CN116040960A - 一种稳定的无机框架结构光催化TiO2薄膜的制备方法 - Google Patents
一种稳定的无机框架结构光催化TiO2薄膜的制备方法 Download PDFInfo
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- 230000001699 photocatalysis Effects 0.000 title claims abstract description 22
- 229910010413 TiO 2 Inorganic materials 0.000 title claims abstract description 12
- 238000007146 photocatalysis Methods 0.000 title claims abstract description 7
- 238000004519 manufacturing process Methods 0.000 title description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 36
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 29
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 25
- 239000001301 oxygen Substances 0.000 claims abstract description 21
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 21
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- 238000002360 preparation method Methods 0.000 claims abstract description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229920002223 polystyrene Polymers 0.000 claims abstract description 11
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 11
- 239000010936 titanium Substances 0.000 claims abstract description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000004005 microsphere Substances 0.000 claims abstract description 10
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000012159 carrier gas Substances 0.000 claims abstract description 8
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- 238000006243 chemical reaction Methods 0.000 claims abstract description 5
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000001035 drying Methods 0.000 claims abstract description 4
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 238000001354 calcination Methods 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
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Abstract
本发明涉及一种稳定的无机框架结构光催化TiO2薄膜的制备方法,其特征在于:(1)以钛酸丁酯为前驱体、以聚苯乙烯微球为薄膜填充模板制备氧化钛/PS前驱混合溶胶;(2)将前驱混合溶胶镀制在玻璃基板上,烘干、热处理,得到多孔框架微结构氧化钛膜;(3)以氧化钛膜为基底,在其上沉积一层TiO2结构增强层,沉积过程以氩气为反应载气源,以异氧丙醇钛或四二甲氨基钛为钛源,以氧气或者H2O为氧源进行等离子体氧原子层沉积或热氧原子层沉积。本发明优点:本发明制备过程易于控制,由于表面孔结构的存在大大增加了其比表面积,提升了薄膜表面的润湿性,从而使薄膜具有良好的光催化性能、超亲水以及自清洁能力。
Description
技术领域
本发明属于人工微结构功能薄膜制备领域,涉及一种多孔结构薄膜的制备,具体涉及一种稳定的无机框架结构光催化TiO2薄膜的制备方法。
背景技术
长期以来氧化钛以其显著的光催化性能被广泛研究,光催化材料接受光照产生跃迁的自由电子,光生电子或空穴与离子或分子结合生成活性自由基,具有氧化性或还原性,能够将大分子有机物降解。光催化材料广泛应用于玻璃自清洁、污水处理、异味消除、杀菌消毒等领域。而传统的氧化钛自清洁薄膜的光催化性能相对较弱,这样就限制了氧化钛薄膜的应用领域,增强提高其光催化能力,对提高氧化钛薄膜玻璃的自清洁效能同时扩大氧化钛镀膜玻璃的应用领域显得尤为重要。
发明内容
本发明的目的是为了弥补现有技术的不足,提供一种稳定的无机框架结构光催化TiO2薄膜的制备方法。
为了实现上述目的,本发明采用的技术方案如下:
一种稳定的无机框架结构光催化TiO2薄膜的制备方法,其特征在于包括如下步骤:
(1)以钛酸丁酯为前驱体、以聚苯乙烯(PS)微球为薄膜填充模板制备氧化钛/PS前驱混合溶胶;
(2)将氧化钛/PS前驱混合溶胶镀制在玻璃基板上,随后将玻璃基板进行烘干,然后热处理煅烧除去薄膜体结构中的PS微球模板,得到多孔框架微结构氧化钛膜;
(3)以步骤(2)制得的氧化钛膜为基底,在其上沉积一层TiO2结构增强层,沉积过程以氩气为反应载气源,以异氧丙醇钛或四二甲氨基钛为钛源,以氧气或者H2O为氧源进行等离子体氧原子层沉积或热氧原子层沉积。
进一步,所述热处理的温度为400-650℃、时间为1~3h。
进一步,所述热处理的温度为550-600℃、时间为1~2h。
进一步,所述的聚苯乙烯微球的直径为250~700nm。
进一步,所述步骤(3)中原子层沉积本底真空度为0.1~1.0Pa,载气流量为100~200sccm,沉积温度为100~200℃,脉冲循环次数为100~1000次;硅源参数:脉冲30~60ms,吹扫15~30s;氧源的热原子层沉积参数:脉冲10~30ms,吹扫20~35s;氧源的等离子体原子层沉积参数:射频电源功率50~150W,脉冲1000~2000ms,吹扫30~50s。
进一步,所述TiO2结构增强层的厚度为1~20nm。
本发明以钛酸丁酯为前驱体,以聚苯乙烯(PS)微球为薄膜填充模板制备氧化钛/PS前驱混合溶胶,将该混合溶胶在基底上镀膜,将镀膜玻璃置烘干,辅以高温处理去除薄膜体结构中的PS微球模板,即得到一种无机框架结构TiO2薄膜;为保持S1所制备框架结构的稳定性及薄膜与基底的结合力,以S1制备的框架TiO2薄膜为镀膜基底,进行原子层沉积TiO2结构增强层,以氩气为反应载气源,以异氧丙醇钛或四二甲氨基钛为钛源,以氧气或者H2O为氧源进行等离子体氧原子层沉积或热氧原子层沉积。
与现有技术相比,本发明具有如下优点:
1.以模板法制得了多孔框架结构的薄膜,同时利用ALD沉积薄膜对于异形结构基底的均匀成膜及原子级别的厚度可控成膜的特性,达到稳定框架TiO2结构的目的,同时增加了制备的薄膜与基底的结合力;本发明制备过程易于控制,适合大规模的推广;
2.氧化钛薄膜由于表面孔结构的存在大大增加了其比表面积,从而使薄膜具有良好的光催化性能,同时表面微结构的存在提升了薄膜表面的润湿性,使薄膜表现为超亲水。薄膜对水的超小接触角,几乎为0度,展示了氧化钛薄膜玻璃作为自清洁玻璃效能提高的潜力,同时优良的光催化性能能够扩展氧化钛镀膜玻璃的应用领域。
附图说明
图1为本发明实施例1的样品断面扫描图片;
图2为本发明实施例1的样品光催化图谱;
图3为本发明实施例1的样品接触角测试图。
具体实施方式
一种稳定的无机框架结构光催化TiO2薄膜的制备方法,具体实施步骤如下:
实施例1
(1)取20ml酞酸丁酯与60ml无水乙醇混合均匀,加入5ml乙酰丙酮,静置1h,后滴入10ml离子水使酞酸丁酯水解,调解溶液pH=3.0,加入2ml N,N-二甲基甲酰胺,搅拌2h后静置24h得到前驱液;
(2)取5ml前驱液与固含量5%的聚苯乙烯微球乳液0.5ml混合并超声搅拌均匀,得前驱混合溶胶;将前驱混合溶胶以旋涂的方式镀膜,旋涂500r/min,时间5s;将旋涂后的玻璃基板置于120℃的环境下烘干;烘干后玻璃基板置于600℃下热处理1h,使得PS模板热裂解去除,得到多孔框架微结构氧化钛膜;
(3)以多孔框架微结构氧化钛膜基底,在其上沉积一层厚度为10nm 的TiO2结构增强层,以氩气为反应载气源,以异氧丙醇钛为钛源,以氧气为氧源进行等离子体氧原子层沉积;
沉积本底真空度为0.5Pa,载气流量为150sccm,沉积温度为150℃,脉冲循环次数为500次;钛源参数:脉冲45ms,吹扫20s;
以氧气为氧源进行等离子体原子层沉积时,氧源的等离子体原子层沉积参数:射频电源功率50W,脉冲1500ms,吹扫40s。
实施例2
采用和实施例1相同的操作步骤,和实施例1不同之处在于:步骤(3)中以四二甲氨基钛为钛源,以H2O为氧源进行热氧原子层沉积;氧源的热原子层沉积参数:脉冲25ms,吹扫25s。
Claims (6)
1.一种稳定的无机框架结构光催化TiO2薄膜的制备方法,其特征在于包括如下步骤:
(1)以钛酸丁酯为前驱体、以聚苯乙烯微球为薄膜填充模板制备氧化钛/PS前驱混合溶胶;
(2)将氧化钛/PS前驱混合溶胶镀制在玻璃基板上,随后将玻璃基板进行烘干,然后热处理煅烧除去薄膜体结构中的PS微球模板,得到多孔框架微结构氧化钛膜;
(3)以步骤(2)制得的氧化钛膜为基底,在其上沉积一层TiO2结构增强层,沉积过程以氩气为反应载气源,以异氧丙醇钛或四二甲氨基钛为钛源,以氧气或者H2O为氧源进行等离子体氧原子层沉积或热氧原子层沉积。
2.根据权利要求1所述一种稳定的无机框架结构光催化TiO2薄膜的制备方法,其特征在于:所述热处理的温度为400-650℃、时间为1~3h。
3.根据权利要求1所述一种稳定的无机框架结构光催化TiO2薄膜的制备方法,其特征在于:所述热处理的温度为550-600℃、时间为1~2h。
4.根据权利要求1所述一种稳定的无机框架结构光催化TiO2薄膜的制备方法,其特征在于:所述的聚苯乙烯微球的直径为250~700nm。
5.根据权利要求1所述一种稳定的无机框架结构光催化TiO2薄膜的制备方法,其特征在于:所述步骤(3)中原子层沉积本底真空度为0.1~1.0Pa,载气流量为100~200sccm,沉积温度为100~200℃,脉冲循环次数为100~1000次;硅源参数:脉冲30~60ms,吹扫15~30s;氧源的热原子层沉积参数:脉冲10~30ms,吹扫20~35s;氧源的等离子体原子层沉积参数:射频电源功率50~150W,脉冲1000~2000ms,吹扫30~50s。
6.根据权利要求1所述一种稳定的无机框架结构光催化TiO2薄膜的制备方法,其特征在于:所述TiO2结构增强层的厚度为1~20nm。
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Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110171137A1 (en) * | 2008-09-11 | 2011-07-14 | Ramot At Tel-Aviv University Ltd. | Novel nanostructures and process of preparing same |
CN104167293A (zh) * | 2014-08-08 | 2014-11-26 | 青岛科技大学 | 一种染料敏化太阳能电池光阳极及其制备方法 |
CN104888612A (zh) * | 2015-05-25 | 2015-09-09 | 哈尔滨工业大学 | 一种利用原子层沉积对微滤膜进行复合光催化剂改性的方法 |
CN106630666A (zh) * | 2016-12-21 | 2017-05-10 | 蚌埠玻璃工业设计研究院 | 一种具有光催化性能的多孔超亲水薄膜制备方法 |
CN109659375A (zh) * | 2019-01-31 | 2019-04-19 | 中建材蚌埠玻璃工业设计研究院有限公司 | 一种仿生结构空心纳米二氧化硅粒子减反膜的制备方法 |
CN112162439A (zh) * | 2020-10-14 | 2021-01-01 | 中国科学技术大学 | 一种增强二氧化钛电极光学调控能力的方法 |
CN112844384A (zh) * | 2020-12-25 | 2021-05-28 | 北京印刷学院 | 一种基于二氧化钛/铜复合薄膜的光催化器件及其制备方法和应用 |
US20220280929A1 (en) * | 2019-05-14 | 2022-09-08 | Institute Of Coal Chemistry, Chinese Academy Of Sciences | Multi-sandwich composite catalyst and preparation method and application thereof |
-
2022
- 2022-12-29 CN CN202211705818.4A patent/CN116040960B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110171137A1 (en) * | 2008-09-11 | 2011-07-14 | Ramot At Tel-Aviv University Ltd. | Novel nanostructures and process of preparing same |
CN104167293A (zh) * | 2014-08-08 | 2014-11-26 | 青岛科技大学 | 一种染料敏化太阳能电池光阳极及其制备方法 |
CN104888612A (zh) * | 2015-05-25 | 2015-09-09 | 哈尔滨工业大学 | 一种利用原子层沉积对微滤膜进行复合光催化剂改性的方法 |
CN106630666A (zh) * | 2016-12-21 | 2017-05-10 | 蚌埠玻璃工业设计研究院 | 一种具有光催化性能的多孔超亲水薄膜制备方法 |
CN109659375A (zh) * | 2019-01-31 | 2019-04-19 | 中建材蚌埠玻璃工业设计研究院有限公司 | 一种仿生结构空心纳米二氧化硅粒子减反膜的制备方法 |
US20220280929A1 (en) * | 2019-05-14 | 2022-09-08 | Institute Of Coal Chemistry, Chinese Academy Of Sciences | Multi-sandwich composite catalyst and preparation method and application thereof |
CN112162439A (zh) * | 2020-10-14 | 2021-01-01 | 中国科学技术大学 | 一种增强二氧化钛电极光学调控能力的方法 |
CN112844384A (zh) * | 2020-12-25 | 2021-05-28 | 北京印刷学院 | 一种基于二氧化钛/铜复合薄膜的光催化器件及其制备方法和应用 |
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