KR20000035099A - Electron probe micro analyzer - Google Patents

Abstract

PURPOSE: An electro-probe micro analyzer is provided, to be analyzed in high precision by the smaller acquisition of coordinate values. CONSTITUTION: The electro-probe micro analyzer (1) which analyzes the atoms of sample surface by using the specific X-ray emitted from the sample (S) by radiation of electron rays, is provided with an operation function which forms the equivalent line of z-axis coordinate values within the analysis range (2A) and calculates the range of z-axis corrected values (2C) which are distinguished by the equivalent line, and controls the z-axis position of samples (S) to satisfy the analysis height of sample surface based on the z-axis corrected values. Also the electro-probe micro analyzer (1) is provided with an operation function which calculates the corrected value of height of the line which passes the center position of height distribution of sample and calculates the three dimensional corrected value whose rotation center is the center position of the height distribution by using the corrected value of height, and controls the z-axis position of samples (S) to satisfy the analysis height of sample surface based on the z-axis corrected values obtained from the three dimensional corrected value.

Description

Electron probe micro analyzer {Electron probe micro analyzer}

TECHNICAL FIELD The present invention relates to an electronic probe microanalyzer, and more particularly, to position control in the Z axis direction of a sample.

In the Electron Probe Microanalyzer (EPMA) using a wavelength-dispersive spectrometer, as a condensing condition for detecting characteristic X-rays emitted from a sample by electron beam irradiation, an X-ray spectrometer of a sample, a spectral crystal, and a detector It is required to arrange with high precision. Usually, condensing conditions of this X-ray spectrometer are performed by aligning the height of a sample surface.

In the analysis using the electronic probe microanalyzer, a point analysis for analyzing a point of a sample surface or a line analysis for obtaining a one-dimensional or two-dimensional distribution of an X-ray signal by detecting an X-ray signal at each time while changing an analysis position on a sample surface one by one And mapping analysis. To perform highly accurate point analysis, line analysis, and mapping analysis on uneven sample surfaces, it is always necessary to control the height direction of the sample stage so that the height of the sample surface at each analysis position satisfies the condensing conditions of the X-ray spectrometer. have.

Conventionally, the alignment of the height direction (Z axis direction) of the electronic probe microanalyzer (a) acquires the current height information of the sample surface at each analysis point, returns it to the sample stage, and the analysis point on the sample surface satisfies the condensing conditions. Feedback control for adjusting the height position of the sample stage so that the position of the sample stage is adjusted, or (b) dividing the sample surface into the smallest unit area, and acquiring coordinate values at the intersection points of the respective divided areas in advance. The control which adjusts the height position of a sample stage based on the height information obtained by approximating the height information of an analysis point is performed.

Conventionally, in the case of performing point analysis, line analysis, and mapping analysis by using an electronic probe microanalyzer, in order to align the height direction with high precision by the control of (a) and (b), a coordinate value is provided for each analysis point. It is necessary to increase the number of divisions or the number of divisions of the area and the number of acquisition of coordinate values. In particular, the number of times of acquiring the coordinate value when performing line analysis or mapping analysis is enormous.

In line analysis and mapping analysis, it is necessary to perform the position control in the height direction while moving the analysis point. In the feedback control of (a), when the amount of variation in the height direction per unit time is large, the response speed of the position control is increased. Since it does not reach the speed of change, there is a problem that the likelihood of departure from the following state is increased by the control diverging. In the line analysis and the mapping analysis, when the control by the decomposition area of (b) is performed, there is no risk of divergence that occurs when the feedback control is sequentially performed as shown in (a). However, since the obtained height information does not accurately represent the shape of the sample, the height correction is performed on the sample surface where the undulation change is partly present. The area must be subdivided, the number of divisions of the area and the number of acquisitions of the coordinate values increase, thereby increasing the number of data and processing time.

In case of performing line analysis and mapping analysis on the sample whose surface is concentrically symmetrical about one axis, even though it is known that the same height information in the circumferential direction is applied when the control by the subdivision of (b) is applied There is a problem in that a large number of divisions and a number of acquisitions of coordinate values are required.

Accordingly, an object of the present invention is to solve the above-mentioned conventional problems and to perform high-precision analysis with few acquisition times of coordinate values in an electronic probe microanalyzer. It is also an object of the present invention to perform a high-precision analysis in which the control does not diverge even when the change in the height direction is large.

1 is a schematic block diagram of a configuration example of an electronic probe micro analyzer of the present invention;

2 is a functional block diagram for explaining the functions of the first embodiment of the present invention;

3 is a flowchart for explaining the functions and operations of the first embodiment of the present invention;

4 is a view showing Z-axis coordinate values and isolines for explaining the functions of the first embodiment of the present invention;

5 is a view showing a Z-axis correction value for explaining the function of the first embodiment of the present invention;

6 is a functional block diagram for explaining the functions of the second embodiment of the present invention;

7 is a flowchart for explaining the functions and operations of the second embodiment of the present invention;

8 is a view showing a three-dimensional correction value for explaining the function of the second embodiment of the present invention;

9 is a view showing a three-dimensional correction value for explaining the function of the second embodiment of the present invention;

10 is a diagram showing a three-dimensional correction value for explaining the function of the second embodiment of the present invention.

<Explanation of symbols for main parts of drawing>

1: electronic probe micro analyzer 2: computer

3: stage controller 4: driver

5: Imaging means 6: Auto focus controller

7: monitor 11: filament

12 electron beam 13 condenser lens

14 objective lens 15 spectroscopy element

16 detector 17 sample stage

2A, 2a: analysis range 2B, 2b: X, Y, Z coordinate values

2C, 2c: Z-axis correction value 2D, 2d: Z-axis correction function

2E, 2e: Z axis correction value, Z axis correction function calculation function block

2F: Isometric map 2f: Center position

2G: Isometric line function block 2g: Z axis coordinate value of height correction

2h: 3D function 2i: Slope

2j: Straight line, measuring point setting function block 2k: Center position calculation function block

2 m: Height correction function block 2n: Approximate function function block

2p: 3D function block 2q: Slope function block

20A, 20a: Data storage block S: Sample

The first invention of the present application is an electron probe micro analyzer which performs elemental analysis of a sample surface by characteristic X-rays emitted from a sample by irradiation of electron beams, and forms an isoline of Z-axis coordinate values at measured coordinate values within the analysis range. And an arithmetic function for finding the area of the Z axis correction value divided by the isoline, and performing position control in the Z axis direction so that the sample surface satisfies the analysis condition height based on the Z axis correction value.

The first invention uses the region of the Z-axis correction value divided by the isoline of the Z-axis coordinate value to perform position control in the Z-axis direction of the specimen. A Z-axis correction value is determined for each area divided by an isoline of the Z-axis coordinate value, and position control in the Z-axis direction is performed using the Z-axis correction value determined within the area with respect to the analysis point existing in the area.

The isolines of the Z-axis coordinate values are obtained by measuring the Z-axis coordinate values for the X and Y coordinate values within the analysis range and using the measured coordinate values to bundle the same Z-axis coordinate values in the Z-axis direction. The Z-axis coordinate value of the area formed in the range divided by the isoline of the Z-axis coordinate value is within a predetermined width range. In the analysis of the analysis point in this area, the position set in the Z-axis direction of the sample is controlled using the value set in the area as the Z-axis correction value.

The first aspect of the Z-axis correction value is set to one value for the area partitioned by the isoline, and the second aspect is set to the Z-axis correction function value that changes continuously in accordance with the moving directions of the X and Y coordinate axes. In line analysis and mapping analysis, position control can be performed in either of the first Z axis correction value or the second Z axis correction function value.

According to the first invention, since the Z-axis correction value for adjusting the height satisfying the analysis conditions of the sample surface is provided over the entire analysis range, control divergence can be prevented. In addition, the acquisition point and the acquisition point of the Z-axis coordinate value can be selected according to the shape of the sample surface, such as increasing or decreasing the acquisition point of the Z-axis coordinate value in accordance with the density of the undulation of the sample surface. High precision position control can be performed.

According to a second aspect of the present application, an electron probe microanalyzer performing elemental analysis of a sample surface by characteristic X-rays emitted from a sample by irradiation of an electron beam, the linear height correction value passing through the center position of the height distribution of the sample. And a three-dimensional correction value obtained by using the height correction value as the center position of the height distribution, and the surface of the sample increases the analysis condition height based on the Z-axis correction value obtained from the three-dimensional correction value. It is set as the structure which performs position control of the Z-axis direction of a sample so that it may be satisfied.

The second invention is to analyze a sample having a geometrical feature whose height changes with distance from a point where the height distribution of the sample is measured, and the three-dimensional Z-axis correction which uses the center position of the height distribution as the rotational center. Use a value. The three-dimensional Z-axis correction value can be obtained by obtaining a linear height correction value through the center position of the height distribution of the sample, and rotating the height correction value by rotating the center position of the height distribution as the rotation center. The Z coordinate values corresponding to the X and Y coordinate values of the analysis point are corrected using a three-dimensional Z axis correction value and position control in the Z axis direction is performed.

Since the sample has a shape that changes in height depending on the distance from one point of the height distribution, the height correction value is obtained from a straight line through the center position of the height distribution of the sample, thereby obtaining the Z-axis correction value over the entire surface of the analysis range. You can get it. The three-dimensional Z-axis correction value over the entire surface of the analysis range can be obtained by rotating the height correction value by rotating the center position of the height distribution as the rotation center. To analyze the analysis point within the analysis range using the three-dimensional correction value, the Z-axis correction value corresponding to the analysis point X and Y coordinate values is obtained from the three-dimensional correction value, and the obtained Z-axis correction value Position control in the Z-axis direction is performed.

The height correction value on a straight line passing through the center position of the height distribution of the sample may be determined in steps at predetermined intervals in the height direction, or may be determined in a continuous value.

The three-dimensional correction value has a cylindrical shape in which the height direction is the Z-axis correction value when the stepwise height correction value is used, and the height direction in the radial direction is used when the continuous height correction value is used. It becomes a cylindrical body which changes. To calculate the Z-axis correction value from the three-dimensional correction value, in the case of point analysis, the Z coordinate value corresponding to the X and Y coordinate values of the analysis point is calculated within the three-dimensional correction value, and the Z coordinate value is Z. In the case of line analysis or mapping analysis, the corresponding Z coordinate value is obtained according to the moving direction of the X and Y coordinate axes within the three-dimensional correction value, and the Z axis coordinate value is converted into the Z axis correction value. do.

In addition, it is also possible to use one or a plurality of straight lines for calculating the height correction value. When a plurality of straight lines are used, the three-dimensional correction value can be divided in the circumferential direction and set in the vicinity of the straight line.

In the second invention, the three-dimensional correction value is inclined in accordance with the inclination of the analysis range, and the Z-axis correction value can be obtained using the inclined three-dimensional correction value to perform position control in the Z-axis direction of the sample. The slope of the analysis range can be obtained from the height on the sample surface within the analysis range.

According to the second aspect of the present invention, since the Z-axis correction value for adjusting the height that satisfies the analysis condition of the sample surface is obtained over the entire analysis range, control divergence can be prevented. Moreover, since the Z-axis correction value over the whole analysis range can be calculated | required by measuring the height in a straight line through the center position of the height distribution of a sample, high precision position control can be performed with the acquisition frequency with few coordinate values.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described in detail, referring drawings.

1 is a schematic block diagram of a configuration example of an electronic probe micro analyzer of the present invention. The electron beam 12 generated from the filament 11 in the electron probe microanalyzer 1 shown in FIG. 1 is disposed on the sample stage 17 through the condenser lens 13 and the objective lens 14. The X-rays emitted from the sample S are analyzed with an X-ray spectrometer including a spectroscopic element 15 for spectroscopic wavelength analysis and a detector 16 for detecting spectroscopic characteristic X-rays.

The sample stage 17 is movable in the X, Y, and Z axis directions by the driver 4 receiving the control pulse from the stage controller 3. The stage controller 3 performs positioning in the X- and Y-axis directions and height adjustment in the Z-axis directions by a control command from the computer 2. Observation of the sample S captures an image reflected by the reflector 18 with an imaging device 5 such as a CCD camera and displays it on the monitor 7 through the autofocus controller 6. The autofocus controller 6 returns the data in the Z-axis direction to the stage controller 3 to feedback-control the sample stage 17 to acquire the height data of the sample S while focusing the image. Normally, the focus position on the sample S of the imaging device 5 by the autofocus controller 6 and the analysis position satisfying the condensing conditions on the sample S by the X-ray spectrometer are set to coincide with each other. By focusing the optical image with the focus controller 6, the condensing conditions of the X-ray spectrometer can be met. In the conventional electron probe microanalyzer, the optical image is observed at each analysis point, and the position of the sample stage 17 is aligned in the Z-axis direction so as to focus.

In the invention of the present application, the function of the computer 2 is used to align the Z-axis direction of the sample stage 17 without observing an optical image for each analysis point. Hereinafter, the first embodiment will be described with reference to FIGS. 2 to 5, and the second embodiment will be described with reference to FIGS. 6 to 10.

First, the first embodiment will be described. 2 is a functional block diagram for explaining the functions of the first embodiment, FIG. 3 is a flowchart for explaining the functions and operations of the first embodiment, and FIGS. 4 and 5 are for explaining the functions of the first embodiment. It is a figure which shows a Z-axis coordinate value and an isoline, and a Z-axis correction value.

In the first embodiment, an isometric line of Z-axis coordinate values is formed from measured coordinate values within the analysis range, and the area of the Z-axis correction value divided by the isolines is obtained, and the sample surface satisfies the analysis condition height based on the Z-axis correction value. Position control of the specimen in the Z-axis direction is performed.

Each block shown in dashed line in FIG. 2 represents a functional block included in the computer 2, a data storage block 20A for storing each data, an arithmetic function block 2G for obtaining an isoline, and a Z-axis correction function. Is provided with an arithmetic function block 2E.

The data storage block 20A includes an analysis range (2A), an X, Y, Z coordinate value (2B), an equivalence diagram (2F), a Z axis correction value (2C), a Z axis correction function value (2D), and the like. Store each data of the. The analysis range 2A is a range in which analysis is performed on the sample S, and is set by input means (not shown) while observing the optical image displayed on the monitor 7 and the like. The X, Y and Z coordinate values 2B are coordinate values of the sample surface within the analysis range. The X and Y coordinate values are input from the stage controller 3 to the current position of the sample stage 17. The height information of the sample surface obtained by the height detecting means such as the focus controller 6 is received.

The isoline operation (2G) is obtained by concatenating the same Z-axis coordinate values using coordinate data of X, Y, Z coordinate values within the analysis range. The spacing of the isolines can be set arbitrarily. The isotropic line obtained by the isoline operation (2G) is stored in the isotropic line diagram 2F. The equivalence line diagram can be confirmed by the monitor 7, and the acquisition of X, Y, Z coordinate values and the isoline operation can be repeated as necessary. The isometric diagram shows the unevenness of the surface of the sample and the deviation in the Z-axis direction from the reference position of the sample stage.

The Z-axis correction value and Z-axis correction function (2E) are operations for calculating the height adjustment amount required for the sample plane to satisfy the analysis conditions. The obtained Z-axis correction value and the Z-axis correction function are the Z-axis correction values ( 2C) or Z-axis correction function value 2D, sent to the stage controller 3 at the time of analysis, and height control is performed to adjust the focus position of the X-ray spectrometer.

In addition, the height detection means which forms the unevenness | corrugation of the sample S shown in the structural example shown is an example formed by the autofocus controller 6, and is calculated | required by the optical focusing obtained by the feedback system shown with the dotted line in a figure. Can be.

Next, the operation of the first embodiment will be described using the flowchart of FIG. 3 and FIGS. 4 and 5. The optical image, the SEM image, and the like of the sample S are observed by the monitor 7 to set the analysis range and stored in the analysis range 2A (step S1). In order to find the surface shape of the sample S, the X and Y coordinates are set by the sample stage 17 within the analysis range, and the Z coordinate values are obtained by the autofocus controller 6 to obtain the X, Y, Z coordinate values. Remember at (2B). 4 (a) shows an analysis range and coordinate values obtained within the analysis range, and numerical values represent Z coordinate values. The measuring point which calculates | requires a coordinate value can be arbitrarily selected, for example, the part with sharp shape change can be measured closely, and the part with moderate shape change can be measured roughly (step S2).

The isoline operation 2G obtains the isoline using the measured X, Y, and Z coordinate values and displays the same on the monitor 7. 4B is an example of an isotropic diagram. Although the figure shows the equivalence line which made the space | interval in Z direction the equal interval of 1, the space | interval of equivalence lines can be made arbitrarily and can also be made into the inequal space. The calculated equivalent line is stored in the equivalent line diagram 2F (step S3). The obtained equivalent diagram can be observed with a monitor, and if necessary, steps S2 and S3 can be repeated to increase the accuracy of the equivalent diagram (step S4).

The Z-axis correction value is set in the area divided by the isoline. FIG. 5A shows an example of setting the Z-axis correction value, and sets a value of "1" to "8" in each region as the Z-axis correction value. The Z-axis correction value may be set to one value in each area. In line analysis or mapping analysis, the Z-axis correction value may be a continuous Z-axis correction function depending on the analysis direction (step S5).

In the case of performing point analysis (step S6), X and Y coordinate values of an analysis point are determined within an analysis range. The corresponding Z-axis correction value is obtained from the Z-axis correction value 2C with respect to the X and Y coordinate values of the determined analysis point. For example, if a point A (xa, ya) is determined as an analysis point in FIG. 5A, 3 can be obtained as a corresponding Z-axis correction value (step S7a). The Z-axis correction value is sent to the pulse motor driver through the stage controller 3 to control the height of the Z-axis of the sample stage 17. Thereby, height adjustment at an analysis point can be performed (step S8a).

In the case of performing line analysis and mapping analysis (step S6), the analysis line or analysis range is determined within the analysis range. The corresponding Z-axis correction value is obtained from the Z-axis correction value 2C with respect to the X and Y coordinate values of the determined analysis line and the analysis range. For example, if a measurement line in the x-axis direction whose y coordinate value is y0 is determined as the analysis line in Fig. 5A, Fig. 5B or Fig. 5 is shown in the isoline diagram of Fig. 5A. The Z-axis correction value and Z-axis correction function shown in (c) of (c) can be obtained (step S7b). The Z-axis correction value determined by the Z-axis correction value or the Z-axis correction function is sent to the pulse motor driver through the stage controller 3 to control the height of the Z-axis of the sample stage 17. Thereby, height adjustment at an analysis point can be performed (step S8b).

Next, a second embodiment will be described. 6 is a functional block diagram for explaining the functions of the second embodiment, FIG. 7 is a flowchart for explaining the functions and operations of the second embodiment, and FIGS. 8 to 10 are for explaining the functions of the second embodiment. It is a figure which shows the three-dimensional correction value.

The second embodiment analyzes a sample having a geometrical feature whose height varies in accordance with a distance from a point having a height distribution of the sample, and a three-dimensional Z axis whose center of rotation is the center position of the height distribution. Use the correction value. The three-dimensional Z-axis correction value is obtained by obtaining a linear height correction value through the height distribution of the sample through the center position, and rotating the height correction value by rotating the center position of the height distribution as the rotation center. The Z coordinate value corresponding to the X and Y coordinate values of the analysis point is corrected using a three-dimensional Z axis correction value to perform position control in the Z axis direction.

In Fig. 6, each block indicated by a dashed line indicates a functional block included in the computer 2, a data storage block 20a for storing each data, a functional block 2j for setting a straight line and a measurement point, and a center position. A function block (2k) for calculating a value, an arithmetic function block (2m) for performing a height correction operation, a function block (2n) for an approximation function for obtaining an approximation function of a height correction value, and a function for obtaining a three-dimensional function from an approximation function A block 2p, a function block 2q for obtaining the inclination of the sample plane and the three-dimensional function, and a calculation function block 2e for obtaining the Z-axis correction value and the Z-axis correction function are provided.

The data storage block 20a includes an analysis range 2a, a center position 2f, an X, Y, and Z coordinate value 2b, a Z axis coordinate value 2g of a height correction value, a 3D function 2h, a slope (2i), Z-axis correction value 2c, Z-axis correction function value 2d, and the like are stored.

The analysis range 2a is a range which analyzes on the sample S, and is set by the input means which is not shown, observing the optical image etc. which are displayed on the monitor 7. As shown in FIG. The X, Y and Z coordinate values 2b are coordinate values of the sample surface within the analysis range, and the X and Y coordinate values are input to the current position of the sample stage 17 by the stage controller 3, and the Z axis coordinate values are The height information of the sample surface obtained by height detection means, such as the autofocus controller 6, is input.

The sample to be analyzed has the characteristic that the height changes according to the distance from one point of the height distribution, and the center position calculation block 2k calculates the center position by using the X, Y, and Z coordinate values and the center. It stores in the position 2f.

The straight line and the measuring point setting block 2j define a straight line in the radial direction at the center position, and set the measuring point on the straight line. The calculation block 2m of the height correction value obtains the Z-axis coordinate value of the height correction from the Z-axis coordinate value at the measurement point and stores it in the Z-axis coordinate value 2g of the height correction. The approximation block 2n obtains an approximation function of the height correction in the radial direction by using the Z-axis coordinate value of the height correction. The three-dimensional function is obtained and stored in the block three-dimensional function (2h). Incidentally, the inclination calculation block 2q obtains the inclination of the sample surface and stores the inclination coefficient obtained in the inclination 2i.

The Z-axis correction value and the Z-axis correction function (2e) are adjusted to the height required for the sample surface to satisfy the analysis conditions using the data of the 3D function (2h) or the 3D function (2h) and the slope (2i). Find the quantity. The obtained Z-axis correction value and Z-axis correction function are stored in the Z-axis correction value (2c) or the Z-axis correction function value (2d), and are sent to the stage controller (3) at the time of analysis to control the height of the X-ray analyzer. Set the focus position.

Next, the operation of the second embodiment will be described using the flowchart of FIG. 7 and FIGS. 8 to 10. The optical image, the SEM image, and the like of the sample S are observed by the monitor 7, the analysis range is set, and stored in the analysis range 2a. The rectangle enclosed by the dotted line in FIG. 8 has shown an example of the analysis range (step S11).

Since the sample S has a geometrical feature in which the height changes with the distance from one point with the height distribution, the shape of the entire sample is obtained by measuring only the change in height in the radial direction from the center of the shape of the sample surface. . The coordinate values of the specimen surface are obtained by the stage controller and the autofocus controller, the center position is calculated by the center position calculation 2k, and stored in the storage block center position 2f (step S12).

Further, a straight line (one dashed line in FIG. 8) in the radial direction through the obtained center position is set (step S13), and the coordinate value is acquired on the straight line. Acquisition of coordinate values can be performed by setting the X and Y coordinates by the sample stage 17 and obtaining the Z coordinate values by the autofocus controller 6, and the X, Y and Z coordinate values 2b are obtained. Remember The measuring point which calculated | required the coordinate value can be arbitrarily made on a straight line, for example, the part with sharp shape change can be measured seamlessly, and the part with moderate shape change can be measured roughly (step S14).

The Z-axis coordinate value of the height correction value is obtained from the obtained coordinate values (step S15), and an approximation function of the height correction in the radial direction of the specimen is also obtained. 8 shows an example of an approximation function of height correction (step S16). The three-dimensional function is obtained by rotating the approximation function of the height correction with the center position as the center of rotation. This three-dimensional function shows the surface shape of a sample, and can correct | amend Z-axis direction using this coordinate value. Fig. 8 shows a three-dimensional function with a part cut out (step S17).

Although the three-dimensional function calculated | required in step S17 assumes that there is no inclination of the sample S, in practice, the sample S may be inclined with respect to the sample stage. Steps S18 and S19 find a Z axis correction value in consideration of the inclination of the sample in such a case. Here, after obtaining the coordinate values for various points on the analysis range of the sample S (step S18), the inclination coefficient of the three-dimensional function is obtained so that the three-dimensional function passes as close as possible to the obtained coordinate value. By correcting the Z-axis using this inclination coefficient and the three-dimensional function, height correction considering the inclination of the sample surface can be performed. FIG. 9 shows the relationship between the inclination of the specimen surface and the three-dimensional function, and as shown in FIG. 10, the inclination of the analysis range indicated by the diagonal line in FIG. 9 is inclined by θx in the X-axis direction and Y-axis direction. Incline by? Y (step S19).

After that, in step S20 to step S22, the height direction is corrected and analyzed in the same manner as the steps S6 to S8. The processing in steps S20 to S22 may also be performed using only the three-dimensional function obtained in step S17, or the three-dimensional function obtained in step S17 and the inclination coefficient obtained in step S19. Hereinafter, the case where the three-dimensional function and the gradient coefficient are used will be described.

In the case of performing point analysis (step S20), X and Y coordinate values of an analysis point are determined within an analysis range. A corresponding Z-axis correction value is obtained from the three-dimensional function and the gradient coefficient with respect to the determined X and Y coordinate values of the analysis point (step S21a). The Z-axis correction value is sent to the pulse motor driver through the stage controller 3 to control the height of the Z-axis of the sample stage 17. Thereby, height adjustment at an analysis point can be performed (step S22a).

In the case of performing line analysis and mapping analysis (step S20), the analysis line or analysis range is determined within the analysis range. The Z-axis correction function corresponding to the three-dimensional function and the inclination coefficient is obtained for the X and Y coordinate values of the determined analysis line and analysis range (step S21b). The Z-axis correction value determined by this Z-axis correction function is sent to the pulse motor driver through the stage controller 3 to control the height of the Z-axis of the sample stage 17. Thereby, height adjustment at an analysis point can be performed (step S22b).

In the above example, the three-dimensional function is obtained by using one approximation function. However, depending on the shape characteristic of the circumferential direction of the sample surface, a plurality of approximation functions are drawn by drawing a plurality of straight lines radially from the center position. To obtain a plurality of three-dimensional functions by rotating the approximation function by a predetermined angle in the circumferential direction, and arranging the plurality of three-dimensional functions in the circumferential direction, whereby Z-axis correction of the sample surface can be performed. .

As described above, according to the present invention, the electronic probe microanalyzer can perform high-precision analysis with a small number of acquisitions of coordinate values, and high precision in which no control is emitted even when the degree of change in the height direction is large. Can be analyzed.

Claims (2)

In an electronic probe microanalyzer, which performs elemental analysis of a sample surface by characteristic X-rays emitted from a sample by irradiation of an electron beam, a Z-axis divided by an isoline by forming an isoline of Z-axis coordinate values from measured coordinate values within the analysis range. And an arithmetic function for finding an area of a correction value, and performing position control in the Z-axis direction of the sample so that the sample surface satisfies the analysis condition height based on the Z-axis correction value. In an electron probe microanalyzer that performs elemental analysis of a sample surface by characteristic X-rays emitted from a sample by irradiation of an electron beam, the linear height correction value through the center position of the height distribution of the sample is obtained, and the height correction value is obtained. And a three-dimensional correction value for calculating the center position of the height distribution by using the center of rotation, and the sample surface satisfies the analysis condition height based on the Z-axis correction value obtained from the three-dimensional correction value. An electronic probe microanalyzer, wherein the position control in the Z-axis direction is performed.