JP2010052844A - Substrate conveyance method, posture change device, and substrate conveyance device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To highly efficiently change a conveyance direction of a substrate with reduced space, while conveying the substrates with tilted posture along conveyance paths intersected with each other. <P>SOLUTION: The posture change device 22 includes: a support table 221; and an oscillation mechanism oscillating the table 221. The oscillation mechanism oscillates the support table 221 between a substrate receiving posture and a substrate delivering posture. In the substrate receiving posture, an upper surface of the table is tilted when seen from a specific direction, and the substrate S conveyed with tilted posture in the specific direction is received. In the substrate delivering posture, the upper surface of the table is tilted from a direction orthogonal to the specific direction, and the substrate S supported on the table is fed with the tilted posture in the specific direction. The substrate delivering posture is a posture in which the substrate S is rotated up to a position where a side S1 is in parallel with the orthogonal direction around an axis in parallel with a diagonal line passing through a top part on a lead and lower side of the substrate S, out of diagonal lines of a virtual square formed on the substrate S in which the side S1 on the lead side of the substrate S received with the substrate receiving posture is set to be a side. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a substrate transport method, an attitude change device, and a substrate transport device suitable for manufacturing a glass substrate for an FPD (flat panel display) such as an LCD (liquid crystal display device) or a PDP (plasma display).

  Conventionally, in a manufacturing process of a glass substrate such as an LCD (hereinafter simply referred to as a substrate), a predetermined process process is applied to the substrate by supplying a processing liquid to the substrate surface while the substrate is conveyed in an inclined posture by a conveyance roller. It is done. According to such a processing method, the processing residue on the substrate can be quickly removed from the substrate together with the processing liquid, and the processing liquid on the substrate can be quickly replaced with a new processing liquid. , Substrate processing can be made more efficient.

  However, when the substrate is transported in a tilted posture as described above, it is difficult to change the transport direction while maintaining the tilted posture, and a posture change is required. For example, as disclosed in Patent Document 1, a U-shaped conveyance path including an outward path, a reversing path, and a return path is provided for the indexer unit, and the substrate taken out from the indexer unit is sequentially processed and collected again in the indexer unit. In such a case, it is necessary to change the transport direction by 90 ° in the forward path to the reverse path, and in the reverse path to the forward path. Is required.

In such a case, conventionally, an apparatus configuration as shown in FIG. 10 has been adopted. That is, a U-shaped transport path including an outward path 501, an inversion path 502, and a return path 503 is provided for the indexer unit 500, and processing is performed while the substrate S is transported in an inclined posture on the forward path 501, the inversion path 502, and the return path 503. As shown in the figure, between the forward path 501 and the reversing path 502, the substrate S is returned to the horizontal position from the first mechanism 511 for returning the posture of the substrate S from the inclined position during the forward path 501 conveyance. A second mechanism 512 for converting the substrate S to the next inclined posture (inclined posture during conveyance of the reversing path 502), and after the substrate S in the inclined posture is returned to the horizontal posture at one end and then converted to the next inclined posture. Then, sending to the reversing path 502 is performed. Similarly, between the reversing path 502 and the return path 503, the third mechanism 514 for returning the substrate S transported in the tilted posture to the horizontal posture and the substrate S returned to the horizontal posture in the next tilted posture (when the return path 503 is transported). And a fourth mechanism 515 for converting to an inclined posture).
JP 2004-284694 A (see FIG. 1)

  However, in the configuration as described above, since it is necessary to provide a total of four posture changing mechanisms, two at each change point in the transport direction of the substrate S, the apparatus is increased in size. In addition, there is a problem that efficient processing is hindered because it takes time to change the posture of the substrate. Therefore, it is required to improve this point.

  The present invention has been made in view of the above circumstances, and can transfer the substrate in a tilted posture along the transfer paths orthogonal to each other, while efficiently changing the transfer direction of the substrate in a smaller space. The purpose is to do so.

  In order to solve the above problems, the present invention provides a method for transporting a substrate by transporting a rectangular substrate in a first transport direction and then changing the transport direction to a second transport direction orthogonal to the first transport direction. The substrate is transported in the first transport direction in a state in which the substrate is supported in a first inclined posture whose surface is inclined when viewed from the first transport direction and whose one side is parallel to the first transport direction. A transport step, and a posture conversion step of converting the substrate transported in the first transport direction into a second inclined posture in which the surface is inclined when viewed from the second transport direction and one side thereof is parallel to the second transport direction. And a second transporting step of transporting the substrate, whose posture has been converted into the second tilted posture in the posture converting step, in the second transport direction in a state of being supported in the second tilted posture, and the posture changing step Then, the front side of the substrate transported in the first transport direction Among diagonal lines of a virtual square formed on the substrate as one side, a diagonal line passing through the top of the top lower side of the substrate or an axis parallel to the diagonal line to a position where the top side is parallel to the second transport direction The substrate is converted from the first inclined posture to the second inclined posture by rotating the substrate.

  According to this method, after the first transporting process, the posture of the substrate can be directly converted from the first tilted posture to the second tilted posture and transferred to the second transporting process in one step. Therefore, a conventional method that requires two steps for changing the posture of the substrate, that is, the substrate in the inclined posture (first inclined posture) transported in the first transport direction is once returned to the horizontal posture and then the next inclined posture ( Compared with the method of converting to the second inclined posture) and transporting the substrate in the second transport direction, the space required for the posture change of the substrate can be reduced and the time required for the posture change can be shortened. . Therefore, it is possible to efficiently change the substrate transport direction in a smaller space.

  On the other hand, the posture changing device according to the present invention transports a rectangular substrate in the first transport direction in a state in which the surface thereof is tilted when viewed from the transport direction and is supported in a first inclined posture in which one side is parallel to the transport direction. First transport means for transporting the substrate in a second transport direction orthogonal to the first transport direction, the surface of the substrate being inclined when viewed from the second transport direction, and one side of the substrate being transported in the second transport direction. The substrate is placed between the second transport means for transporting in a state supported in a second inclined posture parallel to the direction, and the posture of the substrate is set so as to deliver the substrate from the first transport means to the second transport means. A posture conversion device for converting from a first inclined posture to a second inclined posture, comprising: a table having a support portion that supports the substrate so as to be displaceable at least in the first transport direction and the second transport direction; and A support means for swingably supporting; The upper surface of the table is tilted when viewed from the first transport direction, and the substrate receiving posture for receiving the substrate transported in the first tilted posture from the first transport means and the upper surface of the table when viewed from the second transport direction. Swinging means for swinging the table over a substrate delivery posture that allows the substrate supported on the table to be delivered to the second transport means, and the substrate delivery posture is Around a diagonal line passing through the top of the top lower side of the substrate of the virtual square diagonal line formed on the substrate with the side on the top side of the substrate received in the table in the substrate receiving posture as one side, or around an axis parallel to the diagonal line The substrate is rotated to a position where the leading side is parallel to the second transport direction.

  According to this posture changing apparatus, after the substrate is received in the first inclined posture on the table in the substrate receiving posture, the table is changed to the substrate delivery posture by the operation of the swinging means, whereby the substrate posture is changed to the first posture. It is possible to directly convert the inclined posture to the second inclined posture. Therefore, the substrate posture change from the first inclined posture to the second inclined posture can be efficiently performed in a smaller space.

  As a specific configuration, the support means includes a support shaft that is provided in parallel with the diagonal line and rotatably supports the table, and the swinging means rotates the table about the support shaft. Configured as follows.

  In this configuration, when the table rotates (swings) around the support shaft, the table is converted into a substrate receiving posture and a substrate delivery posture. Therefore, it is possible to achieve the above-described substrate posture change with a simple configuration.

  In addition, said structure presupposes the case where the inclination angle (inclination angle with respect to a horizontal surface) of a 1st inclination attitude | position and a 2nd inclination attitude | position is mutually equal, Therefore, the inclination angle of a 1st inclination attitude | position and a 2nd inclination attitude | position When they are different from each other, application becomes difficult.

  However, such an inconvenience is solved by providing an angle variable means for switching the tilt angle of the table in the substrate receiving posture or the substrate delivery posture by changing the tilt angle of the support shaft with respect to the horizontal plane.

  That is, according to this configuration, even when the tilt angles of the first tilt posture and the second tilt posture are different from each other, the tilt angle of the table can be switched between when the substrate is received and when the substrate is delivered by operating the angle varying means. Thus, the substrate can be transferred from the first transport unit to the second transport unit without difficulty.

  In the posture changing device, the first thrust applying means for applying a thrust in the first transport direction to the substrate supported on the table in the substrate receiving posture, and the table on the table in the substrate delivery posture. It is preferable that the apparatus further includes a second thrust applying unit that applies a thrust in the second transport direction to the substrate supported by the first substrate. For example, as the first and second thrust applying means, a driving roller that supports the lower end of the inclined substrate and applies the thrust to the substrate by rotation can be provided.

  According to such a configuration, when the substrate is received from the first transport unit to the table, the substrate is quickly received into the table by applying the thrust in the first transport direction to the substrate by the first thrust applying unit. In addition, when the substrate is transferred from the table to the second transfer means, the substrate in the table is quickly sent out by applying a thrust in the second transfer direction to the substrate by the second thrust applying means. Will be able to.

  On the other hand, the substrate transport apparatus according to the present invention transports a rectangular substrate in the first transport direction in a state where the surface thereof is inclined when viewed from the transport direction and one side is parallel to the transport direction. First transport means for transporting the substrate in a second transport direction orthogonal to the first transport direction, the surface of the substrate being inclined when viewed from the second transport direction, and one side of the substrate being transported in the second transport direction. A second transport unit that transports the substrate while supporting the second tilt posture parallel to the direction, and the substrate posture from the first tilt posture to transfer the substrate from the first transport device to the second transport device. A substrate transfer device including a posture changing device that converts to a two-tilt posture, the posture changing device including the posture changing device as described above.

  According to this substrate transport apparatus, the posture as described above can directly convert the posture of the substrate from the first tilted posture to the second tilted posture while transporting the substrate in a tilted posture along transport paths orthogonal to each other. Since it is equipped with a conversion device, compared to this type of conventional device that requires two steps to change the posture, the size of the device can be effectively suppressed, and the substrate can be changed while quickly changing the transport direction. It becomes possible to convey efficiently.

  According to the present invention, since the substrate posture change can be performed in one step as described above while the substrate is transferred in an inclined posture in the transfer directions orthogonal to each other, the space required for the substrate posture change can be reduced. In addition, the time required for the posture conversion can be shortened. Therefore, it is possible to efficiently change the substrate transport direction in a smaller space.

  A preferred embodiment of the present invention will be described with reference to the drawings.

  FIG. 1 is a schematic plan view showing an outline of a substrate processing apparatus to which a substrate transfer apparatus according to the present invention (a substrate transfer apparatus to which an attitude changing apparatus according to the present invention is applied) is applied. This apparatus performs a chemical solution process and a cleaning process on a rectangular glass substrate (hereinafter simply referred to as a substrate).

  As shown in the figure, the substrate processing apparatus includes an indexer unit 1 and a plurality of processing units connected to the indexer unit 1 in a “U” shape in plan view. Specifically, the substrate S is transported in a specific direction (right direction in FIG. 1) and the substrate S is subjected to a cleaning process, and is connected to the terminal of the first processor 2, and the process is performed. A second processing unit 3 that performs a chemical treatment and a cleaning process on the substrate S while transporting the substrate S processed in the unit 2 in a direction orthogonal to the specific direction (upward in FIG. 1); 3 is a third process in which a finish cleaning process and a drying process are performed on the substrate S while being transported in a direction opposite to the substrate traveling direction in the first processing unit 2. In this way, the substrate S taken out from the indexer unit 1 is sequentially passed through the processing units 2 to 4 and then collected again in the indexer unit.

  In this substrate processing apparatus, the indexer unit 1 and the processing units 2 to 4 have the following configuration. In the following description, as shown in FIG. 1, the transport direction of the substrate S by the first processing unit 1 on the horizontal plane is the X direction, and the direction orthogonal thereto is the Y direction. When the term “side” is used, the description is based on the assumption that the direction is based on the transport direction of the substrate S.

<Indexer part 1>
The indexer unit 1 has a cassette mounting unit 1a for mounting a substrate storage cassette C (hereinafter abbreviated as cassette C) storing the substrate S, and a substrate S with respect to the cassette C placed on the cassette mounting unit 1a. The robot R takes in and removes the substrates S from the cassette C by the robot R and carries them into the first processing unit 2. To return to the cassette C. Note that the cassette C is configured to be carried into and out of the cassette mounting portion 1a by, for example, an automatic guided vehicle (not shown).

<First processing unit 2>
As shown in FIGS. 1 and 2 (a), the first processing unit 2 includes a carry-in chamber 2A and a first cleaning chamber 2B. In each chamber 2A, 2B, a transport roller 10 is placed in the X direction at a predetermined interval. Is arranged. The transport rollers 10 are arranged with a gradient of an angle θ along the Y direction (see FIG. 3A), whereby the surface of the substrate S is inclined when the surface is viewed from the transport direction (X direction). More specifically, the sheet is conveyed while being supported in a posture that is inclined downward toward the outside of the apparatus and one side thereof is parallel to the conveyance direction.

  In the carry-in chamber 2 </ b> A, a receiving mechanism 12 for receiving the substrate S from the robot R and a posture changing mechanism 14 for changing the posture of the substrate S are arranged at a position upstream of the transport rollers 10. Yes. The receiving mechanism 12 and the posture changing mechanism 14 receive the substrate S taken out from the indexer unit 1 in a horizontal posture by the robot R and convert the posture into a posture capable of being transported by the transport roller 10.

  As shown in FIG. 2A, the receiving mechanism 12 includes a plurality of support pins 122 for supporting the substrate S and an actuator 121 such as an air cylinder that drives the support pins 122 up and down. On the other hand, as shown in FIGS. 3A and 3B, the posture changing mechanism 14 includes a plurality of conveying rollers 141 arranged in the X direction at predetermined intervals, and an air cylinder that moves up and down one end side of these conveying rollers 141. And the like, and the conveyance roller 141 is integrally switched between a horizontal posture and an inclined posture by driving the actuator 142. The receiving mechanism 12 is disposed at a position below the conveying roller 141 of the posture changing mechanism 14, and an operating position in which the support pin 122 protrudes above the conveying roller 141 by the operation of the actuator 121 and the conveying roller 22. It is comprised so that it may raise / lower to the retreat position which retreats below. That is, when the substrate S is carried into the carry-in chamber 2A from the indexer unit 1, first, the transport rollers 141 of the posture changing mechanism 14 are set to a horizontal posture, and the support pins 122 of the receiving mechanism 12 are set to the operating positions. In this state, the substrate S is delivered from the robot R to the support pins 122 of the receiving mechanism 12. Thereafter, the support pin 122 is lowered to the retracted position, whereby the substrate S is transferred onto the transport roller 141 (FIG. 3A), and the transport roller 141 is switched to the inclined posture, whereby the substrate S is transported. 10 is converted into an inclined posture having a gradient of the angle θ along the Y direction (FIG. 3B).

  On the other hand, in the first cleaning chamber 2 </ b> B, a cleaning liquid supply nozzle 16 for supplying a cleaning liquid to the substrate S is disposed above the transport roller 10. These cleaning liquid supply nozzles 16 are composed of shower nozzles or the like. In the first cleaning chamber 2B, the cleaning liquid is supplied from these cleaning liquid supply nozzles 16 to the substrate S that is carried in an inclined posture, and thus along the substrate S. The cleaning process proceeds while the cleaning liquid is allowed to flow down. That is, by flowing the cleaning liquid along the substrate S, the foreign matter on the substrate S is quickly removed from the substrate together with the cleaning liquid, and the cleaning liquid on the substrate S is quickly replaced with a new cleaning liquid, thereby efficiently performing the cleaning process. It has come to advance.

<Second processing unit 3>
As shown in FIGS. 1 and 2B, the second processing unit 3 includes a first posture conversion chamber 3A, a chemical solution processing chamber 3B, and a second posture conversion chamber 3C in order from the upstream side in the transport direction of the substrate S. Is provided. In each of the chambers 3A to 3C, transport rollers 20 are arranged in the Y direction at a predetermined interval. Each transport roller 20 is arranged with a gradient of an angle θ along the X direction, whereby the surface of the substrate S is inclined when viewed from the transport direction (Y direction), and specifically toward the outside of the apparatus. It is transported in a state where it is tilted forward and supported in a posture in which one side is parallel to the transport direction.

  In the first posture conversion chamber 3A, the substrate S transported in an inclined posture from the first cleaning chamber 2B, specifically, an inclined posture (corresponding to the first inclined posture) having a gradient of an angle θ along the Y direction. The traveling direction of the substrate S transported in the X (+) direction (corresponding to the first transport direction) is changed by 90 ° to the Y (+) direction (corresponding to the second transport direction), and the attitude of the substrate S Is converted into an attitude that can be conveyed by the conveying roller 20, that is, an inclined attitude (corresponding to a second inclined attitude) having a gradient of an angle θ along the X direction.

  The posture changing mechanism 22 corresponds to the posture changing device according to the present invention, and the specific configuration of the posture changing mechanism 22 will be described in detail later. In this embodiment, the transport roller 10 of the first processing unit 2 corresponds to the first transport unit according to the present invention, and the transport roller 20 of the second processing unit 3 serves as the second transport unit according to the present invention. Equivalent to.

  In the chemical solution processing chamber 3B, a chemical solution supply nozzle 24 for supplying a predetermined chemical solution to the substrate S is disposed above the transport roller 20. These chemical liquid supply nozzles 24 are shower nozzles or the like. In the chemical liquid processing chamber 3B, the chemical liquid flows down along the substrate S by supplying the chemical liquid from the chemical liquid supply nozzle 24 to the substrate S carried in an inclined posture. It is designed to proceed with chemical treatment while In other words, the chemical solution is flowed down along the substrate S, so that processing residues and the like on the substrate S are quickly removed from the substrate together with the chemical solution, and the chemical solution on the substrate S is promptly replaced with a new chemical solution. It has come to advance efficiently.

  In the second posture conversion chamber 3C, the traveling direction of the substrate S transported in an inclined posture (an inclined posture having a gradient of angle θ along the X direction) from the chemical solution processing chamber 3B is 90 ° in the X (−) direction. At the same time, an attitude conversion mechanism 26 is provided for converting the attitude of the substrate S into an attitude that can be conveyed by the conveyance rollers 30 described later in the third processing unit 4, that is, an inclined attitude having a gradient of angle θ along the Y direction. Yes. The posture changing mechanism 26 has the same basic configuration as the posture changing mechanism 22 provided in the first posture changing chamber 3A, and this will be described later together with the description of the posture changing mechanism 22.

  In the second posture changing chamber 3C, a cleaning liquid supply nozzle 28 for supplying a cleaning liquid to the substrate S after the chemical liquid processing is further provided above the posture changing mechanism 26. These cleaning liquid supply nozzles 28 are composed of, for example, shower nozzles and the like, and the cleaning liquid is supplied to the substrate S whose posture is being changed by the cleaning liquid supply nozzles 28, so that the cleaning process is immediately performed on the substrate S after the chemical processing. It has become.

<Third processing unit 4>
As shown in FIGS. 1 and 2C, the third processing unit 4 includes a second cleaning chamber 4A and a carry-out chamber 4B. In each of the chambers 4A and 4B, a transport roller 30 is arranged in the X direction at a predetermined interval. It is arranged. Each transport roller 30 is arranged with a gradient of an angle θ along the Y direction, whereby the surface of the substrate S is inclined when viewed from the transport direction (X direction), and specifically toward the outside of the apparatus. It is transported in a state where it is tilted forward and supported in a posture in which one side is parallel to the transport direction.

  In the second cleaning chamber 4 </ b> A, a cleaning liquid supply nozzle 32 for supplying a cleaning liquid to the substrate S is disposed above the transport roller 30. These cleaning liquid supply nozzles 32 are composed of, for example, shower nozzles, and in the second cleaning chamber 4A, the cleaning liquid is supplied from the cleaning liquid supply nozzles 32 onto the upper surface of the substrate S carried in an inclined posture from the second posture changing chamber 3C. Thus, the cleaning process of the substrate S is advanced while the cleaning liquid is allowed to flow along the substrate S.

  In the second cleaning chamber 4 </ b> A, a pair of upper and lower liquid cutting knives 33 is disposed at a position downstream of the cleaning liquid supply nozzle 32. These liquid cutting knives 33 are composed of slit nozzles or the like, and spray the high-pressure air or inert gas onto the upper and lower surfaces of the substrate S after the supply of the cleaning liquid to remove the cleaning liquid adhering to the substrate S. Is dried.

  In the carry-out chamber 4B, a posture changing mechanism 36 and a delivery mechanism 34 are provided. The delivery mechanism 34 and the posture changing mechanism 36 convert the substrate S transported from the second cleaning chamber 4A in an inclined posture into a horizontal posture and deliver it to the robot R. The basic configuration is the above-described loading chamber. Common to the receiving mechanism 12 and the attitude changing mechanism 14 deployed in 2A.

  That is, when unloading the substrate S from the unloading chamber 4B, first, the transport rollers (not shown) of the posture changing mechanism 36 are set to the inclined posture, and the support pins 342 of the delivery mechanism 34 are set to the retracted position. In the state, the substrate S is loaded from the second cleaning chamber 4A to the unloading chamber 4B. The attitude of the substrate S is changed from the inclined attitude to the horizontal attitude by changing the attitude of the attitude changing mechanism 36 to the horizontal attitude. Thereafter, the actuator 341 operates to cause the support pins 342 of the delivery mechanism 34 to operate. In this state, the substrate S is transferred from the delivery mechanism 34 to the robot R in a horizontal posture, so that the robot R can transfer the substrate S to the unloading chamber 4B. And is accommodated in the cassette C of the indexer unit 1.

  4-7 has shown the attitude | position conversion mechanism 22 deployed in the 1st attitude | position conversion chamber 3A.

  As shown in the figure, the posture changing mechanism 22 includes a support table 221 for supporting the substrate S and a swinging mechanism for swinging the support table 221.

  The support table 221 is a square table having one side slightly longer than one side (long side) of the substrate S, and is supported on the base 220 in the first posture conversion chamber 3A via a swing mechanism.

  As shown in FIG. 5, the support table 221 is arranged so that one side thereof is along the X (or Y) direction in a plan view, and is supported on the base 220 while being inclined by an angle θ along the diagonal line. And can be swung (rotated) about an axis parallel to the diagonal line.

  That is, below the support table 221, a diagonal line of the support table 221, specifically, a diagonal line passing through the top of the support table 221 located at the end in the X (+) direction and the end in the Y (−) direction. A support shaft 240 (corresponding to the support means according to the present invention) is provided along. As shown in FIGS. 4 and 6, the support shaft 240 has one end (one end in the X (+) direction; hereinafter referred to as the tip of the support shaft 240) via a pin 214 with respect to the bracket 242 on the base 220. While being supported, the other end (referred to as the rear end of the support shaft 240) is connected to the tip of the rod 245 of the elevating air cylinder 244 fixed on the base 220 via a pin 246, thereby along the diagonal line. The rear end side is supported on the base 220 in a tilting attitude that is inclined downward from the front end side, and the tilt angle can be switched with the front end as a fulcrum as the lifting air cylinder 244 is operated. Yes. The tilt angle of the support shaft 240 is held at the tilt angle of the transport rollers 10 and 20, that is, the tilt angle θ of the substrate S during transport.

  The support table 221 is supported on the support shaft 240 via a plurality of (two in the illustrated example) rotary actuators 248 (corresponding to the swinging means according to the present invention). The rotary actuator 248 includes a stator portion and a rotor portion that is rotatably supported inside the stator portion, and includes a so-called pneumatic motor that rotationally drives the rotor portion with respect to the stator portion by air pressure. Is fixed to the outer peripheral surface of the support shaft 240, while the stator portion is fixed to a position along the diagonal line on the lower surface of the support table 221.

  As a result, the support table 221 is supported on the base 220 in a state where the support table 221 has a gradient of the angle θ along the diagonal line, and around the support axis 240 in accordance with the operation of each rotary actuator 248, that is, around the axis parallel to the diagonal line. Can be swung (rotated). With this configuration, the support table 221 moves around the support shaft 240 to a position where one side 221b of the Y (−) direction side of the support table 221 is horizontal, that is, a position parallel to the substrate transport direction by the upstream transport roller 10. 4 and 6, the support table 221 is aligned with the transport roller 10 in a state inclined at the same angle θ as the upstream transport roller 10, and as a result, as illustrated in FIG. 4 and FIG. 6. 10 can receive the substrate S on the support table 221 (see FIG. 2A). On the other hand, the support table 221 is rotated around the support shaft 240 to a position where one side 221a on the X (+) direction side of the support table 221 is horizontal, that is, a position parallel to the transport direction by the transport roller 20 on the downstream side. 8 and 9, the support table 221 is aligned with the transport roller 20 in a state inclined at the same angle θ as the transport roller 20, and as a result, the substrate S from the support table 221 to the transport roller 20 is aligned. Delivery is now possible. In the following description, the state of the support table 221 illustrated in FIGS. 4 and 6 is referred to as a “substrate receiving posture”, and the state of the support table 221 illustrated in FIGS. 8 and 9 is referred to as a “substrate delivery posture”. To do.

  As shown in FIGS. 4 and 5, a plurality of support portions 222 for supporting the substrate S are arranged on the upper surface of the support table 221 in a matrix. These support portions 222 are formed of, for example, ball casters that support the substrate S by a sphere that is rotatably held, whereby the support table 221 supports the substrate S in a state in which the substrate S can be displaced in any direction along the surface. It is configured to be able to.

  On the upper surface of the support table 221, a plurality of receiving rollers 224 (referred to as receiving-side roller groups) are provided at equal intervals along the side 221b at positions along the side 221b. A plurality of delivery rollers 226 (referred to as delivery-side roller groups) are provided at equal intervals along the side 221a at the same end and along the side 221a.

  These rollers 224 and 226 each receive a lower side end portion of the substrate S supported on the support table 221 in an inclined posture and apply thrust in the substrate transport direction to the substrate S. The receiving roller 224, the postscript receiving motor 230 and the like correspond to the first thrust applying means according to the present invention, and the delivery roller 226 and the postscript passing motor 232 and the like correspond to the second thrust applying means according to the present invention.

  These rollers 224 and 226 are supported so as to be rotatable about an axis perpendicular to the upper surface of the support table 221, and the rollers 224 and 226 are integrally rotated in the same direction for each roller group. It is configured as follows. That is, as shown in FIG. 7, the support table 221 is provided with a roller shaft that passes through the support table 221 and is rotatably supported by the table 221, and rollers 224 and 226 are attached to the roller shaft on the upper surface side of the support table 221. On the other hand, pulleys 224 a and 226 a are fixed to the roller shaft on the lower surface side of the support table 221. A receiving motor 230 and a delivery motor 232 are fixed to the lower surface (back surface) of the support table 221, and a plurality of tension pulleys 225 and 227 are provided, and a pulley (not shown) fixed to the output shaft of the receiving motor 230. A drive belt 231 is stretched over the pulleys 224a and 225, while a drive belt 233 is stretched between the pulley 232a fixed to the output shaft of the delivery motor 232 and the pulleys 226a and 227. Yes. With this configuration, each receiving roller 224 of the receiving side roller group is integrally rotated in the same direction by the operation of the receiving motor 230, while each passing roller 226 of the delivery side roller group is rotated in the same direction by the operation of the passing motor 232. It is designed to rotate together. 6 and 9, the drive belts 231 and 233 are not shown for convenience.

  As shown in FIG. 5, each of the rollers 224 and 226 has a substrate S supported on a support table 221 and two orthogonal sides S1 and S2 of the substrate S in contact with the rollers 224 and 226, respectively. The vertical angle of the substrate S formed by the two sides S1 and S2 is provided so as to be positioned on the diagonal line of the support table 221. Thus, when the support table 221 swings around the support shaft 240, the side S1 located on the leading side in the transport direction (X direction) by the transport roller 10 of the two sides S1 and S2 is formed on the substrate S as one side. The substrate S swings about an axis parallel to the diagonal D of the virtual square (that is, the support shaft 240).

  According to the posture conversion mechanism 22 as described above, the posture of the substrate S is converted as follows.

  First, as shown in FIGS. 4 and 6, the support table 221 is set to the substrate receiving posture by the operation of the rotary actuator 248. As a result, the substrate S transported in an inclined posture from the first cleaning chamber 2B is received on the support table 221 (see the two-dot chain line arrow in FIG. 4). At this time, the receiving roller 224 is driven, and the lower end portion of the substrate S moving on the support table 221 is supported by the receiving roller 224, whereby the substrate S moves in the transport direction (X (+) direction). A thrust is applied, and as a result, the substrate S is received into the support table 221 promptly. When the substrate S is sent to a position where one side S1 of the front end in the advancing direction contacts the delivery roller 226 (the state shown in FIG. 5), the driving of the acceptance roller 224 is stopped and the substrate S is received on the support table 221. Is completed.

  When the acceptance of the substrate S is completed, the support table 221 is swung by the operation of the rotary actuator 248, and the posture of the support table 221 is switched from the substrate acceptance posture to the substrate delivery posture as shown in FIGS. Accordingly, the posture of the substrate S is converted into an inclined posture having a gradient in the X direction. When the posture of the support table 221 is switched in this way, the substrate S has a diagonal D of a virtual square formed on the substrate S with the side S1 positioned on the leading side in the transport direction (X direction) by the transport roller 10 as one side. An axis parallel to (see FIG. 5), that is, the leading side S1 around the support shaft 240 is rotated to a position parallel to the transport direction (Y direction) by the transport roller 20, whereby the posture of the substrate S is changed. It is converted into an inclined posture having a gradient along the X direction and the leading side S1 positioned at the lower end.

  When the posture of the substrate S is converted in this way, the delivery roller 226 is driven and a thrust in the transport direction, that is, the Y (+) direction is applied to the substrate S, whereby the substrate S is moved from the support table 221 onto the transport roller 20. Then, the posture changing operation of the substrate S by the posture changing mechanism 22 is completed.

  Here, the configuration of the posture conversion mechanism 22 provided in the first posture conversion chamber 3A has been described, but the posture conversion mechanism 26 provided in the second posture conversion chamber 3C also basically has the same configuration. . That is, although not shown in detail, the posture changing mechanism 26 sets the substrate S that is transported in the tilted posture (the tilted posture having a gradient in the X direction) by the transport roller 20 after the chemical treatment, to the substrate receiving posture. After receiving on the support table 261 (see FIG. 2B), the support table 261 is converted into a substrate delivery posture, whereby the posture of the substrate S can be conveyed by the conveyance roller 30 in an inclined posture (gradient in the Y direction). The substrate S is transferred from the support table 261 to the transport roller 30.

  Next, a series of processing of the substrate S in this substrate processing apparatus will be described.

  First, the substrate S taken out from the cassette C in the indexer unit 1 is carried into the first processing unit 2 (loading chamber 2A) while being in a horizontal posture by the robot R and delivered to the receiving mechanism 12. Then, after the posture is changed from the horizontal posture to the inclined posture by the posture changing mechanism 14, it is conveyed by driving the conveying roller 10 and carried into the first cleaning chamber 2B, and moves in the first cleaning chamber 2B at a predetermined speed. In the meantime, the cleaning liquid is supplied to the surface from the cleaning liquid supply nozzle 16 to perform the cleaning process.

  The substrate S that has passed through the first cleaning chamber 2B is then carried into the first posture changing chamber 3A of the second processing unit 3 and delivered from the transport roller 10 to the posture changing mechanism 22. Then, the posture conversion mechanism 22 converts the posture of the substrate S from a tilted posture having a gradient along the Y direction into a tilted posture having a gradient along the X direction, and in a direction in which the transport direction of the substrate S is orthogonal. Converted.

  After the posture change, the substrate S is transferred from the posture changing mechanism 22 to the transport roller 20, transported by the drive of the transport roller 20, and transported into the chemical solution processing chamber 3B, while moving in the first cleaning chamber 2B at a predetermined speed. Further, the chemical solution is applied to the surface by supplying the chemical solution from the chemical solution supply nozzle 24.

  The substrate S that has passed through the chemical solution processing chamber 3B is then carried into the second posture changing chamber 3C and transferred from the transport roller 20 to the posture changing mechanism 26. Then, the posture conversion mechanism 26 converts the posture of the substrate S from a tilted posture having a gradient along the X direction to a tilted posture having a gradient along the Y direction, and changes the transport direction of the substrate S to a direction orthogonal. Is done. During the posture changing operation, the cleaning liquid is supplied to the substrate S from the cleaning liquid supply nozzle 28, whereby the cleaning process is quickly started on the substrate S after the chemical processing.

  The substrate S whose posture has been changed in this way is delivered from the posture changing mechanism 26 to the transport roller 30, transported by driving the transport roller 30, and carried into the second cleaning chamber 4 </ b> A. Then, while moving in the second cleaning chamber 4A at a predetermined speed, the cleaning liquid is further supplied to the surface from the cleaning liquid supply nozzle 32, so that the cleaning process is further performed.

  Next, the substrate S is unloaded from the second cleaning chamber 4A to the unloading chamber 4B. Then, when the substrate S is unloaded from the second cleaning chamber 4A, the substrate S is subjected to a drying process by spraying high-pressure air or the like onto the upper and lower surfaces of the substrate S with the liquid cutting knife 33 to remove the cleaning solution.

  When the substrate S is carried into the carry-out chamber 4B in this manner, the posture of the substrate S is first returned to the horizontal posture by the posture changing mechanism 36, and then the substrate S is delivered to the robot R by the delivery mechanism 34. The substrate S is accommodated in the cassette C by R. As a result, a series of processing of the substrate S by the substrate processing apparatus is completed.

  According to the substrate processing apparatus as described above, a “U” -shaped conveyance path is configured with respect to the indexer unit 1, and the substrate S taken out from the indexer unit 1 is passed through the processing units 2 to 4 to the indexer unit 1. Since it is configured to return, the loading and unloading of the substrate S with respect to the substrate processing apparatus can be unified into the indexer unit 1 so that the cassette can be rationally transported by the automatic guided vehicle, and the substrate S can be performed throughout the entire process. Since the substrate S is configured to perform a process such as cleaning while being conveyed in an inclined posture, the process such as cleaning can be efficiently advanced while flowing the cleaning liquid or the like along the substrate S.

  Moreover, in this substrate processing apparatus, the traveling direction of the substrate S needs to be changed by 90 ° between the first cleaning chamber 2B and the chemical processing chamber 3B, and between the chemical processing chamber 3B and the second cleaning chamber 4A. The posture changing mechanisms 22 and 26 as described above are arranged, and the posture of the substrate S before changing the direction (the inclined posture having a gradient along the Y direction (X direction)) is changed by the single posture changing mechanism 22 (26). Since the posture is changed to a posture after direct change (an posture having a gradient along the X direction (Y direction)), the transport direction of the substrate S can be efficiently changed in a smaller space compared to this type of conventional apparatus. be able to. That is, this type of conventional technique in which a substrate transported in an inclined posture is once returned to a horizontal posture by the posture converting mechanism, and the substrate in the horizontal posture is transferred to another posture converting mechanism, and then the substrate S is converted into the next inclined posture. In this device, it is necessary to arrange a total of four posture conversion mechanisms, two at each turning point in the traveling direction, so that the space occupied by the posture conversion mechanism becomes large and the posture conversion requires a lot of time. It becomes. On the other hand, according to the apparatus of the above embodiment, since the attitude of the substrate S can be directly converted into the attitude after the direction change by the single attitude changing mechanism 22 (26) as described above, the substrate S is compared with the conventional apparatus. The space required for the posture change can be reduced, and the time required for the posture change can be greatly shortened. Therefore, it is possible to efficiently change the transport direction of the substrate S in a smaller space.

  In particular, the posture changing mechanism 22 (26) of the above embodiment has the support table 221 swingably mounted on the support shaft 240 via the rotary actuator 248, and the support table 221 is swung by the operation of the rotary actuator 248. Since it is configured as described above, there is an advantage that the above-described effects can be enjoyed with a very simple configuration.

  In the substrate processing apparatus described above, the inclination angle of the substrate S before the direction change and the inclination angle of the substrate S after the direction change, for example, the inclination angle of the substrate S conveyed by the conveyance roller 10 in the first cleaning chamber 2B and the chemical solution. Although the case where the inclination angle of the substrate S transported by the transport roller 20 is equal in the processing chamber 3B has been described, according to the posture changing mechanism 22 (26), the inclination angle of the substrate S before and after the direction change is also different. There is an advantage that it can respond.

  That is, when the inclination angles of the substrate S before and after the direction change are different, first, the support table 221 is set to the substrate receiving posture, and then the lifting air cylinder 244 (corresponding to the angle varying means according to the present invention) is operated. Thus, the tilt angle of the support shaft 240 is changed, whereby the tilt angle of the support table 221 is matched with the tilt angle of the substrate S before the direction change, and the substrate S is received on the support table 221. Thereafter, the support table 221 is switched to the substrate delivery posture and the lifting air cylinder 244 is operated to change the tilt angle of the support shaft 240 so that the tilt angle of the support table 221 matches the tilt angle of the substrate S after the change of direction. Then, the substrate S on the support table 221 is sent to the downstream side. In this way, even when the inclination angles of the substrate S before and after the direction change are different, it can be handled without difficulty.

  By the way, the substrate processing apparatus described above is an example of a substrate processing apparatus to which the substrate transfer apparatus according to the present invention (the substrate transfer apparatus to which the posture changing apparatus according to the present invention is applied) is applied. The configuration of the substrate transfer device and the specific configuration of the posture changing device can be changed as appropriate without departing from the scope of the present invention.

  For example, in the above embodiment, the support table 221 is rotatably supported on the support shaft 240 via the rotary actuator 248, and the support table 221 is rotated (oscillated) around the support shaft 240 by driving the rotary actuator 248. However, instead of the rotary actuator 248, the lower surface of the support table 221 is supported by an actuator such as an air cylinder, and the support table 221 is swung around the support shaft 240 by driving the actuator. May be. Further, without providing the support shaft 240, the lower surface of the support table 221 is supported by a plurality of lifting actuators such as air cylinders, and the posture of the support table 221 is switched by individually controlling the actuators. Also good. That is, if the support table 221 can be swung between the substrate receiving posture and the substrate delivery posture, the specific configuration for swinging the support table 221 is not limited to that of the embodiment. These can be changed as appropriate.

  In the above embodiment, the substrate processing apparatus is configured to sequentially perform cleaning processing, chemical processing, and drying processing on the substrate S while the substrate S is transported in an inclined posture. It is not limited to the form, and can be changed as appropriate.

1 is a schematic plan view showing an outline of a substrate processing apparatus to which a substrate transfer apparatus according to the present invention (a substrate transfer apparatus to which an attitude changing apparatus according to the present invention is applied) is applied. It is a figure which shows the outline of the substrate processing apparatus shown in FIG. 1 by a side view, (a) is a side view which shows the part from a 1st process part to a 2nd process part, (b) is a side view which shows a 2nd process part. (C) is a side view which shows the part from a 2nd process part to a 3rd process part. It is a perspective schematic diagram which shows the attitude | position conversion mechanism of the board | substrate arrange | positioned in a carrying-in chamber, (a) shows the state which supported the board | substrate in the horizontal attitude | position, (b) shows the state which converted the board | substrate into the inclination attitude | position, respectively. It is a perspective view which shows the attitude | position conversion mechanism of the board | substrate arrange | positioned in a 1st attitude | position conversion chamber (The state in which the support table was set to the board | substrate receiving attitude | position). It is a top view which shows an attitude | position conversion mechanism. FIG. 5 is a view in the direction of the arrow VI in FIG. 4 showing a swing mechanism incorporated in the posture conversion mechanism. FIG. 7 is a view taken in the direction of the arrow VII in FIG. 4 showing a swing mechanism incorporated in the posture changing mechanism and a drive mechanism for receiving and delivery rollers. It is a perspective view (state with the support table set to the substrate delivery posture) showing the posture change mechanism. It is a side view (side view corresponding to Drawing 6) showing a posture change mechanism. It is a schematic diagram which shows the outline of the conventional board | substrate conveyance apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Indexer part 2 1st process part 3 2nd process part 4 3rd process part 2A Carry-in room 2B 1st washing room 3A 1st attitude | position conversion room 3B Chemical solution process room 3C 2nd attitude | position conversion room 4A 2nd washing room 4B Unloading room 22, 26 Posture change mechanism 221,261 Support table C Cassette R Robot S Substrate

Claims (7)

A method of transporting a substrate by transporting a rectangular substrate in a first transport direction and then changing the transport direction to a second transport direction orthogonal to the first transport direction,
A first transport step for transporting the substrate in a first transport direction in a state where the surface is inclined when viewed from the first transport direction and one side of the substrate is supported in a first inclined posture parallel to the first transport direction;
A posture conversion step of converting the substrate transported in the first transport direction into a second tilt posture in which the surface is inclined when viewed from the second transport direction and one side thereof is parallel to the second transport direction;
A second transporting step of transporting the substrate that has been transformed into the second tilted posture in the posture transforming step in the second transporting direction in a state where the substrate is supported in the second tilted posture,
In the posture changing step, the diagonal line passing through the top of the lower-most side of the substrate among the diagonal lines of the virtual square formed on the substrate with the side on the leading side of the substrate transported in the first transport direction as one side and the diagonal line The substrate is converted from the first inclined posture to the second inclined posture by rotating the substrate to a position where the leading side is parallel to the second transport direction around a parallel axis. Transport method. A first transport means for transporting a rectangular substrate in a first transport direction in a state where the surface thereof is inclined when viewed from the transport direction and one side thereof is parallel to the transport direction; A transport means for transporting a substrate in a second transport direction orthogonal to the direction, wherein the substrate is tilted when viewed from the second transport direction and is supported in a second inclined posture whose one side is parallel to the second transport direction. The substrate posture is changed between the first inclined posture and the second inclined posture so as to deliver the substrate from the first conveying means to the second conveying means. A posture changing device that performs
A table provided with a support portion that supports the substrate so as to be displaceable in at least the first transport direction and the second transport direction;
Support means for swingably supporting the table;
A substrate receiving posture in which the upper surface of the table is tilted when viewed from the first transport direction and the substrate transported in the first tilted posture is received from the first transport means, and the upper surface of the table is viewed from the second transport direction. Swinging means for swinging the table over a substrate delivery posture that allows the substrate that is inclined and supported on the table to be delivered to the second transport means;
The substrate delivery posture is a diagonal line passing through the top portion of the top lower side of the substrate of the virtual square diagonal line formed on the substrate with the top side of the substrate received on the table in the substrate receiving posture as one side. An attitude conversion device characterized in that the board is rotated to a position where the leading side is parallel to the second transport direction around an axis parallel to the diagonal line. The posture changing apparatus according to claim 2,
The support means includes a support shaft that is provided in parallel to the diagonal line and supports the table so as to be rotatable. The swinging means rotates the table about the support shaft. Conversion device. In the posture conversion device according to claim 3,
An attitude conversion device comprising angle changing means for changing an inclination angle of the table in the substrate receiving attitude or the substrate delivery attitude by changing an inclination angle of the support shaft with respect to a horizontal plane. In the posture changing device according to any one of claims 2 to 4,
First thrust applying means for applying a thrust in a first transport direction to a substrate supported on the table in the substrate receiving posture; and the first thrust applying means for the substrate supported on the table in the substrate delivery posture. A posture changing device comprising: a second thrust applying means for applying a thrust in two transport directions. The posture changing apparatus according to claim 5,
The posture changing device characterized in that the first and second thrust applying means are driving rollers that support a lower side end portion of a substrate in an inclined posture and apply the thrust to the substrate by rotation. A first transport means for transporting a rectangular substrate in a first transport direction in a state where the surface thereof is inclined when viewed from the transport direction and one side thereof is parallel to the transport direction; A transport means for transporting a substrate in a second transport direction orthogonal to the direction, wherein the substrate is tilted when viewed from the second transport direction and is supported in a second inclined posture whose one side is parallel to the second transport direction. A second transport unit that transports the substrate in a state in which the substrate is transferred, and a posture conversion device that converts the posture of the substrate from the first tilted posture to the second tilted posture to deliver the substrate from the first transport unit to the second transport unit; A substrate transfer device comprising:
A substrate transfer apparatus comprising the attitude changing apparatus according to claim 2 as the attitude changing apparatus.

Images