CN121153104A - 膜形成用组合物、基板的制造方法及膜形成用组合物的制造方法 - Google Patents

膜形成用组合物、基板的制造方法及膜形成用组合物的制造方法

Info

Publication number
CN121153104A
CN121153104A CN202480033666.9A CN202480033666A CN121153104A CN 121153104 A CN121153104 A CN 121153104A CN 202480033666 A CN202480033666 A CN 202480033666A CN 121153104 A CN121153104 A CN 121153104A
Authority
CN
China
Prior art keywords
film
forming composition
general formula
atoms
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202480033666.9A
Other languages
English (en)
Chinese (zh)
Inventor
铁村美月
武久彩香
公文创一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Publication of CN121153104A publication Critical patent/CN121153104A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/20—Cleaning during device manufacture

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
CN202480033666.9A 2023-05-31 2024-05-29 膜形成用组合物、基板的制造方法及膜形成用组合物的制造方法 Pending CN121153104A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023090176 2023-05-31
JP2023-090176 2023-05-31
PCT/JP2024/019656 WO2024248021A1 (ja) 2023-05-31 2024-05-29 膜形成用組成物、基板の製造方法、および膜形成用組成物の製造方法

Publications (1)

Publication Number Publication Date
CN121153104A true CN121153104A (zh) 2025-12-16

Family

ID=93658061

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202480033666.9A Pending CN121153104A (zh) 2023-05-31 2024-05-29 膜形成用组合物、基板的制造方法及膜形成用组合物的制造方法

Country Status (5)

Country Link
JP (1) JPWO2024248021A1 (https=)
KR (1) KR20260015280A (https=)
CN (1) CN121153104A (https=)
TW (1) TW202503015A (https=)
WO (1) WO2024248021A1 (https=)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5663160B2 (ja) 2009-09-28 2015-02-04 東京応化工業株式会社 表面処理剤及び表面処理方法
SG185632A1 (en) 2010-06-07 2012-12-28 Central Glass Co Ltd Liquid chemical for foaming protecting film
KR102306472B1 (ko) * 2016-06-13 2021-09-29 후지필름 가부시키가이샤 액체 조성물이 수용된 수용 용기 및 액체 조성물의 보관 방법
US10593538B2 (en) * 2017-03-24 2020-03-17 Fujifilm Electronic Materials U.S.A., Inc. Surface treatment methods and compositions therefor
JP7277700B2 (ja) * 2018-01-15 2023-05-19 セントラル硝子株式会社 撥水性保護膜形成用薬液、及びウェハの表面処理方法
US20200035494A1 (en) * 2018-07-30 2020-01-30 Fujifilm Electronic Materials U.S.A., Inc. Surface Treatment Compositions and Methods
KR20230015958A (ko) * 2020-05-21 2023-01-31 샌트랄 글래스 컴퍼니 리미티드 반도체 기판의 표면 처리 방법, 및 표면처리제 조성물

Also Published As

Publication number Publication date
KR20260015280A (ko) 2026-02-02
WO2024248021A1 (ja) 2024-12-05
TW202503015A (zh) 2025-01-16
JPWO2024248021A1 (https=) 2024-12-05

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