101074629A patent/CN1903683B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000049206A (en) * | 1998-07-28 | 2000-02-18 | Dainippon Screen Mfg Co Ltd | Substrate treating apparatus |
| JP2004140336A (en) * | 2002-08-19 | 2004-05-13 | Sumitomo Precision Prod Co Ltd | Lift type substrate treatment apparatus and substrate treatment system equipped with the same |
| CN1506286A (en) * | 2002-10-31 | 2004-06-23 | 三星康宁精密琉璃株式会社 | Conveyor system for glass base plate |
| JP2004349475A (en) * | 2003-05-22 | 2004-12-09 | Shibaura Mechatronics Corp | Processor, transporting device and processing method for substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007035790A (en) | 2007-02-08 |
| CN1903683A (en) | 2007-01-31 |
| KR20070013225A (en) | 2007-01-30 |
| TWI459491B (en) | 2014-11-01 |
| JP4643384B2 (en) | 2011-03-02 |
| TW200739791A (en) | 2007-10-16 |
| KR101340422B1 (en) | 2013-12-11 |
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