CN1483547A - 激光修复装置和方法 - Google Patents
激光修复装置和方法 Download PDFInfo
- Publication number
- CN1483547A CN1483547A CNA031331459A CN03133145A CN1483547A CN 1483547 A CN1483547 A CN 1483547A CN A031331459 A CNA031331459 A CN A031331459A CN 03133145 A CN03133145 A CN 03133145A CN 1483547 A CN1483547 A CN 1483547A
- Authority
- CN
- China
- Prior art keywords
- mentioned
- laser
- electrode panel
- visible light
- laser beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 27
- 230000001678 irradiating effect Effects 0.000 claims abstract description 8
- 230000008439 repair process Effects 0.000 claims description 52
- 230000002950 deficient Effects 0.000 claims description 11
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 238000002310 reflectometry Methods 0.000 abstract description 3
- 230000000007 visual effect Effects 0.000 abstract 4
- 230000007812 deficiency Effects 0.000 description 8
- 230000003321 amplification Effects 0.000 description 5
- 238000003199 nucleic acid amplification method Methods 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000003760 hair shine Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000005755 formation reaction Methods 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
- H01S5/0608—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by light, e.g. optical switch
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/149—Beam splitting or combining systems operating by reflection only using crossed beamsplitting surfaces, e.g. cross-dichroic cubes or X-cubes
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/71—Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Signal Processing (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Laser Beam Processing (AREA)
- Liquid Crystal (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0044710A KR100457565B1 (ko) | 2002-07-29 | 2002-07-29 | 레이저 수리 장치 및 방법 |
KR44710/2002 | 2002-07-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1483547A true CN1483547A (zh) | 2004-03-24 |
CN1269608C CN1269608C (zh) | 2006-08-16 |
Family
ID=36975573
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB031331459A Expired - Fee Related CN1269608C (zh) | 2002-07-29 | 2003-07-29 | 激光修复装置和方法 |
Country Status (4)
Country | Link |
---|---|
JP (2) | JP2004066344A (zh) |
KR (1) | KR100457565B1 (zh) |
CN (1) | CN1269608C (zh) |
TW (1) | TW592864B (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7564543B2 (en) | 2006-02-03 | 2009-07-21 | Kabushiki Kaisha Toshiba | Defective pixel correction apparatus for liquid crystal panel |
CN102189332A (zh) * | 2010-03-18 | 2011-09-21 | 奥林巴斯株式会社 | 激光加工方法及激光加工装置 |
CN103978310A (zh) * | 2014-05-07 | 2014-08-13 | 大连理工大学 | 一种金属结构件表面微小裂纹修复方法和装置 |
CN107824968A (zh) * | 2017-11-08 | 2018-03-23 | 深圳泰德激光科技有限公司 | Ccd视觉定位的激光焊接装置 |
CN112859394A (zh) * | 2020-12-31 | 2021-05-28 | 苏州科韵激光科技有限公司 | 一种激光加工光路系统 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR200412432Y1 (ko) * | 2006-01-17 | 2006-03-27 | (주)에타솔라 | 태양전지모듈 제작용 지그 |
KR20070092430A (ko) * | 2006-03-10 | 2007-09-13 | 삼성전자주식회사 | 표시 장치의 픽셀 수리 장치 |
KR100817825B1 (ko) * | 2007-05-02 | 2008-03-31 | 주식회사 이오테크닉스 | 레이저 가공장치 |
DE102009044022A1 (de) * | 2009-09-16 | 2011-03-24 | Reis Gmbh & Co. Kg Maschinenfabrik | Verfahren zum Reparieren eines elektrischen Kontakts |
WO2011000814A2 (de) | 2009-06-29 | 2011-01-06 | Reis Gmbh & Co. Kg Maschinenfabrik | Verfahren zum freilegen eines elektrischen kontakts |
KR101129262B1 (ko) * | 2010-04-21 | 2012-03-26 | 주식회사 코윈디에스티 | 레이저 리페어 장치의 광학계 |
KR102077935B1 (ko) * | 2018-08-14 | 2020-02-14 | 주식회사 코윈디에스티 | 표시장치 패널에 대한 레이저 리페어 및 검사 방법과 이에 적합한 리페어 및 검사 장치 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63264286A (ja) * | 1987-04-20 | 1988-11-01 | Nec Corp | レ−ザ−トリミング装置 |
JPH0682801A (ja) * | 1992-08-31 | 1994-03-25 | Ntn Corp | 欠陥検査修正装置 |
JP2002066771A (ja) * | 2000-08-16 | 2002-03-05 | Toshiba Corp | レーザ装置 |
-
2002
- 2002-07-29 KR KR10-2002-0044710A patent/KR100457565B1/ko not_active IP Right Cessation
-
2003
- 2003-07-14 JP JP2003273860A patent/JP2004066344A/ja active Pending
- 2003-07-15 TW TW092119239A patent/TW592864B/zh not_active IP Right Cessation
- 2003-07-29 CN CNB031331459A patent/CN1269608C/zh not_active Expired - Fee Related
-
2006
- 2006-05-31 JP JP2006151268A patent/JP4469813B2/ja not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7564543B2 (en) | 2006-02-03 | 2009-07-21 | Kabushiki Kaisha Toshiba | Defective pixel correction apparatus for liquid crystal panel |
CN100541271C (zh) * | 2006-02-03 | 2009-09-16 | 株式会社东芝 | 液晶面板的缺陷像素修正装置 |
CN102189332A (zh) * | 2010-03-18 | 2011-09-21 | 奥林巴斯株式会社 | 激光加工方法及激光加工装置 |
CN103978310A (zh) * | 2014-05-07 | 2014-08-13 | 大连理工大学 | 一种金属结构件表面微小裂纹修复方法和装置 |
CN103978310B (zh) * | 2014-05-07 | 2015-10-28 | 大连理工大学 | 一种金属结构件表面微小裂纹修复方法和装置 |
CN107824968A (zh) * | 2017-11-08 | 2018-03-23 | 深圳泰德激光科技有限公司 | Ccd视觉定位的激光焊接装置 |
CN112859394A (zh) * | 2020-12-31 | 2021-05-28 | 苏州科韵激光科技有限公司 | 一种激光加工光路系统 |
Also Published As
Publication number | Publication date |
---|---|
JP2006341311A (ja) | 2006-12-21 |
JP2004066344A (ja) | 2004-03-04 |
KR20040011674A (ko) | 2004-02-11 |
TW592864B (en) | 2004-06-21 |
KR100457565B1 (ko) | 2004-11-18 |
CN1269608C (zh) | 2006-08-16 |
JP4469813B2 (ja) | 2010-06-02 |
TW200401685A (en) | 2004-02-01 |
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ASS | Succession or assignment of patent right |
Owner name: YINGDI CO., LTD. Free format text: FORMER OWNER: LG ELECTRONICS INC. Effective date: 20130617 |
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C41 | Transfer of patent application or patent right or utility model | ||
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Effective date of registration: 20130617 Address after: Seoul, South Kerean Patentee after: Neo Lab Convergence Inc. Address before: Seoul, South Kerean Patentee before: LG Electronics Inc. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060816 Termination date: 20140729 |
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