CN116601339A - 镀Ag材、镀Ag材的制造方法、以及电子部件 - Google Patents

镀Ag材、镀Ag材的制造方法、以及电子部件 Download PDF

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Publication number
CN116601339A
CN116601339A CN202180085179.3A CN202180085179A CN116601339A CN 116601339 A CN116601339 A CN 116601339A CN 202180085179 A CN202180085179 A CN 202180085179A CN 116601339 A CN116601339 A CN 116601339A
Authority
CN
China
Prior art keywords
plating
layer
plated
plated material
porous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180085179.3A
Other languages
English (en)
Chinese (zh)
Inventor
佐藤阳介
平井悠太郎
荒井健太郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Metaltech Co Ltd
Original Assignee
Dowa Metaltech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Metaltech Co Ltd filed Critical Dowa Metaltech Co Ltd
Publication of CN116601339A publication Critical patent/CN116601339A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R43/00—Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors
    • H01R43/16—Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors for manufacturing contact members, e.g. by punching and by bending
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/46—Electroplating: Baths therefor from solutions of silver
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00—Contacts
    • H01H1/02—Contacts characterised by the material thereof
    • H01H1/021—Composite material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02—Contact members
    • H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroplating Methods And Accessories (AREA)
CN202180085179.3A 2020-12-23 2021-07-14 镀Ag材、镀Ag材的制造方法、以及电子部件 Pending CN116601339A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020214110A JP7644597B2 (ja) 2020-12-23 2020-12-23 Ａｇめっき材、Ａｇめっき材の製造方法、および、電気部品
JP2020-214110 2020-12-23
PCT/JP2021/026414 WO2022137613A1 (ja) 2020-12-23 2021-07-14 Ａｇめっき材、Ａｇめっき材の製造方法、および、電気部品

Publications (1)

Publication Number Publication Date
CN116601339A true CN116601339A (zh) 2023-08-15

Family

ID=82158896

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180085179.3A Pending CN116601339A (zh) 2020-12-23 2021-07-14 镀Ag材、镀Ag材的制造方法、以及电子部件

Country Status (6)

Country Link
US (1) US12497707B2 (https=)
EP (1) EP4269659A4 (https=)
JP (1) JP7644597B2 (https=)
CN (1) CN116601339A (https=)
MX (1) MX2023006862A (https=)
WO (1) WO2022137613A1 (https=)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1966779A (zh) * 2005-11-17 2007-05-23 中国科学院兰州化学物理研究所 镍－铜－银多层膜的制备方法
JP2012057212A (ja) * 2010-09-08 2012-03-22 Furukawa Electric Co Ltd:The 複合めっき材料、及びそのめっき材料を用いた電気・電子部品
CN102691033A (zh) * 2011-03-22 2012-09-26 鸿富锦精密工业（深圳）有限公司 抗菌镀膜件及其制备方法
JP2012252878A (ja) * 2011-06-02 2012-12-20 Panasonic Corp 接点、開閉器およびｍｅｍｓリレー
JP2013129902A (ja) * 2011-12-22 2013-07-04 Om Sangyo Kk めっき品及びその製造方法
CN104040035A (zh) * 2011-12-22 2014-09-10 Om产业股份有限公司 镀品及其制造方法
JP2017014589A (ja) * 2015-07-03 2017-01-19 Ｄｏｗａメタルテック株式会社 銀めっき材およびその製造方法
CN111455434A (zh) * 2019-01-22 2020-07-28 同和金属技术有限公司 复合镀覆制品及其制造方法
WO2020153396A1 (ja) * 2019-01-24 2020-07-30 三菱マテリアル株式会社 コネクタ用端子材及びコネクタ用端子

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015059260A (ja) 2013-09-20 2015-03-30 株式会社オートネットワーク技術研究所 コネクタ用電気接点材料及びその製造方法
JP6532322B2 (ja) 2015-07-03 2019-06-19 Ｄｏｗａメタルテック株式会社 銀めっき材およびその製造方法
JP2020187971A (ja) * 2019-05-16 2020-11-19 株式会社オートネットワーク技術研究所 コネクタ端子、端子付き電線、及び端子対
JP7625412B2 (ja) * 2020-12-10 2025-02-03 Ｄｏｗａメタルテック株式会社 Ａｇ被覆素材、Ａｇ被覆素材の製造方法及び端子部品
CN117996479A (zh) * 2022-10-31 2024-05-07 泰科电子(上海)有限公司 导电端子及其所应用的电连接器

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1966779A (zh) * 2005-11-17 2007-05-23 中国科学院兰州化学物理研究所 镍－铜－银多层膜的制备方法
JP2012057212A (ja) * 2010-09-08 2012-03-22 Furukawa Electric Co Ltd:The 複合めっき材料、及びそのめっき材料を用いた電気・電子部品
CN102691033A (zh) * 2011-03-22 2012-09-26 鸿富锦精密工业（深圳）有限公司 抗菌镀膜件及其制备方法
JP2012252878A (ja) * 2011-06-02 2012-12-20 Panasonic Corp 接点、開閉器およびｍｅｍｓリレー
JP2013129902A (ja) * 2011-12-22 2013-07-04 Om Sangyo Kk めっき品及びその製造方法
CN104040035A (zh) * 2011-12-22 2014-09-10 Om产业股份有限公司 镀品及其制造方法
JP2017014589A (ja) * 2015-07-03 2017-01-19 Ｄｏｗａメタルテック株式会社 銀めっき材およびその製造方法
CN111455434A (zh) * 2019-01-22 2020-07-28 同和金属技术有限公司 复合镀覆制品及其制造方法
WO2020153396A1 (ja) * 2019-01-24 2020-07-30 三菱マテリアル株式会社 コネクタ用端子材及びコネクタ用端子

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
YUNSONG NIU等: "Influence of microstructure on the wear mechanism of multilayered Ni coating deposited by ultrasound-assisted electrodeposition", SURFACE & COATINGS TECHNOLOGY, vol. 210, 18 August 2012 (2012-08-18), pages 21 - 27 *

Also Published As

Publication number Publication date
US20240026558A1 (en) 2024-01-25
MX2023006862A (es) 2023-06-22
WO2022137613A1 (ja) 2022-06-30
US12497707B2 (en) 2025-12-16
EP4269659A4 (en) 2024-10-09
JP7644597B2 (ja) 2025-03-12
EP4269659A1 (en) 2023-11-01
JP2022100002A (ja) 2022-07-05

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