JPWO2022123714A1 - - Google Patents

Info

Publication number
JPWO2022123714A1
JPWO2022123714A1 JP2022567962A JP2022567962A JPWO2022123714A1 JP WO2022123714 A1 JPWO2022123714 A1 JP WO2022123714A1 JP 2022567962 A JP2022567962 A JP 2022567962A JP 2022567962 A JP2022567962 A JP 2022567962A JP WO2022123714 A1 JPWO2022123714 A1 JP WO2022123714A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022567962A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022123714A1 publication Critical patent/JPWO2022123714A1/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0977—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser having auxiliary ionisation means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Lasers (AREA)
JP2022567962A 2020-12-10 2020-12-10 Pending JPWO2022123714A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2020/045982 WO2022123714A1 (ja) 2020-12-10 2020-12-10 ガスレーザ装置及び電子デバイスの製造方法

Publications (1)

Publication Number Publication Date
JPWO2022123714A1 true JPWO2022123714A1 (https=) 2022-06-16

Family

ID=81973472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022567962A Pending JPWO2022123714A1 (https=) 2020-12-10 2020-12-10

Country Status (4)

Country Link
US (1) US20230268710A1 (https=)
JP (1) JPWO2022123714A1 (https=)
CN (1) CN116491033A (https=)
WO (1) WO2022123714A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240222927A1 (en) * 2021-04-28 2024-07-04 Cymer, Llc Electronic module for a magnetic switching network to produce a pulse of the pulsed output light beam
CN120642154A (zh) * 2023-03-09 2025-09-12 极光先进雷射株式会社 气体激光装置以及电子器件的制造方法

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4797888A (en) * 1986-06-23 1989-01-10 Lambda Physik Circuit for the preionization and main discharge of a pulsed gas laser
JPH0429382A (ja) * 1990-05-24 1992-01-31 Hitachi Ltd ガスレ―ザ装置とレ―ザ加工システム
JPH0690047A (ja) * 1992-09-08 1994-03-29 Hitachi Ltd 放電励起エキシマレーザ発振装置
JPH0846275A (ja) * 1994-07-26 1996-02-16 Toshiba Corp ガスレ−ザ装置
JPH0864892A (ja) * 1994-08-26 1996-03-08 Komatsu Ltd 放電励起型レーザ装置における充放電装置
JPH0992917A (ja) * 1995-09-22 1997-04-04 Mitsubishi Electric Corp ＫｒＦエキシマレーザ
JPH11177171A (ja) * 1997-12-11 1999-07-02 Nissin Electric Co Ltd パルスガスレーザ装置
JP2000077754A (ja) * 1998-08-27 2000-03-14 Nidek Co Ltd レーザ装置
JP2000252566A (ja) * 1999-02-25 2000-09-14 Komatsu Ltd 放電励起型レーザ装置
US20080285607A1 (en) * 2007-05-17 2008-11-20 Synrad, Inc. Laser tube with external adjustable reactace for a gas discharge rf-excited laser
WO2016152738A1 (ja) * 2015-03-25 2016-09-29 国立大学法人長岡技術科学大学 高電圧パルス発生装置及びガスレーザ装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3705165A1 (de) * 1986-02-18 1987-08-20 Mitsubishi Electric Corp Mit entladungserregung arbeitende laservorrichtung fuer kurze impulse
US6650679B1 (en) * 1999-02-10 2003-11-18 Lambda Physik Ag Preionization arrangement for gas laser
JP4223887B2 (ja) * 2003-08-11 2009-02-12 株式会社小松製作所 ２ステージレーザのパルスエネルギー制御装置及び２ステージレーザシステム

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4797888A (en) * 1986-06-23 1989-01-10 Lambda Physik Circuit for the preionization and main discharge of a pulsed gas laser
JPH0429382A (ja) * 1990-05-24 1992-01-31 Hitachi Ltd ガスレ―ザ装置とレ―ザ加工システム
JPH0690047A (ja) * 1992-09-08 1994-03-29 Hitachi Ltd 放電励起エキシマレーザ発振装置
JPH0846275A (ja) * 1994-07-26 1996-02-16 Toshiba Corp ガスレ−ザ装置
JPH0864892A (ja) * 1994-08-26 1996-03-08 Komatsu Ltd 放電励起型レーザ装置における充放電装置
JPH0992917A (ja) * 1995-09-22 1997-04-04 Mitsubishi Electric Corp ＫｒＦエキシマレーザ
JPH11177171A (ja) * 1997-12-11 1999-07-02 Nissin Electric Co Ltd パルスガスレーザ装置
JP2000077754A (ja) * 1998-08-27 2000-03-14 Nidek Co Ltd レーザ装置
JP2000252566A (ja) * 1999-02-25 2000-09-14 Komatsu Ltd 放電励起型レーザ装置
US20080285607A1 (en) * 2007-05-17 2008-11-20 Synrad, Inc. Laser tube with external adjustable reactace for a gas discharge rf-excited laser
WO2016152738A1 (ja) * 2015-03-25 2016-09-29 国立大学法人長岡技術科学大学 高電圧パルス発生装置及びガスレーザ装置

Also Published As

Publication number Publication date
US20230268710A1 (en) 2023-08-24
WO2022123714A1 (ja) 2022-06-16
CN116491033A (zh) 2023-07-25

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