CN116601330A - 涂覆有氧化钇的耐火金属部件 - Google Patents
涂覆有氧化钇的耐火金属部件 Download PDFInfo
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- CN116601330A CN116601330A CN202180081827.8A CN202180081827A CN116601330A CN 116601330 A CN116601330 A CN 116601330A CN 202180081827 A CN202180081827 A CN 202180081827A CN 116601330 A CN116601330 A CN 116601330A
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- 239000003870 refractory metal Substances 0.000 title claims abstract description 18
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 title description 3
- 238000004519 manufacturing process Methods 0.000 claims abstract description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 16
- 229910052750 molybdenum Inorganic materials 0.000 claims description 14
- 239000011733 molybdenum Substances 0.000 claims description 13
- 239000006082 mold release agent Substances 0.000 claims description 7
- 229910052721 tungsten Inorganic materials 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 5
- 239000002002 slurry Substances 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 229910052702 rhenium Inorganic materials 0.000 claims description 4
- 238000007581 slurry coating method Methods 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical group CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 239000010955 niobium Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 2
- 125000006850 spacer group Chemical group 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 28
- 239000011248 coating agent Substances 0.000 description 21
- 238000000576 coating method Methods 0.000 description 21
- 239000000725 suspension Substances 0.000 description 16
- 239000000463 material Substances 0.000 description 11
- 239000007921 spray Substances 0.000 description 10
- 238000000137 annealing Methods 0.000 description 9
- 239000007787 solid Substances 0.000 description 8
- 238000011068 loading method Methods 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 238000005245 sintering Methods 0.000 description 5
- 229910052582 BN Inorganic materials 0.000 description 4
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 238000012864 cross contamination Methods 0.000 description 4
- 230000001680 brushing effect Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000004901 spalling Methods 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- CAVCGVPGBKGDTG-UHFFFAOYSA-N alumanylidynemethyl(alumanylidynemethylalumanylidenemethylidene)alumane Chemical compound [Al]#C[Al]=C=[Al]C#[Al] CAVCGVPGBKGDTG-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 229910000963 austenitic stainless steel Inorganic materials 0.000 description 1
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 description 1
- LGLOITKZTDVGOE-UHFFFAOYSA-N boranylidynemolybdenum Chemical compound [Mo]#B LGLOITKZTDVGOE-UHFFFAOYSA-N 0.000 description 1
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910003470 tongbaite Inorganic materials 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C24/00—Coating starting from inorganic powder
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
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Abstract
本发明涉及一种由耐火金属组成的部件,其特征在于,该部件的表面至少部分地涂覆有Y2O3层。本发明还涉及该被涂覆部件的制造以及Y2O3在高温应用中作为脱模剂的用途。
Description
技术领域
本发明涉及一种包括耐火金属的部件,其特征在于,该部件的表面至少部分地涂覆有Y2O3层。本发明还涉及该被涂覆部件的制造以及Y2O3在高温应用中作为脱模剂的用途。
背景技术
在高温设备如烧结炉、热处理设备和石英熔化设备中,或者在照明设备和蒸发设备中,所使用的部件即使在反复暴露于温度和应力之后也必须是可拆卸的。在暴露于1000℃至1400℃范围内的高温之后,这种部件的可拆卸性存在特别的挑战,因为通常由金属制造的部件倾向于在其接触面处与配合接触面烧结,因此出现卡滞现象。如果接触面额外受到压力,例如在螺纹连接的情况下,则进一步促进接触面对的冶金结合。此后,接触面对在不造成损坏的情况下不再能够彼此分离,并且分离导致至少一个部件的损坏。
为了避免这个问题,现有技术采用不同的材料组合或使用辅助物和脱模剂,例如套筒或施加浆料的分离层。然而,这些方法在极端条件下迅速达到其极限。例如,一些辅助物和脱模剂由于其组分蒸发的风险而不能在真空中使用和/或由于分解而限制其操作温度。目前,Al2O3、ZrO2或氮化硼喷涂或粉末用于熔炉结构中的应用。然而,这些变体不适合温度超过1400℃的应用,特别地因为部件与辅助物和脱模剂之间的交叉污染是一个问题。
在生产粗晶粒的抗蠕变的钼装料板时,在1700℃至1900℃的温度下进行再结晶退火是必要的,从而使得片材在堆叠中部分地烧结,并因此在进行退火之后不再可分离。到目前为止,钨薄片已被用作分离辅助物。然而,缺点是钨薄片只能使用一次,因此显著地导致了装料板的高生产成本。
DE 102013213503涉及一种用于真空应用的螺纹连接,其包括具有外螺纹的螺钉和具有螺母内螺纹的部件,其中部件或螺钉或两者由奥氏体不锈钢制成,其中通过用不同于基材的涂层材料涂覆所述部件/螺钉来产生不同对的接触面,从而允许在没有对真空有害的润滑剂的情况下相互滑动。
在GB 201110939中,提供了一种适用于选择性地接合第二构件的第一构件,该第一构件包括涂层,并且第一构件的至少接合部分被该涂层涂覆,该涂层通过气相沉积形成,以在高达800℃的温度下提供热化学稳定层。该涂层可以包括钛、铬或铝的一种或多种氮化物、氧化物或碳化物。例如,该涂层可以包括氮化钛、氮化铬、氮化铝、氧化钛、氧化铬、氧化铝、碳化钛、碳化铬或碳化铝中的一种或多种。
在高温处理领域,使用1400℃至1900℃的超高温的需求不断增加。与此同时,对处理后产品的纯度提出了越来越严格的要求。
发明内容
因此,本发明的目的是提供一种被涂覆部件,其即使在1000℃至1400℃,特别是高达1900℃的温度范围内使用后也是可拆卸的,其中不会发生与其他部件或处理后产品的交叉污染。
该目的通过提供根据权利要求1所述的由耐火金属组成的部件来解决,该耐火金属的表面至少部分地涂覆有Y2O3层,该目的还通过其生产以及Y2O3在高温应用中作为脱模剂的用途来解决。本发明的有利实施例是从属权利要求的主题,其可以彼此自由地组合。
Y2O3层的使用使得部件能够在不同的环境中使用,例如氢气或真空中,而没有交叉污染或分解的风险。这些层的应用还分别确保部件的无损更换和无损打开。因此可以防止部件零件的烧结,并且因此可以确保它们保持可拆卸。对于Y2O3层,特别是1000℃至1400℃,特别是可以涵盖高达1900℃的温度应用范围,没有污染或卡滞的风险,并且可以实现部件/机器元件的可拆卸性。
根据本发明,如果彼此直接接触的部件的表面能够在不损坏该部件的情况下再次彼此分离,则连接是可拆卸的,并且如果为了再次将接触面彼此分离而必须至少部分地破坏部件,则连接不可拆卸。
根据本发明的被涂覆部件特别适用于高温应用,即温度在1000℃至2000℃范围内的应用、目前特别是1400℃至1900℃。
为了承受这些温度,本发明的部件由耐火金属组成。
在本发明的上下文中,耐火金属应理解为选自由钛、锆、铪、钒、铌、钽、铬、钼、钨和铼组成的群组的金属,以及上述金属的合金,在本文中也称为耐火金属合金。耐火金属合金是具有至少50at.%(原子百分比)的一种或多种上述金属的合金、优选地具有至少70at.%、进一步优选地具有至少90at.%、甚至更优选地具有至少95at.%。
应理解,选择上述定义的耐火金属的熔点,以使得该部件适合于使用中的目标温度。优选地,耐火金属的熔点大于1400℃、更优选地大于1800℃、并且更优选地大于2000℃。
在一个实施例中,除了不可避免的杂质之外,该部件还包括钼或钼合金。
在一个实施例中,进一步优选的是,除了钼之外,合金还包括高达30wt.%(重量百分比)的额外上述耐火金属元素。
在另一个实施例中,优选的是,除了钼之外,组合物还由以下重量百分比的元素组成:
0.5wt.%的Ti和0.08wt.%的Zr,以及0.01wt.%至0.04wt.%的C。1.2wt.%的Hf和0.01wt.%至0.04wt.%的C。0.3wt.%的La2O3。0.7wt.%的La2O3。0.47wt.%的Y2O3和0.08wt.%的Ce2O3。0.005wt.%至0.1wt.%的K和0.005wt.%至0.1wt.%的Si,以及0.01wt.%至0.2wt%的O。5wt.%Re或41wt.%Re。30wt.%W。此外,还包括与此处给定的比例相差高达10%的组合物。
给定的比例和数据指的是在每种情况下所指的元素(例如Mo、C或W),而不管它是以元素形式还是结合形式存在于钼基材料中。不同元素的比例是通过化学分析确定的。
本发明意义上的术语“部件”包括单个零件(机器元件、部件),特别是适用于更换或可逆地紧固和松开机器元件以及由单个零件组成的组件的构造装置。合适的部件具体为螺钉、螺母、销、定位销、垫片、螺栓、片材、夹具、管、杆以及U形导轨。作为“组件”,可以特别提及被焊接和铆接的部件,例如进气管、加热器悬架和装料架。本发明中使用的术语“部件”特别排除了切削工具的切削零件。
作为生产辅助物的优选部件为接触部件,例如隔板和垫片。特别地,优选为隔板。
此外,作为生产辅助物的优选部件是具有螺纹的部件,例如螺钉或螺母。螺钉是特别优选的。
根据本发明,该部件的涂层由Y2O3组成。Y2O3涂层通常通过刷涂、喷涂、印刷或浸渍Y2O3悬浮液并随后干燥来施加到部件上。优选地,Y2O3悬浮液是乙醇基悬浮液。
优选地,Y2O3悬浮液在约1800℃的氢气气氛中烧结到部件上打2至6小时。这提高了初始层的附着力。
被涂覆部件具有Y2O3层,其厚度范围为10μm至150μm、优选为20μm至110μm、更优选为40μm至80μm、进一步优选为50μm至70μm。涂层的厚度可以通过被涂覆部件的横截面的横向SEM测量来确定。该部件通常不具有其他材料的其他层。如果存在其他层,例如为了提供附着力,Y2O3层是被涂覆部件的最外层。
通常,该层完全施加在待与其它部件接触的被涂覆部件的表面上。为了实现部件的改进的可拆卸性,若该层仅部分地施加到被涂覆部件的待与其它部件接触的表面就足够了。
优选地,被涂覆部件的待与其他部件接触的表面的20%至100%被该层涂覆,进一步优选地为50%至100%。
本发明可用于在部件用于高温应用后,要求该部件与其他部件具有良好的可拆卸性的任意情况。因此,使用Y2O3作为脱模剂来改进高温应用中部件的可拆卸性也是本发明的主题。优选地,氧化钇以通过浆料涂覆的形式使用,优选地在由耐火金属组成的部件上。
本发明的进一步优点将从以下例举的实施例的描述中变得明显的。
具体实施方式
实施例1:螺纹连接
TZM板(重量分数为0.5Ti和0.08Zr以及0.01至0.04C的钼)140x80x9mm,9mm深的通孔M6螺纹铣削。
钼垫片:18x6,4x1.5mm
钼螺钉:M6x12mm
用Y2O3-悬浮液(根据本发明)、ZrO2-悬浮液、TaC-悬浮液或ZrC-悬浮液通过浆料涂覆对几个螺钉进行涂覆,然后干燥。涂层的厚度范围为50至70μm。
如下表所示,在不同的条件下,进行了几次测试以评估Y2O3涂层与对比涂层的比较。为此,在每种情况下选择三个带垫片的螺钉(S1至S3),并以12Nm的拧紧扭矩拧入该板中。在400℃至1400℃的温度范围(T,单位为℃)以及不同的大气压(A)(氢气H,真空10-6毫巴V)下进行高温处理,保持时间为2h。测量高温处理后的开启扭矩(L,单位为Nm),并目实际上检查螺纹是否有卡滞(S),如果适用,还检测了螺钉的断裂(B)。
从上表中可以看出,涂覆ZrO2和TaC的螺钉在400℃的低温下已经显示出卡滞现象,因此不适合高温应用。涂覆ZrC的螺钉在1000℃以上会出现卡滞现象,因此也不适合高温应用。
相反,使用根据本发明的Y2O3涂层,不会发生螺纹连接的卡滞。因此,该涂层可以实现接触耐火金属部件的可拆卸性。此外,没有检测到部件之间的交叉污染。
实施例2:被涂覆脱模剂片材的生产和评估
测试并评估了各种产品作为可能的脱模剂以用于片材的堆叠退火。为此,在片材之间施加不同的脱模剂。将喷剂或悬浮液施加在1mm厚钼片的一侧(面积约为40x 20mm)。所施加的涂层的厚度在50至70μm之间。在氢气气氛中,将25张片材在1900℃的堆叠中退火1小时。
评估结果总结如下:
ZrO2浆料通过腐蚀实验室(ISTO)作为泵喷剂:只有使用工具才能分离;浆料“烘烤”到片材上;不适合。
Al2O3固体通过腐蚀实验室(ISTO),陶瓷,99.7%纯度:只有使用工具才能分离;部分带有片材边缘痕迹的陶瓷;不适合。
氮化硼喷涂(Henze HeBoCoat 21E喷剂):
片材在退火后可分离,但在退火过程中形成厚度为10-20μm的硼化钼层;不适合。
ZrO2喷涂(ZYP涂层包括98%的ZrO2、0.7%的MgO、1.2%的SiO2的喷剂):
片材在退火后是可分离的,但喷涂层在片材上主要是松散的。ZrO2喷涂层剥落造成的设备污染;不适合。
来自CeramTec 3YSZ的ZrO2固体80μm陶瓷:
固体粘在片材上,片材只能有阻力地分离;固体非常难以去除,并且在某些情况下不能完全去除;不适合。
来自CeramTec 5YSZ的ZrO2固体300μm陶瓷:
固体粘在片材上,片材只能有阻力地分离。固体非常难以去除,并且在某些情况下不能完全去除,并且固体的印记出现在相反的一侧;不适合。
来自Sindlhauser Materials的Zr-W-37型的ZrO2悬浮液:
悬浮液显示出在刷涂过程中对片材的润湿性差。退火后,片材在夹层中牢固地粘在一起,并且涂层不能从涂层片材上去除。在某些情况下,在未涂覆的片材侧面上发现涂层的残留物;不适合。
来自Sindlhauser Materials的Y-E-32型的Y2O3悬浮液:
悬浮液显示出在刷涂过程中对片材的润湿性好。退火后,片材可以很好地分离。在未被涂覆的片材侧面上未发现涂层的残留物。额外的显微切片分析表明,没有表面扩散到片材中;适合。
从上述评估中可以看出,一些产品不适合作为高温条件下的脱模剂。尽管ZrO2喷剂和氮化硼喷剂能够保持片材的可拆卸性,但由于高温使用后ZrO2喷涂层的剥落需要在烧结设备中进行特殊清洁,并且氮化硼喷剂使退火材料的表面硼化,因此会发生设备或产品的污染。此外,喷剂的使用仅在有限的程度上适用于批量生产的生产环境。
相反,通过Y2O3悬浮液施加的层的使用使得在1900℃下退火的钼片材易于分离。该层不会从退火材料的表面剥落。该层不会从片材上剥落,并且该层不会扩散到片材的表面中。因此,Y2O3在高温应用中作为脱模剂是优异的。
在另一系列实验中,用Y2O3悬浮液在1mm钼片材(面积265mm x265mm)的两侧涂覆,并在1850℃的氢气气氛中多次堆叠退火6小时,作为钼装料板之间的隔板(每对并排;2mm x130mm x 260mm)。为了堆叠,在Mo-Y2O3隔板之后是并排放置的两个装料板,然后是隔板,依此类推。装料板层交替旋转90°以形成交叉层结构。该堆包括20至25个装料板层。在应用了13次之后,隔板仍然可以工作。
由于Y2O3层的存在,不会发生装料板的烧结。堆叠的板也可以在退火后再次分离而没有问题。Y2O3层即使在多次应用之后也稳定地附着在隔板上。在热处理之后,片材总是能够容易地彼此分离。此外,没有观察到由于污染而对基材和烧结炉产生负面影响。可以看出,两侧具有薄Y2O3层的Mo载体板非常适合于装料板的高温处理。特别地,这种涂覆Y2O3的钼隔板的多种可用性导致了相当大的经济和生态优势,并且超过了钨粉。
Claims (12)
1.一种由耐火金属组成的部件,其特征在于,所述部件的表面至少部分地涂覆有Y2O3层。
2.根据权利要求1所述的部件,其中,所述耐火金属为选自由钛、锆、铪、钒、铌、钽、铬、钼、钨和铼组成的群组的金属,以及上述金属的合金。
3.根据前述权利要求中任一项所述的部件,其中,所述耐火金属由至少70wt.%的钼组成。
4.根据前述权利要求中任一项所述的部件,其中,所述部件为螺栓、螺母、销、定位销、垫片、螺栓、片材、夹具、管、杆或者U形导轨。
5.根据权利要求1至3中任一项所述的部件,其中,所述部件是被焊接和/或铆接的单个零件的组件。
6.根据前述权利要求中任一项所述的部件,其中,所述Y2O3层的厚度在10μm至150μm的范围内。
7.根据前述权利要求中任一项所述的部件,其中,所述部件的表面被完全涂覆。
8.根据权利要求1至6中任一项所述的部件,其中,所述部件的表面被部分涂覆。
9.根据前述权利要求中任一项所述的部件,其特征在于,所述层由通过浆料涂覆施加的Y2O3组成。
10.一种Y2O3在高温应用下作为部件的脱模剂的用途。
11.一种制造被涂覆部件的方法,包括以下步骤:
-提供由耐火金属组成的部件
-通过浆料涂覆将Y2O3层涂覆到所述部件表面的至少一部分上。
12.根据权利要求11所述的方法,其中,乙醇基Y2O3浆料用于所述浆料涂覆。
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