CN116491033A - 气体激光装置和电子器件的制造方法 - Google Patents

气体激光装置和电子器件的制造方法 Download PDF

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Publication number
CN116491033A
CN116491033A CN202080106922.4A CN202080106922A CN116491033A CN 116491033 A CN116491033 A CN 116491033A CN 202080106922 A CN202080106922 A CN 202080106922A CN 116491033 A CN116491033 A CN 116491033A
Authority
CN
China
Prior art keywords
capacitor
main discharge
circuit
electrode
ionization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202080106922.4A
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English (en)
Chinese (zh)
Inventor
山之内庸一
梅田博
永井一喜
植山健史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gigaphoton Inc
Original Assignee
Gigaphoton Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gigaphoton Inc filed Critical Gigaphoton Inc
Publication of CN116491033A publication Critical patent/CN116491033A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0977—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser having auxiliary ionisation means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Lasers (AREA)
CN202080106922.4A 2020-12-10 2020-12-10 气体激光装置和电子器件的制造方法 Pending CN116491033A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/045982 WO2022123714A1 (ja) 2020-12-10 2020-12-10 ガスレーザ装置及び電子デバイスの製造方法

Publications (1)

Publication Number Publication Date
CN116491033A true CN116491033A (zh) 2023-07-25

Family

ID=81973472

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080106922.4A Pending CN116491033A (zh) 2020-12-10 2020-12-10 气体激光装置和电子器件的制造方法

Country Status (4)

Country Link
US (1) US20230268710A1 (https=)
JP (1) JPWO2022123714A1 (https=)
CN (1) CN116491033A (https=)
WO (1) WO2022123714A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240222927A1 (en) * 2021-04-28 2024-07-04 Cymer, Llc Electronic module for a magnetic switching network to produce a pulse of the pulsed output light beam
CN120642154A (zh) * 2023-03-09 2025-09-12 极光先进雷射株式会社 气体激光装置以及电子器件的制造方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4837773A (en) * 1986-02-18 1989-06-06 Mitsubishi Denki Kabushiki Kaisha Discharge excitation type short pulse laser
JPH0429382A (ja) * 1990-05-24 1992-01-31 Hitachi Ltd ガスレ―ザ装置とレ―ザ加工システム
JPH0690047A (ja) * 1992-09-08 1994-03-29 Hitachi Ltd 放電励起エキシマレーザ発振装置
JPH0864892A (ja) * 1994-08-26 1996-03-08 Komatsu Ltd 放電励起型レーザ装置における充放電装置
JPH0992917A (ja) * 1995-09-22 1997-04-04 Mitsubishi Electric Corp ＫｒＦエキシマレーザ
JP2000077754A (ja) * 1998-08-27 2000-03-14 Nidek Co Ltd レーザ装置
JP2000252566A (ja) * 1999-02-25 2000-09-14 Komatsu Ltd 放電励起型レーザ装置
US20170338618A1 (en) * 2015-03-25 2017-11-23 National University Corporation Nagaoka University Of Technology High-voltage pulse generator and gas laser apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3644004C2 (de) * 1986-06-23 1995-08-03 Lambda Physik Gmbh Schaltung für die Vorionisierung und Hauptentladung eines gepulsten Gaslasers
JPH0846275A (ja) * 1994-07-26 1996-02-16 Toshiba Corp ガスレ−ザ装置
JPH11177171A (ja) * 1997-12-11 1999-07-02 Nissin Electric Co Ltd パルスガスレーザ装置
US6650679B1 (en) * 1999-02-10 2003-11-18 Lambda Physik Ag Preionization arrangement for gas laser
JP4223887B2 (ja) * 2003-08-11 2009-02-12 株式会社小松製作所 ２ステージレーザのパルスエネルギー制御装置及び２ステージレーザシステム
US7480323B2 (en) * 2007-05-17 2009-01-20 Synrad, Inc. Laser tube with external adjustable reactance for a gas discharge RF-excited laser

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4837773A (en) * 1986-02-18 1989-06-06 Mitsubishi Denki Kabushiki Kaisha Discharge excitation type short pulse laser
JPH0429382A (ja) * 1990-05-24 1992-01-31 Hitachi Ltd ガスレ―ザ装置とレ―ザ加工システム
JPH0690047A (ja) * 1992-09-08 1994-03-29 Hitachi Ltd 放電励起エキシマレーザ発振装置
JPH0864892A (ja) * 1994-08-26 1996-03-08 Komatsu Ltd 放電励起型レーザ装置における充放電装置
JPH0992917A (ja) * 1995-09-22 1997-04-04 Mitsubishi Electric Corp ＫｒＦエキシマレーザ
JP2000077754A (ja) * 1998-08-27 2000-03-14 Nidek Co Ltd レーザ装置
JP2000252566A (ja) * 1999-02-25 2000-09-14 Komatsu Ltd 放電励起型レーザ装置
US20170338618A1 (en) * 2015-03-25 2017-11-23 National University Corporation Nagaoka University Of Technology High-voltage pulse generator and gas laser apparatus

Also Published As

Publication number Publication date
JPWO2022123714A1 (https=) 2022-06-16
US20230268710A1 (en) 2023-08-24
WO2022123714A1 (ja) 2022-06-16

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