CN1185615C - 氧化铟锡膜用浸蚀液 - Google Patents

氧化铟锡膜用浸蚀液 Download PDF

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Publication number
CN1185615C
CN1185615C CNB011354283A CN01135428A CN1185615C CN 1185615 C CN1185615 C CN 1185615C CN B011354283 A CNB011354283 A CN B011354283A CN 01135428 A CN01135428 A CN 01135428A CN 1185615 C CN1185615 C CN 1185615C
Authority
CN
China
Prior art keywords
acid
ito
indium oxide
ito film
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB011354283A
Other languages
English (en)
Chinese (zh)
Other versions
CN1348165A (zh
Inventor
山边纯成
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of CN1348165A publication Critical patent/CN1348165A/zh
Application granted granted Critical
Publication of CN1185615C publication Critical patent/CN1185615C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/91—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics involving the removal of part of the materials of the treated articles, e.g. etching
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
    • C04B41/5338—Etching
    • C04B41/5353—Wet etching, e.g. with etchants dissolved in organic solvents
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
    • C04B2111/00844—Uses not provided for elsewhere in C04B2111/00 for electronic applications
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
  • Liquid Crystal (AREA)
  • Manufacturing Of Electric Cables (AREA)
CNB011354283A 2000-10-12 2001-10-12 氧化铟锡膜用浸蚀液 Expired - Fee Related CN1185615C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP312080/2000 2000-10-12
JP2000312080A JP3445570B2 (ja) 2000-10-12 2000-10-12 酸化インジウム錫膜用エッチング液およびエッチング方法

Publications (2)

Publication Number Publication Date
CN1348165A CN1348165A (zh) 2002-05-08
CN1185615C true CN1185615C (zh) 2005-01-19

Family

ID=18791739

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB011354283A Expired - Fee Related CN1185615C (zh) 2000-10-12 2001-10-12 氧化铟锡膜用浸蚀液

Country Status (4)

Country Link
JP (1) JP3445570B2 (ko)
KR (1) KR20020029308A (ko)
CN (1) CN1185615C (ko)
TW (1) TWI249568B (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100448868B1 (ko) * 2002-07-10 2004-09-18 동우 화인켐 주식회사 비결정질 ｉｔｏ 식각액 조성물
KR20040005457A (ko) * 2002-07-10 2004-01-16 동우 화인켐 주식회사 개선된 ｉｔｏ 또는 비결정질 ｉｔｏ 식각액 조성물
EP1707763A4 (en) 2003-12-12 2010-06-23 Honda Motor Co Ltd CAMSHAFT, METHOD FOR MAKING A CAM FOR A CAMSHAFT AND METHOD FOR PRODUCING THE CAMSHAFT WAVE
JP4534591B2 (ja) * 2004-05-17 2010-09-01 日本錬水株式会社 高純度シュウ酸水溶液の回収方法
JP2011166006A (ja) * 2010-02-12 2011-08-25 Sumitomo Precision Prod Co Ltd エッチング方法
CN102585832A (zh) * 2011-12-30 2012-07-18 江阴江化微电子材料股份有限公司 一种低张力ito蚀刻液及其制备方法

Also Published As

Publication number Publication date
CN1348165A (zh) 2002-05-08
KR20020029308A (ko) 2002-04-18
JP2002124506A (ja) 2002-04-26
JP3445570B2 (ja) 2003-09-08
TWI249568B (en) 2006-02-21

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SE01 Entry into force of request for substantive examination
C06 Publication
PB01 Publication
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20050119

Termination date: 20151012

EXPY Termination of patent right or utility model