CN117813352A - 组合物、膜、滤光器、光学传感器、图像显示装置及结构体 - Google Patents

组合物、膜、滤光器、光学传感器、图像显示装置及结构体 Download PDF

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Publication number
CN117813352A
CN117813352A CN202280053840.7A CN202280053840A CN117813352A CN 117813352 A CN117813352 A CN 117813352A CN 202280053840 A CN202280053840 A CN 202280053840A CN 117813352 A CN117813352 A CN 117813352A
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China
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Pending
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CN202280053840.7A
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English (en)
Chinese (zh)
Inventor
泷下大贵
田口贵规
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Fujifilm Corp
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Fujifilm Corp
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Publication of CN117813352A publication Critical patent/CN117813352A/zh
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/549—Silicon-containing compounds containing silicon in a ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Toxicology (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN202280053840.7A 2021-08-19 2022-08-15 组合物、膜、滤光器、光学传感器、图像显示装置及结构体 Pending CN117813352A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021133931 2021-08-19
JP2021-133931 2021-08-19
PCT/JP2022/030853 WO2023022122A1 (ja) 2021-08-19 2022-08-15 組成物、膜、光学フィルタ、光学センサ、画像表示装置および構造体

Publications (1)

Publication Number Publication Date
CN117813352A true CN117813352A (zh) 2024-04-02

Family

ID=85240812

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280053840.7A Pending CN117813352A (zh) 2021-08-19 2022-08-15 组合物、膜、滤光器、光学传感器、图像显示装置及结构体

Country Status (5)

Country Link
US (1) US20240228746A1 (https=)
JP (1) JPWO2023022122A1 (https=)
KR (1) KR102948778B1 (https=)
CN (1) CN117813352A (https=)
WO (1) WO2023022122A1 (https=)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004203788A (ja) 2002-12-25 2004-07-22 Kose Corp 固形状油中水型乳化化粧料
JP2005082796A (ja) 2003-09-11 2005-03-31 Hakuto Co Ltd オルガノポリシロキサン化合物含有化粧料
JP4707656B2 (ja) 2004-03-29 2011-06-22 Ｈｏｙａ株式会社 反射防止膜を有する光学部材
JP4654233B2 (ja) 2007-11-21 2011-03-16 Ｈｏｙａ株式会社 反射防止膜を有する光学部材
JP2010195694A (ja) * 2009-02-24 2010-09-09 Miyoshi Kasei Inc 粉体分散物とこの粉体分散物を含有する化粧料
JP2014034488A (ja) 2012-08-08 2014-02-24 Canon Inc 中空粒子の分散液の製造方法、反射防止膜の製造方法及び光学素子の製造方法
EP3088465B1 (en) 2013-12-26 2019-02-13 Daicel Corporation Curable composition for lens, and lens and optical device
JP7352334B2 (ja) 2017-09-19 2023-09-28 三洋化成工業株式会社 活性エネルギー線硬化性組成物
JP7396019B2 (ja) 2019-02-15 2023-12-12 Ａｇｃ株式会社 硬化性組成物、硬化物及び積層体
JP7376347B2 (ja) * 2019-12-25 2023-11-08 東京応化工業株式会社 樹脂組成物、硬化物、及びシロキサン変性（メタ）アクリル樹脂

Also Published As

Publication number Publication date
US20240228746A1 (en) 2024-07-11
WO2023022122A1 (ja) 2023-02-23
KR102948778B1 (ko) 2026-04-06
JPWO2023022122A1 (https=) 2023-02-23
TW202313849A (zh) 2023-04-01
KR20240025652A (ko) 2024-02-27

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