JP2002167036A - Device and method of carrying large board - Google Patents

Device and method of carrying large board

Info

Publication number
JP2002167036A
JP2002167036A JP2000366034A JP2000366034A JP2002167036A JP 2002167036 A JP2002167036 A JP 2002167036A JP 2000366034 A JP2000366034 A JP 2000366034A JP 2000366034 A JP2000366034 A JP 2000366034A JP 2002167036 A JP2002167036 A JP 2002167036A
Authority
JP
Japan
Prior art keywords
substrate
transfer
board
holding mechanism
roller frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000366034A
Other languages
Japanese (ja)
Other versions
JP3690982B2 (en
Inventor
Yoichiro Nakajima
洋一郎 中島
Eishiro Sasagawa
英四郎 笹川
Naoyuki Miyazono
直之 宮園
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP2000366034A priority Critical patent/JP3690982B2/en
Publication of JP2002167036A publication Critical patent/JP2002167036A/en
Application granted granted Critical
Publication of JP3690982B2 publication Critical patent/JP3690982B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a mechanism and a method of delivering boards capable of carrying them in the standing position and the fallen position with the stabilized operation without generating the concentration of a load to a part of the board held by a board holding mechanism when standing and bringing down the board to the stabilized angle of inclination in a board delivery mechanism for a board delivery stage of a board carrying roller in a large board carrying device provided with a carriage for delivering the large boards at the board delivery stage outside a vacuum treatment chamber and the board holding mechanism for holding the board on the carriage. SOLUTION: In the large board carrying device provided with the carriage for delivering large boards at the board delivery stage outside of the vacuum treatment chamber and the board holding mechanism for holding the boards on the carriage, a folding type board delivery mechanism for standing a roller frame provided at the board delivery stage position of a board carrying roller to the stabilized angle of inclination separately from other board carrying roller parts to deliver the board to the board holding mechanism of the carriage is assembled in the carrying roller.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術の分野】本発明は、プラズマCV
D、スパッタリング、ドライエッチング等の処理を大型
基板に施すための大型基板用真空処理装置に用いる大型
基板搬送装置及び搬送方法に関する。
The present invention relates to a plasma CV.
The present invention relates to a large-size substrate transfer device and a transfer method used for a large-size substrate vacuum processing apparatus for performing a process such as D, sputtering, or dry etching on a large-size substrate.

【0002】[0002]

【従来の技術】近年太陽電池などの製造を目的として、
大型の基板を真空中でプラズマCVD、スパッタリン
グ、ドライエッチング等の処理を均質・連続・大量に施
す必要性が益々高まっている。本発明者等は今までに一
連の関連技術の発明を出願、開示してきたが、真空処理
装置の各部において解決すべき課題が多々あるなかで、
特に大型脆性材質からなる基板を操作するところの基板
搬送装置について特願平11−301271にその発明
の1つを出願した。
2. Description of the Related Art In recent years, for the purpose of manufacturing solar cells and the like,
There is an increasing need to uniformly, continuously, and mass-process large-sized substrates in a vacuum, such as plasma CVD, sputtering, and dry etching. The present inventors have applied for and disclosed a series of related art inventions so far, but there are many problems to be solved in each part of the vacuum processing apparatus,
In particular, one of the inventions was filed in Japanese Patent Application No. 11-301271 for a substrate transfer apparatus for operating a substrate made of a large brittle material.

【0003】前記先願技術(非公知)の要点を図3を参
照しながら説明すると、トレイレス斜め基板搬送装置1
01において、該装置は基板Gを減圧下で処理する真空
処理室110と、この真空処理室との間で基板を受け渡
しする基板搬送台車106A、106B、106C、1
06Dと、この搬送台車上で基板を斜めに立て掛けて支
持する基盤保持機構と、基板台車を真空処理室110に
出し入れして操作可能にするレールを含む進退機構を有
している。基板台車の基盤保持機構は、基板受渡しステ
ージ102上で図示のように倒れてローラー103で搬
送されてきた基板Gを把持し、斜め安定角度まで起立し
た後、真空処理室へと進む。
The main points of the prior application (unknown) will be described with reference to FIG.
At 01, the apparatus includes a vacuum processing chamber 110 for processing a substrate G under reduced pressure, and substrate transport carts 106A, 106B, 106C, and 1 for transferring substrates between the vacuum processing chamber.
06D, a substrate holding mechanism for supporting the substrate obliquely on the transport trolley, and an advance / retreat mechanism including a rail for allowing the substrate trolley to be moved into and out of the vacuum processing chamber 110 for operation. The substrate holding mechanism of the substrate carrier grasps the substrate G which has been conveyed by the rollers 103 by being tilted down on the substrate transfer stage 102 as shown in the figure, and stands up to an obliquely stable angle before proceeding to the vacuum processing chamber.

【0004】しかしこのような基板受渡しステージ上で
の基板受渡し機構であると、基板の大型化に伴い、脆弱
な薄い材質であるので、搬送台車側の保持機構を回転起
立させるとき、基板を把持している部分に集中してかか
る荷重で基板が破損することがあり、製造の歩留や製品
の品質に影響した。
However, such a substrate transfer mechanism on the substrate transfer stage is made of a fragile thin material as the size of the substrate is increased. Therefore, when the holding mechanism on the side of the carrier is rotated and raised, the substrate is gripped. In some cases, the substrate may be damaged by the load concentrated on the portion where the substrate is formed, which affects the production yield and product quality.

【0005】[0005]

【発明が解決しようとする課題】本発明はこのような従
来の問題点に鑑みなされたもので、大型基板を真空処理
室外の基板受け渡しステージで基板を受け渡しさせる搬
送台車と、この搬送台車上で基板を保持する基板保持機
構とを具えた大型基板搬送装置において、基板搬送ロー
ラーの基板受け渡しステージでの基板受渡しの機構にお
いて、基板を傾斜安定角まで起立したり倒したりすると
き、基板が基板保持機構に把持されている部分に荷重が
集中してかからず、安定した動作で起立転倒可能な基板
受渡し機構及び方法とすることを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned conventional problems, and it is an object of the present invention to provide a carrier for transferring a large substrate to a substrate at a substrate transfer stage outside a vacuum processing chamber. In a large-sized substrate transfer device having a substrate holding mechanism for holding a substrate, in a substrate transfer mechanism of a substrate transfer stage of a substrate transfer roller, when the substrate is raised or tilted to a stable tilt angle, the substrate is held. It is an object of the present invention to provide a substrate delivery mechanism and a method capable of standing and falling down with stable operation without load being concentrated on a portion gripped by the mechanism.

【0006】[0006]

【課題を解決するための手段】本発明は、大型基板を真
空処理室外の基板受け渡しステージで基板を受け渡しす
る搬送台車と、この搬送台車上で基板を保持する基板保
持機構とを具えた大型基板搬送装置において、基板搬送
ローラーの基板受け渡しステージ位置にあるローラーフ
レームが他の基板搬送ローラー部と分離して傾斜安定角
度まで起立し、搬送台車の基板保持機構に基板の受渡し
をする可倒式基板受渡し機構を搬送ローラーに組み込ん
だことを特徴とする。
SUMMARY OF THE INVENTION The present invention provides a large-sized substrate having a carrier for transferring a large substrate on a substrate transfer stage outside a vacuum processing chamber, and a substrate holding mechanism for holding the substrate on the carrier. In the transfer device, the roller frame at the substrate transfer stage position of the substrate transfer roller separates from the other substrate transfer roller portions, stands up to a stable tilt angle, and transfers the substrate to the substrate holding mechanism of the transfer carriage. The transfer mechanism is incorporated in the transport roller.

【0007】即ち、先願技術のように台車側の保持機構
が基板を把持して、起立させるのではなく、本発明はロ
ーラーコンベアが延在してその終点となっている基板受
け渡しステージで、その部分のローラーフレーム自体が
基板と共に傾斜安定角まで起立し、台車側の受け取り機
構に接近して受け渡す機構を組み込んである。
[0007] That is, instead of the holding mechanism on the cart gripping and erecting the substrate as in the prior application, the present invention provides a substrate delivery stage in which a roller conveyor extends and is an end point. The roller frame itself at that portion stands up to the stable tilt angle together with the substrate, and incorporates a mechanism that approaches and approaches the receiving mechanism on the bogie side.

【0008】本発明は更に、可倒式基板受渡し機構のロ
ーラーフレームが傾斜安定角度まで起立したとき、該ロ
ーラーフレームが積載している基板の下端を支持する支
持手段を具えている事を特徴とする。即ち基板の支え具
を基板下端側に当たるところのローラーフレーム上に設
けて基板がずり落ちないようにしている。
[0008] The present invention is further characterized in that the roller frame of the retractable substrate transfer mechanism is provided with a support means for supporting the lower end of the substrate on which the roller frame is loaded when the roller frame stands up to a stable tilt angle. I do. That is, a support for the substrate is provided on the roller frame at the lower end of the substrate so that the substrate does not slip down.

【0009】本発明は更に、可倒式基板受渡し機構のロ
ーラーフレームが傾斜安定角度まで起立した状態で、搬
送台車の基板保持機構に対面して進退することによっ
て、受け取り時、受け渡し時にローラーフレームが前記
起立状態で基板保持機構に離合可能である進退機構を具
えていていることを特徴とする。
In the present invention, the roller frame of the retractable substrate delivery mechanism is advanced to the substrate holding mechanism of the carrier while the roller frame is standing up to the tilt stable angle, so that the roller frame is received and delivered at the time of delivery. An up-and-down mechanism that can be separated from the substrate holding mechanism in the upright state is provided.

【0010】即ち、本発明の可倒式基板受渡し機構が台
車側の基板保持機構と良好な共働関係で基板のやり取り
ができるよう、位置関係を調整する機構としてこのよう
な進退機構を設けることが好ましい。
That is, such an advance / retreat mechanism is provided as a mechanism for adjusting the positional relationship so that the retractable substrate transfer mechanism of the present invention can exchange a substrate with the substrate holding mechanism on the carriage side in a good cooperative relationship. Is preferred.

【0011】更に、本発明は、大型基板を真空処理室外
の基板受け渡しステージで基板を搬送台車に受け取り、
搬送台車上の基板保持機構で基板を保持して、基板を搬
送する大型基板搬送方法において、基板搬送ローラーの
基板受け渡しステージ位置まで搬送された基板を載置し
ているローラーフレームを他の基板搬送ローラー部と分
離して傾斜安定角度まで起立させ、搬送台車の基板保持
機構に受渡すことを特徴とする。
Further, according to the present invention, a large-sized substrate is received on a transfer trolley at a substrate transfer stage outside the vacuum processing chamber.
In a large-sized substrate transfer method for transferring a substrate while holding the substrate by a substrate holding mechanism on a transfer trolley, a roller frame on which the substrate transferred to the substrate transfer stage position of the substrate transfer roller is transferred to another substrate transfer device. It is characterized in that it is separated from the roller unit, rises up to a stable inclination angle, and is delivered to the substrate holding mechanism of the carrier.

【0012】更に、本発明は、大型基板を真空処理室内
の基板処理位置で搬送台車に受け取り、搬送台車上の基
板保持機構で基板を保持して、基板を搬送する大型基板
搬送方法において、基板搬送ローラーの基板受け渡しス
テージ位置にあるローラーフレームを他の基板搬送ロー
ラー部と分離して傾斜安定角度まで起立させ、搬送台車
の基板保持機構にある基板を該基板保持機構から該ロー
ラーフレームに受取ることを特徴とする。
Further, the present invention provides a large-size substrate transfer method for receiving a large-size substrate on a transfer trolley at a substrate processing position in a vacuum processing chamber, holding the substrate by a substrate holding mechanism on the transfer trolley, and transferring the substrate. Separating the roller frame at the substrate transfer stage position of the transfer roller from the other substrate transfer roller portions to stand up to a stable tilt angle, and receiving the substrate in the substrate holding mechanism of the transfer trolley from the substrate holding mechanism to the roller frame. It is characterized by.

【0013】即ち、台車上にロードするときにも、アン
ロードするときにも本発明の可倒式基板受渡し方法を適
用できることが特徴である。
[0013] That is, the present invention is characterized in that the folding substrate delivery method of the present invention can be applied to both loading and unloading on a cart.

【0014】[0014]

【発明の実施の形態】以下に図面を参照しつつ、本発明
の実施の形態を例示的に説明する。但し本実施の形態に
記載される製品の形状、寸法、材質、その相対配置等は
特に特定的な記載がない限りは本発明をそれのみに限定
する趣旨ではなく、単なる説明例に過ぎない。
Embodiments of the present invention will be described below with reference to the accompanying drawings. However, the shapes, dimensions, materials, relative arrangements, and the like of the products described in the present embodiment are not intended to limit the present invention to them unless otherwise specified, but are merely illustrative examples.

【0015】図1は可倒式基板受渡し機構を搬送ローラ
ーに組み込んだ大型基板搬送装置の概要図である。
FIG. 1 is a schematic view of a large-sized substrate transfer device in which a folding substrate transfer mechanism is incorporated in a transfer roller.

【0016】図1で1は基板受渡しステージにあるロラ
ーフレーム、2は基板Gを水平に搬送する搬送ローラ
ー、3は前記ロラーフレームと基板搬送台車基板保持機
構4との位置関係を調節するため等の搬送コンベアー本
体移動装置、4は基板台車上の基板搬送台車基板保持機
構、5は基板台車が真空処理室に出入りする真空処理室
ゲート、6は基板が台車上の基板保持機構4から基板G
を受け渡して、基板Gが真空処理される真空処理室、7
はLMガイド、8はローラーフレームが跳ね上がった
り、倒れたりする回転運動の中心である回転軸である。
In FIG. 1, 1 is a roller frame on a substrate transfer stage, 2 is a transport roller for horizontally transporting the substrate G, 3 is a device for adjusting the positional relationship between the roller frame and the substrate holding mechanism 4 and the like. , A substrate transport mechanism substrate holding mechanism on the substrate cart, 5 a vacuum processing chamber gate for the substrate cart to enter and exit the vacuum processing chamber, 6 a substrate from the substrate holding mechanism 4 on the board to the substrate G
A vacuum processing chamber in which the substrate G is vacuum-processed;
Is an LM guide, and 8 is a rotation axis which is the center of a rotation movement in which the roller frame jumps up and down.

【0017】前記搬送ローラー2で搬送された基板Gは
基板受渡しステージにあるロラーフレーム1で停止、待
機する。基板受渡しステージにあるロラーフレーム1は
全体のローラーコンベアーと分断されていて、シリンダ
ー10に駆動されて回転軸8を中心に回転可能に配置さ
れている。
The substrate G transported by the transport roller 2 stops and waits at the roller frame 1 at the substrate transfer stage. The roller frame 1 in the substrate transfer stage is separated from the entire roller conveyor, and is driven by a cylinder 10 to be rotatable about a rotation shaft 8.

【0018】基板台車の保持機構4は傾斜安定角度で基
板を保持できるような機構を具えていて、ローラーフレ
ーム1が回転軸8を中心に回転し、同角度まで起立して
接近したとき、基板Gにタッチ、把持する把持爪を含む
把持機構(図示していない)も具えている。
The holding mechanism 4 of the substrate carriage has a mechanism capable of holding the substrate at a stable tilt angle, and when the roller frame 1 rotates about the rotation shaft 8 and stands up to the same angle and approaches, the substrate frame is held. A gripping mechanism (not shown) including gripping claws for touching and gripping G is also provided.

【0019】前記したように受渡し動作の際、起立した
ローラーフレ−ム1と基板台車間が最適の距離に位置す
るよう、ローラーフレ−ム1が取りつけられている枠組
み全体が基板台車に向って、LMガイド7にスライドし
て進退できるよう、搬送コンベアー本体移動装置3を具
えている。
As described above, during the transfer operation, the entire frame on which the roller frame 1 is mounted faces the substrate carriage so that the distance between the upright roller frame 1 and the substrate carriage is at an optimum distance. LM guide 7 so as to be able to slide forward and backward.

【0020】かくして、基板Gを受け取った台車は、真
空処理室ゲート5を潜って真空処理室6に、図示してい
ない台車進退機構によって、入り、真空処理後再び真空
処理室内の基板を受け取って、基板受渡しステージに戻
り、そこで、再び空のローラーフレ−ム1が起立して台
車に接近、台車が基板を受渡して、ローラーフレ−ム1
上に斜めに載せ、ローラーフレーム1が水平位置まで転
倒して、基板は回転駆動される搬送ローラー2で搬送さ
れていくよう構成されている。
Thus, the cart having received the substrate G enters the vacuum processing chamber 6 through the vacuum processing chamber gate 5 by means of a bogie advancing / retreating mechanism (not shown), and after vacuum processing, again receives the substrate in the vacuum processing chamber. Returning to the substrate transfer stage, the empty roller frame 1 stands up again and approaches the truck, and the truck delivers the substrate, and the roller frame 1 is transferred.
The substrate is placed diagonally on top, the roller frame 1 falls down to the horizontal position, and the substrate is transported by the transport roller 2 which is driven to rotate.

【0021】図2は本発明の可倒式基板受渡し機構の1
例の側面を見た図で、ローラーフレーム1の進退機構を
示す概要図である。
FIG. 2 shows one of the folding substrate transfer mechanisms of the present invention.
FIG. 4 is a schematic diagram illustrating a mechanism for moving a roller frame 1 in a side view of the example.

【0022】この例では、ローラーフレーム1の右端
に、起立した時はローラーフレームの下部の基板積載面
側に基板支持爪12を具えていて、基板がずり落ちない
よう構成されている。またローラーフレーム1自体が台
車基板保持機構に進退可能なように、ローラーフレーム
進退機構、具体的にはエアシリンダーを設けてある。
In this example, a substrate supporting claw 12 is provided at the right end of the roller frame 1 on the substrate loading surface under the roller frame when it stands up, so that the substrate does not slip down. Further, a roller frame advance / retreat mechanism, specifically, an air cylinder is provided so that the roller frame 1 itself can advance / retreat to the carriage substrate holding mechanism.

【0023】[0023]

【発明の効果】以上説明したように本発明により、大型
基板を真空処理室外の基板受け渡しステージで基板を受
け渡しさせる搬送台車と、この搬送台車上で基板を保持
する基板保持機構とを具えた大型基板搬送装置におい
て、基板搬送ローラーの基板受け渡しステージでの基板
受渡しの機構において、基板を傾斜安定角まで起立した
り倒したりするとき、基板が基板保持機構に把持されて
いる部分に荷重が集中してかからず、安定した動作で起
立転倒可能な基板受渡す機構を提供することができ、従
来のトラブルは皆無となり、製造の歩留まりが向上し
た。
As described above, according to the present invention, a large-sized carrier including a carrier for transferring a large substrate to a substrate transfer stage outside the vacuum processing chamber and a substrate holding mechanism for holding the substrate on the carrier. In the substrate transfer mechanism of the substrate transfer stage of the substrate transfer roller in the substrate transfer device, when the substrate is raised or tilted to a stable tilt angle, the load concentrates on a portion where the substrate is held by the substrate holding mechanism. It is possible to provide a mechanism for transferring a substrate that can stand upright and fall down with a stable operation without any troubles and improve the production yield.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 可倒式基板受渡し機構を搬送ローラーに組み
込んだ大型基板搬送装置の概要図
FIG. 1 is a schematic diagram of a large-sized substrate transfer device in which a folding type substrate transfer mechanism is incorporated in a transfer roller.

【図2】 ローラーフレームの進退機構を示す概要図FIG. 2 is a schematic diagram showing a roller frame moving mechanism.

【図3】 トレイレス斜め基板搬送装置概要図FIG. 3 is a schematic view of a trayless oblique substrate transfer device.

【符号の説明】[Explanation of symbols]

1 ロラーフレーム 2 搬送ローラー 3 搬送コンベアー本体移動装置 4 基板搬送台車基板保持機構 5 真空処理室ゲート 6 真空処理室 7 LMガイド 10 エアシリンダー 11 ローラーフレーム進退機構 12 基板支持爪 101 トレイレス斜め基板搬送装置 106A、B、C、D 搬送台車 108A 台車レール 110 真空処理室 G 基板 DESCRIPTION OF SYMBOLS 1 Roller frame 2 Transport roller 3 Transport conveyor main body moving device 4 Substrate transport trolley substrate holding mechanism 5 Vacuum processing chamber gate 6 Vacuum processing chamber 7 LM guide 10 Air cylinder 11 Roller frame advance / retreat mechanism 12 Substrate support claw 101 Trayless oblique substrate transport device 106A , B, C, D Carriage cart 108A Cart rail 110 Vacuum processing chamber G Substrate

フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01L 21/68 H01L 21/302 B (72)発明者 宮園 直之 長崎市飽の浦町1番1号 三菱重工業株式 会社長崎造船所内 Fターム(参考) 4K029 AA24 CA05 KA01 KA03 4K030 CA17 GA12 LA16 5F004 BC06 5F031 CA05 FA02 FA07 FA13 FA18 GA53 LA15 MA28 MA29 MA32 5F045 EN04 Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat II (Reference) H01L 21/68 H01L 21/302 B (72) Inventor Naoyuki Miyazono 1-1, Akunoura-cho, Nagasaki-shi Mitsubishi Heavy Industries, Ltd. Nagasaki Shipbuilding Co., Ltd. In-house F term (reference) 4K029 AA24 CA05 KA01 KA03 4K030 CA17 GA12 LA16 5F004 BC06 5F031 CA05 FA02 FA07 FA13 FA18 GA53 LA15 MA28 MA29 MA32 5F045 EN04

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 大型基板を真空処理室外の基板受け渡し
ステージで基板を受け渡しする搬送台車と、この搬送台
車上で基板を保持する基板保持機構とを具えた大型基板
搬送装置において、 基板搬送ローラーの基板受け渡しステージ位置にあるロ
ーラーフレームが他の基板搬送ローラー部と分離して傾
斜安定角度まで起立し、搬送台車の基板保持機構に基板
の受渡しをする可倒式基板受渡し機構を搬送ローラーに
組み込んだことを特徴とする大型基板搬送装置。
1. A large-sized substrate transfer apparatus comprising: a transfer carriage for transferring a large substrate on a substrate transfer stage outside a vacuum processing chamber; and a substrate holding mechanism for holding the substrate on the transfer carriage. The roller frame at the substrate transfer stage position separates from the other substrate transfer roller sections and stands up to a stable tilt angle, and the transfer roller incorporates a retractable substrate transfer mechanism that transfers the substrate to the substrate holding mechanism of the transfer cart. A large substrate transfer device characterized by the above-mentioned.
【請求項2】 可倒式基板受渡し機構のローラーフレー
ムが傾斜安定角度まで起立したとき、該ローラーフレー
ムが積載している基板の下端を支持する支持手段を具え
ている事を特徴とする請求項1記載の大型基板搬送方
法。
2. The apparatus according to claim 1, further comprising a supporting means for supporting a lower end of the substrate on which the roller frame is loaded when the roller frame of the retractable substrate transfer mechanism stands up to a stable inclination angle. 2. The method for transferring a large-sized substrate according to 1.
【請求項3】 可倒式基板受渡し機構のローラーフレー
ムが傾斜安定角度まで起立した状態で、搬送台車の基板
保持機構に対面して進退することによって、受け取り
時、受け渡し時にローラーフレームが前記起立状態で基
板保持機構に離合可能である進退機構を具えていている
ことを特徴とする請求項1乃至4いずれかの項記載の大
型基板搬送装置。
3. The roller frame of the retractable substrate transfer mechanism is moved up and down facing the substrate holding mechanism of the carrier in a state in which the roller frame is raised up to a stable tilt angle, so that the roller frame is in the upright state when receiving and transferring. 5. The large-sized substrate transfer device according to claim 1, further comprising an advancing / retracting mechanism that can be separated from the substrate holding mechanism.
【請求項4】 大型基板を真空処理室外の基板受け渡し
ステージで基板を搬送台車に受け取り、搬送台車上の基
板保持機構で基板を保持して、基板を搬送する大型基板
搬送方法において、 基板搬送ローラーの基板受け渡しステージ位置まで搬送
された基板を載置しているローラーフレームを他の基板
搬送ローラー部と分離して傾斜安定角度まで起立させ、
搬送台車の基板保持機構に受渡すことを特徴とする大型
基板搬送方法。
4. A large-sized substrate transfer method for receiving a substrate on a transfer trolley at a substrate transfer stage outside the vacuum processing chamber, holding the substrate by a substrate holding mechanism on the transfer trolley, and transferring the substrate. The roller frame on which the substrate transported to the substrate transfer stage position is placed is separated from the other substrate transport roller parts, and is erected to a tilt stable angle,
A large-sized substrate transfer method, wherein the transfer is performed to a substrate holding mechanism of a transfer trolley.
【請求項5】 大型基板を真空処理室内の基板処理位置
で搬送台車に受け取り、搬送台車上の基板保持機構で基
板を保持して、基板を搬送する大型基板搬送方法におい
て、 基板搬送ローラーの基板受け渡しステージ位置にあるロ
ーラーフレームを他の基板搬送ローラー部と分離して傾
斜安定角度まで起立させ、搬送台車の基板保持機構にあ
る基板を基板保持機構から該ローラーフレームに受取る
ことを特徴とする大型基板搬送方法。
5. A large-sized substrate transfer method for receiving a large-sized substrate on a transfer trolley at a substrate processing position in a vacuum processing chamber, holding the substrate by a substrate holding mechanism on the transfer trolley, and transferring the substrate. The roller frame at the transfer stage position is separated from the other substrate transporting roller portions to stand up to a tilt stable angle, and the substrate in the substrate holding mechanism of the transport trolley is received by the roller frame from the substrate holding mechanism. Substrate transfer method.
JP2000366034A 2000-11-30 2000-11-30 Large substrate transfer apparatus and transfer method Expired - Fee Related JP3690982B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000366034A JP3690982B2 (en) 2000-11-30 2000-11-30 Large substrate transfer apparatus and transfer method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000366034A JP3690982B2 (en) 2000-11-30 2000-11-30 Large substrate transfer apparatus and transfer method

Publications (2)

Publication Number Publication Date
JP2002167036A true JP2002167036A (en) 2002-06-11
JP3690982B2 JP3690982B2 (en) 2005-08-31

Family

ID=18836714

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3690982B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009044526A1 (en) 2007-10-05 2009-04-09 Evatech Co., Ltd. Substrate holding mechanism, substrate delivery/reception mechanism, and substrate processing device
WO2009148077A1 (en) * 2008-06-06 2009-12-10 株式会社アルバック Apparatus for manufacturing thin film solar cell
JP2010006545A (en) * 2008-06-26 2010-01-14 Ihi Corp Branch levitation conveyor and substrate levitation conveying system
CN101988191A (en) * 2010-12-01 2011-03-23 东莞宏威数码机械有限公司 Substrate unloading device and unloading method thereof
CN102312199A (en) * 2010-06-30 2012-01-11 上方能源技术(杭州)有限公司 Scanning coating device and scan coating assembly

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009044526A1 (en) 2007-10-05 2009-04-09 Evatech Co., Ltd. Substrate holding mechanism, substrate delivery/reception mechanism, and substrate processing device
WO2009148077A1 (en) * 2008-06-06 2009-12-10 株式会社アルバック Apparatus for manufacturing thin film solar cell
JPWO2009148077A1 (en) * 2008-06-06 2011-11-04 株式会社アルバック Thin film solar cell manufacturing equipment
JP5302960B2 (en) * 2008-06-06 2013-10-02 株式会社アルバック Thin film solar cell manufacturing equipment
JP2010006545A (en) * 2008-06-26 2010-01-14 Ihi Corp Branch levitation conveyor and substrate levitation conveying system
CN102312199A (en) * 2010-06-30 2012-01-11 上方能源技术(杭州)有限公司 Scanning coating device and scan coating assembly
CN101988191A (en) * 2010-12-01 2011-03-23 东莞宏威数码机械有限公司 Substrate unloading device and unloading method thereof

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