CN1241950C - 聚合性组合物 - Google Patents

聚合性组合物 Download PDF

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Publication number
CN1241950C
CN1241950C CNB028006216A CN02800621A CN1241950C CN 1241950 C CN1241950 C CN 1241950C CN B028006216 A CNB028006216 A CN B028006216A CN 02800621 A CN02800621 A CN 02800621A CN 1241950 C CN1241950 C CN 1241950C
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CN
China
Prior art keywords
compound
parts
general formula
aryl
colorless
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB028006216A
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English (en)
Chinese (zh)
Other versions
CN1458938A (zh
Inventor
上杉隆彦
有岛真史
八木弹生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Artience Co Ltd
Original Assignee
Toyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co Ltd filed Critical Toyo Ink Mfg Co Ltd
Publication of CN1458938A publication Critical patent/CN1458938A/zh
Application granted granted Critical
Publication of CN1241950C publication Critical patent/CN1241950C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/22—Esters containing nitrogen
    • C08F222/225—Esters containing nitrogen the ester chains containing seven or more carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/24—Esters containing sulfur
    • C08F222/245—Esters containing sulfur the ester chains containing seven or more carbon atoms

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CNB028006216A 2001-03-12 2002-03-12 聚合性组合物 Expired - Fee Related CN1241950C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP67938/2001 2001-03-12
JP2001067938A JP4019645B2 (ja) 2001-03-12 2001-03-12 重合性組成物
JP67938/01 2001-03-12

Publications (2)

Publication Number Publication Date
CN1458938A CN1458938A (zh) 2003-11-26
CN1241950C true CN1241950C (zh) 2006-02-15

Family

ID=18926197

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB028006216A Expired - Fee Related CN1241950C (zh) 2001-03-12 2002-03-12 聚合性组合物

Country Status (6)

Country Link
US (1) US6900250B2 (cg-RX-API-DMAC7.html)
JP (1) JP4019645B2 (cg-RX-API-DMAC7.html)
KR (1) KR100865832B1 (cg-RX-API-DMAC7.html)
CN (1) CN1241950C (cg-RX-API-DMAC7.html)
TW (1) TWI304816B (cg-RX-API-DMAC7.html)
WO (1) WO2002072640A1 (cg-RX-API-DMAC7.html)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7510822B2 (en) * 2002-04-10 2009-03-31 Fujifilm Corporation Stimulation sensitive composition and compound
US20040063849A1 (en) * 2002-09-26 2004-04-01 Nippon Paint Co., Ltd. Photosolder resist composition
JP2004217551A (ja) * 2003-01-14 2004-08-05 Sanshin Chem Ind Co Ltd スルホニウム化合物
JP3873931B2 (ja) * 2003-05-30 2007-01-31 ソニーケミカル＆インフォメーションデバイス株式会社 吸液性シート及び非水電解液電池パック
AU2003286758A1 (en) 2003-07-17 2005-03-07 Honeywell International Inc Planarization films for advanced microelectronic applications and devices and methods of production thereof
JP4533639B2 (ja) * 2003-07-22 2010-09-01 富士フイルム株式会社 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法
US20090033834A1 (en) * 2005-02-18 2009-02-05 Takashi Kuroda Liquid crystal layer forming ink composition, and optical film, polarizing film and liquid crystal display produced with the ink composition
JP4533799B2 (ja) * 2005-05-31 2010-09-01 東洋インキ製造株式会社 感光性着色組成物およびカラーフィルタ
US7674571B2 (en) * 2006-01-21 2010-03-09 Gary Ganghui Teng Laser sensitive lithographic printing plate comprising specific acrylate monomer and initiator
US20090041991A1 (en) * 2006-02-24 2009-02-12 Teikoku Ink Mfg Co., Ltd. Method for Manufacturing Inks, and Inks, Printed Matter and Shaped Products Based on Method Thereof
KR101345280B1 (ko) * 2006-05-24 2013-12-26 엘지디스플레이 주식회사 패턴형성용 레진 조성물 및 이를 이용하는 인-플레인프린팅 공정방법
KR101341137B1 (ko) * 2007-07-30 2013-12-13 삼성디스플레이 주식회사 밀봉제 및 이를 이용한 표시 장치
JP5483808B2 (ja) * 2007-08-14 2014-05-07 チェイル インダストリーズ インコーポレイテッド 粘着剤組成物及び光学部材
JP5304977B2 (ja) * 2007-10-04 2013-10-02 セイコーエプソン株式会社 光硬化組成物を用いた硬化物の形成方法およびその硬化物
US9249237B2 (en) * 2008-02-15 2016-02-02 Catalyse Self-repairing composition, self-repairing materials, self-repairing methods and applications
JP2009210870A (ja) * 2008-03-05 2009-09-17 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物、カラーフィルタの製造方法、及びカラーフィルタ
JP5441504B2 (ja) * 2009-06-05 2014-03-12 日東電工株式会社 粘着シート
US20120165227A1 (en) * 2009-07-10 2012-06-28 The Governors Of The University Of Alberta Compounds and methods for detection and quantification of carboxylic acids
TW201233403A (en) * 2011-02-11 2012-08-16 Univ Nat Taiwan Dental composite material and applications thereof
JP6367834B2 (ja) * 2013-01-31 2018-08-01 日東電工株式会社 色覚異常を矯正するための光学素子
JP2014214129A (ja) * 2013-04-26 2014-11-17 サンアプロ株式会社 硬化性組成物及びそれを用いた硬化体

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1526923A (en) 1974-09-18 1978-10-04 Ici Ltd Photopolymerisable compositions
US5500453A (en) 1992-02-07 1996-03-19 Toyo Ink Manufacturing Co., Ltd. (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition
JP2803454B2 (ja) 1992-03-13 1998-09-24 東洋インキ製造株式会社 スルホニウム錯体またはオキソスルホニウム錯体
JP2929858B2 (ja) 1992-08-14 1999-08-03 東洋インキ製造株式会社 重合性組成物および重合方法
US5631307A (en) 1994-06-28 1997-05-20 Toyo Ink Manufacturing Co., Ltd. Photopolymerization initiator composition and photopolymerizable composition
US5998496A (en) * 1995-10-31 1999-12-07 Spectra Group Limited, Inc. Photosensitive intramolecular electron transfer compounds
TWI286664B (en) * 2000-06-23 2007-09-11 Sumitomo Chemical Co Chemical amplification type positive resist composition and sulfonium salt

Also Published As

Publication number Publication date
JP4019645B2 (ja) 2007-12-12
KR100865832B1 (ko) 2008-10-28
CN1458938A (zh) 2003-11-26
JP2002265512A (ja) 2002-09-18
KR20020091285A (ko) 2002-12-05
WO2002072640A1 (fr) 2002-09-19
US6900250B2 (en) 2005-05-31
US20030212162A1 (en) 2003-11-13
TWI304816B (cg-RX-API-DMAC7.html) 2009-01-01

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SE01 Entry into force of request for substantive examination
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Granted publication date: 20060215

Termination date: 20150312

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