CN1148800C - 存储器的电容器下电极的制造方法 - Google Patents
存储器的电容器下电极的制造方法 Download PDFInfo
- Publication number
- CN1148800C CN1148800C CNB001227777A CN00122777A CN1148800C CN 1148800 C CN1148800 C CN 1148800C CN B001227777 A CNB001227777 A CN B001227777A CN 00122777 A CN00122777 A CN 00122777A CN 1148800 C CN1148800 C CN 1148800C
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- Prior art keywords
- insulating barrier
- contact window
- conductor layer
- lower electrode
- voluntarily
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB001227777A CN1148800C (zh) | 2000-08-14 | 2000-08-14 | 存储器的电容器下电极的制造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB001227777A CN1148800C (zh) | 2000-08-14 | 2000-08-14 | 存储器的电容器下电极的制造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1338774A CN1338774A (zh) | 2002-03-06 |
CN1148800C true CN1148800C (zh) | 2004-05-05 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CNB001227777A Expired - Lifetime CN1148800C (zh) | 2000-08-14 | 2000-08-14 | 存储器的电容器下电极的制造方法 |
Country Status (1)
Country | Link |
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CN (1) | CN1148800C (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102420214B (zh) * | 2010-09-25 | 2017-06-13 | 中芯国际集成电路制造(上海)有限公司 | 形成强化对准标记的方法以及半导体器件 |
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2000
- 2000-08-14 CN CNB001227777A patent/CN1148800C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
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CN1338774A (zh) | 2002-03-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: TAIWEN INTEGRATED CIRCUIT MANUFACTURE CO., LTD. Free format text: FORMER OWNER: WORLD ADVANCED INTEGRATED CIRCUIT STOCK-SHARING CO., LTD. Effective date: 20110406 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 000000 HSINCHU SCIENCE BASED INDUSTRIAL PARK, TAIWAN, CHINA TO: 000000 HSINCHU CITY, TAIWAN, CHINA |
|
TR01 | Transfer of patent right |
Effective date of registration: 20110406 Address after: 000000 Hsinchu, Taiwan, China Patentee after: Taiwan Semiconductor Manufacturing Co., Ltd. Address before: 000000 Hsinchu Science Industrial Park, Taiwan, China Patentee before: World Advanced Integrated circuit stock-sharing Co., Ltd. |
|
CX01 | Expiry of patent term | ||
CX01 | Expiry of patent term |
Granted publication date: 20040505 |