CN1329285C - 用于制造一种具有构造表面的产品的方法 - Google Patents

用于制造一种具有构造表面的产品的方法 Download PDF

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Publication number
CN1329285C
CN1329285C CNB038085410A CN03808541A CN1329285C CN 1329285 C CN1329285 C CN 1329285C CN B038085410 A CNB038085410 A CN B038085410A CN 03808541 A CN03808541 A CN 03808541A CN 1329285 C CN1329285 C CN 1329285C
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China
Prior art keywords
product
glass
substrate
auxiliary substrate
structured surface
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Expired - Fee Related
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CNB038085410A
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English (en)
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CN1646418A (zh
Inventor
F·比克
J·莱布
D·蒙德
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Schott AG
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Schott Glaswerke AG
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Priority claimed from DE10222958A external-priority patent/DE10222958B4/de
Priority claimed from DE10222964A external-priority patent/DE10222964B4/de
Priority claimed from DE10222609A external-priority patent/DE10222609B4/de
Application filed by Schott Glaswerke AG filed Critical Schott Glaswerke AG
Publication of CN1646418A publication Critical patent/CN1646418A/zh
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261—Processes for packaging MEMS devices
    • B81C1/00269—Bonding of solid lids or wafers to the substrate
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/006—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of microcrystallites, e.g. of optically or electrically active material
    • C—CHEMISTRY; METALLURGY
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    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
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    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C—CHEMISTRY; METALLURGY
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    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/12—Compositions for glass with special properties for luminescent glass; for fluorescent glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
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    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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    • H01L21/314—Inorganic layers
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Abstract

本发明的目的是提供一种方法，用于在玻璃或类似玻璃的层中制造微构造。为此使用一个具有一个构造表面(20a)的辅助基片(10，20)，其中，所述表面确定一个用于待制造产品的负模。在辅助基片的构造表面(20a)上蒸镀一个由玻璃或类似玻璃的材料制成的层(30)。接着将辅助基片例如用湿法化学方法去除，使正构造暴露。通过本发明能够产生特别好的微通道和光学微构造，如微透镜。

Description

用于制造一种具有构造表面的产品的方法
技术领域
本发明一般涉及一种用于制造一种具有构造表面的产品的方法以及这种产品和一种用于特别在玻璃中产生微构造的方法。
背景技术
玻璃由于其突出的光学和化学特性受到重视并得到大量应用。玻璃例如特别耐水、耐水蒸汽和尤其也耐腐蚀性物质，如酸和碱。此外玻璃通过不同的组分和添加物可以特别大地变化并由此能够适配于许多应用领域。
玻璃的一个大应用场合是光学和光电子领域。例如，在数据传输领域不会不再考虑使用光学元件。
正是在这种应用场合中元件总是较小的，由此对元件精度的要求持续地提高，例如对折射或衍射的较高光学品质的元件的光学影响存在一个较高的需求。在这种位置只示例性地称之为光学微透镜。
玻璃由于其突出的光学特性对此是特别适合的。但是恰恰相反，玻璃在应用中存在一些问题。因此玻璃的精确制造、尤其是细构造的制造存在问题。
尽管已知玻璃的湿法或干法化学腐蚀。但是在此尤其对于玻璃只能实现微小的腐蚀率，因此这样一种方法是漫长的并相应地增加了大量生产的制造成本。
还已知，使用光电构造的玻璃，如FOTURAN。但是这种玻璃是特别昂贵的。
通过激光也能够在玻璃上制造出精确的构造，但是这种工艺也是非常慢速地并对于大量生产同样是昂贵的。
此外已知不同的机械制造方法，如磨削或抛光，但是一般不能实现可通过其它方法所实现的精度和精细度。
发明内容
因此本发明的目的是，提供一种方法，它能够简单且经济地制造出具有一个构造表面的产品。
本发明的另一目的是，提供一种制造具有微构造表面的产品的方法，它能够形成可精密的、精准定位的和/或多种构造。
本发明的另一目的是，提供一种制造具有微构造、尤其是微构造表面的产品的方法，它适用于玻璃或具有玻璃状构造的金属，但是不局限于此。
本发明的另一目的是，提供一种制造具有微构造表面的产品方法，它适用于大量制造并避免或至少防止现有技术的缺陷。
这个目的以特别简单的方法通过本发明的方法得以实现。
按照本发明的用于制造具有构造表面的产品的方法，用于产生衍射或折射的玻璃透镜，包括至少这些步骤：
预备一个具有一个构造表面的辅助基片，
辅助基片的构造表面限定用于透镜的相应的负模，
将一个由玻璃制成的第一层通过蒸镀涂覆到构造表面上，施加一产品基片；以及，去除辅助基片。
按照本发明方法制造的产品，包括一个辅助基片、和一个由一种第一材料制成的第一层，该第一层沉积到辅助基片上并与辅助基片连接，其中第一层具有一个构造表面，该构造表面包括衍射或折射构造或通道且面对辅助基片，并且第一层在保持其构造表面的情况下可与辅助基片分离。
按照本发明提供了一种用于制造具有预定构造、尤其是用于产生微构造、例如在玻璃里面制造或由玻璃中制成的微透镜和/或微通道的方法。该方法包括提供至少一个辅助基片，将一个辅助基片的至少一个表面形成构造和将一个由第一材料制成的第一层涂覆到辅助基片的构造表面上。
在此，在本发明的意义上作为辅助基片的构造表面不一定只理解为辅助基片上可直接形成构造的表面，而且也可以理解为涂覆到辅助基片上的层的构造表面。尽管如此，所述辅助基片也可以直接形成构造(参见图4a，4c，4d)。
对于本发明使用一个辅助基片、必要时配有其它层作为确定构造的部件已经证明是特别有利的，因为其材料可以根据可构造特性来选择和适配。尤其是辅助基片不必是透明的，因为它又被去除并因此不是成品的组成部分。可去除的辅助基片必要时甚至可以再利用并由此更有利于降低成本。
因此所述辅助基片尤其与第一层或与产品最好在涂覆第一层后、必要时按照另一工艺步骤再分离或去除。换言之，所述第一层与辅助基片在保持构造表面的情况下可以分离或分解。
尤其是对于按照本发明的方法预备一个具有预定构造表面的负掩模或负模，并且这个第一层在负掩模上为了产生负掩模的构造表面的一个正印痕而沉积在第一层上。
优选将由第三种材料、尤其是由玻璃、具有玻璃状构造的材料或其它尤其透明的材料制成的自载的载体或产品基片施加到第一层上。
在此要指出，按照本发明的用于在一个基片、尤其是产品基片上制造一个构造层的方法显示出非常突出的沉积性，因为该层不象传统方法那样离开产品基片而是相对于以待制造的产品向着产品基片方向生长，即借助于负工艺将构造层生长在辅助基片上。
按照本发明的方法是特别有利的，因为微构造在玻璃中的产生由此可以简单、快速且经济地实现。此外可以在层表面中制造非常小的、尤其是衍射或反射的构造，如微透镜或微通道，其中辅助基片的表面限定相应的负模。
此外，所述表面构造可以通过负工艺精确地预定和监控，因此实现一个一致的产品质量和高的表面品质。
优选第一材料是玻璃或一种类似玻璃的材料，因此可以制造一个具有上述优点的预定构造的玻璃层。按照本发明的微构造、如由玻璃、类似玻璃或其它透明的材料制成的微透镜的预备在玻璃纤维光学领域具有特别广泛的应用。
作为类似玻璃的层尤其是一个SiO2层，它们通过CVD(化学气相沉积)方法沉积并例如考虑掺杂磷和/或硼。磷和硼的沉积同样由气相实现。这种层的优点是温度的回落比对于玻璃的情况更小。
作为本发明所不期望的附加使用已经证实，一个按照本发明的构造产品尤其适用于微射流。在此特别的优点在于，配有微通道的玻璃层由于其高的化学稳定性尤其与众不同。
玻璃还由于其在热、机械和光特性方面的高度变化性而与众不同。
特别有利的是，第一层或玻璃层沉积在尤其是蒸镀在辅助基片上。电子束蒸镀工艺或溅镀工艺尤其得到证实是有效的。在此优选将一种蒸镀玻璃、如Schott公司的蒸镀玻璃8329在一个真空室中通过电子束加热到蒸发，其中蒸汽在辅助基片上冷凝并玻璃化。
这一点请参阅同一申请人的下列申请
DE 202 05 830.1，提交于2002年4月12日；
DE 102 22 964.3，提交于2002年5月23日；
DE 102 22 609.1，提交于2002年5月23日；
DE 102 22 958.9，提交于2002年5月23日；
DE 102 52 787.3，提交于2002年11月13日；
DE 103 01 559.0，提交于2003年1月16日，
其公开内容在此明确地并入作为参考。
下面的工艺参数对于涂覆一封闭的玻璃层是有利的：
基片的表面粗糙度：＜50μm
汽化期间的BIAS-温度：≈100℃
汽化期间的压力：10-4mbar
第一层的沉积或蒸镀通过等离子体离子支持的蒸镀(PIAD)进行。在此附加地使一个离子射线对准待涂覆的基片。该离子射线可以通过等离子源、例如通过一种适当气体的电离产生。通过等离子实现层的附加压实以及松散粘附的颗粒在基片表面上的分离。这一点导致特别密实且无缺陷地沉积的层。
按照本发明的优选扩展构造，第一层在涂覆或沉积后例如通过化学和/或机械方法平面化。为此可以考虑玻璃层的湿法化学腐蚀或磨削和/或抛光。在此该产品基片最好在平面化之后施加。
优选将尤其自载的且给予产品强度的产品基片施加到尤其平面化的第一层或玻璃层上。在此所述产品基片例如与第一层阳极地粘接。阳极粘接具有优点，所制造的产品可以承受高化学负荷。
也可以选择或附加地将产品基片粘接到第一层上。在此尤其可以以有利的方式省去平面化，因为粘接剂能够补偿不平性。在这个实例中平面化可以说通过粘接剂实现。这个简单的实施例尤其适用于非光学产品，即，例如用于微射流的产品。作为粘接剂例如可以使用一种尤其透明的环氧化物。
不仅在阳极粘接时而且在通过环氧化物粘接时，在去除辅助基片后作为中间产品或最终产品存在可以制造或通过按照本发明的方法制造，通过阳极粘接或环氧化物形成一个可靠且持久的由产品基片、第一层或玻璃层和连接层组成的多层符合体。
尤其是所述产品基片和/或第一层是透明的，因此复合体尤其对于光线优选在可视或红外区是可透穿或透明的。换言之，按照本发明产生一个光学的、例如反射或衍射的复合部件。因此按照本发明可以制造例如整个的微透镜阵列。
也可以选择或附加地最好将其它的层如一个防反射层和/或一个红外吸收层、尤其涂覆在平面化的第一层上、即第一层与产品基片之间。但是这样的层或各层也可以在产品基片的位于第一层对面的一面上涂覆到该产品基片上。由此集合其它的光学部件。
按照本发明的一个优选实施例，所述辅助基片包括一个自载的由第二材料制成的载体或者由这样一种材料组成。作为第二材料最好不使用玻璃而是使用一种半导体材料，例如硅和/或一种陶瓷和/或一种金属，例如铝和/或一种金属合金。
按照本发明的一个特殊的扩展构造，所述辅助基片直接或更准确地说是构造到第二材料中，因此在沉积玻璃层之前不必、但是可以涂覆其它的层。尤其是在这个扩展构造中，所述辅助基片在形成构造的步骤之前或必要时之后，尤其通过化学方法或机械方法、例如通过平面研磨而平面化。
为了在沉积玻璃层之后使玻璃构造暴露，所述辅助基片、尤其是第二材料最好基本上完全或至少局部地腐蚀掉。例如在硅辅助基片的情况下将这个基片通过氢氧化钾(KOH)化学地溶解。
对于上述实施例也可以选择或附加地使辅助基片按照另一实施例包括一个自载的由第二材料制成的载体和一个构造层，它涂覆到载体上。在此优选使构造层形成构造而载体不形成构造。
所述构造层包括或由特别是保护层、光电保护层、抗蚀剂或光致抗蚀剂组成。尤其为了制造类似的构造、例如透镜使用一种灰度(Grauton)抗蚀剂。该构造层在沉积玻璃层之后完全或至少局部地腐蚀掉、尤其是化学地溶解。
按照本发明的一个优选扩展构造，在载体与构造层之间还设置至少一个或多个中间层。这些中间层优选包括一个抗蚀剂或由一个抗蚀剂组成。尤其是中间层的抗蚀剂和构造层的抗蚀剂由不同的材料组成，因此能够实现有选择地腐蚀掉。
对于一个特别优选的实施例，所述辅助基片或构造层光刻地形成构造。但是也可以选择或附加地使构造通过一个精密母体机械地例如通过顶压、尤其在一个薄膜中产生。对于这种简单的方法甚至可以实现微米范围内的精度。
对于具有更小精度需求的构造，所述构造例如可以通过丝网印刷产生。
特别简单且因此优选的是，将一个已经预构造成或微构造成的薄膜涂覆或粘接到辅助基片上。
此外本发明与这样一些发明相结合，它们在2002年4月15日提交的德国实用新型申请U-202 05 830.1和2002年5月23日提交的德国专利申请DE-102 22 609.1中描述。因此上述两个申请的内容在此通过引用而全面地用于本公开文件的内容。
附图说明
下面借助于实施例并结合附图详细描述本发明。附图中：
图1a-I为按照本发明的第一实施例制造一个按照本发明的产品，
图2f-g为按照本发明的第二实施例制造一个按照本发明的产品，
图3a-f为按照本发明的第三实施例制造一个按照本发明的产品，
图4a、c、d为按照本发明的第四实施例制造一个按照本发明的产品，
图5f-g为按照本发明的第五实施例制造一个按照本发明的产品，
图6a、d、f为按照本发明的第六实施例制造一个按照本发明的产品，
图7为一个TOF-SIMS-测量的结果，
图8为一个显微摄影的图像，和
图9为一个用于密度测试的具有孔掩模的晶片简图。
具体实施方式
下面示例性地描述本发明的六个实施例，其中不同实施例的特征可以相互组合。
附图以相应制造阶段简示出产品的截面图。为了清晰起见以相同或类似制造阶段示出的附图配有相同的字母，因此对于图号省去一些字母。相同或类似的部件在附图中配有相同的标记符号。
示例1
图1a示出一个由硅构成的辅助基片10。
按照下一在图1b中示出的工艺步骤，将一个由光致抗蚀剂、更准确地说由灰度抗蚀剂构成的层20涂覆到基片10的一个表面10a上。灰度抗蚀剂具有也可以产生类似构造的优点。
如图1c所示，灰度抗蚀剂20通过灰度光刻配有构造21至24。在此构造21和22表示两个旋转对称的凹槽，它们构成用于两个凸透镜的负模。构造23形成用于三角形构造的负模而构造24构成用于一个矩形的二元衍射构造的负模。
如图1d所示，在抗蚀剂20的表面20a上通过PVD(物理气相沉积)物理地沉积一个第一层或玻璃层30。作为玻璃层30的材料在这个实施例中使用Schott玻璃公司的蒸镀玻璃8329。但是也可以选择各种其它的可蒸镀的玻璃。但是也可以沉积其它材料作为玻璃如AL2O3或SiO2。
如在图1d看到的那样，为了使玻璃层30的不平表面30a平整，将这个表面平面化。
在所示实施例中，平面化通过在玻璃层30的背离辅助基片10的表面30a上对玻璃层30进行磨光和抛光实现。由此使玻璃层30获得一个光滑抛光的表面30b。在图1e中示出平面化后的结果。
如图1f所示，一个与辅助基片10不全等的产品基片50与玻璃层30在其表面30b上阳极地粘接，其中粘接在图1f中以标记符号40表示。
作为产品基片50例如使用一种拉拔的玻璃、尤其是Schott公司的D263。根据使用也可以使用无碱玻璃，例如Schott公司的AF 45，AF37是有利的。也可以选择使用浮法玻璃，如Schott公司的Borofloat 33，公知的名称为“Jenaer Glas”。所述产品基片50是自载的并用于强化待制造的产品，因此玻璃层30在这个实例中不是自载的，但可以是子支承的。
接着将辅助基片10和灰度抗蚀剂20通过腐蚀掉灰度抗蚀剂而去除，因此如图1g所示，只是还有产品基片50、玻璃层或玻璃构造30和阳极粘接40是留下的。玻璃层30具有正构造31至34，它们与负构造21至24互补。正构造包括两个旋转对称的直径约为1mm的凸透镜31、32、一个三角形凸起33和一个矩形构造34。构造33和34垂直于图纸平面延伸。对于专业人员可以看出，通过按照本发明的方法也可以在玻璃层30中产生几乎任意的其它二元和非二元的构造。尤其是可以制造小于500μm、200μm、100μm、50μm、20μm或10μm的构造。
如图1g所示的产品已经形成一个具有微构造表面的光学透明的产品。但是按照这个实施例，产品按照图1h和1i继续制造，以保证获得具有两个或两面的构造表面的产品。
参照图1h将一个防反射层60涂覆到产品基片50的背离玻璃层30的表面50a上。可以选择或附加地也可以例如涂覆一个红外吸收层和/或其它光学层。
参照图1i所示，将一个第二构造的玻璃层通过阳极粘接70涂覆到防反射层60上。第二构造玻璃层80按照与第一构造玻璃层30相同的方法制造。在此有利的是，第二构造玻璃层80还与从属的光致抗蚀剂和辅助基片(未示出)一起、即对应于图1e的阶段涂覆到防反射层70上，然后才接着将从属于第二玻璃层80的光致抗蚀剂和辅助基片(未示出)腐蚀掉。
也可以选择将第二构造玻璃层80在将辅助基片10和光致抗蚀剂层20从第一构造玻璃层30上腐蚀掉之前、即在图1f所示的状态也涂覆到产品基片50上，必要时还可以中间连接防反射层60和/或其它层。这种工作方式具有优点，可以将从属于第一和第二构造玻璃层30、80的光致抗蚀剂和辅助基片同时腐蚀掉。
示例2
参照图2f示出一个产品，它代替阳极粘接通过一个环氧化物层41粘接。本产品直到图2f所示状态对应于在图1a至1d所示的步骤制造。
产品在玻璃层30平面化步骤之前用来作为产品基片或载体50粘接的初始点。通过环氧化物将产品基片50粘接到不平的玻璃层30上。如在图2f中可以看到的那样，环氧化物41补偿玻璃层30的不平度。
参照图2g，将辅助基片10和光致抗蚀剂层20如同对于第一实施例那样腐蚀掉。
在图2g中所示的产品1与图1d中产品的不同之处在于，另一代替二元构造34的三角形二元构造35。在两个垂直于图纸平面延伸的三角形构造33、35之间存在一个容量为0.1至2μl范围内的微通道36。该产品1由于玻璃的生物中性而特别适用于微射流，例如所谓的DNA处理器。
因为对于如图2g所示的按照本发明第二实施例的产品1，所述连接层或粘接层41不是两面平面地构成，已经证实使用一种具有这样的折射率的环氧化物是有利的，该折射率与构造玻璃层30和产品基片50的折射率近似。
作为环氧化物41已经证实特别适合的是，使用一种以单组分无溶剂的UV粘接剂为基础、折射率n＝1.5的光学环氧粘接剂，例如Delo公司的“Delo Katiobond 4653”。
在所述情况下选择如下的折射率：
产品基片50        玻璃AF 45              n＝1.52
环氧化物层41      Delo Katiobond 4653    n＝1.50
玻璃层30          蒸镀玻璃8329           n＝1.47
在使用Boroloat 33(n＝1.47)或D263(n＝1.52)时，作为产品基片50的材料由于较小的折射率差可以通过同一环氧化物制造。如果要使用其它玻璃或者用于玻璃层30或者产品基片50，可以选择具有相应折射率的环氧化物。为此折射率为1.3至1.7的环氧化物是可以买到的。
示例3
图3a-f示出按照本发明的第三实施例制造按照本发明的仅具有二元构造的产品。
首先预备一个由硅制成的自载的辅助基片10(图3a)。接着将一个第一中间层15涂覆到辅助基片10上。该中间层15可以是一个光致抗蚀剂或一个简单的非光敏的中间层，如由塑料制成。
将一个光致抗蚀剂层20涂覆到中间层15上并且例如通过光刻法形成二元构造。产品在图3c中表示。
接着蒸镀一个玻璃层30(图3d)。将该玻璃层30平面化并将一个产品基片50阳极粘接到平面化的玻璃层30上(图3e)。
接着将辅助基片、中间层15和光致抗蚀剂层20腐蚀掉，使玻璃层30的构造表面30c暴露，并提供光学产品1(图3f)。
所述中间层15在此防止蒸镀玻璃30与辅助基片10粘接。因此上述实施例对于制造二元构造、对于不使用灰度抗蚀剂是特别有利的。
示例4
参照图4a示出一个按照本发明的第四实施例制造按照本发明的产品。所述辅助基片10由一个抛光的硅片制成。
参照图4c，将一个二元负构造10a通过化学湿法刻蚀直接在辅助基片10、即在硅片上产生。
接着蒸镀玻璃层30并对应于其它实施例对产品继续制造。
对于这个实施例，所述辅助基片10、更准确地说硅片通过KOH溶液溶解，以露出构造表面30c。
示例5
图5f以对应于图3f的状态示出按照第五实施例的一个按照本发明的产品，具有一个略微不同的构造表面30c。玻璃层30的表面30c具有一个中心凹部35和在外边缘上凸出的凸起36。
参照图5g，所述产品1以玻璃层30凸起36的底面通过一个第二阳极粘接70与第二产品基片81连接。在此存在一个围绕MEMS(mikro-elektro-mechanisches-system：微电机械系统)—构造82的中心空腔35，该MEMS构造通过这种方法形成外壳(封装)。
示例6
图6a示出一个压花的、预构造的塑料薄膜25，它例如作为3M公司的米制商品可以买到。
将该预构造的薄膜25涂覆到，例如粘接到辅助基片10上(图6d)。接着将玻璃层30蒸镀到塑料表面25的构造表面上。
参照图6f，将玻璃层30磨掉并与产品基片阳极粘接。接着将塑料薄膜25例如通过刻蚀或其它的分离方式去除。现在又出现一个完全透明的产品1，它在玻璃载体50上具有一个构造玻璃层30形式的单面构造表面。
下面描述由玻璃8329蒸镀成的玻璃层的不同实验结果。
参照图7示出一个TOF-SIMS测量结果，其中计数速率作为溅射时间的函数。该测量表征玻璃层元素浓缩曲线。它获得对于＜1％层厚的玻璃层的厚度常数。
参照图8示出按照本发明产生的玻璃8329的玻璃构造。
此外如下进行由玻璃8329制成的复制保护层的密度测试。
一个硅晶片配有刻蚀停止掩模。如图9所示，晶片97被分成9个孔面98(1cm×1cm)。每个孔间距在孔面中如下逐行变化：
第一行：1mm孔距
第二行：0.5mm孔距
第三行：0.2mm孔距
所有正方形小孔99具有一个15μm的边长。
在以8μm(试件A)或18μm(试件B)的玻璃8329层镀覆无构造的晶片背面以后，接着将晶片在孔面上干法刻蚀到玻璃。刻蚀的结果可以很好地在透视显微镜中观察。
对于所有18个测试孔面的氦泄漏测试得到一个小于10-8mbar l/sec的泄漏率。
令人惊奇的是，在各测量面中进行测量期间，尽管晶片明显弯曲但是也显示出很高的玻璃层区域强度。即使在200℃下也没有产生玻璃构造变化。
此外按照DIN/ISO进行玻璃层耐抗性测试。结果在表1中给出：
表1：
试样标记：8329
水DIN ISO 719等级 消耗HCl(ml/g) 当量Na2O(μg/g)     评价
HGB1   0.011   3  无
酸DIN 121116等级   去除量(mg/dm2)   整个表面(cm2)  评价/可见变化
1W作为材料   0.4    2×40  无变化
碱DIN ISO 695   去除量(mg/dm2)   整个表面(cm2)  评价/可见变化
A2作为材料   122   2×14  无变化
对于专业人员可以看出，上述实施例只是示例性的，并且本发明不局限于此，而是可以具有多种变化，而不脱离本发明的思想。

Claims (12)

1.一种用于制造具有构造表面(30c)的产品(1)的方法，用于产生衍射或折射的玻璃透镜，包括至少这些步骤：
预备一个具有一个构造表面(20a)的辅助基片(10，20)，
辅助基片(10，20)的构造表面(20a)限定用于透镜的相应的负模，
将一个由玻璃制成的第一层(30)通过蒸镀涂覆到构造表面(20a)上，施加一产品基片(50)；以及
去除辅助基片(10，20)。
2.如权利要求1所述的方法，其特征在于，将所述第一层(30)平面化(30b)。
3.如权利要求1所述的方法，其特征在于，将产品基片(50)胶粘地连接(41)到第一层(30)上。
4.如权利要求1所述的方法，其特征在于，将产品基片(5)与第一层(30)阳极粘接(40)。
5.如权利要求1所述的方法，其特征在于，所述辅助基片包括一个由第二种材料制成的自载的载体(10)，并直接使第二种材料形成构造。
6.如权利要求1所述的方法，其特征在于，将所述辅助基片(10)在形成构造步骤前平面化。
7.如权利要求1所述的方法，其特征在于，将所述辅助基片(10，20)至少局部地腐蚀掉。
8.如权利要求1所述的方法，其特征在于，所述辅助基片包括一个由第二种材料制成的载体(10)，将一个构造层(20)涂覆到载体上并使构造层形成构造。
9.如权利要求8所述的方法，其特征在于，所述构造层(20)包括一个预构造的薄膜(25)。
10.如权利要求8或9所述的方法，其特征在于，在所述载体(10)与构造层(20)之间涂覆一个中间层(15)。
11.如权利要求1所述的方法，其特征在于，涂覆一个包括光致抗蚀剂或灰度抗蚀剂的构造层(20)。
12.如权利要求1所述的方法，其特征在于，所述形成构造的步骤包括光刻法或机械压制。
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IL164304A0 (en) 2005-12-18
JP2005527459A (ja) 2005-09-15
EP1494965A2 (de) 2005-01-12
AU2003233973A8 (en) 2003-10-27
WO2003086958A3 (de) 2004-02-12
WO2003086958A2 (de) 2003-10-23
CN1646418A (zh) 2005-07-27
EP1494965B1 (de) 2017-09-06
US20060051584A1 (en) 2006-03-09
CA2480854A1 (en) 2003-10-23

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