CN115667572A - 遮挡掩膜版、掩膜版组件及蒸镀装置 - Google Patents

遮挡掩膜版、掩膜版组件及蒸镀装置 Download PDF

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CN115667572A
CN115667572A CN202180000048.0A CN202180000048A CN115667572A CN 115667572 A CN115667572 A CN 115667572A CN 202180000048 A CN202180000048 A CN 202180000048A CN 115667572 A CN115667572 A CN 115667572A
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mask
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area
reticle
plate body
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CN115667572B (zh
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黄琰
吴建鹏
徐倩
牛彤
张国梦
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

一种遮挡掩膜版、掩膜版组件及蒸镀装置，所述遮挡掩膜版包括板体，所述板体包括第一表面，所述板体的第一表面设置为支撑所述掩膜版组件的多个精细金属掩膜版，所述板体设有多个开口，所述开口设置为暴露所述精细金属掩膜版的掩膜图案区；所述板体包括靠近周向边缘的第一区域和被所述第一区域包围的第二区域，在垂直于所述板体的方向上，所述第二区域的第一表面凸出于所述第一区域的第一表面；所述第一区域的第一表面上设有支撑部，所述支撑部避开所述开口，所述支撑部设置为能够与所述第二区域的第一表面共同支撑所述多个精细金属掩膜版。

Description

PCT国内申请，说明书已公开。

Claims (18)

  1. PCT国内申请，权利要求书已公开。
CN202180000048.0A 2021-01-22 2021-01-22 遮挡掩膜版、掩膜版组件及蒸镀装置 Active CN115667572B (zh)

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CN116083842A (zh) * 2023-01-03 2023-05-09 京东方科技集团股份有限公司 掩膜板组件

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CN111549316A (zh) * 2020-06-22 2020-08-18 京东方科技集团股份有限公司 蒸镀用掩膜版
CN111778480A (zh) * 2020-07-15 2020-10-16 京东方科技集团股份有限公司 掩膜集成框架及其组装方法

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US20120156812A1 (en) * 2010-12-20 2012-06-21 Samsung Mobile Display Co., Ltd. Mask frame assembly, method of manufacturing the same, and method of manufacturing organic light-emitting display device using the mask frame assembly
CN106158697A (zh) * 2014-12-19 2016-11-23 三星显示有限公司 掩模框架组件、沉积装置及有机发光显示装置的制造方法
JP2017155338A (ja) * 2016-03-03 2017-09-07 エルジー ディスプレイ カンパニー リミテッド 有機発光素子の蒸着装置
JP2017166029A (ja) * 2016-03-16 2017-09-21 大日本印刷株式会社 蒸着マスクおよび蒸着マスク中間体
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CN106048521A (zh) * 2016-06-12 2016-10-26 鄂尔多斯市源盛光电有限责任公司 一种金属掩膜板的制备方法及金属掩膜板
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CN207109079U (zh) * 2017-05-23 2018-03-16 京东方科技集团股份有限公司 一种双层掩膜版组件和蒸镀装置
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CN210856314U (zh) * 2019-06-24 2020-06-26 昆山国显光电有限公司 一种掩膜版
CN111549316A (zh) * 2020-06-22 2020-08-18 京东方科技集团股份有限公司 蒸镀用掩膜版
CN111778480A (zh) * 2020-07-15 2020-10-16 京东方科技集团股份有限公司 掩膜集成框架及其组装方法

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US20230295790A1 (en) 2023-09-21
WO2022155895A1 (zh) 2022-07-28
CN115667572B (zh) 2024-05-17

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