CN1253291A - Electron probe differential analyzer - Google Patents
Electron probe differential analyzer Download PDFInfo
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- CN1253291A CN1253291A CN99119443A CN99119443A CN1253291A CN 1253291 A CN1253291 A CN 1253291A CN 99119443 A CN99119443 A CN 99119443A CN 99119443 A CN99119443 A CN 99119443A CN 1253291 A CN1253291 A CN 1253291A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
- G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/079—Investigating materials by wave or particle radiation secondary emission incident electron beam and measuring excited X-rays
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/303—Accessories, mechanical or electrical features calibrating, standardising
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
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- G01N2223/306—Accessories, mechanical or electrical features computer control
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Abstract
To carry out highly precise analysis in spite of a low retrieval frequency of a coordinate value and carry out highly precise analysis without any divergence of control even when an extent of a height directional change is greatly increased in an electron prove microanalyzer. In electron probe microanalyzer 1 carrying out elementary analysis on a sample surface on the basis of a characteristic X-ray emitted from a sample by electron beam radiation, a computing function forming an isoline of a Z-axis coordinate value from a measured coordinate value within an analysis range and finding the range of the Z-axis correction value divided by the isoline is provided, and Z-axis directional position control of the sample is carried out according to the Z-axis correction value so that the sample surface satisfies an analysis condition height. A computing function finding a height correction value on a straight line passing the central position of a height distribution of the sample and using the height correction value for finding a three-dimensional correction value using a center position of the height distribution as a rotation center is provided, and Z-axis directional position control of the sample is carried out on the basis of the Z-axial correction value obtained from the three-dimensional correction value so that the sample surface satisfies the analysis condition height.
Description
The present invention relates to a kind of electro-probe micro analyzer, particularly the position control on the test portion Z-direction.
In the electro-probe micro analyzer (EPMA) that adopts wavelength dispersion type optical splitter, as the light harvesting condition that detects by the electron beam irradiation characteristic X line that test portion radiated, require the X line optical splitter of test portion and beam split crystallization, detecting device is configured on the circumference of Luo Lande circle accurately.Usually, satisfy the light harvesting condition of this X line optical splitter by the height and position of adjusting the test portion face.
In the analysis of adopting electro-probe micro analyzer, the only point analysis of a bit analyzing on the test portion face is arranged, and the X line signal that detects this place when perhaps progressively changing analysis position on the test portion face is to obtain the line analysis and the surface analysis of one dimension or Two dimensional Distribution.For irregular test portion face,, be necessary to control the short transverse of test portion platform at any time so that make it satisfy the light harvesting condition of X line optical splitter in order to carry out high-precision point analysis, line analysis and surface analysis.
The method that the position adjustment of the short transverse of existing electro-probe micro analyzer (Z-direction) is adopted is, (a) obtain each analysis site the test portion face current elevation information and feed back to the test portion platform, the height and position of adjusting the test portion platform is so that the analysis site on the test portion face satisfies the feedback control method of light harvesting condition, (b) the test portion face is divided into the least unit zone, obtain the coordinate figure of the intersection point in constituent parts zone in advance, according to the elevation information of the analysis site in this coordinate figure approximate treatment unit area, adjust the control method of the height and position of test portion platform according to resulting elevation information.
When adopting existing electro-probe micro analyzer to carry out point analysis, line analysis and surface analysis, in order to adjust the position of short transverse accurately with the control method of above-mentioned (a) and (b), need to obtain the coordinate figure of each analysis site, perhaps increase the number of times that obtains of cutting apart number or coordinate figure in zone, existing needs to handle the huge data volume and the problem of long-timeization of processing time.Particularly the coordinate figure when carrying out line analysis and surface analysis to obtain number of times huger.
Again, need in mobile analysis site, adjust the position on the short transverse in on-line analysis and the surface analysis, in the feedback of above-mentioned (a), if the variation of the short transverse in the unit interval is bigger, then the response speed of position control can't be caught up with the speed of change and make control disperse, and exists the problem of the possibility that increase departs under the following state.Again, when controlling by the cut zone of above-mentioned (b) in on-line analysis and the surface analysis, though can not go out the caused phenomenon of dispersing of the FEEDBACK CONTROL of phenomenon (a), but, because the elevation information that is obtained is not the thing that correctly shows test material shape, in order to exist the test portion face in the intensive zone of fluctuations to carry out the height revisal to part, must contrast the closeest zone of fluctuations and carry out the segmentation of cut zone, thereby can increase the number of times that obtains of cutting apart number or coordinate, increase data volume and processing time.
To the surface for being that the test portion of concentric circles of the symmetry at center is when carrying out line analysis and surface analysis with one, if adopt the control of being undertaken by the cut zone of (b), even known that the elevation information on its circumferencial direction is identical, still existing needs the huge Region Segmentation number and the problem of obtaining coefficient of coordinate figure.
For this reason, the objective of the invention is to solve above-mentioned existing problem, in electro-probe micro analyzer, obtain number of times and carry out high-precision analysis with few coordinate figure.When even the variation of short transverse is big, can occur control yet and disperse and can carry out high-precision analysis again.
The 1st kind of invention of the present invention constitutes, the electro-probe micro analyzer that the characteristic X line that radiates from test portion by the electron beam irradiation in utilization carries out the ultimate analysis on test portion surface, has the isoline that forms Z axial coordinate value according to the mensuration coordinate figure in the analyst coverage, obtain the calculation function in the zone of the Z axle compensating value of being distinguished by isoline, the height that allows the test portion surface satisfy analysis condition according to above-mentioned Z axle compensating value carries out the position control of test portion Z-direction.
Above-mentioned the 1st kind of invention in order to carry out the position control of test portion Z-direction, utilizes the zone of the Z axle compensating value that the isoline of Z axial coordinate value distinguishes.Z axle compensating value is determined in each zone of distinguishing for the isoline of Z axial coordinate value, for the analysis site that exists in the zone, utilize in this zone fixed Z axle compensating value carry out the position control of Z-direction.
The isoline of Z axial coordinate value utilizes this mensuration coordinate figure to be connected the equal Z axial coordinate value of Z-direction and obtains by the interior Z coordinate figure corresponding to X, Y coordinate figure of determination and analysis scope.The Z axial coordinate value in the formed zone of scope that the isoline of Z axial coordinate value is distinguished is in given amplitude range.When carrying out the analysis of certain analysis site in this zone, carry out the position control of test portion Z-direction as Z axle compensating value with the value of this zone setting.
The 1st kind of form of Z axle compensating value is to set 1 value in the zone that isoline is distinguished, and the 2nd kind of form is to set continually varying Z axle revisal function along the moving direction of X, Y coordinate figure.In on-line analysis and the surface analysis, promptly can also can carry out position control according to the 1st Z axle compensating value according to the 2nd Z axle revisal function.
According to above-mentioned the 1st kind of invention, owing to have the Z axle compensating value of the height control of the analysis condition that satisfies the test portion face on whole of analyst coverage, what can prevent to control disperses.Again, because can be according to the number of times that obtains of the thick close increase and decrease Z axial coordinate value of the fluctuations on test portion surface, select obtaining the position and obtaining and count of the Z axial coordinate value of coincideing, under the few situation of obtaining number of times of coordinate figure, just can carry out high-precision position control with the test portion surface configuration.
Constituting of the 2nd kind of invention of the present invention, utilizing the characteristic X line that radiates from test portion by the electron beam irradiation to carry out the electro-probe micro analyzer of ultimate analysis on test portion surface, has the height augmenting value on the straight line of obtaining the center of passing through the test portion height profile, the center that utilizes this height augmenting value to obtain with height profile is the calculation function of the three-dimensional complement value of rotation center, according to the Z axle compensating value that obtains from above-mentioned three-dimensional complement value, the height that allows the test portion surface satisfy analysis condition carries out the position control of test portion Z-direction.
Above-mentioned the 2nd kind of invention is that the height profile at test portion has according to the test portion of the feature of the shape that highly changes from certain distance that a bit begins and analyzes, and utilizing the center with height profile is the three-dimensional Z axle compensating value of rotation center.Three-dimensional Z axle compensating value can allow the center rotation that this height augmenting value winds with height profile be obtained by obtaining the height augmenting value on the straight line that passes test portion height profile center earlier then.Utilize three-dimensional complement value to carry out revisal corresponding to the X of analysis site, the Z coordinate figure of Y coordinate figure, carry out the position control of Z-direction.
Because test portion has its height profile according to the shape that highly changes from certain distance that a bit begins,, obtain the Z axle compensating value on whole in the analyst coverage by obtaining the height augmenting value on the straight line that passes test portion height profile center.Three-dimensional Z axle compensating value in the analyst coverage on whole can be by allowing the height augmenting value be that rotation center is rotated and obtains with the center of height profile.Utilize three-dimensional complement value, carry out the analysis of certain analysis site in the analyst coverage,, obtain the X corresponding to analysis site, the Z axle compensating value of Y coordinate figure, use the Z axle compensating value of being obtained to carry out the position control of test portion Z-direction according to three-dimensional complement value.
Passing the height augmenting value on the straight line of test portion height profile center, can be the form that the ladder at given interval is determined in short transverse promptly, also can the determined form of successive value.
Three-dimensional complement value is when adopting the stepped appearance height augmenting value, and becoming the cylinder-like body of Z axle compensating value is overlapping shape for short transverse in the footpath direction, when adopting continuous height augmenting value, is the cylinder-like body that changes along footpath direction short transverse.In order to obtain Z axle compensating value from three-dimensional complement value, when point analysis, obtain the X corresponding to the analysis site in the three-dimensional complement value, the Z coordinate figure of Y coordinate figure, with this Z axial coordinate value as Z axle compensating value, again, when on-line analysis and surface analysis, obtain in the three-dimensional complement value corresponding to Z coordinate figure along the moving direction of X, Y coordinate figure, with this Z axial coordinate value as Z axle compensating value.
For promptly can being 1, the straight line of obtaining height augmenting value also can be many again.When adopting many straight lines, can near straight line, cut apart three-dimensional complement value and set at circumferencial direction.
In above-mentioned the 2nd kind of invention, can allow three-dimensional complement value tilt according to the inclination of analyst coverage, utilize the three-dimensional complement value after this inclination to obtain Z axle compensating value, carry out the position control of test portion Z-direction.The slope of analyst coverage can be tried to achieve by the height on the test portion face in the analyst coverage.
According to above-mentioned the 2nd kind of invention, owing to have the Z axle compensating value of the height control of the analysis condition that satisfies the test portion face on whole of analyst coverage, what can prevent to control disperses.Again, get the center and get on the straight line to such an extent that highly obtain the Z axle compensating value of whole of analyst coverage, under the few situation of obtaining number of times of coordinate figure, just can carry out high-precision position control owing to can pass the test portion height profile by mensuration.
Below accompanying drawing is carried out brief description.
Fig. 1 is the schematic block diagram of the configuration example of expression electro-probe micro analyzer of the present invention.
Fig. 2 is the functional block diagram of the function of expression explanation first example of the present invention.
Fig. 3 is the function of expression explanation first example of the present invention and the process flow diagram of action.
Fig. 4 is the expression Z axial coordinate value of the function of expression explanation first example of the present invention and the figure of isoline.
Fig. 5 is the figure of the expression Z axle compensating value of the function of expression explanation first example of the present invention.
Fig. 6 is the functional block diagram of the function of expression explanation second example of the present invention.
Fig. 7 is the function of expression explanation second example of the present invention and the process flow diagram of action.
Fig. 8 is the figure of the expression three-dimensional complement value of the function of expression explanation second example of the present invention.
Fig. 9 is the figure of the expression three-dimensional complement value of the function of expression explanation second example of the present invention.
Figure 10 is the figure of the expression three-dimensional complement value of the function of expression explanation second example of the present invention.
Among the figure, the 1-electro-probe micro analyzer, the 2-computing machine, the 3-platform controller, the 4-driver, the 5-camera head, the automatic focusing controller of 6-, the 7-monitor, the 11-tungsten filament, the 12-electron beam, the 13-condenser, the 14-object lens, the 15-beam splitter, the 16-detecting device, 17-test portion platform, 2A, the 2a-analyst coverage, 2B, 2b-X, Y, the Z coordinate figure, 2C, 2c-Z axle compensating value, 2D, 2d-Z axle revisal functional value, 2E, 2e-Z axle compensating value, Z axle revisal functional operation functional block, the 2F-isogram, the 2f-center, 2G-isoline calculation function piece, the Z axial coordinate value of 2g-height revisal, the 2h-three-dimensional function, the 2i-slope, the 2j-straight line, measuring point set-up function piece, 2k-center calculation block, 2m-height correcting function piece, 2n-approximate function functional block, 2p-three-dimensional function functional block, 2q-slope functional block, 20A, the 20a-data are preserved piece, the S-test portion.
Below embodiments of the present invention will be described in detail with reference to the accompanying drawings
Fig. 1 is the schematic block diagram of the configuration example of expression electro-probe micro analyzer of the present invention.In electro-probe micro analyzer shown in Figure 11, be placed on the test portion S on the test portion platform 17 by condenser 13, object lens 14 irradiations from 11 ejected electron bundles 12 of tungsten filament.Analyze by the X line optical splitter of the detecting device 16 that comprises the characteristic X line that comes out according to the beam splitter 15 and the beam split of detection institute of wavelength beam split from the X line that test portion S emits.
Test portion platform 17 can move on X, Y, Z-direction by the driver 4 of acceptance from the gating pulse of platform controller 3.Determine and the height control of Z-direction by position on X, the Y direction by finishing from the control command of computing machine 2 for platform controller 3.The picture of the observation of test portion S by taking by catoptron 18 reflections with camera heads such as CCD gamma camera 5, and be presented on the monitor 7 through automatic focusing controller 6 and realize.Automatically focusing controller 6 feeds back to platform controller 3 by FEEDBACK CONTROL test portion platform 17 with the data of Z-direction, obtains the altitude information of test portion S when focusing.Usually, will according to the focal position on the test portion S of the camera head 5 of automatic focusing controller 6 with set for consistently according to the analysis position that satisfies the light harvesting condition on the test portion S of X optical splitter, can satisfy the light harvesting condition of X line optical splitter by focus by automatic focusing controller 6 alignment optical pictures.In existing electro-probe micro analyzer, observe the optical image of each analysis site, the position of adjusting the Z-direction of test portion platform 17 makes it aim at focus.
The function that is had by computing machine 2 among the present invention, the optical image that does not need to observe each point can carry out the position adjustment of the Z-direction of test portion platform 17.Below, by Fig. 2～Fig. 5 first example is described for function and the action thereof that computing machine had, by Fig. 6～Figure 10 second example is described.
First example at first is described.Fig. 2 is the functional block diagram of the function of expression explanation first example of the present invention.Fig. 3 is the function of expression explanation the present invention first example and the process flow diagram of action.Fig. 4,5 represents to illustrate the figure of the expression Z axial coordinate value of function of first example of the present invention and isoline, expression Z axle compensating value respectively.
In first example, mensuration coordinate figure in the analyst coverage form Z axial coordinate value isoline, obtain the zone of the Z axle compensating value of distinguishing by isoline, the position control of carrying out on the test portion Z-direction according to Z axle compensating value makes the test portion surface satisfy the height of analysis condition.
In Fig. 2, represent the functional block that computing machine 2 is had by each piece that pecked line enclosed, comprise the calculation function piece 2E of the data preservation piece 20A that preserves each data, the calculation function piece 2G that calculates isoline and calculating Z axle compensating value, Z axle revisal functional value.
Data are preserved each data that piece 20A preserves analyst coverage 2A, X, Y, Z coordinate figure 2B, isogram 2F, Z axle compensating value 2C, Z axle revisal functional value 2D etc.The indicate scope analyzed on test portion S of analyst coverage 2A is while set by unillustrated input media among the figure by observing the optical image that shown by monitor 7 etc.X, Y, Z coordinate figure 2B represent the coordinate figure on the test portion surface in the analyst coverage, X, Y coordinate figure be by the current location of platform controller 3 input test portion platforms 17, the elevation information on the test portion surface that the Z coordinate figure is obtained by automatic focusing controller 6 equal altitudes pick-up units input.
Isoline computing 2G utilizes X, the Y in the analyst coverage, the coordinate data of Z coordinate figure to carry out computing by connecting identical Z coordinate figure.Interval between the isoline can be set arbitrarily.The isoline of being obtained by isoline computing 2G is kept among the isogram 2F.Isogram is confirmed by monitor 7, as required, can be carried out obtaining and the isoline computing of X, Y, Z coordinate figure repeatedly.Isogram is represented the concavo-convex of test portion surface, the deviation on the Z-direction that expression begins from the reference position of test portion platform.
The calculation function piece 2E of Z axle compensating value, Z axle revisal functional value calculates in order to allow the test portion face satisfy the desired height control amount of analysis condition, the Z axle compensating value of being obtained, Z axle revisal functional value are kept among Z axle compensating value 2C and the Z axle revisal functional value 2D, when analyzing, flow to platform controller 3 and carry out height control, adjust the focal position of X line optical splitter.
In addition, the concavo-convex height detecting device that forms the test portion S shown in the illustrated configuration example is the example that is formed by automatic focusing controller 6, can be obtained by the focus of the resulting optics of feedback system shown in the dotted line among the figure by aiming at.
Below, use the process flow diagram of Fig. 3 and the action that Fig. 4,5 illustrates first example.Observe the optical image of test portion S and SEM picture etc. with monitor 7 and set analyst coverage, be saved in (S1 step) among the analyst coverage 20A.In order to calculate the surface configuration of test portion S, in analyst coverage, set X, Y coordinate by test portion platform 17 and calculate the Z coordinate figure by automatic focusing controller 6 simultaneously, be saved among X, Y, the Z coordinate figure 2B.Coordinate figure in Fig. 4 (a) expression analyst coverage and the analyst coverage, numeric representation Z coordinate figure.The measuring point of the coordinate figure of asking can be arbitrarily, and for example, the rapid part of change of shape can intensively be measured, and change of shape part slowly can sparsely be measured (S2 step).
Isoline computing 2G utilizes X, Y, the Z coordinate figure measured to calculate isoline, is presented in the monitor 7.One example of Fig. 4 (b) expression isogram.Though expression is 1 the equally spaced isoline of being spaced apart of Z direction among the figure, the interval of isoline can be set arbitrarily, also can be unequal interval.The isoline of being obtained is kept at (S3 step) among the isogram 2F.The isogram of being obtained is observed with monitor, can repeat S2,3 steps if necessary repeatedly, can improve the precision (S4 step) of isogram.
In the zone that isoline is distinguished, set Z axle compensating value.The setting example of Fig. 5 (a) expression Z axle compensating value is set 1～8 value as Z axle compensating value in each zone.Z axle compensating value can be set 1 value in each zone, again, also can set continuous Z axle revisal function for along analysis directions in on-line analysis and the surface analysis.
When in the zone, being set at 1 value, can adopt the interior value arbitrarily of scope of Z axial coordinate value.The situation (S5 step) of setting regions minimum value is adopted in expression among Fig. 5 (a).
When carrying out point analysis (S6 step), determine X, the Y coordinate figure of middle analysis site in the analyst coverage.For X, the Y coordinate figure of definite analysis site, from Z axle compensating value 2C, obtain pairing Z axle compensating value.For example in Fig. 5 (a), (xa ya), can obtain for 3 (S7a steps) as the Z axle compensating value of correspondence if analysis site is defined as an A.Carry control signal by platform controller 3 to stepper motor driver according to this Z axle compensating value, carry out the height control of the Z axle of test portion platform 17.Like this, can adjust the height (S8a step) of analysis site.
When carrying out line analysis and surface analysis (S6 step), determine middle analytical line or analyst coverage in the analyst coverage again.For X, the Y coordinate figure of definite analytical line or analyst coverage, from Z axle compensating value 2C, obtain pairing Z axle compensating value.For example in Fig. 5 (a),, from the isogram of Fig. 5 (a), can obtain Z axle compensating value shown in Fig. 5 (b) or Fig. 5 (c) or Z axle revisal function (S7b step) if determine that the y coordinate figure y0 as analytical line is the mensuration line of x axle.Carry control signal by platform controller 3 to stepper motor driver according to this Z axle compensating value or this Z axle revisal function, carry out the height control of the Z axle of test portion platform 17.Like this, can adjust the height (S8b step) of analysis site.
Second example below is described.Fig. 6 is the functional block diagram of the expression explanation second routine function, and Fig. 7 is the process flow diagram of expression explanation second routine function and action, and Fig. 8～10 are the figure of the expression three-dimensional complement value of the expression explanation second routine function.
Second example is that the height profile with test portion is analyzed from the test portion of the feature of the shape of certain distance that a bit begins, its height change for basis, and adopting the center with height profile is the three-dimensional Z axle compensating value of rotation center.Three-dimensional Z axle compensating value is by the height augmenting value on the straight line of obtaining the center by the test portion height profile earlier, allows this height augmenting value be to obtain after the rotation center rotation with the center of height profile then.Adopt the revisal of three-dimensional Z axle compensating value corresponding to the X of analysis site, the Z coordinate figure of Y coordinate figure, carry out the position control of Z-direction.
In Fig. 6, represent the functional block that computing machine 2 is had by each piece that pecked line enclosed, comprise the data of preserving each data preserve the functional block 2k of piece 20a, the functional block 2j that sets straight line, measuring point, calculating central position, carry out height revisal computing calculation function piece 2m, computed altitude compensating value approximate function approximate function functional block 2n, from approximate function calculate three-dimensional function functional block 2p, calculate the slope between test portion face and the three-dimensional function functional block 2q, calculate the calculation function piece 2e of Z axle compensating value, Z axle revisal functional value.
Each data of Z coordinate figure 2g, the three-dimensional function 2h of data preservation piece 20a preservation analyst coverage 2a, center 2f, X, Y, Z coordinate figure 2b, height augmenting value, slope 2i, Z axle compensating value 2c, Z axle revisal functional value 2d etc.
The indicate scope analyzed on test portion S of analyst coverage 2a is while set by unillustrated input media among the figure by observing the optical image that shown by monitor 7 etc.X, Y, Z coordinate figure 2b represent the coordinate figure on the test portion surface in the analyst coverage, X, Y coordinate figure be by the current location of platform controller 3 input test portion platforms 17, the elevation information on the test portion surface that the Z coordinate figure is obtained by automatic focusing controller 6 equal altitudes pick-up units input.
The test portion of analytic target has its height profile and is the feature of basis from certain distance that a bit begins, height change, and center operation blocks 2k calculates the center with X, Y, Z coordinate figure, is kept among the 2f of center.
Straight line, measuring point set-up function piece 2j determine the straight line from center radius vector direction, set measuring point on straight line.Height augmenting value operation blocks 2m calculates the Z axial coordinate value of height revisal according to the Z axial coordinate value of measuring point and is saved among the 2g.The piece 2n of approximate function adopts the Z axial coordinate value of height revisal to calculate the height revisal function of relevant footpath direction, and the piece 2p of three-dimensional function calculates and allows the approximate function be that rotation center is rotated obtaining three-dimensional function with the center, and is saved among the piece 2h.Again, the piece 2q of slope computing calculates the slope on test portion surface, and the slope function of being obtained is saved among the 2i.
Z axle compensating value, Z axle revisal functional value operation blocks 2e, adopt three-dimensional function 2h or with the data of three-dimensional function inclination 2i, calculate in order to allow the test portion face satisfy the desired height control amount of analysis condition.The Z axle compensating value of being obtained, Z axle revisal functional value are kept among Z axle compensating value 2c and the Z axle revisal functional value 2d, flow to platform controller 3 and carry out height control when analyzing, and adjust the focal position of X line optical splitter.
Below, with the process flow diagram of Fig. 7 and the action of Fig. 8～10 explanations, second example.Observe the optical image of test portion S and SEM picture etc. with monitor 7, set analyst coverage, be saved among the analyst coverage 20a.The rectangle that dotted line enclosed among Fig. 8 is represented an example (S11 step) of analyst coverage.
Because test portion S has its height profile according to the feature from certain distance that a bit begins, the shape that highly changes, what only need to measure the test portion surface configuration just can obtain the shape of test portion integral body from the height change of center radius vector direction.For this reason, by platform controller and automatically focusing controller obtain the coordinate figure of test portion face, piece 2k calculates the center by the center, and is saved in (S12 step) among the storage block 2f.
Further, set the straight line (the some solid line among Fig. 8) (S13 step) of the footpath direction of passing the center of being obtained, obtain the coordinate figure on the straight line.Obtaining of coordinate figure can be undertaken by the mode that automatic focusing controller 6 is calculated the Z coordinate figure simultaneously by set X, Y coordinate by test portion platform 17, is saved among X, Y, the Z coordinate figure 2b.The measuring point of the coordinate figure of asking can be arbitrarily on straight line, and for example, the rapid part of change of shape can intensively be measured, and change of shape part slowly can sparsely be measured (S14 step).
According to the coordinate figure of being obtained, obtain the Z axial coordinate value (S15 step) of height augmenting value, further, obtain the height revisal approximate function of test portion radial direction.Fig. 8 represents an example (S16 step) of height revisal approximate function.Allow the height revisal approximate function be that rotation center is rotated with the center, obtain three-dimensional function.This three-dimensional function is represented the shape on test portion surface, utilizes this coordinate figure can carry out the revisal of Z-direction.Fig. 8 represents to intercept the three-dimensional function (S17 step) after the part.
The three-dimensional function that the S17 step is obtained is to carry out under the situation that hypothesis test portion S does not have to tilt, and in fact exists test portion S that the situation of inclination is arranged with respect to the test portion platform.18th, 19 steps were obtained the Z axle compensating value of having considered that test portion tilts at this situation.At this, after the several points on the analyst coverage of test portion S are obtained coordinate figure (the 18th step), allow three-dimensional function pass through the slope coefficient of as far as possible nearby locating to obtain three-dimensional function of the coordinate figure of asking.By utilizing this slope coefficient and three-dimensional function to carry out the revisal of Z axle, just can consider the height revisal of the inclination of test portion face.Fig. 9 represents the relation of the slope and the three-dimensional function of test portion face, and the inclination of the analyst coverage of representing for Fig. 9 bend as shown in figure 10, allows three-dimensional function at X-direction cant angle theta x, and Y direction cant angle theta y gets final product (the 19th step).
Afterwards,, carry out the revisal on the short transverse identical, analyze with above-mentioned the 6th～8 step by the 20th～22 step.The processing in the 20th～22 step, the three-dimensional function that can only be obtained with the 17th step carries out, and also can go on foot the slope coefficient of being obtained with the three-dimensional function and the 19th that the 17th step was obtained and carry out.Below the situation that adopts three-dimensional function and slope coefficient is described.
When carrying out point analysis (S20 step), determine X, the Y coordinate figure of middle analysis site in the analyst coverage.For X, the Y coordinate figure of definite analysis site, obtain pairing Z axle compensating value (S21a step) from three-dimensional function and slope coefficient.Carry control signal by platform controller 3 to stepper motor driver according to this Z axle compensating value, carry out the height control of the Z axle of test portion platform 17.Like this, can adjust the height (S22a step) of analysis site.
Again, (S20 step) determines analyst coverage inner analysis line or analyst coverage when carrying out line analysis and surface analysis.For X, the Y coordinate figure of definite analytical line or analyst coverage, obtain pairing Z axle revisal function (S21b step) from three-dimensional function and slope coefficient.According to this Z axle revisal function fixed Z axle compensating value carry control signal by platform controller 3 to stepper motor driver, carry out the height control of the Z axle of test portion platform 17.Like this, can adjust the height (S22b step) of analysis site.
In addition, in above-mentioned example, though only show the situation that adopts an approximate function to obtain three-dimensional function, according to the style characteristic of the Zhou Fangxiang on test portion surface, also can be by draw many straight lines of reflection shape from the center, obtain a plurality of approximate functions, allow approximate function rotate according to given angle, obtain a plurality of three-dimensional functions, these a plurality of three-dimensional functions are arranged in circumferencial direction at circumferencial direction, thus, carry out the Z axle revisal on test portion surface.
According to above explanation,, in electro-probe micro analyzer, can under the few situation of obtaining number of times of coordinate figure, carry out high-precision analysis according to the present invention, again, even under the big situation of short transverse intensity of variation, control can not dispersed yet, and can carry out high-precision analysis.
Claims (2)
1. electro-probe micro analyzer, the characteristic X line that utilization is radiated from test portion by the electron beam irradiation carries out the ultimate analysis on test portion surface, it is characterized in that having the isoline that forms Z axial coordinate value according to the mensuration coordinate figure in the analyst coverage, obtain the calculation function in the zone of the Z axle compensating value of being distinguished by isoline, the height that allows the test portion surface satisfy analysis condition according to described Z axle compensating value carries out the position control of test portion Z-direction.
2. electro-probe micro analyzer, the characteristic X line that utilization is radiated from test portion by the electron beam irradiation carries out the ultimate analysis on test portion surface, it is characterized in that having the height augmenting value on the straight line of obtaining the center of passing through the test portion height profile, the center that utilizes this height augmenting value to obtain with height profile is the calculation function of the three-dimensional complement value of rotation center, according to the Z axle compensating value that obtains from described three-dimensional complement value, the height that allows the test portion surface satisfy analysis condition carries out the position control of test portion Z-direction.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP319195/1998 | 1998-11-10 | ||
| JP319195/98 | 1998-11-10 | ||
| JP31919598A JP3379637B2 (en) | 1998-11-10 | 1998-11-10 | Electronic probe micro analyzer |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2005100649412A Division CN1661363B (en) | 1998-11-10 | 1999-09-24 | Electro-probe micro analyzer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1253291A true CN1253291A (en) | 2000-05-17 |
| CN1205467C CN1205467C (en) | 2005-06-08 |
Family
ID=18107483
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB991194438A Expired - Lifetime CN1205467C (en) | 1998-11-10 | 1999-09-24 | Electron probe differential analyzer |
| CN2005100649412A Expired - Lifetime CN1661363B (en) | 1998-11-10 | 1999-09-24 | Electro-probe micro analyzer |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2005100649412A Expired - Lifetime CN1661363B (en) | 1998-11-10 | 1999-09-24 | Electro-probe micro analyzer |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP3379637B2 (en) |
| KR (1) | KR100346407B1 (en) |
| CN (2) | CN1205467C (en) |
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| CN103608890A (en) * | 2011-06-09 | 2014-02-26 | 株式会社日立高新技术 | Stage device and control method for stage device |
| US8739309B2 (en) | 2008-11-13 | 2014-05-27 | Bruker Nano, Inc. | Method and apparatus of operating a scanning probe microscope |
| US8955161B2 (en) | 2008-11-13 | 2015-02-10 | Bruker Nano, Inc. | Peakforce photothermal-based detection of IR nanoabsorption |
| US9274139B2 (en) | 2008-11-13 | 2016-03-01 | Bruker Nano, Inc. | Method and apparatus of operating a scanning probe microscope |
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| JP5070074B2 (en) * | 2008-02-01 | 2012-11-07 | 株式会社日立ハイテクノロジーズ | Scanning electron microscope |
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Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN87214469U (en) * | 1987-10-14 | 1988-07-20 | 上海钢铁研究所 | Multifunctional specimen-loading support for electronic scanning microscope |
-
1998
- 1998-11-10 JP JP31919598A patent/JP3379637B2/en not_active Expired - Lifetime
-
1999
- 1999-09-24 CN CNB991194438A patent/CN1205467C/en not_active Expired - Lifetime
- 1999-09-24 CN CN2005100649412A patent/CN1661363B/en not_active Expired - Lifetime
- 1999-10-28 KR KR1019990047285A patent/KR100346407B1/en active IP Right Grant
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| CN102439462B (en) * | 2008-11-13 | 2015-07-22 | 布鲁克纳米公司 | Method and apparatus of operating a scanning probe microscope |
| US9207167B2 (en) | 2008-11-13 | 2015-12-08 | Bruker Nano, Inc. | Peak force photothermal-based detection of IR nanoabsorption |
| US8739309B2 (en) | 2008-11-13 | 2014-05-27 | Bruker Nano, Inc. | Method and apparatus of operating a scanning probe microscope |
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| CN103608890B (en) * | 2011-06-09 | 2015-01-28 | 株式会社日立高新技术 | Stage device and control method for stage device |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN1205467C (en) | 2005-06-08 |
| KR20000035099A (en) | 2000-06-26 |
| JP2000149851A (en) | 2000-05-30 |
| CN1661363A (en) | 2005-08-31 |
| JP3379637B2 (en) | 2003-02-24 |
| KR100346407B1 (en) | 2002-08-01 |
| CN1661363B (en) | 2011-03-23 |
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