CN121002448A - 印刷配线基板用曝光装置、曝光方法、印刷配线基板的制造方法 - Google Patents

印刷配线基板用曝光装置、曝光方法、印刷配线基板的制造方法

Info

Publication number
CN121002448A
CN121002448A CN202380097259.XA CN202380097259A CN121002448A CN 121002448 A CN121002448 A CN 121002448A CN 202380097259 A CN202380097259 A CN 202380097259A CN 121002448 A CN121002448 A CN 121002448A
Authority
CN
China
Prior art keywords
substrate
mask
exposure
laser beam
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380097259.XA
Other languages
English (en)
Chinese (zh)
Inventor
大谷义和
山冈裕
仓田昌实
宇佐美健人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Engineering Co Ltd
Original Assignee
Shin Etsu Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Engineering Co Ltd filed Critical Shin Etsu Engineering Co Ltd
Publication of CN121002448A publication Critical patent/CN121002448A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Sustainable Development (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
CN202380097259.XA 2023-04-19 2023-04-19 印刷配线基板用曝光装置、曝光方法、印刷配线基板的制造方法 Pending CN121002448A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/015608 WO2024218897A1 (ja) 2023-04-19 2023-04-19 プリント配線基板用露光装置、露光方法及びプリント配線基板の製造方法

Publications (1)

Publication Number Publication Date
CN121002448A true CN121002448A (zh) 2025-11-21

Family

ID=93152108

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380097259.XA Pending CN121002448A (zh) 2023-04-19 2023-04-19 印刷配线基板用曝光装置、曝光方法、印刷配线基板的制造方法

Country Status (6)

Country Link
JP (1) JPWO2024218897A1 (https=)
KR (1) KR20260002933A (https=)
CN (1) CN121002448A (https=)
DE (1) DE112023006228T5 (https=)
TW (1) TW202445282A (https=)
WO (1) WO2024218897A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3591922B2 (ja) * 1995-07-17 2004-11-24 キヤノン株式会社 光量測定装置
JP3726270B2 (ja) * 1996-05-23 2005-12-14 株式会社ニコン 露光装置及び方法
JP3605722B2 (ja) * 1999-09-28 2004-12-22 住友重機械工業株式会社 レーザ穴あけ加工方法及び加工装置
JP2007158225A (ja) * 2005-12-08 2007-06-21 Canon Inc 露光装置
US20080073596A1 (en) * 2006-08-24 2008-03-27 Asml Netherlands B.V. Lithographic apparatus and method
JP2017132120A (ja) 2016-01-27 2017-08-03 株式会社沖データ 露光装置、画像形成装置及び露光装置製造方法

Also Published As

Publication number Publication date
TW202445282A (zh) 2024-11-16
DE112023006228T5 (de) 2026-02-26
JPWO2024218897A1 (https=) 2024-10-24
KR20260002933A (ko) 2026-01-06
WO2024218897A1 (ja) 2024-10-24

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