CN116837332A - Magnetron sputtering method for surface of neodymium-iron-boron magnet - Google Patents
Magnetron sputtering method for surface of neodymium-iron-boron magnet Download PDFInfo
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- CN116837332A CN116837332A CN202310511652.0A CN202310511652A CN116837332A CN 116837332 A CN116837332 A CN 116837332A CN 202310511652 A CN202310511652 A CN 202310511652A CN 116837332 A CN116837332 A CN 116837332A
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- target
- magnetic
- driven
- target seat
- conduction plate
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- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims abstract description 16
- 229910001172 neodymium magnet Inorganic materials 0.000 title claims abstract description 16
- 230000033001 locomotion Effects 0.000 claims abstract description 25
- 150000002500 ions Chemical class 0.000 claims abstract description 11
- 239000007788 liquid Substances 0.000 claims description 18
- 239000000110 cooling liquid Substances 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 4
- 230000000694 effects Effects 0.000 claims description 4
- 230000017525 heat dissipation Effects 0.000 claims description 4
- 238000000151 deposition Methods 0.000 abstract description 4
- 230000008021 deposition Effects 0.000 abstract description 4
- 239000013077 target material Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 230000032683 aging Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a magnetron sputtering method for the surface of a neodymium iron boron magnet.A lower part of a quick return motion assembly driven by a motor is fixedly arranged on a base, and an output end of the upper part of the quick return motion assembly is connected to a cross beam; two groups of driving components are symmetrically arranged on the upper surface of the base, and the driving components are used for driving the magnetic conduction plate to reciprocate; when the motor drives the quick return movement assembly to operate, the target seat is driven by the cross beam to drive the target to move up and down, and the upward movement is high-speed, so that the target collides with incident ions at a high speed; when the target seat moves up and down, the magnetic part is driven to move up and down, and meanwhile, the driving part drives the magnetic conduction plate to move back and forth, so that the part with larger magnetic field intensity moves back and forth to cover the whole target, and the bombardment is uniform. The invention can make the sputtered atoms have higher initial kinetic energy, and is convenient for the atoms close to the back of the target to be sputtered, thereby being more efficiently combined with the surface of the target workpiece and improving the deposition efficiency.
Description
Technical Field
The invention relates to the technical field of magnetron sputtering, in particular to a magnetron sputtering method for the surface of a neodymium iron boron magnet.
Background
The high coercivity NdFeB magnet is often obtained by magnetron sputtering coating and then high-temperature aging permeation. Magnetron sputtering is one of physical vapor deposition, and under the condition of proper ion energy, incident ions collide with atoms on the surface of a target material to sputter the atoms, and the sputtered atoms have certain kinetic energy and fly along a certain direction, are shot to a substrate and are deposited on the substrate, so that the growth of a film is realized.
The targets in the prior art are mainly fixedly arranged, the surfaces of the targets are impacted continuously during sputtering, the atomic layers of the targets close to the back surfaces of the targets are combined more firmly under the action of impact force, the targets are not easy to sputter out, the initial kinetic energy is small, and therefore the targets are not easy to combine with target materials, and the sputtering deposition efficiency is low.
Disclosure of Invention
The invention aims to provide a magnetron sputtering method for the surface of a neodymium iron boron magnet, wherein a target seat is driven by a cross beam to drive a target material to move up and down, and the upward movement is high-speed, so that the target material collides with incident ions at a high speed, sputtered atoms have higher initial kinetic energy, and atoms close to the back surface of the target material are sputtered conveniently, so that the atoms can be combined with the surface of a target workpiece more efficiently, and the deposition efficiency is improved; when the target seat moves up and down, the magnetic part is driven to move up and down, and meanwhile, the driving part drives the magnetic conduction plate to move back and forth, so that the part with larger magnetic field intensity moves back and forth to cover the whole target, and the bombardment is uniform.
In order to achieve the above purpose, the present invention provides the following technical solutions:
the magnetron sputtering method for the surface of the NdFeB magnet is characterized by comprising the following steps of: the target is embedded in the target seat, a magnetic component is arranged at the bottom of the target, and the magnetic component comprises a magnetic conduction plate; the beam is horizontally and fixedly arranged on the bottom surface of the target seat, the lower part of the emergency back movement assembly driven by the motor is fixedly arranged on the base, and the output end of the upper part of the emergency back movement assembly is connected to the beam; two groups of driving components are symmetrically arranged on the upper surface of the base, and the driving components are used for driving the magnetic conduction plate to reciprocate;
when the motor drives the quick return movement assembly to operate, the target seat is driven by the cross beam to drive the target to move up and down, and the upward movement is high-speed, so that the target collides with incident ions at a high speed;
when the target seat moves up and down, the magnetic part is driven to move up and down, and meanwhile, the driving part drives the magnetic conduction plate to move back and forth, so that the part with larger magnetic field intensity moves back and forth to cover the whole target, and the bombardment is uniform.
The beneficial effects of the invention are as follows: the invention utilizes the quick return movement assembly to enable the target to move upwards at a high speed, so that the target collides with the incident ions at a high speed, and compared with a mode of static arrangement of the target, the target collides with the incident ions at a high speed, so that sputtered atoms have higher initial kinetic energy, and atoms close to the back surface of the target are convenient to sputter out, thereby being capable of being combined with the surface of a target workpiece more efficiently and improving the deposition efficiency; and meanwhile, the magnetic component is driven to move back and forth by the driving component matched with the movement of the target seat, so that the part with larger magnetic field strength moves back and forth to cover the whole target material, the bombardment is uniform, the full utilization of the target material is realized, and the waste can be effectively avoided.
Preferably, a diversion cavity is formed in the target seat, the diversion cavity is annular, a heat conducting plate is fixedly installed on one side, close to the target material, of the diversion cavity in a sealing mode, heat generated by bombardment of the target material is conducted in time through the heat conducting plate, overhigh temperature is prevented, two liquid inlet pipes and two liquid outlet pipes are vertically and fixedly installed in the base, the two liquid inlet pipes and the two liquid outlet pipes are respectively communicated with the insides of four telescopic cylinders, diversion pipes are fixedly installed in movable ends of the four telescopic cylinders, and the tops of the four diversion pipes are communicated with the insides of the diversion cavity.
Preferably, when the target seat moves up and down, four telescopic cylinders are driven to repeatedly stretch, so that the internal volume of the telescopic cylinders changes, when the target seat moves up, a first one-way valve in a liquid inlet pipe is conducted, the internal volume of the telescopic cylinders is increased, cooling liquid is sucked through the liquid inlet pipe, meanwhile, the volume of the telescopic cylinders connected with a liquid outlet pipe is also increased, and the cooling liquid after absorbing heat in a diversion cavity is led into the telescopic cylinders;
when the target seat moves downwards, the first one-way valve is cut off, the volume of the telescopic cylinder is reduced, the pressure is increased, the cooling liquid sucked before in the telescopic cylinder connected with the liquid inlet pipe is pressed into the flow guide cavity, the timely replacement of the cooling liquid is realized, the cooling liquid in the flow guide cavity can be replaced timely in this way, the heat conduction plate is subjected to efficient heat dissipation, and the high efficiency of the cooling effect is ensured. The cooling liquid in the flow guide cavity circularly flows and is replaced through the up-and-down movement of the target seat, so that the heat conduction plate is subjected to efficient heat dissipation, and the high efficiency of the cooling effect is ensured.
Drawings
FIG. 1 is a schematic diagram of a front perspective view of a device used in a magnetron sputtering method for a surface of a neodymium-iron-boron magnet;
FIG. 2 is a schematic diagram of a perspective exploded structure of a device used in a magnetron sputtering method for a surface of a NdFeB magnet according to the present invention;
FIG. 3 is a schematic diagram of a rear view partial cross-section structure of a device used in the magnetron sputtering method for the surface of a NdFeB magnet according to the present invention;
fig. 4 is a schematic diagram of an internal top view structure of a device used in a magnetron sputtering method for a surface of a neodymium iron boron magnet according to the present invention;
fig. 5 is a schematic diagram of a distribution structure of a magnetic field in a device used in a magnetron sputtering method for a surface of a neodymium iron boron magnet according to the present invention;
fig. 6 is an enlarged view of the structure at a in fig. 1.
In the figure: 1. a target holder; 2. a target material; 3. a screw; 4. tabletting; 5. a telescopic cylinder; 6. a cross beam; 7. a base; 8. a chute; 9. a supporting frame; 10. a brace rod; 11. a motor; 12. a rocker; 13. swing rod; 14. a pull rod; 15. a column; 16. a sliding port; 17. a rod; 18. a magnetic conductive plate; 19. a first magnetic block; 20. a second magnetic block; 21. a clamping groove; 22. a slide block; 23. a screw; 24. a gear; 25. a rack; 26. a limit groove; 27. a diversion cavity; 28. a heat conductive plate; 29. a liquid inlet pipe; 30. a liquid outlet pipe; 31. a flow guiding pipe; 32. a first one-way valve; 33. and a second one-way valve.
Detailed Description
The following description of the present invention will be made more fully hereinafter with reference to the accompanying drawings, in which it is evident that only some, but not all embodiments of the invention are shown. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
A magnetron sputtering method for the surface of a neodymium-iron-boron magnet comprises the following steps: the target comprises a target seat 1 and a target 2, wherein the target 2 is embedded in the target seat 1, a magnetic component is arranged at the bottom of the target 1, and the magnetic component comprises a magnetic conduction plate 18; the beam 6 is horizontally and fixedly arranged on the bottom surface of the target seat 1, the lower part of the emergency back movement assembly driven by the motor 11 is fixedly arranged on the base 7, and the output end of the upper part of the emergency back movement assembly is connected to the beam 6; two groups of driving components are symmetrically arranged on the upper surface of the base 7, and the driving components are used for driving the magnetic conduction plate 18 to reciprocate;
when the motor drives the quick return movement assembly to operate, the target seat is driven by the transverse 6 beam to drive the target material 2 to move up and down, and the upward movement is high-speed, so that the target material 2 collides with incident ions at a high speed;
when the target holder 1 moves up and down, the magnetic component is driven to move up and down, and meanwhile, the driving component drives the magnetic conduction plate 18 to move back and forth, so that the part with larger magnetic field intensity moves back and forth to cover the whole target, and the bombardment is uniform.
The inside water conservancy diversion chamber 27 of seting up of target holder 1, water conservancy diversion chamber 27 is annular, and be close to the heat-conducting plate 28 of fixed mounting of one side of target 2, heat-conducting plate 28 is in time conducted the heat that the target 2 produced because of the bombardment, prevent that the temperature is too high, two feed liquor pipes 29 and two drain pipes 30 are installed perpendicularly in the base 7, two feed liquor pipes 29 and two drain pipes 30 switch on with four telescopic cylinder 5 inside respectively, the inside honeycomb duct 31 of all fixed mounting in four telescopic cylinder 5 active end, four honeycomb duct 31 top all switch on with water conservancy diversion chamber 27 inside, the conduction direction of two feed liquor pipes 29 internally fixed mounting has first check valve 32, the conduction direction of first check valve 32 is from feed liquor pipe 29 to telescopic cylinder 5 in, all fixed mounting has second check valve 33 in the four honeycomb duct 31, two second check valves 33 switch on the direction that are relative with feed liquor pipe 29 are from telescopic cylinder 5 to water conservancy diversion chamber 27, two second check valve 33 switch on the direction that are relative with drain pipe 30 are from telescopic cylinder 27 to telescopic cylinder 5.
When the target seat 1 moves up and down, four telescopic cylinders 5 can be driven to repeatedly stretch out and draw back, so that the internal volume of the telescopic cylinders 5 changes, when the target seat 1 moves up, the first one-way valve 32 in the liquid inlet pipe 29 is communicated, the internal volume of the telescopic cylinders 5 is increased, cooling liquid is sucked through the liquid inlet pipe 29, meanwhile, the volume of the telescopic cylinders 5 connected with the liquid outlet pipe 30 is also increased, the cooling liquid after absorbing heat in the flow guide cavity 27 is led into the telescopic cylinders 5, when the target seat 1 moves down, the first one-way valve 32 is cut off, the volume of the telescopic cylinders 5 is reduced, the pressure is increased, the cooling liquid sucked before in the telescopic cylinders 5 connected with the liquid inlet pipe 29 is pressed into the flow guide cavity 27, so that the timely replacement of the cooling liquid is realized, the cooling liquid in the flow guide cavity 27 can be timely replaced in such a way, the heat dissipation plate 28 is efficient, and the high efficiency of the cooling effect is ensured.
In this embodiment, as shown in fig. 1-6, a base 7 is disposed at the bottom side of the target seat 1, a plurality of telescopic cylinders 5 are vertically installed between the upper surface of the base 7 and the bottom surface of the target seat 1 at intervals, a cross beam 6 is horizontally and fixedly installed at the bottom surface of the target seat 1, the lower part of the quick return movement assembly is fixedly installed on the base 7, and the output end at the upper part of the quick return movement assembly is connected to the cross beam 6, and the target seat 1 is driven by the cross beam 6 to drive the target 2 to realize high-speed upward movement.
The quick return motion assembly comprises a supporting frame 9, a supporting rod 10, a motor 11, a rocker 12, a swinging rod 13, a pull rod 14 and a stand column 15, wherein the supporting frame 9 is vertically and fixedly installed on the base 7, the supporting rod 10 is horizontally and fixedly installed on the side surface of the supporting frame 9, the motor 11 is fixedly installed in the supporting frame 9, the tail end of the swinging rod 13 is rotatably sleeved on the supporting rod 10, a sliding opening 16 is horizontally formed in the middle of the swinging rod, the rocker 12 is fixedly sleeved on an output shaft of the motor 11, one end far away from the motor 11 is slidably installed in the sliding opening 16 through an inserting rod 17, the stand column 15 is vertically and fixedly installed in the middle of the bottom surface of the cross beam 6, the pull rod 14 is horizontally and fixedly installed on the side surface of the stand column 15, a sliding groove 8 is horizontally formed in the front end of the swinging rod 13, the pull rod 14 is slidably embedded in the sliding groove 8, when the motor 11 rotates, the swinging rod 12 is driven to rotate in a whole circle, the swinging rod 13 is driven to swing up and down under the support of the supporting rod 10 through the inserting rod 17, the quick return motion is generated in the swinging process, and the swinging rod 13 is driven to move upwards through the stand column 15 through the pull rod 14.
The magnetic component comprises a magnetic conduction plate 18, two first magnetic blocks 19 and second magnetic blocks 20 with opposite magnetic poles to the first magnetic blocks 19, wherein the second magnetic blocks 20 are fixedly arranged in the middle of the magnetic conduction plate 18, and the two first magnetic blocks 19 are fixedly arranged on two sides of the magnetic conduction plate 18 and symmetrically arranged relative to the second magnetic blocks 20.
The top ends of the two first magnetic blocks 19 are N poles, the top ends of the second magnetic blocks 20 are S poles, clamping grooves 21 are horizontally formed in the two inner side walls of the bottom of the target seat 1, and the two ends of the magnetic conduction plate 18 are respectively and slidably embedded in the two clamping grooves 21. Two groups of driving components are symmetrically arranged on the upper surface of the base 7, and the driving components are used for driving the magnetic conduction plate 18 to reciprocate.
The driving part comprises a sliding block 22, a screw rod 23, a gear 24 and a rack 25, wherein a limiting groove 26 is formed in the middle of the side wall of the clamping groove 21, the sliding block 22 is positioned in the limiting groove 26 and fixedly connected with the side surface of the magnetic conduction plate 18, the screw rod 23 is rotatably sleeved in the target seat 1 and penetrates through the limiting groove 26, the screw rod 23 is in threaded sleeve joint with the sliding block 22, the rack 25 is vertically and fixedly arranged on the upper surface of the base 7, and the gear 24 is fixedly sleeved at the end part of the screw rod 23 and is in meshed connection with the rack 25.
The magnetic induction lines are sent out from the top ends of the two first magnetic blocks 19 and finally enter the top ends of the second magnetic blocks 20 to form a magnetic field, the magnetic field at the bottom is short-circuited by the magnetic conduction plate 18, the magnetic field intensity at the front upper part of the first magnetic blocks 19 and the second magnetic blocks 20 is larger, the positions corresponding to the targets 2 are bombarded with more incident ions, the magnetic field intensity at the upper part of the second magnetic blocks 20 is weaker, the positions corresponding to the targets 2 are bombarded with less incident ions, so that more sputtering is easily caused at two sides of the targets 2, less sputtering is caused at the middle part, and full utilization of the targets 2 cannot be realized.
When the target seat 1 moves up and down, the magnetic part is driven to move up and down, the gear 24 drives the screw 23 to rotate under the interference of the rack 25, the screw 23 drives the sliding block 22 to move, and the sliding block 22 drives the magnetic conduction plate 18 to move back and forth in the clamping groove 21, so that the part with larger magnetic field intensity moves back and forth to cover the whole target 2, the bombardment is uniform, and the full utilization of the target 2 is realized, and the waste is avoided.
Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (3)
1. The magnetron sputtering method for the surface of the NdFeB magnet is characterized by comprising the following steps of: the target is embedded in the target seat, a magnetic component is arranged at the bottom of the target, and the magnetic component comprises a magnetic conduction plate; the beam is horizontally and fixedly arranged on the bottom surface of the target seat, the lower part of the emergency back movement assembly driven by the motor is fixedly arranged on the base, and the output end of the upper part of the emergency back movement assembly is connected to the beam; two groups of driving components are symmetrically arranged on the upper surface of the base, and the driving components are used for driving the magnetic conduction plate to reciprocate;
when the motor drives the quick return movement assembly to operate, the target seat is driven by the cross beam to drive the target to move up and down, and the upward movement is high-speed, so that the target collides with incident ions at a high speed;
when the target seat moves up and down, the magnetic part is driven to move up and down, and meanwhile, the driving part drives the magnetic conduction plate to move back and forth, so that the part with larger magnetic field intensity moves back and forth to cover the whole target, and the bombardment is uniform.
2. The magnetron sputtering method for the surface of the neodymium-iron-boron magnet according to claim 1, wherein,
the inside water conservancy diversion chamber of having offered of target seat, the water conservancy diversion chamber is annular, and is close to the equal sealed fixed mounting in one side of target, and the heat-conducting plate is in time conducted the heat that the target produced owing to the bombardment, prevents that the temperature is too high, and perpendicular fixed mounting has two feed liquor pipes and two drain pipes in the base, and two feed liquor pipes and two drain pipes switch on with four telescopic cylinder insidely respectively, and four telescopic cylinder expansion end insidely all fixed mounting has the honeycomb duct, and four honeycomb duct tops all switch on with the water conservancy diversion intracavity portion.
3. The magnetron sputtering method for the surface of the neodymium-iron-boron magnet according to claim 2, wherein,
when the target seat moves up and down, four telescopic cylinders are driven to repeatedly stretch, so that the internal volume of the telescopic cylinders changes, when the target seat moves up, a first one-way valve in a liquid inlet pipe is conducted, the internal volume of the telescopic cylinders is increased, cooling liquid is sucked through the liquid inlet pipe, meanwhile, the volume of the telescopic cylinders connected with a liquid outlet pipe is also increased, and the cooling liquid after absorbing heat in a flow guide cavity is led into the telescopic cylinders;
when the target seat moves downwards, the first one-way valve is cut off, the volume of the telescopic cylinder is reduced, the pressure is increased, the cooling liquid sucked before in the telescopic cylinder connected with the liquid inlet pipe is pressed into the flow guide cavity, the timely replacement of the cooling liquid is realized, the cooling liquid in the flow guide cavity can be replaced timely in this way, the heat conduction plate is subjected to efficient heat dissipation, and the high efficiency of the cooling effect is ensured.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310511652.0A CN116837332B (en) | 2023-05-09 | 2023-05-09 | Magnetron sputtering method for surface of neodymium-iron-boron magnet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310511652.0A CN116837332B (en) | 2023-05-09 | 2023-05-09 | Magnetron sputtering method for surface of neodymium-iron-boron magnet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN116837332A true CN116837332A (en) | 2023-10-03 |
| CN116837332B CN116837332B (en) | 2023-11-17 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310511652.0A Active CN116837332B (en) | 2023-05-09 | 2023-05-09 | Magnetron sputtering method for surface of neodymium-iron-boron magnet |
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| CN210394504U (en) * | 2019-05-27 | 2020-04-24 | 东莞市汇成真空科技有限公司 | Target body telescopic mechanism in magnetron sputtering coating machine |
| CN212713730U (en) * | 2020-07-02 | 2021-03-16 | 苏州精美科光电材料有限公司 | Adjustable target material assembly |
| CN213447281U (en) * | 2020-07-02 | 2021-06-15 | 苏州精美科光电材料有限公司 | Novel magnetron sputtering target material component |
| CN113073301A (en) * | 2021-03-25 | 2021-07-06 | 斡兹真空科技(嘉兴)有限公司 | Adjustable unbalanced rectangular plane magnetron sputtering cathode |
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2023
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| JPH042773A (en) * | 1990-04-20 | 1992-01-07 | Mitsubishi Heavy Ind Ltd | High speed film forming sputtering apparatus |
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| CN116837332B (en) | 2023-11-17 |
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