CN1721091A - 清洗方法及用于实施该方法的清洗装置 - Google Patents

清洗方法及用于实施该方法的清洗装置 Download PDF

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Publication number
CN1721091A
CN1721091A CNA2005100843041A CN200510084304A CN1721091A CN 1721091 A CN1721091 A CN 1721091A CN A2005100843041 A CNA2005100843041 A CN A2005100843041A CN 200510084304 A CN200510084304 A CN 200510084304A CN 1721091 A CN1721091 A CN 1721091A
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CN
China
Prior art keywords
radgas
cleaned
thing
cleaning
heating arrangements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2005100843041A
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English (en)
Chinese (zh)
Inventor
小林芳树
安川雅彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JAVIC CO Ltd
Original Assignee
JAVIC CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JAVIC CO Ltd filed Critical JAVIC CO Ltd
Publication of CN1721091A publication Critical patent/CN1721091A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/007—Heating the liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2230/00—Other cleaning aspects applicable to all B08B range
    • B08B2230/01—Cleaning with steam
CNA2005100843041A 2004-07-16 2005-07-12 清洗方法及用于实施该方法的清洗装置 Pending CN1721091A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004210297A JP2006026549A (ja) 2004-07-16 2004-07-16 洗浄方法及びそれを実施するための洗浄装置
JP2004210297 2004-07-16

Publications (1)

Publication Number Publication Date
CN1721091A true CN1721091A (zh) 2006-01-18

Family

ID=35893514

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2005100843041A Pending CN1721091A (zh) 2004-07-16 2005-07-12 清洗方法及用于实施该方法的清洗装置

Country Status (4)

Country Link
JP (1) JP2006026549A (ko)
KR (1) KR20060050162A (ko)
CN (1) CN1721091A (ko)
TW (1) TW200613070A (ko)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7913351B2 (en) 2006-08-28 2011-03-29 Tokyo Electron Limited Cleaning apparatus and cleaning method
CN102284441A (zh) * 2011-06-15 2011-12-21 朱品桦 塑料件蒸气清洗系统及清洗方法
CN101134203B (zh) * 2006-08-28 2015-05-27 东京毅力科创株式会社 洗涤装置和洗涤方法
CN108176679A (zh) * 2017-12-28 2018-06-19 深圳市鑫承诺环保产业股份有限公司 一种金属薄膜在线清洗方法
CN112893330A (zh) * 2021-04-19 2021-06-04 惠州市浩发机械设备有限公司 一种辊面清洁装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4909611B2 (ja) * 2006-03-10 2012-04-04 芝浦メカトロニクス株式会社 基板の洗浄処理装置及び洗浄処理方法
JP2013193061A (ja) * 2012-03-22 2013-09-30 Sharp Corp 除塵装置および除塵方法
US11282696B2 (en) 2019-11-22 2022-03-22 Dangsheng Ni Method and device for wet processing integrated circuit substrates using a mixture of chemical steam vapors and chemical gases

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19522525A1 (de) * 1994-10-04 1996-04-11 Kunze Concewitz Horst Dipl Phy Verfahren und Vorrichtung zum Feinstreinigen von Oberflächen
JPH11346645A (ja) * 1998-06-04 1999-12-21 Seda Giken:Kk 洗浄殺菌機
JP3725051B2 (ja) * 2001-07-27 2005-12-07 大日本スクリーン製造株式会社 基板処理装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7913351B2 (en) 2006-08-28 2011-03-29 Tokyo Electron Limited Cleaning apparatus and cleaning method
CN101134203B (zh) * 2006-08-28 2015-05-27 东京毅力科创株式会社 洗涤装置和洗涤方法
CN102284441A (zh) * 2011-06-15 2011-12-21 朱品桦 塑料件蒸气清洗系统及清洗方法
CN108176679A (zh) * 2017-12-28 2018-06-19 深圳市鑫承诺环保产业股份有限公司 一种金属薄膜在线清洗方法
CN112893330A (zh) * 2021-04-19 2021-06-04 惠州市浩发机械设备有限公司 一种辊面清洁装置

Also Published As

Publication number Publication date
JP2006026549A (ja) 2006-02-02
TW200613070A (en) 2006-05-01
KR20060050162A (ko) 2006-05-19

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C06 Publication
PB01 Publication
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication