CN1850350A - Air-intaking device for increasing intake evenness - Google Patents
Air-intaking device for increasing intake evenness Download PDFInfo
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- CN1850350A CN1850350A CN 200510126356 CN200510126356A CN1850350A CN 1850350 A CN1850350 A CN 1850350A CN 200510126356 CN200510126356 CN 200510126356 CN 200510126356 A CN200510126356 A CN 200510126356A CN 1850350 A CN1850350 A CN 1850350A
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- Prior art keywords
- nozzle body
- chamber
- base plate
- uniformity
- gas
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Abstract
The present invention relates to the field of microelectronic technology. In the concrete, it relates to a gas-supplying device capable of raising gas-supplying uniformity. It includes a cylindrical nozzle main body, its bottom end portion is equipped with a bottom plate on which a through hole is set, and the inner wall of lower portion of the described cylindrical nozzle main body is equipped with grill, and the cylindrical nozzle main body and the bottom plate are connected into one body.
Description
Technical field
The present invention relates to microelectronics technology, be specifically related to a kind of inlet duct that improves intake uniformity.
Background technology
The present invention is designed into field of semiconductor fabrication processes, in semiconductor fabrication, it is vital that source of the gas enters in the processing chamber equably, because the uniformity of gas in chamber directly had influence on the uniformity of plasma in the chamber, and then has influence on the quality of process results.In semiconductor technology, plasma etching for example, in the technologies such as CVD, the mode of source of the gas air inlet has directly determined the distributing homogeneity of gas in chamber, the uniformity of gas (stream) has crucial effect to producing uniform plasma in the chamber, thereby directly influenced the uniformity of technology, prior art as shown in Figure 1, front end at tubular nozzle forms conical expansion angle θ, so that gas diffusion spray into chamber, wherein θ is open angle, angle commonly used at present is 90,110,120 degree owing to reasons such as admission pressure and distances, utilize prior art can not more effectively make the even distribution of gas in whole chamber.
Summary of the invention
(1) technical problem that will solve
The purpose of this invention is to provide a kind of inlet duct that improves intake uniformity, thereby make gas enter into chamber interior more uniformly, reach the uniformity of improving technology.
(2) technical scheme
In order to achieve the above object, the present invention takes following scheme:
A kind of inlet duct that improves the chamber intake uniformity of the present invention comprises cylindric nozzle body, and described cylindric nozzle body bottom is provided with base plate, through hole is arranged on the base plate, the lower inner wall of described cylindric nozzle body is provided with grid, and wherein, cylindric nozzle body and base plate are connected as a single entity.
Wherein, described grid top flushes with the chamber inner top.
Wherein, described grid evenly distribute on the lower inner wall of cylindric nozzle body.
Wherein, described through hole evenly distributes on base plate.
(3) beneficial effect
Compared with the prior art the present invention owing to adopt above scheme, has increased admission pressure, makes that the gas that enters in the chamber is more even, thereby makes plasma more even.Improved the uniformity of technology.
Description of drawings
Fig. 1 is a prior art nozzle arrangements schematic diagram;
Fig. 2 is a nozzle base sheet structural representation of the present invention;
Fig. 3 is the cutaway view of nozzle front view of the present invention;
Fig. 4 is the schematic diagram that nozzle of the present invention is connected with Pit cover;
Fig. 5 is the vertical view of Fig. 3.
Among the figure:
1 through hole, 2 base plates, 3 grid, 4 cylindric nozzle bodies
6 Pit covers, 7 grid gaps, 8 nozzle body inwalls
The specific embodiment
Following examples are used to illustrate the present invention, but are not used for limiting the scope of the invention.
A kind of inlet duct that improves intake uniformity, as shown in Figure 3, comprise cylindric nozzle body 4, be provided with base plate 2 in cylindric nozzle body 4 bottoms, through hole 1 is arranged on the base plate 2, the lower inner wall 8 of described cylindric nozzle body 4 is provided with grid 3, and wherein, cylindric nozzle body 4 and base plate 2 are connected as a single entity.In the present embodiment, be evenly distributed with 5 through holes 1 on the base plate 2.The effect of these 5 through holes 1 is to allow the gas inflow chamber chamber interior of part, because be the hole of opening on base plate 2, so just portion gas enters in the chamber through these 5 through holes 1.Grid 3 are for the part barrier air so that allow gas from the grid gap the 7 stronger distant places that spray to away from nozzle, promptly in the chamber around, thereby remedy the few defective of ambient gas.When the present invention installed, grid 3 tops were mutually neat with the chamber inner top.
Claims (4)
1, a kind of inlet duct that improves the chamber intake uniformity, comprise that cylindric nozzle body is characterized in that: described cylindric nozzle body bottom is provided with base plate, through hole is arranged on the base plate, the lower inner wall of described cylindric nozzle body is provided with grid, wherein, cylindric nozzle body and base plate are connected as a single entity.
2, a kind of inlet duct that improves the chamber intake uniformity as claimed in claim 1 is characterized in that: described grid evenly distribute on the lower inner wall of cylindric nozzle body.
3, a kind of inlet duct that improves the chamber intake uniformity as claimed in claim 1 is characterized in that: described through hole evenly distributes on base plate.
4, a kind of inlet duct that improves the chamber intake uniformity as claimed in claim 1, it is characterized in that: described grid top flushes with the chamber inner top.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510126356 CN1850350A (en) | 2005-12-07 | 2005-12-07 | Air-intaking device for increasing intake evenness |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510126356 CN1850350A (en) | 2005-12-07 | 2005-12-07 | Air-intaking device for increasing intake evenness |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1850350A true CN1850350A (en) | 2006-10-25 |
Family
ID=37131861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200510126356 Pending CN1850350A (en) | 2005-12-07 | 2005-12-07 | Air-intaking device for increasing intake evenness |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1850350A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104112637A (en) * | 2013-04-17 | 2014-10-22 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Air inlet system and plasma processing device |
| CN105702600A (en) * | 2014-11-28 | 2016-06-22 | 中国科学院微电子研究所 | Air inlet device of semiconductor equipment |
-
2005
- 2005-12-07 CN CN 200510126356 patent/CN1850350A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104112637A (en) * | 2013-04-17 | 2014-10-22 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Air inlet system and plasma processing device |
| CN105702600A (en) * | 2014-11-28 | 2016-06-22 | 中国科学院微电子研究所 | Air inlet device of semiconductor equipment |
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Legal Events
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|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Open date: 20061025 |