CN1303479C - 以感光性铟锡氧化物溶液形成铟锡氧化物图案的方法 - Google Patents
以感光性铟锡氧化物溶液形成铟锡氧化物图案的方法 Download PDFInfo
- Publication number
- CN1303479C CN1303479C CNB2004100616132A CN200410061613A CN1303479C CN 1303479 C CN1303479 C CN 1303479C CN B2004100616132 A CNB2004100616132 A CN B2004100616132A CN 200410061613 A CN200410061613 A CN 200410061613A CN 1303479 C CN1303479 C CN 1303479C
- Authority
- CN
- China
- Prior art keywords
- tin oxide
- indium tin
- photonasty
- patterning
- oxide solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 11
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 68
- 238000000059 patterning Methods 0.000 claims description 37
- 230000015572 biosynthetic process Effects 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 7
- 239000000853 adhesive Substances 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 230000008859 change Effects 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- 230000007480 spreading Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 38
- 238000000576 coating method Methods 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 5
- 238000005245 sintering Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000007669 thermal treatment Methods 0.000 description 3
- 238000012940 design transfer Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 208000034189 Sclerosis Diseases 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000007630 basic procedure Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Metallurgy (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Electric Cables (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Light Receiving Elements (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (10)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/687,612 US20050084805A1 (en) | 2003-10-20 | 2003-10-20 | Method for forming patterned ITO structure by using photosensitive ITO solution |
US10/687,612 | 2003-10-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1609710A CN1609710A (zh) | 2005-04-27 |
CN1303479C true CN1303479C (zh) | 2007-03-07 |
Family
ID=34521007
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100616132A Expired - Fee Related CN1303479C (zh) | 2003-10-20 | 2004-06-23 | 以感光性铟锡氧化物溶液形成铟锡氧化物图案的方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20050084805A1 (zh) |
CN (1) | CN1303479C (zh) |
TW (1) | TWI261698B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102117767A (zh) * | 2010-12-29 | 2011-07-06 | 上海大学 | 基于溶胶式全透明tft有源矩阵制造方法 |
TW201411448A (zh) * | 2012-09-03 | 2014-03-16 | Wintek Corp | 觸控面板 |
CN103230864B (zh) * | 2013-04-03 | 2015-03-25 | 江西沃格光电股份有限公司 | 防静电tft基板的制作方法 |
CN103199061B (zh) * | 2013-04-07 | 2015-06-03 | 江西沃格光电股份有限公司 | 防静电tft基板的制作方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20010048489A1 (en) * | 2000-06-02 | 2001-12-06 | Yoshihiro Izumi | Active matrix substrate, display device, and image sensing device |
CN1348594A (zh) * | 1998-12-10 | 2002-05-08 | 国际商业机器公司 | 使用化学放大抗蚀剂的透明导电膜的形成方法 |
-
2003
- 2003-10-20 US US10/687,612 patent/US20050084805A1/en not_active Abandoned
-
2004
- 2004-03-25 TW TW093108189A patent/TWI261698B/zh not_active IP Right Cessation
- 2004-06-23 CN CNB2004100616132A patent/CN1303479C/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1348594A (zh) * | 1998-12-10 | 2002-05-08 | 国际商业机器公司 | 使用化学放大抗蚀剂的透明导电膜的形成方法 |
US6632115B1 (en) * | 1998-12-10 | 2003-10-14 | International Business Machines Corporation | Method for forming transparent conductive film using chemically amplified resist |
US20010048489A1 (en) * | 2000-06-02 | 2001-12-06 | Yoshihiro Izumi | Active matrix substrate, display device, and image sensing device |
Also Published As
Publication number | Publication date |
---|---|
CN1609710A (zh) | 2005-04-27 |
TW200515041A (en) | 2005-05-01 |
US20050084805A1 (en) | 2005-04-21 |
TWI261698B (en) | 2006-09-11 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: CPT TECHNOLOGY (GROUP) CO., LTD. Free format text: FORMER OWNER: CHINA PROJECTION TUBE CO., LTD. Effective date: 20130717 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: TAIWAN, CHINA TO: 350000 FUZHOU, FUJIAN PROVINCE |
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TR01 | Transfer of patent right |
Effective date of registration: 20130717 Address after: 350000, No. 1, building 6, building No. third, fourth, Confucian Road West, Mawei District, Fujian, Fuzhou Patentee after: CPT DISPLAY TECHNOLOGY (SHENZHEN)CO., LTD. Address before: Taipei City, Taiwan, China Patentee before: Chunghwa Picture Tubes Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070307 Termination date: 20190623 |
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CF01 | Termination of patent right due to non-payment of annual fee |