KR102948778B1 - 조성물, 막, 광학 필터, 광학 센서, 화상 표시 장치 및 구조체 - Google Patents

조성물, 막, 광학 필터, 광학 센서, 화상 표시 장치 및 구조체

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Publication number
KR102948778B1
KR102948778B1 KR1020247002775A KR20247002775A KR102948778B1 KR 102948778 B1 KR102948778 B1 KR 102948778B1 KR 1020247002775 A KR1020247002775 A KR 1020247002775A KR 20247002775 A KR20247002775 A KR 20247002775A KR 102948778 B1 KR102948778 B1 KR 102948778B1
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South Korea
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mass
composition
less
compound
silica particles
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English (en)
Korean (ko)
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KR20240025652A (ko
Inventor
히로타카 타키시타
요시노리 타구치
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후지필름 가부시키가이샤
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/549—Silicon-containing compounds containing silicon in a ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Toxicology (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020247002775A 2021-08-19 2022-08-15 조성물, 막, 광학 필터, 광학 센서, 화상 표시 장치 및 구조체 Active KR102948778B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021133931 2021-08-19
JPJP-P-2021-133931 2021-08-19
PCT/JP2022/030853 WO2023022122A1 (ja) 2021-08-19 2022-08-15 組成物、膜、光学フィルタ、光学センサ、画像表示装置および構造体

Publications (2)

Publication Number Publication Date
KR20240025652A KR20240025652A (ko) 2024-02-27
KR102948778B1 true KR102948778B1 (ko) 2026-04-06

Family

ID=85240812

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247002775A Active KR102948778B1 (ko) 2021-08-19 2022-08-15 조성물, 막, 광학 필터, 광학 센서, 화상 표시 장치 및 구조체

Country Status (5)

Country Link
US (1) US20240228746A1 (https=)
JP (1) JPWO2023022122A1 (https=)
KR (1) KR102948778B1 (https=)
CN (1) CN117813352A (https=)
WO (1) WO2023022122A1 (https=)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004203788A (ja) 2002-12-25 2004-07-22 Kose Corp 固形状油中水型乳化化粧料
JP2005082796A (ja) 2003-09-11 2005-03-31 Hakuto Co Ltd オルガノポリシロキサン化合物含有化粧料
WO2005093465A1 (ja) 2004-03-29 2005-10-06 Hoya Corporation 反射防止膜を有する光学部材
JP2008139870A (ja) 2007-11-21 2008-06-19 Hoya Corp 反射防止膜を有する光学部材
JP2010195694A (ja) 2009-02-24 2010-09-09 Miyoshi Kasei Inc 粉体分散物とこの粉体分散物を含有する化粧料
JP2014034488A (ja) 2012-08-08 2014-02-24 Canon Inc 中空粒子の分散液の製造方法、反射防止膜の製造方法及び光学素子の製造方法
JP2018049280A (ja) 2013-12-26 2018-03-29 株式会社ダイセル レンズの製造方法
JP2019056106A (ja) 2017-09-19 2019-04-11 三洋化成工業株式会社 活性エネルギー線硬化性組成物
JP2020132857A (ja) 2019-02-15 2020-08-31 Ａｇｃ株式会社 硬化性組成物、硬化物及び積層体

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7376347B2 (ja) * 2019-12-25 2023-11-08 東京応化工業株式会社 樹脂組成物、硬化物、及びシロキサン変性（メタ）アクリル樹脂

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004203788A (ja) 2002-12-25 2004-07-22 Kose Corp 固形状油中水型乳化化粧料
JP2005082796A (ja) 2003-09-11 2005-03-31 Hakuto Co Ltd オルガノポリシロキサン化合物含有化粧料
WO2005093465A1 (ja) 2004-03-29 2005-10-06 Hoya Corporation 反射防止膜を有する光学部材
JP2008139870A (ja) 2007-11-21 2008-06-19 Hoya Corp 反射防止膜を有する光学部材
JP2010195694A (ja) 2009-02-24 2010-09-09 Miyoshi Kasei Inc 粉体分散物とこの粉体分散物を含有する化粧料
JP2014034488A (ja) 2012-08-08 2014-02-24 Canon Inc 中空粒子の分散液の製造方法、反射防止膜の製造方法及び光学素子の製造方法
JP2018049280A (ja) 2013-12-26 2018-03-29 株式会社ダイセル レンズの製造方法
JP2019056106A (ja) 2017-09-19 2019-04-11 三洋化成工業株式会社 活性エネルギー線硬化性組成物
JP2020132857A (ja) 2019-02-15 2020-08-31 Ａｇｃ株式会社 硬化性組成物、硬化物及び積層体

Also Published As

Publication number Publication date
US20240228746A1 (en) 2024-07-11
CN117813352A (zh) 2024-04-02
WO2023022122A1 (ja) 2023-02-23
JPWO2023022122A1 (https=) 2023-02-23
TW202313849A (zh) 2023-04-01
KR20240025652A (ko) 2024-02-27

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