CN117198935A - 具有气体分布及单独泵送的批量固化腔室 - Google Patents

具有气体分布及单独泵送的批量固化腔室 Download PDF

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Publication number
CN117198935A
CN117198935A CN202311176344.3A CN202311176344A CN117198935A CN 117198935 A CN117198935 A CN 117198935A CN 202311176344 A CN202311176344 A CN 202311176344A CN 117198935 A CN117198935 A CN 117198935A
Authority
CN
China
Prior art keywords
exhaust
processing chamber
batch processing
showerhead
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202311176344.3A
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English (en)
Chinese (zh)
Inventor
A·可罕
S·文卡特拉曼
J·D·平森三世
J-G·杨
N·K·英格尔
梁奇伟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of CN117198935A publication Critical patent/CN117198935A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • H10P14/6342—
    • H10P72/0441—
    • H10P72/0462—
    • H10P72/3302—
    • H10P72/3411—
    • H10P72/7612—
    • H10P72/7624—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Formation Of Insulating Films (AREA)
  • Polyurethanes Or Polyureas (AREA)
CN202311176344.3A 2014-05-14 2015-04-21 具有气体分布及单独泵送的批量固化腔室 Pending CN117198935A (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201461996817P 2014-05-14 2014-05-14
US61/996,817 2014-05-14
US14/577,828 US10113236B2 (en) 2014-05-14 2014-12-19 Batch curing chamber with gas distribution and individual pumping
US14/577,828 2014-12-19
PCT/US2015/026937 WO2015175175A1 (en) 2014-05-14 2015-04-21 Batch curing chamber with gas distribution and individual pumping
CN201580025098.9A CN106463362B (zh) 2014-05-14 2015-04-21 具有气体分布及单独泵送的批量固化腔室

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN201580025098.9A Division CN106463362B (zh) 2014-05-14 2015-04-21 具有气体分布及单独泵送的批量固化腔室

Publications (1)

Publication Number Publication Date
CN117198935A true CN117198935A (zh) 2023-12-08

Family

ID=54480423

Family Applications (3)

Application Number Title Priority Date Filing Date
CN202311176344.3A Pending CN117198935A (zh) 2014-05-14 2015-04-21 具有气体分布及单独泵送的批量固化腔室
CN201580025098.9A Active CN106463362B (zh) 2014-05-14 2015-04-21 具有气体分布及单独泵送的批量固化腔室
CN201911127078.9A Active CN110828346B (zh) 2014-05-14 2015-04-21 具有气体分布及单独泵送的批量固化腔室

Family Applications After (2)

Application Number Title Priority Date Filing Date
CN201580025098.9A Active CN106463362B (zh) 2014-05-14 2015-04-21 具有气体分布及单独泵送的批量固化腔室
CN201911127078.9A Active CN110828346B (zh) 2014-05-14 2015-04-21 具有气体分布及单独泵送的批量固化腔室

Country Status (5)

Country Link
US (3) US10113236B2 (enExample)
JP (2) JP6592012B2 (enExample)
KR (3) KR102588544B1 (enExample)
CN (3) CN117198935A (enExample)
WO (1) WO2015175175A1 (enExample)

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Also Published As

Publication number Publication date
JP2017522718A (ja) 2017-08-10
US10113236B2 (en) 2018-10-30
KR102588544B1 (ko) 2023-10-11
KR20220104184A (ko) 2022-07-26
US20220341042A1 (en) 2022-10-27
KR102407734B1 (ko) 2022-06-10
KR20170007411A (ko) 2017-01-18
WO2015175175A1 (en) 2015-11-19
US12203171B2 (en) 2025-01-21
JP6592012B2 (ja) 2019-10-16
US20190048470A1 (en) 2019-02-14
KR20230025035A (ko) 2023-02-21
JP2020036015A (ja) 2020-03-05
KR102500194B1 (ko) 2023-02-14
CN110828346A (zh) 2020-02-21
CN110828346B (zh) 2023-10-03
JP6928043B2 (ja) 2021-09-01
US11408075B2 (en) 2022-08-09
US20150329970A1 (en) 2015-11-19
CN106463362A (zh) 2017-02-22
CN106463362B (zh) 2019-11-26

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