JPWO2024218897A1 - - Google Patents
Info
- Publication number
- JPWO2024218897A1 JPWO2024218897A1 JP2025514956A JP2025514956A JPWO2024218897A1 JP WO2024218897 A1 JPWO2024218897 A1 JP WO2024218897A1 JP 2025514956 A JP2025514956 A JP 2025514956A JP 2025514956 A JP2025514956 A JP 2025514956A JP WO2024218897 A1 JPWO2024218897 A1 JP WO2024218897A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Sustainable Development (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2023/015608 WO2024218897A1 (ja) | 2023-04-19 | 2023-04-19 | プリント配線基板用露光装置、露光方法及びプリント配線基板の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024218897A1 true JPWO2024218897A1 (https=) | 2024-10-24 |
| JPWO2024218897A5 JPWO2024218897A5 (https=) | 2026-01-21 |
Family
ID=93152108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025514956A Pending JPWO2024218897A1 (https=) | 2023-04-19 | 2023-04-19 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPWO2024218897A1 (https=) |
| KR (1) | KR20260002933A (https=) |
| CN (1) | CN121002448A (https=) |
| DE (1) | DE112023006228T5 (https=) |
| TW (1) | TW202445282A (https=) |
| WO (1) | WO2024218897A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3591922B2 (ja) * | 1995-07-17 | 2004-11-24 | キヤノン株式会社 | 光量測定装置 |
| JP3726270B2 (ja) * | 1996-05-23 | 2005-12-14 | 株式会社ニコン | 露光装置及び方法 |
| JP3605722B2 (ja) * | 1999-09-28 | 2004-12-22 | 住友重機械工業株式会社 | レーザ穴あけ加工方法及び加工装置 |
| JP2007158225A (ja) * | 2005-12-08 | 2007-06-21 | Canon Inc | 露光装置 |
| US20080073596A1 (en) * | 2006-08-24 | 2008-03-27 | Asml Netherlands B.V. | Lithographic apparatus and method |
| JP2017132120A (ja) | 2016-01-27 | 2017-08-03 | 株式会社沖データ | 露光装置、画像形成装置及び露光装置製造方法 |
-
2023
- 2023-04-19 WO PCT/JP2023/015608 patent/WO2024218897A1/ja not_active Ceased
- 2023-04-19 JP JP2025514956A patent/JPWO2024218897A1/ja active Pending
- 2023-04-19 CN CN202380097259.XA patent/CN121002448A/zh active Pending
- 2023-04-19 KR KR1020257038302A patent/KR20260002933A/ko active Pending
- 2023-04-19 DE DE112023006228.5T patent/DE112023006228T5/de active Pending
-
2024
- 2024-04-16 TW TW113114084A patent/TW202445282A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN121002448A (zh) | 2025-11-21 |
| TW202445282A (zh) | 2024-11-16 |
| DE112023006228T5 (de) | 2026-02-26 |
| KR20260002933A (ko) | 2026-01-06 |
| WO2024218897A1 (ja) | 2024-10-24 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20251014 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20251014 |