CN116174383B - Germanium single chip production cleaning equipment with cyclic utilization function - Google Patents
Germanium single chip production cleaning equipment with cyclic utilization function Download PDFInfo
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- CN116174383B CN116174383B CN202310451018.2A CN202310451018A CN116174383B CN 116174383 B CN116174383 B CN 116174383B CN 202310451018 A CN202310451018 A CN 202310451018A CN 116174383 B CN116174383 B CN 116174383B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/024—Cleaning by means of spray elements moving over the surface to be cleaned
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/02—Devices for holding articles during cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention relates to the technical field of semiconductor manufacturing equipment, and discloses cleaning equipment with a recycling function for germanium single crystal wafer production.
Description
Technical Field
The invention relates to the technical field of semiconductor manufacturing equipment, in particular to cleaning equipment with a recycling function for germanium single crystal wafer production.
Background
The germanium monocrystal is a germanium crystal without large-angle grain boundaries or twin crystals, is in a diamond crystal structure and is an important semiconductor material, the application of the germanium monocrystal is more and more wide, the yield is greatly increased, the germanium monocrystal is mainly used as a substrate material of a three-junction solar cell, and compared with a monocrystalline silicon cell, the germanium substrate cell has higher photoelectric conversion efficiency and lower power generation cost, better high-temperature resistance and better space radiation resistance, and the service life is about twice that of the silicon solar cell, so that the germanium substrate has good application in the aspect of preparing space satellite solar cells.
At present, the cleaning equipment for single chip production mainly sprays cleaning liquid on the surface of a wafer rotating at a high speed to achieve the aim of cleaning, in the cleaning process, the clamping part clamps the wafer to rotate at a high speed, so that the cleaning liquid can wash out particles on the surface of the single chip, but the cleaning dead angle is easy to appear due to the fact that a spray head is fixed in the cleaning process, the surface of the wafer is not convenient to clean in all aspects, meanwhile, impurities in the cleaning liquid are not convenient to filter, the recycling function of the cleaning liquid is influenced, and the use cost of the cleaning liquid is increased.
Disclosure of Invention
The invention aims to provide cleaning equipment with a recycling function for germanium single crystal wafer production, so as to solve the problems in the background technology.
In order to solve the technical problems, the invention provides the following technical scheme: this germanium single chip production is with cleaning equipment with cyclic utilization function includes the washing cabinet, be provided with cleaning chamber and plenum chamber in the washing cabinet, install the base in the cleaning chamber, set up on the base and put the thing groove, the module slide rail is installed at the top of cleaning chamber, slidable mounting has the seat that removes on the module slide rail, remove the seat and install the shower nozzle, install the circulating pump on the washing cabinet, the output of circulating pump is connected through the transfer line with the shower nozzle, and the input of circulating pump is connected through the pipette with the plenum chamber, cleaning chamber and plenum chamber are linked together through the recovery hole, be provided with the filter screen in the plenum chamber, when the staff places the single chip in putting the thing groove through the manipulator, when wasing the single chip upper surface, start the circulating pump, spray the washing liquid through the shower nozzle in with the plenum chamber and rinse liquid and rinse the seat, rinse liquid, because remove the seat and can drive the shower nozzle and remove along the module slide rail, be convenient for carry out the shower nozzle to the full-back flow through the filter screen in the aspect of the cleaning liquid to the filter screen in the aspect can be carried in the aspect of the filter screen through the full-back flow to the filter chamber, can carry out the filter particles in the filter liquor in the aspect of the cleaning liquid to the filter liquor is realized.
As the preferable technical scheme, the cleaning cabinet is provided with a cleaning anti-pollution assembly and a cleaning anti-pollution utilization assembly, and the cleaning anti-pollution assembly provides operation driving force for the cleaning anti-pollution utilization assembly.
As a preferable technical scheme, the cleaning anti-pollution assembly comprises a working cavity, a double-shaft driving motor, a perforation, a turntable and an electric sucking disc;
the base is internally provided with a working cavity, a double-shaft driving motor is arranged in the working cavity, the working cavity is communicated with a storage groove through a through hole, a turntable is arranged in the storage groove, an upper output shaft of the double-shaft driving motor penetrates through the through hole and is connected with the turntable, an electric sucking disc is arranged on the turntable, when a single crystal wafer is placed on the turntable, the electric sucking disc is started to realize the adsorption fixation of the single crystal wafer, the double-shaft driving motor is started again, the upper output shaft of the double-shaft driving motor drives the turntable to rotate at a high speed, the turntable can drive the single crystal wafer to synchronously rotate, and cleaning liquid on the upper surface of the single crystal wafer can be thrown away by utilizing a rotating centrifugal force, so that the cleaning effect of the cleaning liquid on the surface of the single crystal wafer is improved.
As a preferable technical scheme, the cleaning anti-pollution assembly comprises a moving block, a wire hole, a connecting spring, a connecting bearing, a connecting ring, a transmission plate, a jacking rod, a first sliding hole, a transmission ring and a plugging pad;
the upper output shaft of the double-shaft driving motor is provided with threads, the upper output shaft of the double-shaft driving motor is provided with a moving block, the moving block is provided with a screw hole, the upper output shaft of the double-shaft driving motor penetrates through the screw hole, the upper output shaft of the double-shaft driving motor is in threaded fit with the screw hole, the moving block is connected with the double-shaft driving motor through a connecting spring, the moving block is provided with a connecting ring through a connecting bearing sleeve, the connecting ring is provided with a transmission plate, the transmission plate is provided with a lifting rod, the top of the working cavity is provided with a first sliding hole, a transmission ring is placed in the storage groove, the lifting rod penetrates through the first sliding hole and is connected with the transmission ring, the sealing pad is arranged on the driving ring, when the double-shaft driving motor operates, the upper output shaft of the double-shaft driving motor can drive the moving block to stretch the connecting spring to rapidly move upwards in the rotating process, the moving block can drive the driving plate to synchronously move through the connecting ring in the upward moving process, meanwhile, the driving plate can lift the driving ring to synchronously move through the lifting rod in the moving process due to the fact that the lifting rod is in sliding fit with the first sliding hole, the driving ring is beneficial to driving the sealing pad to seal a gap between the object placing groove and the monocrystalline piece by the driving ring, and cleaning liquid can be prevented from flowing into the gap between the object placing groove and the monocrystalline piece.
As a preferable technical scheme, the cleaning anti-pollution assembly further comprises a convex ring, a slide way, a fixed block, a cavity, a top plate, a supporting spring plate, a connecting pin, a through hole and a connecting hole;
the utility model discloses a quick-speed polishing device for the sealing surface of the pipeline, including the baffle ring, the baffle ring is installed on the baffle ring, the slide has been seted up to the bottom of shutoff pad, bulge loop and slide gomphosis mutually, and bulge loop and slide are normal running fit, the bottom fixed mounting of shutoff pad has the fixed block, be equipped with the cavity in the fixed block, sliding mounting has the roof in the cavity, the roof is connected through supporting the shell fragment with the cavity, install the connecting pin on the roof, the through-hole has been seted up on the cavity, the connecting pin runs through the through-hole, the connecting hole has been seted up on the lateral wall of carousel, and when the movable block moved to the highest point, the roof in the cavity can be moved outward under the elasticity effect of supporting the shell fragment at this moment, and the roof can drive the connecting pin and alternates in the connecting hole on the carousel lateral wall at this moment, and simultaneously, because the shutoff pad can drive the shutoff pad and rotate on the baffle ring through the normal running fit of bulge loop, when the carousel rotates, utilize the centrifugal effort that the shutoff pad is rotatory to form, can be with the quick-speed polishing pad on the shutoff surface.
As the preferable technical scheme, all be equipped with the inclined plane on connecting pin and the connecting hole, be equipped with on the shutoff pad and throw away the slope, the tip roll gomphosis of connecting pin has the contact ball, the contact ball is the point contact with the lateral wall of carousel.
As a preferable technical scheme, the cleaning anti-pollution utilization component comprises a linkage rod, a second sliding hole, a rotating shaft and a coupling;
install the gangbar on the drive plate, the second slide hole has been seted up to the bottom of cleaning chamber, the gangbar runs through the second slide hole and is connected with the filter screen, the commentaries on classics hole has been seted up on the filter screen, the pivot is installed through the bearing to the commentaries on classics hole, the shaft coupling is installed to the upper end of pivot, the shaft coupling is in same center axis with the lower output shaft of biax driving motor, when the drive plate moves up, because gangbar and second slide hole be sliding fit, the drive plate can drive the filter screen through the gangbar and carry out synchronous movement in the removal process for the lower output shaft of biax driving motor is connected with the shaft coupling, realizes the butt joint of biax driving motor and shaft coupling, lets the lower output shaft of biax driving motor drive the pivot through the shaft coupling and carries out synchronous rotation.
As the preferable technical scheme, the cleaning anti-pollution utilization assembly further comprises a rotating column, a track, a telescopic rod, a linkage block, a transmission shaft and a tilting plate;
the lower extreme of pivot is installed the steering column, be equipped with the track on the circumference lateral wall of steering column, the linkage piece is installed through the telescopic link to the bottom of filter screen, install the transmission shaft on the linkage piece, the transmission shaft agrees with the track mutually, install the top board on the linkage piece, when the pivot rotates, the pivot can drive the steering column and carry out synchronous rotation, because the transmission shaft agrees with the track mutually, and the transmission shaft can slide in the track, utilize the difference in height that the track formed of steering column rotatory in-process transmission shaft to can drive the linkage piece through the transmission shaft in the rotation cycle of steering column and carry out vertical reciprocating motion, and then make the linkage piece drive the top board vibrate the filter screen, can avoid the granule impurity in the washing liquid to block up the filter screen.
Compared with the prior art, the invention has the following beneficial effects:
when the staff places the monocrystalline wafer in putting the thing groove through the manipulator, when wasing the monocrystalline wafer upper surface, start the circulating pump, in carrying the shower nozzle with the washing liquid in the liquid collecting chamber through pipette and transfer line, spray the washing liquid through the shower nozzle and wash the monocrystalline wafer, because remove the seat and can drive the shower nozzle and remove along the module slide rail, the shower nozzle of being convenient for carries out the washing of all-round to the monocrystalline wafer, can flow back the washing liquid in the washing chamber to the liquid collecting chamber through retrieving the hole, and, can filter the washing liquid of backward flow through the filter screen in the liquid collecting chamber, be favorable to intercepting the granule impurity that carries in the washing liquid, can realize the cyclic utilization of washing liquid.
When the monocrystalline wafer is placed on the carousel, realize the absorption fixed to the monocrystalline wafer through starting electric sucking disc, restart biax driving motor, make biax driving motor's last output shaft drive carousel carry out high-speed rotation, let the carousel can drive the monocrystalline wafer and rotate in step, can utilize rotatory centrifugal force to throw away the washing liquid on the monocrystalline wafer upper surface, improve the cleaning performance of washing liquid to monocrystalline wafer surface.
When the double-shaft driving motor operates, the upper output shaft of the double-shaft driving motor can drive the moving block to stretch the connecting spring to rapidly move upwards in the rotating process, the moving block can drive the transmission plate to synchronously move through the connecting ring in the upward moving process, meanwhile, the transmission plate can lift the transmission ring to synchronously displace through the lifting rod in the moving process due to the fact that the lifting rod is in sliding fit with the first sliding hole, the transmission plate is favorable for driving the blocking pad to block a gap between the object placing groove and the single crystal plate by the driving ring, and cleaning liquid can be prevented from flowing into the gap between the object placing groove and the single crystal plate.
When the drive plate moves up, because gangbar and second slide hole are sliding fit, the drive plate can drive the filter screen through the gangbar and carry out synchronous motion at the removal in-process for biax driving motor's lower output shaft is connected with the axle connector, realize biax driving motor and axle connector's butt joint, let biax driving motor's lower output shaft drive the pivot through the axle connector and carry out synchronous rotation, the pivot can drive the revolving post and carry out synchronous rotation at the rotation in-process, because the transmission shaft agrees with the track mutually, and the transmission shaft can slide in the track, utilize the difference in height that the revolving post rotation in-process track formed to drive the linkage piece and carry out vertical reciprocating motion through the transmission shaft in the rotation cycle of revolving post, and then make the linkage piece drive the subplate and vibrate the filter screen, can avoid granule impurity in the washing liquid to block up the filter screen.
Drawings
The accompanying drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate the invention and together with the embodiments of the invention, serve to explain the invention. In the drawings:
FIG. 1 is a schematic view of the external structure of a washing cabinet of the present invention;
FIG. 2 is a schematic view of the internal structure of the washing cabinet of the present invention;
FIG. 3 is a schematic view of the present invention in cross-section;
FIG. 4 is a schematic view of the structure of the anti-pollution utilization assembly of the present invention;
FIG. 5 is an enlarged schematic view of the structure at A of FIG. 3;
FIG. 6 is an enlarged schematic view of the structure at B of FIG. 3;
FIG. 7 is an enlarged schematic view of the structure at C of FIG. 6;
fig. 8 is an enlarged schematic view of the structure at D of fig. 3.
In the figure: 1. a washing cabinet; 2. a cleaning chamber; 3. a liquid collection chamber; 4. a base; 5. a storage groove; 6. a module sliding rail; 7. a movable seat; 8. a spray head; 9. a circulation pump; 10. an infusion tube; 11. a pipette; 12. a recovery hole; 13. a filter screen;
cleaning the anti-pollution assembly; 1401. a working chamber; 1402. a double-shaft driving motor; 1403. perforating; 1404. a turntable; 1405. an electric suction cup; 1406. a moving block; 1407. a wire hole; 1408. a connecting spring; 1409. connecting a bearing; 1410. a connecting ring; 1411. a drive plate; 1412. a lifting rod; 1413. a first slide hole; 1414. a drive ring; 1415. a plugging pad; 1416. a convex ring; 1417. a slideway; 1418. a fixed block; 1419. a chamber; 1420. a top plate; 1421. a supporting spring plate; 1422. a connecting pin; 1423. a through hole; 1424. a connection hole; 1425. throwing off the slope;
cleaning the anti-pollution utilization component; 1501. a linkage rod; 1502. a second slide hole; 1503. a turning hole; 1504. a rotating shaft; 1505. a coupling; 1506. a rotating column; 1507. a track; 1508. a telescopic rod; 1509. a linkage block; 1510. a transmission shaft; 1511. and (3) a top plate.
Description of the embodiments
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Examples: as shown in fig. 1-3, the present invention provides the following technical solutions: this germanium single chip production is with cleaning equipment with cyclic utilization function, this germanium single chip production is with cleaning equipment with cyclic utilization function includes washs cabinet 1, be provided with wash chamber 2 and plenum chamber 3 in the washings cabinet 1, install base 4 in the wash chamber 2, set up on the base 4 and put thing groove 5, put thing inslot and placed the single chip, module slide rail 6 is installed at the top of wash chamber 2, slidable mounting has movable seat 7 on the module slide rail 6, install shower nozzle 8 on the movable seat 7, install circulating pump 9 on the washings cabinet 1, the output and the shower nozzle 8 of circulating pump 9 are connected through transfer line 10, and the input and the plenum chamber 3 of circulating pump 9 are connected through pipette 11, wash chamber 2 and plenum chamber 3 are linked together through recovery hole 12, be provided with filter screen 13 in the plenum chamber 3, place the single chip in putting thing groove 5 through the manipulator when carrying on the surface to the single chip, start up circulating pump 9, carry the shower nozzle 8 can carry in order to carry the shower nozzle 8 through pipette chamber 11 and carry the filter screen 8 through the shower nozzle 8 to carry in the aspect of washing liquid can carry the shower nozzle 8 through the shower nozzle 8, can carry out the aspect through the shower nozzle 8 to the washing liquid in the aspect of the shower nozzle 3, and carry out the washing liquid can carry out in the aspect through the shower nozzle 8 to the shower nozzle 8, and carry out the washing liquid in the aspect 3 is convenient for the aspect of the aspect is carried in the shower nozzle 3.
The cleaning cabinet 1 is provided with a cleaning and pollution prevention assembly 14 and a cleaning and pollution prevention utilization assembly 15, and the cleaning and pollution prevention assembly 14 provides operation driving force for the cleaning and pollution prevention utilization assembly 15.
As shown in fig. 2-3 and 5-7, the cleaning contamination assembly 14 includes a working chamber 1401, a dual-shaft drive motor 1402, a perforation 1403, a turntable 1404, and an electric suction cup 1405;
the base 4 is internally provided with a working cavity 1401, a double-shaft driving motor 1402 is installed in the working cavity 1401, the working cavity 1401 is communicated with a storage groove 5 through a through hole 1403, a rotary table 1404 is arranged in the storage groove 5, an upper output shaft of the double-shaft driving motor 1402 penetrates through the through hole 1403 to be connected with the rotary table 1404, an electric sucker 1405 is installed on the rotary table 1404, when a single wafer is placed on the rotary table 1404, the adsorption fixation of the single wafer is realized by starting the electric sucker 1405, the double-shaft driving motor 1402 is started again, an upper output shaft of the double-shaft driving motor 1402 drives the rotary table 1404 to rotate at a high speed, the rotary table 1404 can drive the single wafer to synchronously rotate, cleaning liquid on the upper surface of the single wafer can be thrown away by utilizing rotary centrifugal force, and the cleaning effect of the cleaning liquid on the surface of the single wafer is improved.
The cleaning contamination assembly 14 includes a moving block 1406, a wire bore 1407, a connection spring 1408, a connection bearing 1409, a connection ring 1410, a drive plate 1411, a lift rod 1412, a first slide hole 1413, a drive ring 1414, and a seal pad 1415;
the upper output shaft of the dual-shaft driving motor 1402 is provided with threads, the upper output shaft of the dual-shaft driving motor 1402 is provided with a moving block 1406, the moving block 1406 is provided with a threaded hole 1407, the upper output shaft of the dual-shaft driving motor 1402 penetrates through the threaded hole 1407, the upper output shaft of the dual-shaft driving motor 1402 is in threaded fit with the threaded hole 1407, the moving block 1406 and the dual-shaft driving motor 1402 are connected through a connecting spring 1408, the moving block 1406 is sleeved with a connecting ring 1410 through a connecting bearing 1409, the connecting ring 1410 is provided with a transmission plate 1411, the transmission plate 1411 is provided with a lifting rod 1412, the top of the working cavity 1401 is provided with a first sliding hole 1413, a transmission ring 1414 is placed in the storage groove 1415, the lifting rod 1412 penetrates through the first sliding hole 1413 and is connected with the transmission ring 1414, the transmission ring 1414 is provided with a cushion 1415, when the dual-shaft driving motor 1402 runs, the upper output shaft of the dual-shaft driving motor 1402 can drive the moving block connecting spring to rapidly move in a rotating process, the moving block 1406 can be driven to stretch and move upwards through the connecting spring 1408, and can simultaneously move to the transmission plate 1411 and can be driven to move to the sliding plate 1415 in a gap with the sliding groove 1414 in a synchronous way, and the sliding groove 1415 can be synchronously matched with the sliding groove 1414.
The cleaning anti-pollution assembly 14 further comprises a convex ring 1416, a slideway 1417, a fixed block 1418, a cavity 1419, a top plate 1420, a supporting spring plate 1421, a connecting pin 1422, a through hole 1423 and a connecting hole 1424;
the sealing device is characterized in that a convex ring 1416 is arranged on the transmission ring 1414, a slideway 1417 is arranged at the bottom of the sealing pad 1415, the convex ring 1416 is embedded with the slideway 1417, the convex ring 1416 and the slideway 1417 are in running fit, a fixed block 1418 is fixedly arranged at the bottom of the sealing pad 1415, a cavity 1419 is arranged in the fixed block 1418, a top plate 1420 is arranged in the cavity 1419 in a sliding manner, the top plate 1420 is connected with the cavity 1419 through a supporting elastic sheet 1421, a connecting pin 1422 is arranged on the top plate 1420, a through hole 1423 is arranged on the cavity 1419, the connecting pin 1422 penetrates through the through hole 1423, a connecting hole 1424 is arranged on the side wall of the turntable 1404, when the movable block 1406 moves to the highest point, at this moment, the top plate 1420 in the cavity 1419 can move outwards under the elastic action of the supporting elastic sheet 1421, and at the same time, the top plate 1420 can drive the connecting pin 1422 to be inserted into the connecting hole 4 on the side wall of the turntable, and simultaneously, the sealing pad 1415 can be rotated by virtue of the running of the convex ring 1416 and the supporting elastic sheet 1411, and the sealing pad 1415 can be synchronously rotated to form a sealing pad 1415 when the surface is sealed and the surface is sealed.
The connecting pin 1422 and the connecting hole 1424 are both provided with inclined planes, the connecting pin 1422 is favorable to being automatically separated from the connecting hole 1424 in the downward movement process of the connecting pin 1422 through the matching of the inclined planes, the plugging pad 1415 is provided with a throwing-off slope 1425, cleaning liquid on the plugging pad 1415 is conveniently thrown upwards in an inclined mode under centrifugal acting force, cleaning liquid can be prevented from penetrating into a gap, the end part of the connecting pin 1422 is in rolling fit with a contact ball, the contact ball is in point contact with the side wall of the turntable 1404, and the contact ball can roll, so that the moving friction force between the connecting pin 1422 and the side wall of the turntable 1404 in the moving process can be reduced, and the abrasion of the connecting pin 1422 is avoided.
As shown in fig. 3-4 and 8, the cleaning and anti-contamination utilization assembly 15 includes a linkage rod 1501, a second slide hole 1502, a rotation hole 1503, a rotation shaft 1504 and a coupling 1505;
the second sliding hole 1502 is formed in the bottom of the cleaning chamber 2, the second sliding hole 1502 penetrates through the second sliding hole 1502 to be connected with the filter screen 13, the rotating hole 1503 is formed in the filter screen 13, the rotating shaft 1504 is mounted on the rotating hole 1503 through a bearing, the coupler 1505 is mounted at the upper end of the rotating shaft 1504, the coupler 1505 and the lower output shaft of the double-shaft driving motor 1402 are located on the same central axis, when the driving plate 1411 moves upwards, the driving plate 1411 can drive the filter screen 13 to move synchronously through the second sliding hole 1502 in the moving process due to the fact that the linkage rod 1501 is in sliding fit with the second sliding hole 1502, the lower output shaft of the double-shaft driving motor 1402 is connected with the Lian Zhou device 1505, the butt joint of the double-shaft driving motor 1402 and the Lian Zhou device 1505 is achieved, and the lower output shaft of the double-shaft driving motor 1402 drives the rotating shaft 1504 to rotate synchronously through the coupler 1505.
The cleaning contamination utilization assembly 15 further comprises a swivel 1506, a track 1507, a telescopic rod 1508, a linkage block 1509, a drive shaft 1510, and a pitch plate 1511;
the lower extreme of pivot 1504 is installed the column 1506, be equipped with track 1507 on the circumference lateral wall of column 1506, track 1507 is the slope annular track, the linkage piece 1509 is installed through telescopic rod 1508 to the bottom of filter screen 13, install transmission shaft 1510 on the linkage piece 1509, transmission shaft 1510 agrees with track 1507 mutually, install the top 1511 on the linkage piece 1509, when pivot 1504 rotated, pivot 1504 can drive the column 1506 and rotate in step, because transmission shaft 1510 agrees with track 1507 mutually, and transmission shaft 1510 can slide in track 1507, utilizes the difference in height that track 1507 formed to transmission shaft 1510 in the rotatory in-process of column 1506 to can drive the linkage piece 1509 through transmission shaft 1510 and carry out vertical reciprocating motion in the rotation cycle of column 1506, and then make linkage piece 1509 drive top 1511 and vibrate filter screen 13, can avoid granule impurity in the washing liquid to block up filter screen 13.
The working principle of the invention is as follows:
when a worker places a single crystal wafer in the storage tank 5 through a manipulator, and washes the upper surface of the single crystal wafer, the circulating pump 9 is started, the cleaning liquid in the liquid collecting chamber 3 is conveyed to the spray head 8 through the liquid suction pipe 11 and the liquid delivery pipe 10, the single crystal wafer is washed through the spray head 8, the spray head 8 can be driven by the moving seat 7 to move along the module sliding rail 6, the single crystal wafer is conveniently washed by the spray head 8 in an all-around way, the cleaning liquid in the cleaning chamber 2 can be refluxed into the liquid collecting chamber 3 through the recovery hole 12, and the refluxed cleaning liquid can be filtered through the filter screen 13 in the liquid collecting chamber 3, so that the interception of particle impurities carried in the cleaning liquid is facilitated, and the cyclic utilization of the cleaning liquid can be realized.
When single crystal is placed on carousel 1404, realize the absorption fixed to the single crystal through starting electric chuck 1405, restart biax driving motor 1402, make the last output shaft of biax driving motor 1402 drive carousel 1404 and carry out high-speed rotation, let carousel 1404 can drive the single crystal and carry out synchronous rotation, can utilize rotatory centrifugal force to throw away the washing liquid on the single crystal upper surface, improve the cleaning solution to the cleaning effect on single crystal surface.
When the dual-shaft driving motor 1402 operates, the upper output shaft of the dual-shaft driving motor 1402 can drive the moving block 1406 to stretch the connecting spring 1408 to move upwards rapidly in the rotating process, the moving block 1406 can drive the transmission plate 1411 to move synchronously through the connecting ring 1410 in the upward moving process, meanwhile, as the lifting rod 1412 and the first sliding hole 1413 are in sliding fit, the transmission plate 1411 can lift the transmission ring 1414 to perform synchronous displacement in the moving process, the transmission ring 1414 is beneficial to drive the sealing pad 1415 to seal the gap between the object groove 5 and the single crystal wafer, cleaning liquid can be prevented from flowing into the gap between the object groove 5 and the single crystal wafer, when the moving block 1406 moves to the highest point, at this time, the top plate 1420 in the chamber 1419 can move outwards under the elastic force of the supporting spring 1421, the top plate 1420 can drive the connecting pin 1422 to be inserted into the connecting hole 1424 on the side wall of the turntable 1404, and meanwhile, as the sealing pad 1415 can rotate on the transmission ring through the rotating fit of the convex ring 1416 and the sliding way 1417, the sealing pad 1415 can be driven by the connecting pin 1412 to perform synchronous rotation to form the sealing pad 1415, and the sealing pad 1415 can be rotated rapidly by the sealing pad 1415.
When the driving plate 1411 moves upwards, since the linkage rod 1501 and the second sliding hole 1502 are in sliding fit, the driving plate 1411 can drive the filter screen 13 to move synchronously through the linkage rod 1501 in the moving process, so that the lower output shaft of the dual-shaft driving motor 1402 is connected with the Lian Zhou device 1505, the butt joint of the dual-shaft driving motor 1402 and the Lian Zhou device 1505 is realized, the lower output shaft of the dual-shaft driving motor 1402 drives the rotating shaft 1504 to rotate synchronously through the coupling 1505, the rotating shaft 1504 can drive the rotating column 1506 to rotate synchronously in the rotating process, and the transmission shaft 1510 is matched with the track 1507, and the transmission shaft 1510 can slide in the track 1507, so that the height difference formed by the transmission shaft 1510 in the rotating process of the rotating column 1506 can be utilized to drive the linkage block 1509 to move longitudinally and reciprocally in the rotating period of the rotating column 1506, and further the linkage block 1509 drives the rotating plate 1511 to vibrate the filter screen 13, so that the filter screen 13 can be prevented from being blocked by particle impurities in the cleaning liquid.
It will be evident to those skilled in the art that the invention is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Claims (5)
1. Germanium single chip production is with cleaning equipment with cyclic utilization function, its characterized in that: this germanium single chip production is with cleaning equipment with cyclic utilization function includes cleaning cabinet (1), be provided with cleaning chamber (2) and plenum (3) in cleaning cabinet (1), install base (4) in cleaning chamber (2), set up on base (4) and put thing groove (5), module slide rail (6) are installed at the top of cleaning chamber (2), slidable mounting has on module slide rail (6) and removes seat (7), remove and install shower nozzle (8) on seat (7), install circulating pump (9) on cleaning cabinet (1), the output and the shower nozzle (8) of circulating pump (9) are connected through transfer line (10), and the input and the plenum (3) of circulating pump (9) are connected through pipette (11), cleaning chamber (2) and plenum (3) are linked together through recovery hole (12), be provided with filter screen (13) in the plenum (3);
the cleaning cabinet (1) is provided with a cleaning anti-pollution assembly (14) and a cleaning anti-pollution utilization assembly (15), and the cleaning anti-pollution assembly (14) provides operation driving force for the cleaning anti-pollution utilization assembly (15);
the cleaning and pollution prevention assembly (14) comprises a working cavity (1401), a double-shaft driving motor (1402), a perforation (1403), a turntable (1404) and an electric sucker (1405);
a working cavity (1401) is arranged in the base (4), a double-shaft driving motor (1402) is arranged in the working cavity (1401), the working cavity (1401) is communicated with the object placing groove (5) through a through hole (1403), a rotary table (1404) is arranged in the object placing groove (5), an upper output shaft of the double-shaft driving motor (1402) penetrates through the through hole (1403) to be connected with the rotary table (1404), and an electric sucker (1405) is arranged on the rotary table (1404);
the cleaning and pollution prevention assembly (14) comprises a moving block (1406), a wire hole (1407), a connecting spring (1408), a connecting bearing (1409), a connecting ring (1410), a transmission plate (1411), a jacking rod (1412), a first sliding hole (1413), a transmission ring (1414) and a plugging pad (1415);
the utility model discloses a seal plug is equipped with in the transmission, including biax driving motor (1402) and work cavity (1401), last output shaft of biax driving motor (1402) is equipped with the screw thread, and is provided with movable block (1406) on the last output shaft of biax driving motor (1402), last output shaft of biax driving motor (1402) runs through screw hole (1407), and last output shaft of biax driving motor (1402) and screw thread (1407) screw-fit, movable block (1406) are connected through connecting spring (1408) with biax driving motor (1402), movable block (1406) are equipped with go-between (1410) through connecting bearing (1409) cover, install driving plate (1411) on go-between (1410), install jacking rod (1412) on driving plate (1411), first slide hole (1413) have been seted up at the top of work cavity (1401), place transmission ring (1414) in storage tank (5), jacking rod (1413) run through first slide hole (1413) and are connected with transmission ring (1414), install shutoff (1415) on transmission ring (1415).
2. The cleaning device with recycling function for germanium single crystal production of claim 1, wherein the cleaning device is characterized in that: the cleaning anti-pollution assembly (14) further comprises a convex ring (1416), a slideway (1417), a fixed block (1418), a cavity (1419), a top plate (1420), a supporting spring piece (1421), a connecting pin (1422), a through hole (1423) and a connecting hole (1424);
install bulge loop (1416) on transmission ring (1414), slide (1417) have been seted up to the bottom of shutoff pad (1415), bulge loop (1416) and slide (1417) are gomphosis mutually, and bulge loop (1416) are normal running fit with slide (1417), the bottom fixed mounting of shutoff pad (1415) has fixed block (1418), be equipped with cavity (1419) in fixed block (1418), install roof (1420) in cavity (1419), roof (1420) are connected through supporting shell fragment (1421) with cavity (1419), install connecting pin (1422) on roof (1420), through-hole (1423) have been seted up on cavity (1419), connecting pin (1422) run through-hole (1423), connecting hole (1424) have been seted up on the lateral wall of carousel (1404).
3. The cleaning device with recycling function for germanium single crystal production of claim 2, wherein the cleaning device is characterized in that: the connecting pin (1422) and the connecting hole (1424) are respectively provided with an inclined plane, the plugging pad (1415) is provided with a throwing slope (1425), the end part of the connecting pin (1422) is in rolling fit with a contact ball, and the contact ball is in point contact with the side wall of the turntable (1404).
4. The cleaning device with recycling function for germanium single crystal production according to claim 3, wherein: the cleaning and pollution prevention utilizing assembly (15) comprises a linkage rod (1501), a second sliding hole (1502), a rotating hole (1503), a rotating shaft (1504) and a coupler (1505);
install gangbar (1501) on drive plate (1411), second slide hole (1502) have been seted up to the bottom of cleaning chamber (2), gangbar (1501) run through second slide hole (1502) and are connected with filter screen (13), turn round hole (1503) have been seted up on filter screen (13), pivot (1504) are installed through the bearing in turn round hole (1503), shaft coupler (1505) are installed to the upper end of pivot (1504), shaft coupler (1505) are in same central axis with the lower output shaft of biax driving motor (1402).
5. The cleaning device with recycling function for germanium single crystal production of claim 4, wherein the cleaning device is characterized in that: the cleaning and pollution prevention utilizing assembly (15) further comprises a rotating column (1506), a track (1507), a telescopic rod (1508), a linkage block (1509), a transmission shaft (1510) and a top plate (1511);
the rotary column (1506) is installed to the lower extreme of pivot (1504), be equipped with track (1507) on the circumference lateral wall of rotary column (1506), linkage piece (1509) are installed through telescopic link (1508) in the bottom of filter screen (13), install transmission shaft (1510) on linkage piece (1509), transmission shaft (1510) agree with track (1507), install belladonna (1511) on linkage piece (1509).
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| CN202310451018.2A CN116174383B (en) | 2023-04-25 | 2023-04-25 | Germanium single chip production cleaning equipment with cyclic utilization function |
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| CN202310451018.2A CN116174383B (en) | 2023-04-25 | 2023-04-25 | Germanium single chip production cleaning equipment with cyclic utilization function |
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| KR20200118318A (en) * | 2019-04-05 | 2020-10-15 | 주식회사 디엠에스 | Apparatus for adjusting gap of substrate processing unit and substrate processing apparatus using the same |
| CN115346896A (en) * | 2022-08-21 | 2022-11-15 | 浙江奥首材料科技有限公司 | Wafer cutting protection system |
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| CN108231525B (en) * | 2016-12-14 | 2020-03-31 | 北京北方华创微电子装备有限公司 | Chamber and semiconductor equipment |
| US10991570B2 (en) * | 2017-09-18 | 2021-04-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor wafer cleaning apparatus |
| CN108836230B (en) * | 2018-07-25 | 2020-05-12 | 湖南省春龙竹艺有限公司 | Bamboo mat pillow piece cleaning equipment |
| CN112303459B (en) * | 2020-10-12 | 2021-11-05 | 山东翔球汽保设备有限公司 | Bearing cleaning and oiling all-in-one machine |
| CN115547883A (en) * | 2022-08-18 | 2022-12-30 | 江苏晶曌半导体有限公司 | Semiconductor wafer cleaning and recycling equipment |
| CN218574395U (en) * | 2022-08-21 | 2023-03-07 | 浙江奥首材料科技有限公司 | Wafer protective coating belt cleaning device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200118318A (en) * | 2019-04-05 | 2020-10-15 | 주식회사 디엠에스 | Apparatus for adjusting gap of substrate processing unit and substrate processing apparatus using the same |
| CN115346896A (en) * | 2022-08-21 | 2022-11-15 | 浙江奥首材料科技有限公司 | Wafer cutting protection system |
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