CN1553139A - Rapid detection method for structural parameters and surface shape distortion of micro-lens - Google Patents
Rapid detection method for structural parameters and surface shape distortion of micro-lens Download PDFInfo
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Abstract
A method for quickly detecting structural parameters and surface shape distortion of a micro-lens comprises the steps of firstly adopting a light beam to irradiate the surface of the micro-lens, then collecting diffraction light spots at a certain distance after light passes through a micro-lens array, measuring the size of each direction of the diffraction light spots of the micro-lens, and calculating other structural parameters such as the rise, the focal length, the numerical aperture and the like of the micro-lens according to the measured diffraction light spot data and the aperture of the micro-lens; and looking up a table according to the diffraction light spot deformation factor x to obtain the filling factor of the micro-lens array. The invention can be used for detecting parameters of the micro lens such as rise, focal length, numerical aperture and the like, can also be used for detecting filling factors, astigmatism and lens uniformity of the micro lens array, and has the advantages of convenient detection, high speed and non-contact detection in the detection process without any damage to elements.
Description
Technical field
The present invention relates to a kind of method of microlens structure parameter and face deformation being carried out fast detecting by diffraction pattern.
Background technology
The continuous relief microlens array is owing to have characteristics such as volume is little, in light weight, integrated level height, has been widely used in military affairs, scientific research, numerous areas such as civilian, and obtained good effect.Along with the expansion in microlens application field and the raising of lenticule production technique, lenticular structural parameters and face deformation detect and become more and more important.Existing search method mainly adopts two dimension, three-dimensional step profile instrument and scanning electron microscope etc., and these methods not only checkout equipment costliness, detection speed are slow, but also can cause damage to the lenticule surface, influence the lenticule result of use.Some lenticule key parameter particularly, as: lenticule fill factor, curve factor, the lenticular homogeneity of optical element zones of different etc. adopt existing equipment to detect very difficulty, and these parameters should be used for saying to be very important for lenticular.
Summary of the invention
Technology of the present invention is dealt with problems and is: overcome the deficiencies in the prior art, a kind of method for quick that can detect microlens structure parameter and face deformation quickly and accurately is provided, this method not only detection speed is fast, but also can detect lenticular key parameters such as lenticule fill factor, curve factor, the lenticular homogeneity of optical element zones of different.
Technical solution of the present invention is: the method for quick of microlens structure parameter and face deformation, its characteristics are to comprise the following steps:
(1) adopts light beam irradiates lenticule surface;
(2) gather a distance light by the diffraction pattern behind the microlens array, and measure all directions size of lenticule diffraction pattern;
(3) calculate other structural parameters such as lenticule rise, focal length, numerical aperture by the diffraction pattern shape that records, data and lenticule bore;
(4) diffraction pattern and the zero defect lenticule diffraction pattern with the defectiveness microlens array compares, and calculates diffraction pattern distortion factor χ;
(5) according to the relation of the fill factor, curve factor of diffraction pattern distortion factor χ and microlens array, tabling look-up draws the fill factor, curve factor of microlens array;
(6) according to the deformation of above-mentioned diffraction pattern, the distortion and the defective of lenticule face shape are analyzed.
Theoretical foundation of the present invention is: by the scalar diffraction theory of light wave as can be known, have certain functional relation between lenticular far field construction hot spot and the lenticular structure.When lenticular structural parameters variation or face shape generation distortion, lenticular far field construction hot spot must also produce certain corresponding deformation thereupon.So, in theory, can obtain the complete structural information of lenticule by analysis to the deformation of lenticule diffractive light field.
The present invention compared with prior art has following advantage: pick-up unit is simple, testing process is quick, the accuracy of detection height, not only can be used for the measurement of lenticule feature structure parameter, also can detect the very difficult parameter that detects of conventional methods such as fill factor, curve factor, element surface lens homogeneity, avoid the homogeneity that existing detection method apparatus expensive, detection time, length reached greater than the difficult detection of fill factor, curve factor in 86% o'clock, microlens array to be difficult for shortcomings such as detection.
Description of drawings
1. Fig. 1 wherein represents incident beam for the detection light path synoptic diagram of lenticule diffraction pattern among the present invention, 2. represents microlens array, 3. far field construction hot spot receiving screen;
Fig. 2 is one embodiment of the present of invention, its bore 50 μ m, and zero defect microlens array (fill factor, curve factor 100%) synoptic diagram of focal length 400 μ m, wherein ordinate is represented the relief depth of microlens array unit, every scale unit: 1 micron; Horizontal ordinate is represented the bore of microlens array unit, every scale unit: 5 microns;
Fig. 3 is a zero defect microlens array diffraction pattern profile synoptic diagram, and black region is represented the diffraction speck among the figure, and white portion is represented blackening, 4. represents Y direction spot size, 5. represents the directions X spot size;
Fig. 4 is the microlens array profile that has defective, and ordinate is represented the relief depth of microlens array unit among the figure, every scale unit: 1 micron; Horizontal ordinate is represented the bore of microlens array unit, every scale unit: 5 microns.
Fig. 5 is the microlens array diffraction pattern profile synoptic diagram that has defective, and black region is represented the diffraction speck among the figure, and white portion is represented blackening, 4. represents Y direction spot size, 6. represents the diagonal spot size.
Embodiment
As shown in Figure 1, be the detection light path of lenticule diffraction pattern of the present invention, light will form light and dark diffraction pattern by behind the microlens array on the receiving screen a long way off, and by diffraction theory as can be known, all information of microstructure all are reflected in the middle of the diffraction pattern.After the size of lenticule diffraction pattern measured, can calculate structural parameters such as lenticular focal length by the simple geometric relation.Funtcional relationship is as follows:
R lenticule bore, R
xDiffraction pattern size, L lenticule be to the distance of diffraction pattern receiving screen, f lenticule focal length.R
x, L can obtain in experiment, r is known, so can calculate the focal distance f of lens, goes out lens rise and F number by lenticule bore r and focal distance f deducibility:
The lenticule rise:
The lenticule numerical aperture
It can also be seen that by (1) formula under the constant situation of diffraction pattern measuring accuracy, the long more lens arrangement parameter that calculates of L is accurate more.Fig. 2 is bore 50 μ m, the zero defect microlens array synoptic diagram of focal length 400 μ m.Fig. 3 is the profile of this microstructure at the diffraction pattern at distance lens 1m place, through measuring diffraction pattern length of side R
x=120mm, calculating the lenticule focal length is f=416 μ m, error is less than 4%.In addition, adopt the present invention to avoid diffraction pattern to overlap, improve measuring accuracy diffraction pattern by prolonging the way of microlens array and diffraction screen distance L.Fig. 5 is the diffraction pattern profile that has the microlens array of face shape defective, according to the diffraction pattern distortion factor of Computer Simulation foundation
R wherein
XyBe diagonal spot size, R
x, R
yBe respectively X, Y direction spot size, promptly utilize this formula can calculate different directions,,, can understand the astigmatism of lens according to the consistance of the different directions focal length of lens as X, the lenticular focal length of Y direction; The way of employing analog simulation has been set up the form (δ is a fill factor, curve factor) of the relation between statement lenticule fill factor, curve factor and the hot spot distortion factor, and drawing this lenticule fill factor, curve factor is 92.1%, and actual fill factor, curve factor is 90%, and error is less than 2.5%.
Employing also can record other deformation of lenticule generation and the homogeneity of this element easily with standard diffraction pattern and the method that the distortion diffraction pattern compares.When light during, illustrate that the homogeneity of element is better by the diffraction pattern basically identical after the element zones of different; When the diffraction pattern of element zones of different not simultaneously, illustrate that the lenticule homogeneity is relatively poor in the zones of different, also can understand the overall performance of element simultaneously simply, fast.
The present invention is further described below by embodiment:
Embodiment carries out face deformation to the microlens array of a bore φ=50 μ m, focal length 400 μ m and detects, and it is as follows that it specifically detects step:
(1) at first microlens array is positioned in the detection light path, adopts parallel beam irradiation lenticule surface;
(2) measure the far field construction spot size of this microlens array, comprise X, Y direction spot size and diagonal spot size and microlens array distance L, and measure all directions size of lenticule diffraction pattern, record R to diffraction screen
x=120mm, R
Xy=137mm, L=1m;
(3), can calculate the focal distance f of lens by (1) formula by aperture of lens and X, Y direction spot size and microlens array distance L to diffraction screen; Can calculate lens rise h and numerical aperture F by (2) formula and (3) again.(focal distance f=416 μ m, rise h=1.5 μ m, numerical aperture F=8.32)
(4) by diffraction pattern X, Y direction spot size and diagonal spot size, the diffraction pattern and the zero defect lenticule diffraction pattern of defectiveness microlens array are compared, calculate diffraction pattern distortion factor χ=0.34, find corresponding microlens array fill factor, curve factor δ to be about 92% with the relation of diffraction pattern distortion factor x according to fill factor, curve factor δ;
Diffraction pattern distortion factor χ that table 1. is simplified and the relation table of microlens array fill factor, curve factor δ
| ??δ(％) | ?78.6 | ???83.6 | ????87.5 | ????90.6 | ????93.3 | ??95.4 | ??97.1 | ???98.4 | ??99.3 | ????99.8 | ?100 |
| ????χ | ?0 | ???0.1 | ????0.2 | ????0.3 | ????0.4 | ??0.5 | ??0.6 | ???0.7 | ??0.8 | ????0.9 | ?1 |
(5) according to the lenticule diffraction pattern by emulation, lenticule face shape defective is detected;
(6) diffraction pattern to the microlens array zones of different carries out qualitative detection, according to the consistance of the consistency analysis zones of different lens of diffraction pattern, can understand the astigmatism of lens.
At last, experimental result is as follows, and lens parameter detects error less than 4%, the microlens array fill factor, curve factor detects error less than 2.5%, analyze the defective that lenticule exists, and the consistance of element has also been carried out detecting qualitatively, reached the detection effect of expection.
Claims (6)
1, the method for quick of microlens structure parameter and face deformation is characterized in that comprising the following steps:
(1) adopts light beam irradiates lenticule surface;
(2) gather a distance light by the diffraction pattern behind the microlens array, and measure all directions size of lenticule diffraction pattern;
(3) calculate lenticule rise, focal length, numerical aperture structural parameters by the diffraction pattern shape that records, data and lenticule bore;
(4) diffraction pattern and the zero defect lenticule diffraction pattern with the defectiveness microlens array compares, and calculates diffraction pattern distortion factor x according to all directions size of lenticule diffraction pattern;
(5) according to the relation of the fill factor, curve factor of diffraction pattern distortion factor x and microlens array, tabling look-up draws the fill factor, curve factor of microlens array;
(6) according to the deformation of above-mentioned diffraction pattern, the distortion and the defective of lenticule face shape are analyzed.
2, the method for quick of microlens structure parameter according to claim 1 and face deformation is characterized in that: described light beam is a collimated laser beam.
3, the method for quick of microlens structure parameter according to claim 1 and face deformation is characterized in that: lenticule focal length computing formula is in the described step (3):
Wherein, f lenticule focal length, 2r lenticule bore, R
xThe diffraction pattern size, the L lenticule is to the distance of diffraction pattern receiving screen.
4, the method for quick of microlens structure parameter according to claim 1 and face deformation is characterized in that: the computing formula of hot spot distortion factor is in the described step (4)
R
XyBe diagonal spot size, R
xBe the diffraction pattern size.
5, the method for quick of microlens structure parameter according to claim 1 and face deformation, it is characterized in that: adopt the way of analog simulation to set up the form (δ is a fill factor, curve factor, and x is the diffraction pattern distortion factor) of explaining the relation between lenticule fill factor, curve factor and the hot spot distortion factor in the described step (5):
??δ(％) ??78.6 ??83.6 ??87.5 ??90.6 ??93.3 ??95.4 ??97.1 ??98.4 ??99.3 ??99.8 ??100
???x ??0 ??0.1 ??0.2 ??0.3 ??0.4 ??0.5 ??0.6 ??0.7 ??0.8 ??0.9 ??1
6, microlens structure parameter according to claim 4 and face deformation method for quick, it is characterized in that: the computing formula of described hot spot distortion factor can be according to the size of different directions diffraction pattern, calculate the lenticular focal length of different directions, according to the consistance of the different directions focal length of lens, can understand the astigmatism of lens.
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| CN101608905B (en) * | 2009-07-21 | 2010-12-01 | 清华大学 | Measuring method of little opening displacement of microcrack |
| CN102607820A (en) * | 2012-04-05 | 2012-07-25 | 中国科学院光电技术研究所 | Method for measuring focal length of micro-lens array |
| CN102116706B (en) * | 2010-01-04 | 2012-08-29 | 上海微电子装备有限公司 | Measurement device and method for numerical aperture of projection objective |
| CN103217872A (en) * | 2013-04-19 | 2013-07-24 | 中国科学院上海光学精密机械研究所 | Detection device and detection method of micro-lens array for photoetching machine |
| CN107144420A (en) * | 2017-04-26 | 2017-09-08 | 长沙青波光电科技有限公司 | Optical lens aberration detecting and method |
| CN108445021A (en) * | 2018-03-06 | 2018-08-24 | 浙江工业大学 | Microstructured prisms lens quality detecting system |
| CN109387353A (en) * | 2017-08-14 | 2019-02-26 | 深圳光峰科技股份有限公司 | The detection method of microlens array detection system and microlens array |
| CN109470454A (en) * | 2018-12-05 | 2019-03-15 | 陕西理工大学 | A kind of curved microlens array surface shape detection apparatus |
| CN109642850A (en) * | 2016-09-19 | 2019-04-16 | 苹果公司 | Utilize the DOE defect inspection of total internal reflection |
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| DE69528647T2 (en) * | 1994-06-14 | 2003-07-10 | Visionix Ltd | APPARATUS FOR TOPOMETRIC DETECTION OF AN OPTICAL ELEMENT |
| JP2000155071A (en) * | 1998-11-19 | 2000-06-06 | Omron Corp | Focal distance measuring device and focal distance measuring method |
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| CN101608905B (en) * | 2009-07-21 | 2010-12-01 | 清华大学 | Measuring method of little opening displacement of microcrack |
| CN102116706B (en) * | 2010-01-04 | 2012-08-29 | 上海微电子装备有限公司 | Measurement device and method for numerical aperture of projection objective |
| CN102607820A (en) * | 2012-04-05 | 2012-07-25 | 中国科学院光电技术研究所 | Method for measuring focal length of micro-lens array |
| CN102607820B (en) * | 2012-04-05 | 2014-11-19 | 中国科学院光电技术研究所 | Method for measuring focal length of micro-lens array |
| CN103217872A (en) * | 2013-04-19 | 2013-07-24 | 中国科学院上海光学精密机械研究所 | Detection device and detection method of micro-lens array for photoetching machine |
| US10823635B1 (en) | 2013-12-19 | 2020-11-03 | Apple Inc. | Monitoring DOE performance using total internal reflection |
| CN109642850A (en) * | 2016-09-19 | 2019-04-16 | 苹果公司 | Utilize the DOE defect inspection of total internal reflection |
| CN107144420B (en) * | 2017-04-26 | 2020-01-31 | 长沙青波光电科技有限公司 | Optical lens aberration detection device and method |
| CN107144420A (en) * | 2017-04-26 | 2017-09-08 | 长沙青波光电科技有限公司 | Optical lens aberration detecting and method |
| CN109387353A (en) * | 2017-08-14 | 2019-02-26 | 深圳光峰科技股份有限公司 | The detection method of microlens array detection system and microlens array |
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| CN109839383B (en) * | 2018-06-07 | 2024-04-16 | 江阴通利光电科技有限公司 | Flaw detection method and flaw detection equipment for micro-lens array microstructure optical film |
| CN109470454A (en) * | 2018-12-05 | 2019-03-15 | 陕西理工大学 | A kind of curved microlens array surface shape detection apparatus |
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