JPWO2024248021A1 - - Google Patents
Info
- Publication number
- JPWO2024248021A1 JPWO2024248021A1 JP2025524123A JP2025524123A JPWO2024248021A1 JP WO2024248021 A1 JPWO2024248021 A1 JP WO2024248021A1 JP 2025524123 A JP2025524123 A JP 2025524123A JP 2025524123 A JP2025524123 A JP 2025524123A JP WO2024248021 A1 JPWO2024248021 A1 JP WO2024248021A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P70/00—Cleaning of wafers, substrates or parts of devices
- H10P70/20—Cleaning during device manufacture
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023090176 | 2023-05-31 | ||
| PCT/JP2024/019656 WO2024248021A1 (ja) | 2023-05-31 | 2024-05-29 | 膜形成用組成物、基板の製造方法、および膜形成用組成物の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024248021A1 true JPWO2024248021A1 (https=) | 2024-12-05 |
Family
ID=93658061
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025524123A Pending JPWO2024248021A1 (https=) | 2023-05-31 | 2024-05-29 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2024248021A1 (https=) |
| KR (1) | KR20260015280A (https=) |
| CN (1) | CN121153104A (https=) |
| TW (1) | TW202503015A (https=) |
| WO (1) | WO2024248021A1 (https=) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5663160B2 (ja) | 2009-09-28 | 2015-02-04 | 東京応化工業株式会社 | 表面処理剤及び表面処理方法 |
| SG185632A1 (en) | 2010-06-07 | 2012-12-28 | Central Glass Co Ltd | Liquid chemical for foaming protecting film |
| KR102306472B1 (ko) * | 2016-06-13 | 2021-09-29 | 후지필름 가부시키가이샤 | 액체 조성물이 수용된 수용 용기 및 액체 조성물의 보관 방법 |
| US10593538B2 (en) * | 2017-03-24 | 2020-03-17 | Fujifilm Electronic Materials U.S.A., Inc. | Surface treatment methods and compositions therefor |
| JP7277700B2 (ja) * | 2018-01-15 | 2023-05-19 | セントラル硝子株式会社 | 撥水性保護膜形成用薬液、及びウェハの表面処理方法 |
| US20200035494A1 (en) * | 2018-07-30 | 2020-01-30 | Fujifilm Electronic Materials U.S.A., Inc. | Surface Treatment Compositions and Methods |
| KR20230015958A (ko) * | 2020-05-21 | 2023-01-31 | 샌트랄 글래스 컴퍼니 리미티드 | 반도체 기판의 표면 처리 방법, 및 표면처리제 조성물 |
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2024
- 2024-05-29 JP JP2025524123A patent/JPWO2024248021A1/ja active Pending
- 2024-05-29 CN CN202480033666.9A patent/CN121153104A/zh active Pending
- 2024-05-29 WO PCT/JP2024/019656 patent/WO2024248021A1/ja not_active Ceased
- 2024-05-29 KR KR1020257043124A patent/KR20260015280A/ko active Pending
- 2024-05-31 TW TW113120280A patent/TW202503015A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20260015280A (ko) | 2026-02-02 |
| WO2024248021A1 (ja) | 2024-12-05 |
| TW202503015A (zh) | 2025-01-16 |
| CN121153104A (zh) | 2025-12-16 |