CN117242520A - 生产环形物体的方法、成膜装置、环形物体和硬盘驱动装置 - Google Patents

生产环形物体的方法、成膜装置、环形物体和硬盘驱动装置 Download PDF

Info

Publication number
CN117242520A
CN117242520A CN202280032027.1A CN202280032027A CN117242520A CN 117242520 A CN117242520 A CN 117242520A CN 202280032027 A CN202280032027 A CN 202280032027A CN 117242520 A CN117242520 A CN 117242520A
Authority
CN
China
Prior art keywords
annular
plate
film
glass substrate
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280032027.1A
Other languages
English (en)
Chinese (zh)
Inventor
三浦正文
桥本和明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of CN117242520A publication Critical patent/CN117242520A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B33/00—Constructional parts, details or accessories not provided for in the other groups of this subclass
    • G11B33/14—Reducing influence of physical parameters, e.g. temperature change, moisture, dust
    • G11B33/1406—Reducing the influence of the temperature
    • G11B33/1433—Reducing the influence of the temperature by reducing the effects of the thermal expansion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B05B12/18—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area using fluids, e.g. gas streams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/04—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2453—Coating containing SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2456—Coating containing TiO2
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B17/00—Guiding record carriers not specifically of filamentary or web form, or of supports therefor
    • G11B17/02—Details
    • G11B17/038—Centering or locking of a plurality of discs in a single cartridge
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/211—SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/216—ZnO
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C03C2217/241—Doped oxides with halides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/112—Deposition methods from solutions or suspensions by spraying
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/365—Coating different sides of a glass substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Surface Treatment Of Glass (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Nozzles (AREA)
  • Spray Control Apparatus (AREA)
CN202280032027.1A 2021-04-30 2022-05-02 生产环形物体的方法、成膜装置、环形物体和硬盘驱动装置 Pending CN117242520A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021077629 2021-04-30
JP2021-077629 2021-04-30
PCT/JP2022/019495 WO2022231013A1 (ja) 2021-04-30 2022-05-02 リング状物体の製造方法、成膜装置、リング状物体、及びハードディスクドライブ装置

Publications (1)

Publication Number Publication Date
CN117242520A true CN117242520A (zh) 2023-12-15

Family

ID=83846945

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280032027.1A Pending CN117242520A (zh) 2021-04-30 2022-05-02 生产环形物体的方法、成膜装置、环形物体和硬盘驱动装置

Country Status (4)

Country Link
US (1) US20240208859A1 (https=)
JP (2) JP7723079B2 (https=)
CN (1) CN117242520A (https=)
WO (1) WO2022231013A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115176310A (zh) * 2020-03-06 2022-10-11 豪雅株式会社 玻璃间隔件的制造方法、玻璃间隔件和硬盘驱动器装置
CN117563829B (zh) * 2023-11-30 2024-11-08 常州智汇新材科技股份有限公司 一种高防腐智能涂覆生产线及其工作方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0246582A (ja) * 1988-08-05 1990-02-15 Nec Corp ディスクスペーサ
JP2003308672A (ja) * 2002-04-09 2003-10-31 Asahi Glass Co Ltd 磁気ディスク用リング状スペーサの加工方法および磁気ディスク用リング状スペーサ
JP4209316B2 (ja) * 2003-12-12 2009-01-14 Ｈｏｙａ株式会社 情報記録媒体用ガラス基板の製造方法
JP2006332311A (ja) * 2005-05-26 2006-12-07 Daido Electronics Co Ltd ボンド磁石
JP2008305625A (ja) * 2007-06-06 2008-12-18 Hitachi Cable Ltd ガラススペーサの製造方法及びガラススペーサ
JP4947429B2 (ja) * 2007-12-11 2012-06-06 富士電機株式会社 情報記録媒体用基板、およびそれを用いた情報磁気記録媒体
JP2015026733A (ja) * 2013-07-26 2015-02-05 東レエンジニアリング株式会社 基板処理装置
PH12021552252A1 (en) * 2017-03-31 2022-05-02 Hoya Corp Non-magnetic substrate for magnetic disk, and magnetic disk

Also Published As

Publication number Publication date
WO2022231013A1 (ja) 2022-11-03
JP2025156465A (ja) 2025-10-14
JP7723079B2 (ja) 2025-08-13
US20240208859A1 (en) 2024-06-27
JPWO2022231013A1 (https=) 2022-11-03

Similar Documents

Publication Publication Date Title
JP2025156465A (ja) リング状物体の製造方法、成膜装置、ハードディスクドライブ用スペーサ、及びハードディスクドライブ装置
JP5356606B2 (ja) 磁気ディスク用ガラス基板の製造方法
US10468289B2 (en) Substrate holding member
US11682425B2 (en) Glass spacer, hard disk drive apparatus, and method for manufacturing glass spacer
US20110189505A1 (en) Method for manufacturing glass substrate for magnetic recording medium
CN103400588B (zh) 磁记录介质用玻璃基板的制造方法及磁记录介质用玻璃基板
JP5844610B2 (ja) 磁気ディスク用ガラス基板の製造方法
JP7726949B2 (ja) ガラススペーサの製造方法、ガラススペーサ、及びハードディスクドライブ装置
CN100379523C (zh) 一种用于改变媒体表面状态的系统及方法
JP4545714B2 (ja) 磁気記録媒体並びに磁気記録再生装置
US4698716A (en) Support for magnetic recording disk and its production process
CN105163908B (zh) 托盘、磁盘用基板的制造方法以及磁盘的制造方法
JP2007317820A (ja) 静電吸着装置
JP2005071543A (ja) 磁気記録媒体の製造方法
JP2012113801A (ja) 磁気ディスク用ガラス基板の製造方法
JP2003308672A (ja) 磁気ディスク用リング状スペーサの加工方法および磁気ディスク用リング状スペーサ
US20090117411A1 (en) Magnetic disk substrate and magnetic disk thereof
JPS62124619A (ja) 薄膜磁気ヘツド
TH137861A (th) วิธีการขัดผิว, อุปกรณ์การขัดผิว, ซับสเตรตแก้วสำหรับสื่อบันทึกทางแม่เหล็ก และสื่อบันทึกทางแม่เหล็ก
TH50711B (th) วิธีการขัดผิว, อุปกรณ์การขัดผิว, ซับสเตรตแก้วสำหรับสื่อบันทึกทางแม่เหล็ก และสื่อบันทึกทางแม่เหล็ก
CN104603876A (zh) 信息记录介质用玻璃基板的制造方法
WO2013100157A1 (ja) 磁気ディスク用ガラス基板の製造方法
JPH07254146A (ja) 磁気ディスク、その製造方法及び磁気ディスク装置

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination