CN121420639A - 半导体装置及半导体装置的制造方法 - Google Patents

半导体装置及半导体装置的制造方法

Info

Publication number
CN121420639A
CN121420639A CN202480042332.8A CN202480042332A CN121420639A CN 121420639 A CN121420639 A CN 121420639A CN 202480042332 A CN202480042332 A CN 202480042332A CN 121420639 A CN121420639 A CN 121420639A
Authority
CN
China
Prior art keywords
conductive layer
layer
insulating layer
conductive
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202480042332.8A
Other languages
English (en)
Chinese (zh)
Inventor
山崎舜平
中岛基
井坂史人
国武宽司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Publication of CN121420639A publication Critical patent/CN121420639A/zh
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B41/00Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/70Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates the floating gate being an electrode shared by two or more components
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B51/00Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory transistors
    • H10B51/20Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory transistors characterised by the three-dimensional [3D] arrangements, e.g. with cells on different height levels
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B53/00Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
    • H10B53/20Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors characterised by the three-dimensional [3D] arrangements, e.g. with cells on different height levels

Landscapes

  • Semiconductor Memories (AREA)
  • Thin Film Transistor (AREA)
  • Semiconductor Integrated Circuits (AREA)
CN202480042332.8A 2023-07-20 2024-07-12 半导体装置及半导体装置的制造方法 Pending CN121420639A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023118292 2023-07-20
JP2023-118292 2023-07-20
PCT/IB2024/056785 WO2025017440A1 (ja) 2023-07-20 2024-07-12 半導体装置、及び半導体装置の作製方法

Publications (1)

Publication Number Publication Date
CN121420639A true CN121420639A (zh) 2026-01-27

Family

ID=94281403

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202480042332.8A Pending CN121420639A (zh) 2023-07-20 2024-07-12 半导体装置及半导体装置的制造方法

Country Status (5)

Country Link
JP (1) JPWO2025017440A1 (https=)
KR (1) KR20260041049A (https=)
CN (1) CN121420639A (https=)
TW (1) TW202510689A (https=)
WO (1) WO2025017440A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9312257B2 (en) * 2012-02-29 2016-04-12 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP6100559B2 (ja) * 2012-03-05 2017-03-22 株式会社半導体エネルギー研究所 半導体記憶装置
US10074576B2 (en) * 2014-02-28 2018-09-11 Semiconductor Energy Laboratory Co., Ltd. Semiconductor memory device
KR102871324B1 (ko) * 2018-06-08 2025-10-15 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 반도체 장치의 제작 방법
CN114792735A (zh) * 2021-01-26 2022-07-26 华为技术有限公司 薄膜晶体管、存储器及制作方法、电子设备
JP2023044118A (ja) * 2021-09-17 2023-03-30 キオクシア株式会社 半導体記憶装置

Also Published As

Publication number Publication date
KR20260041049A (ko) 2026-03-26
JPWO2025017440A1 (https=) 2025-01-23
TW202510689A (zh) 2025-03-01
WO2025017440A1 (ja) 2025-01-23

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