CN1350651A - 含稀土氟化物的玻璃 - Google Patents
含稀土氟化物的玻璃 Download PDFInfo
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- 229910052761 rare earth metal Inorganic materials 0.000 title claims abstract description 40
- -1 rare earth fluorides Chemical class 0.000 title claims abstract description 34
- 239000011521 glass Substances 0.000 title claims abstract description 24
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 77
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 37
- 238000000034 method Methods 0.000 claims abstract description 19
- 239000011148 porous material Substances 0.000 claims abstract description 12
- 239000000243 solution Substances 0.000 claims abstract description 12
- 239000007864 aqueous solution Substances 0.000 claims abstract description 11
- 239000012025 fluorinating agent Substances 0.000 claims abstract description 5
- 238000001035 drying Methods 0.000 claims abstract description 4
- 239000013307 optical fiber Substances 0.000 claims description 13
- 230000003287 optical effect Effects 0.000 claims description 11
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 claims description 10
- 229910002651 NO3 Inorganic materials 0.000 claims description 8
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 229910052691 Erbium Inorganic materials 0.000 claims description 5
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 4
- 229910052693 Europium Inorganic materials 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 4
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- QZQVBEXLDFYHSR-UHFFFAOYSA-N gallium(III) oxide Inorganic materials O=[Ga]O[Ga]=O QZQVBEXLDFYHSR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052779 Neodymium Inorganic materials 0.000 claims description 3
- 229910052777 Praseodymium Inorganic materials 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 229910052681 coesite Inorganic materials 0.000 claims description 3
- 229910052593 corundum Inorganic materials 0.000 claims description 3
- 229910052906 cristobalite Inorganic materials 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910052682 stishovite Inorganic materials 0.000 claims description 3
- 229910052905 tridymite Inorganic materials 0.000 claims description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 3
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052684 Cerium Inorganic materials 0.000 claims description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 2
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 2
- 229910052689 Holmium Inorganic materials 0.000 claims description 2
- 229910052765 Lutetium Inorganic materials 0.000 claims description 2
- 229910017504 Nd(NO3)3 Inorganic materials 0.000 claims description 2
- 229910052772 Samarium Inorganic materials 0.000 claims description 2
- 229910052771 Terbium Inorganic materials 0.000 claims description 2
- 229910052775 Thulium Inorganic materials 0.000 claims description 2
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 2
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Inorganic materials O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 239000000460 chlorine Substances 0.000 claims description 2
- 239000008367 deionised water Substances 0.000 claims description 2
- 229910021641 deionized water Inorganic materials 0.000 claims description 2
- 229910052746 lanthanum Inorganic materials 0.000 claims description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 2
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 claims description 2
- 229910052727 yttrium Inorganic materials 0.000 claims description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical group S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims 1
- 229910016495 ErF3 Inorganic materials 0.000 claims 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims 1
- 150000001342 alkaline earth metals Chemical class 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 239000003365 glass fiber Substances 0.000 claims 1
- 230000005693 optoelectronics Effects 0.000 claims 1
- QGJSAGBHFTXOTM-UHFFFAOYSA-K trifluoroerbium Chemical compound F[Er](F)F QGJSAGBHFTXOTM-UHFFFAOYSA-K 0.000 claims 1
- 238000005019 vapor deposition process Methods 0.000 claims 1
- 150000002910 rare earth metals Chemical class 0.000 abstract description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 abstract 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 5
- 239000000835 fiber Substances 0.000 description 5
- 239000002241 glass-ceramic Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000005253 cladding Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000005383 fluoride glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000000075 oxide glass Substances 0.000 description 2
- 229910018096 ScF3 Inorganic materials 0.000 description 1
- 239000005371 ZBLAN Substances 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001515 alkali metal fluoride Inorganic materials 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical group 0.000 description 1
- 229910001618 alkaline earth metal fluoride Inorganic materials 0.000 description 1
- 229910001420 alkaline earth metal ion Chemical group 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007596 consolidation process Methods 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- OEKDNFRQVZLFBZ-UHFFFAOYSA-K scandium fluoride Chemical compound F[Sc](F)F OEKDNFRQVZLFBZ-UHFFFAOYSA-K 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
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- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
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- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C03B37/01433—Reactant delivery systems for delivering and depositing additional reactants as liquids or solutions, e.g. for solution doping of the porous glass preform
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- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0095—Solution impregnating; Solution doping; Molecular stuffing, e.g. of porous glass
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- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
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- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
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- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
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- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
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- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
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- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
- C03B2201/36—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers doped with rare earth metals and aluminium, e.g. Er-Al co-doped
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Abstract
本方法提供一种通过溶液化学方法将稀土氟化物嵌入二氧化硅(或掺有氧化锗的二氧化硅)玻璃的新方法。将稀土氟化物嵌入二氧化硅(或掺有氧化锗的二氧化硅)玻璃的方法包括下述步骤。第一步是用OVD法形成多孔二氧化硅芯子预制品。第二步是将该预制品浸在稀土离子水溶液中。第三步是从溶液中取出预制品并清洗预制品的外表面。第四步是将预制品浸在氟化剂水溶液中,氟化剂如氟化氢铵、HF或KF。此时稀土三氟化物从溶液中沉淀出来沉积在孔壁上。然后干燥。
Description
技术领域
本发明涉及将稀土氟化物嵌入二氧化硅玻璃的新方法。这种新嵌入的玻璃可用于通讯用的光学放大器。
背景技术
所有的光学放大器，特别是掺铒的光纤放大器在光纤长途通讯系统中经历了蓬勃的发展，因为这些类型的装置具有超越中继型放大线路的优点。例如，掺铒的光纤放大器(EDFA)能在优选的1550纳米第三长途通讯频谱窗中方便地操作，它具有高的对偏振不敏感的增益、不同波长信号之间的低串话干扰、优良的饱和输出功率、以及接近于基本量子极限的噪声指数。其优异的噪声特性能够使成百的放大器装入跨越数千公里的光纤长途通讯链路。光学放大器、特别是EDFA与电子转发器相比，还能透过一定范围内的信息率、信号格式和波长，所以特别适用于同时对各个信号使用不同波段来传播大量信号的波长多路传输的通讯系统。
近来，掺有氧化锗(germania-doped)的二氧化硅和重金属氟化物(如ZBLAN)玻璃被用作稀土离子如铒和镨的基质玻璃，来制造光纤放大器。二氧化硅基玻璃在化学上和机械上是稳定的。它们能容易地制造并熔制成为掺有氧化锗的二氧化硅通讯光纤。但是，由于二氧化硅玻璃的声子能量大，所以对红外变频无效。另一方面，氟化物玻璃的声子能量虽低，但难以光纤化。它们也难以与二氧化硅光纤熔接。
包含氟化物微晶在主要为氧化物玻璃基体中的透明氧氟化物玻璃陶瓷的独特之处，是提供了氧化物玻璃的极佳耐化学性，并提供了氟化物玻璃或晶体对稀土离子的低声子能量环境。这种玻璃陶瓷通过熔化阳离子的氧化物和氟化物形成氧氟化物玻璃来制造。然后进行热处理，使氟化物微晶沉淀出来即进行陶瓷化。由于这种透明的氧氟化物玻璃陶瓷通常比二氧化硅玻璃具有更低的熔化温度、更高的折射率和更高的热膨胀系数，所以它们在用纯二氧化硅包覆层来制造光纤放大器时可能会遇到难题。
因此，仍然需要CTE配合好的光学放大器和其制造方法。具体是需要将稀土氟化物嵌入玻璃中适合于制成光学放大器的新方法。
发明内容
简要地说，本发明涉及含有稀土氟化物晶体的二氧化硅基玻璃。在另一方面，本发明涉及通过溶液化学方法将稀土氟化物嵌入二氧化硅基(或掺有氧化锗的二氧化硅基)玻璃的方法。二氧化硅基玻璃是指含有二氧化硅和/或掺有氧化锗的二氧化硅作为主要成分的玻璃。
本发明掺有稀土氟化物的二氧化硅预制品包含：
组分 重量百分数
SiO2和GeO2 85-99.0
Al2O3和Ga2O3 0-14.9
RexFy 0.01-2.0
RxFy 0.1-2.0
其中X和Y是整数。总和如SiO2+GeO2中SiO2和GeO2是完全可互换的。只要SiO2+GeO2的总和在85-99％之间，这两种组分都可在0-99％范围内变化。Al2O3和Ga2O3的总和中Al2O3和Ga2O3也是完全可互换的。R是碱金属或碱土金属离子，如Na、K、Li、Ca和Mg。
发明的最佳实施方式
如这里所述，将稀土氟化物嵌入二氧化硅(或掺有氧化锗的二氧化硅)玻璃的方法包括下述步骤。第一步是用OVD法形成多孔的二氧化硅芯子预制品。该预制品的孔径优选约500纳米或更小，更优选在200-500纳米范围内。第二步是将预制品浸在含稀土离子的水溶液中。溶液优选是硝酸盐溶液，如Er(NO3)3、Pr(NO3)3、Nd(NO3)3、Dy(NO3)3、或这些硝酸盐混合物的溶液。在此步骤中，预制品中的孔充满了稀土离子的水溶液。第三步是从硝酸盐溶液中取出预制品，用去离子水将预制品外表面上过量的硝酸盐清洗掉。第四步是将预制品浸在氟化剂的水溶液中，氟化剂如氟化氢铵、HF或KF。F离子扩散进入孔中，发生下面的反应：
稀土三氟化物从溶液中沉淀出来，沉积在预制品的孔壁上。
第五步是在真空中300℃干燥预制品，除去孔中残余的水。通常在干燥步骤后预制品仍是多孔的。
第六步是在氯气或氟气环境中再次加热预制品，除去可能残余的水，并且最后使预制品固结成能用作其它有用制品和装置(如光学放大器用的光纤)的预制品的无孔玻璃体。
稀土氟化物的熔点在1143℃(HoF3)-1515℃(ScF3)之间，低于二氧化硅(1717℃)的熔点，并接近于掺有氧化锗的二氧化硅的烧结温度。因此，在第六步中，可用OVD芯子预制品的普通固结方法来使氟化物-二氧化硅预制品固结。
在另一个实施方式中，第四步可通过使氟气或含氟气体如HF流动/扩散进入预制品的孔隙中来实施。
包埋有氟化物的玻璃的折射率，可在其含有稀土氟化物的同时还使其含有碱金属或碱土金属氟化物来进行调节，碱性或碱土金属氟化物如LiF(nD＝1.393)、CaF2(nD＝1.434)、SrF(nD＝1.442)和MgF2，它们会给出较低的折射率以及较低的水中溶解度。玻璃中氟化物微晶的大小通过控制溶液的浓度和孔表面处理来调节。
发射和吸收光谱的增强需要上述用稀土金属来掺入玻璃的方法。因此，本发明的二氧化硅预制品包含稀土元素，如Y、La、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb或Lu。优选用的稀土元素是Er、Pr、Eu或Dy。更优选用的稀土元素是Er(如ErF3)。玻璃还可能含有各种其它组分。例如，玻璃可能还包含多达5重量％的其它氧化物，如Y2O3、La2O3、CdO、B2O3、SnO、ZrO2、P2O5、Sb2O5、As2C5或Bi2O3。
本发明含稀土氟化物的二氧化硅基玻璃适于制造光学放大器的光纤，它能提供上述透明氧氟化物玻璃陶瓷的独特性能。另外，本发明二氧化硅基的光学放大器在和二氧化硅包覆层一起使用时，还有光纤和包覆层之间的CTE和折射率能良好配合的优点。
除了这些实施方式以外，本领域中的人员可以看到，在不违背本发明精神及范围的条件下，可对上述发明进行许多改良和改变。
Claims (30)
1.将稀土氟化物嵌入二氧化硅玻璃的方法，其特征在于它包括下列步骤：
提供多孔二氧化硅预制品；
将预制品浸在稀土离子水溶液中；
从稀土离子水溶液中取出预制品；
对从稀土离子水溶液取出的预制品进行清洗；
将清洗后的预制品浸在氟化剂水溶液中，使稀土三氟化物沉淀在预制品中；
干燥预制品。
2.如权利要求1所述的方法，其特征在于所述的方法还包括在氯气或氟气环境中对干燥后的预制品进行再次干燥的步骤。
3.如权利要求1所述的方法，其特征在于所述的多孔二氧化硅预制品通过氧化物蒸汽沉积法制造。
4.如权利要求1所述的方法，其特征在于所述的多孔二氧化硅预制品的孔径大小为500纳米。
5.如权利要求1所述的方法，其特征在于所述的稀土离子水溶液是下述硝酸盐溶液：Er(NO3)3、Pr(NO3)3、Nd(NO3)3、Dy(NO3)3、和它们的混合物。
6.如权利要求1所述的方法，其特征在于用去离子水来清洗所述的从稀土离子水溶液中取出的预制品。
7.如权利要求1所述的方法，其特征在于所述的氟化剂是氟化铵、氟化氢铵、HF或KF。
8.如权利要求1所述的方法，其特征在于所述的稀土离子水溶液充满所述多孔二氧化硅预制品的孔隙。
9.如权利要求1所述的方法，其特征在于所述的氟化剂熔入所述二氧化硅预制品的孔隙中，并与稀土离子反应。
10.如权利要求9所述的方法，其特征在于所述的反应产生稀土三氟化物。
11.如权利要求1所述的方法，其特征在于所述的预制品在真空中进行300℃干燥。
12.如权利要求1所述的方法，其特征在于所述的二氧化硅是掺有氧化锗的二氧化硅。
13.如权利要求1所述的方法，其特征在于还包括使预制品固结形成无孔结构的步骤。
14.一种孔径大小约为500纳米的多孔二氧化硅预制品，其特征在于其中嵌入稀土氟化物。
15.如权利要求14所述的预制品，其特征在于所述的二氧化硅是掺有氧化锗的二氧化硅。
16.如权利要求14所述的预制品，其特征在于所述的稀土氟化物是稀土三氟化物。
17.如权利要求14所述的预制品，其特征在于所述的稀土离子是Er、Pr或Ty。
18.如权利要求14所述的预制品，其特征在于它的组成是：
组分 重量百分数
SiO2和GeO2 85-99.0
Al2O3和Ga2O3 0-14.9
RexFy 0.01-2.0
RxFy 0.1-2.0
其中X和Y是整数；R是碱性或碱土金属。
19.如权利要求18所述的预制品，其特征在于所述的Re是Y、La、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb或Lu。
20.如权利要求18所述的预制品，其特征在于所述Re是Er、Pr、Nd、Eu或Dy。
21.如权利要求18所述的预制品，其特征在于RexFy是ErF3。
22.如权利要求14所述的预制品，其特征在于它包含0-5重量％的Y2O3、La2O3、CdO、B2O3、SnO、ZrO2、P2O5、Sb2O5、As2C5或Bi2O3。
23.适于用作光纤放大器的光纤，其特征在于它是由权利要求14所述的预制品制造的。
24.无孔光纤预制品，它是二氧化硅基玻璃，其特征在于所述的玻璃中包埋稀土氟化物晶体。
25.适用于在光学放大器中的光纤，其特征在于它包括权利要求24所述的无孔光纤预制品。
27.光学放大器装置，其特征在于它包括权利要求22所述的玻璃纤维。
28.光电装置，其特征在于它是由权利要求14所述预制品制造的。
29.二氧化硅基玻璃，其特征在于它含有稀土氟化物晶体。
30.光纤，其特征在于它包括权利要求29所述的二氧化硅基玻璃。
31.光学放大器，其特征在于它包括权利要求30所述的光纤。
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| US09/268,768 | 1999-03-15 | ||
| US09/268,768 US6385384B1 (en) | 1999-03-15 | 1999-03-15 | Glasses containing rare earth fluorides |
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| CA (1) | CA2368947A1 (zh) |
| WO (1) | WO2000055660A1 (zh) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102992613A (zh) * | 2012-12-25 | 2013-03-27 | 长飞光纤光缆有限公司 | 一种稀土均匀掺杂光纤预制棒芯棒及其制备方法 |
| CN104609732A (zh) * | 2015-01-23 | 2015-05-13 | 中国计量学院 | 一种稀土离子掺杂的Ca4Y6(SiO4)6O微晶玻璃及其制备方法 |
| CN112955792A (zh) * | 2018-12-13 | 2021-06-11 | 住友电气工业株式会社 | 光纤 |
| CN113934079A (zh) * | 2021-09-30 | 2022-01-14 | 华中科技大学 | 一种光波导放大器及其制备方法 |
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| WO2002097496A1 (en) | 2001-05-29 | 2002-12-05 | 3M Innovative Properties Company | Optical fiber fusion splice having a controlled mode field diameter expansion match |
| US6690868B2 (en) | 2001-05-30 | 2004-02-10 | 3M Innovative Properties Company | Optical waveguide article including a fluorine-containing zone |
| FR2825357B1 (fr) * | 2001-05-31 | 2004-04-30 | Cit Alcatel | Procede de dopage de la silice par du fluor |
| US7440146B2 (en) * | 2001-09-20 | 2008-10-21 | Transpacific Ip, Llp | Scanning method and scanning system free of identifying original's attribute |
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| KR100433909B1 (ko) * | 2002-08-28 | 2004-06-04 | 삼성전자주식회사 | 증폭용 광섬유 및 그 제조 방법 |
| US7062137B2 (en) * | 2004-08-05 | 2006-06-13 | Nufern | Fiber optic article including fluorine |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102992613A (zh) * | 2012-12-25 | 2013-03-27 | 长飞光纤光缆有限公司 | 一种稀土均匀掺杂光纤预制棒芯棒及其制备方法 |
| CN102992613B (zh) * | 2012-12-25 | 2015-09-30 | 长飞光纤光缆股份有限公司 | 一种稀土均匀掺杂光纤预制棒芯棒及其制备方法 |
| CN104609732A (zh) * | 2015-01-23 | 2015-05-13 | 中国计量学院 | 一种稀土离子掺杂的Ca4Y6(SiO4)6O微晶玻璃及其制备方法 |
| CN104609732B (zh) * | 2015-01-23 | 2017-03-29 | 中国计量学院 | 一种稀土离子掺杂的Ca4Y6(SiO4)6O微晶玻璃及其制备方法 |
| CN112955792A (zh) * | 2018-12-13 | 2021-06-11 | 住友电气工业株式会社 | 光纤 |
| CN113934079A (zh) * | 2021-09-30 | 2022-01-14 | 华中科技大学 | 一种光波导放大器及其制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20020017115A1 (en) | 2002-02-14 |
| EP1177467A1 (en) | 2002-02-06 |
| US6385384B1 (en) | 2002-05-07 |
| CA2368947A1 (en) | 2000-09-21 |
| WO2000055660A1 (en) | 2000-09-21 |
| AU3621000A (en) | 2000-10-04 |
| US6401494B2 (en) | 2002-06-11 |
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