CN1810389B - 基板处理方法以及基板处理装置 - Google Patents

基板处理方法以及基板处理装置 Download PDF

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Publication number
CN1810389B
CN1810389B CN2006100063152A CN200610006315A CN1810389B CN 1810389 B CN1810389 B CN 1810389B CN 2006100063152 A CN2006100063152 A CN 2006100063152A CN 200610006315 A CN200610006315 A CN 200610006315A CN 1810389 B CN1810389 B CN 1810389B
Authority
CN
China
Prior art keywords
substrate
treatment fluid
ice
atomic
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2006100063152A
Other languages
English (en)
Chinese (zh)
Other versions
CN1810389A (zh
Inventor
川根旬平
竹市芳邦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Publication of CN1810389A publication Critical patent/CN1810389A/zh
Application granted granted Critical
Publication of CN1810389B publication Critical patent/CN1810389B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N21/00Selective content distribution, e.g. interactive television or video on demand [VOD]
    • H04N21/40Client devices specifically adapted for the reception of or interaction with content, e.g. set-top-box [STB]; Operations thereof
    • H04N21/41Structure of client; Structure of client peripherals
    • H04N21/426Internal components of the client ; Characteristics thereof
    • H04N21/42661Internal components of the client ; Characteristics thereof for reading from or writing on a magnetic storage medium, e.g. hard disk drive
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N21/00Selective content distribution, e.g. interactive television or video on demand [VOD]
    • H04N21/40Client devices specifically adapted for the reception of or interaction with content, e.g. set-top-box [STB]; Operations thereof
    • H04N21/41Structure of client; Structure of client peripherals
    • H04N21/4104Peripherals receiving signals from specially adapted client devices
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N21/00Selective content distribution, e.g. interactive television or video on demand [VOD]
    • H04N21/40Client devices specifically adapted for the reception of or interaction with content, e.g. set-top-box [STB]; Operations thereof
    • H04N21/45Management operations performed by the client for facilitating the reception of or the interaction with the content or administrating data related to the end-user or to the client device itself, e.g. learning user preferences for recommending movies, resolving scheduling conflicts
    • H04N21/462Content or additional data management, e.g. creating a master electronic program guide from data received from the Internet and a Head-end, controlling the complexity of a video stream by scaling the resolution or bit-rate based on the client capabilities
    • H04N21/4621Controlling the complexity of the content stream or additional data, e.g. lowering the resolution or bit-rate of the video stream for a mobile client with a small screen

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Databases & Information Systems (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning In General (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN2006100063152A 2005-01-28 2006-01-18 基板处理方法以及基板处理装置 Expired - Fee Related CN1810389B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2005020802 2005-01-28
JP2005020802 2005-01-28
JP2005-020802 2005-01-28
JP2005325739 2005-11-10
JP2005-325739 2005-11-10
JP2005325739A JP2006231319A (ja) 2005-01-28 2005-11-10 基板処理方法および基板処理装置

Publications (2)

Publication Number Publication Date
CN1810389A CN1810389A (zh) 2006-08-02
CN1810389B true CN1810389B (zh) 2010-07-28

Family

ID=37039544

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006100063152A Expired - Fee Related CN1810389B (zh) 2005-01-28 2006-01-18 基板处理方法以及基板处理装置

Country Status (4)

Country Link
JP (1) JP2006231319A (enExample)
KR (1) KR100670687B1 (enExample)
CN (1) CN1810389B (enExample)
TW (1) TW200640586A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5736615B2 (ja) * 2011-04-26 2015-06-17 国立大学法人大阪大学 基板の洗浄方法
CN107695040B (zh) * 2017-10-20 2021-01-15 大族激光科技产业集团股份有限公司 激光清洗系统及方法
CN109226107B (zh) * 2018-11-08 2024-06-21 广东交通职业技术学院 一种杆件激光清洗系统及清洗方法
JP7186095B2 (ja) * 2019-01-08 2022-12-08 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
CN112090821B (zh) * 2020-07-29 2022-08-26 苏州晶洲装备科技有限公司 一种超高压洗净装置
CN116906959A (zh) * 2023-08-22 2023-10-20 嵊州市浙江工业大学创新研究院 具有辅助电力调峰功能的油烟管道清洁系统及清洁方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3380021B2 (ja) * 1993-12-28 2003-02-24 株式会社エフティーエル 洗浄方法
JP2000031239A (ja) * 1998-07-13 2000-01-28 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2002141269A (ja) * 2000-11-01 2002-05-17 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JP2003033733A (ja) * 2001-07-23 2003-02-04 Taiyo Toyo Sanso Co Ltd 基板洗浄システム
JP2003039031A (ja) * 2001-07-27 2003-02-12 Kakizaki Mamufacuturing Co Ltd 板材洗浄方法および板材洗浄装置
JP2004313827A (ja) * 2003-04-11 2004-11-11 Tokyo Kakoki Kk 表面処理装置

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2000-77828A 2000.03.14
JP特开平10-90913A 1998.04.10

Also Published As

Publication number Publication date
TWI295199B (enExample) 2008-04-01
JP2006231319A (ja) 2006-09-07
KR100670687B1 (ko) 2007-01-17
KR20060087417A (ko) 2006-08-02
CN1810389A (zh) 2006-08-02
TW200640586A (en) 2006-12-01

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20100728

Termination date: 20120118