CN114645281B - Method for removing carbon film on surface of metal workpiece - Google Patents
Method for removing carbon film on surface of metal workpiece Download PDFInfo
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- CN114645281B CN114645281B CN202210356148.3A CN202210356148A CN114645281B CN 114645281 B CN114645281 B CN 114645281B CN 202210356148 A CN202210356148 A CN 202210356148A CN 114645281 B CN114645281 B CN 114645281B
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- 239000002184 metal Substances 0.000 title claims abstract description 123
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 61
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 61
- 238000000034 method Methods 0.000 title claims abstract description 45
- 230000005684 electric field Effects 0.000 claims abstract description 30
- 239000011261 inert gas Substances 0.000 claims abstract description 23
- 239000007789 gas Substances 0.000 claims description 9
- 239000002245 particle Substances 0.000 abstract description 4
- 239000007769 metal material Substances 0.000 abstract description 2
- 238000004544 sputter deposition Methods 0.000 abstract description 2
- 238000000992 sputter etching Methods 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- 238000004381 surface treatment Methods 0.000 abstract description 2
- 210000002381 plasma Anatomy 0.000 description 35
- 238000004140 cleaning Methods 0.000 description 12
- 238000001035 drying Methods 0.000 description 12
- 238000011068 loading method Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 9
- 230000003647 oxidation Effects 0.000 description 8
- 238000007254 oxidation reaction Methods 0.000 description 8
- 230000001590 oxidative effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000002253 acid Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000003513 alkali Substances 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
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- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention belongs to the technical field of metal material surface treatment, and particularly relates to a method for removing a carbon film on the surface of a metal workpiece. The invention adopts a high-frequency electric field to ionize inert gas to obtain plasma mixed with the inert gas, so that the metal piece is completely immersed in the plasma, and the carbon film on the surface of the metal piece is removed through the combined action of high-energy particle sputtering and active ion etching, which is a physical and chemical combined action process. The method can effectively remove the carbon film on the surface of the metal piece, has no damage to the metal piece, does not influence the tolerance size of the metal piece, and simultaneously adopts inert gas without any pollution to the environment, thereby being suitable for large-scale use.
Description
Technical Field
The invention belongs to the technical field of surface treatment of metal materials. And more particularly to a method of removing a carbon film from the surface of a metal workpiece.
Background
The carbon film has the characteristics of high hardness, low friction coefficient and the like, and is widely applied to the surfaces of metal workpieces such as metal cutters, dies, spare parts and the like so as to improve the surface performance of the metal workpieces. In the process of preparing the carbon film on the surface of the metal workpiece and recycling the carbon film metal workpiece, the problem of fading of the original carbon film on the surface of the metal workpiece can be related. If the removal of the carbon film on the surface of the metal workpiece is incomplete, the redeposition of the subsequent carbon film is affected.
The current methods for removing the carbon film include electrolytic removal and physical oxidation removal. The electrolytic stripping is to strip the carbon film on the surface of the metal workpiece in alkaline or acid solution by electrochemical method, as disclosed in Chinese patent application, the method can strip the diamond-like carbon film on the surface of the workpiece to a certain extent, but the stripping solution has certain environmental pollution and is not ideal for the stripping effect of the carbon film with higher density.
The method for removing the film by the physical oxidation method is to remove the film by exciting the oxidizing gas to generate plasmas and reacting the carbon film in the oxidizing gas (oxygen, fluorine-containing gas and the like) in a vacuum environment in a physical mode, and the method is used for removing the film by the diamond-like film, and is not thorough in film removal although the method avoids the use of strong acid and strong alkali, and further treatment is needed to be carried out by auxiliary mechanical means in the follow-up process, and besides, the strong oxidizing gas has an oxidizing effect on the surface of a metal workpiece and has adverse effects on the adhesion of the follow-up film.
Disclosure of Invention
The invention aims to overcome the defects that strong acid and strong alkali stripping liquid which pollutes the environment and incomplete stripping are needed in the existing removal process of the carbon film on the surface of a metal workpiece, and provides a method for stripping the carbon film on the surface of the metal with high stripping efficiency.
The above object of the present invention is achieved by the following technical solutions:
a method for removing a carbon film on the surface of a metal workpiece, comprising the following steps:
after pretreating a metal workpiece of which the carbon film is removed, introducing inert gas, and demolding for 30-240 min under vacuum and in an inert gas plasma atmosphere;
the inert gas is rare gas and N 2 。
In the field of removal of carbon films on the surfaces of metal workpieces, the commonly adopted methods are physicochemical oxidation methods, electrolytic methods and mechanical grinding or the combination of the physicochemical oxidation methods, the electrolytic methods and the mechanical grinding, and the methods inevitably have certain damage to the workpieces. The method is simple in film stripping, does not damage the workpiece, does not damage the substrate, improves the recycling of the cyclic coating film of the workpiece, and is difficult to reduce the production cost. The prior physicochemical oxidation method has small mechanical damage to the workpiece, and the better mold stripping effect can be achieved by using oxidizing gas to perform oxidation, physical action and mechanical action triple action, the oxidation can effectively remove the film layer, a solid foundation is provided for the subsequent physical action and mechanical action mold stripping, and if the oxidation is lack, the physical action is directly adopted to strip the mold, and the mold stripping effect is greatly reduced.
The invention creatively excites Ar and N by a high-frequency electric field (more than 50 KHz) or an ion source 2 Plasma, ar and N 2 The plasma obtains high-energy particles, ar and N under the action of an electric field 2 The high-energy particles strike the carbon film together to generate synergistic effect, activate and etch the carbon film, remove the carbon film on the surface of the metal part through the physicochemical etching effect of plasma, and pass Ar and N without using oxidizing gas 2 The carbon film on the surface of the metal piece can be effectively removed under the combined action of the plasmas, the metal piece is not damaged, and the tolerance size of the metal piece is not affected.
Preferably, the vacuum degree of the vacuum condition is 0.5 to 5Pa.
More preferably, the vacuum condition has a vacuum degree of 1 to 3Pa.
Preferably, the rare gas is Ar.
Preferably, the vacuum treatment is performed before the inert gas is introduced, when the vacuum degree is higher than 1 multiplied by 10 -2 And (5) introducing inert gas during Pa.
More preferably, when the vacuum degree reaches 7×10 -4 Pa～5×10 -3 And (5) introducing inert gas during Pa.
Preferably, the inert gas plasma is obtained under the conditions of 400-1000V electric field voltage and 50 KHz-10 MHz frequency.
More preferably, the inert gas plasma is obtained under the conditions of 600-800V electric field voltage and 60 KHz-1 MHz frequency.
Preferably, the duty cycle (power-on time and total pulse width ratio) of the electric field is 4 to 30%.
Preferably, the inert gas plasma is obtained under the conditions of 200-800V direct current voltage and starting an ion source.
More preferably, the ion source comprises an anode layer ion source, a hot wire arc ion source, an arc ion source, a radio frequency ion source, or a hollow cathode ion source.
Preferably, the metal workpiece acts as a cathode during demolding and the vacuum chamber wall acts as an anode.
Preferably, the demolding time is 100-180 min.
The invention has the following beneficial effects:
the invention adopts a high-frequency electric field to ionize inert gas to obtain plasma mixed with the inert gas, so that the metal piece is completely immersed in the plasma, and the carbon film on the surface of the metal piece is removed through the combined action of high-energy particle sputtering and active ion etching, which is a physical and chemical combined action process. The method can effectively remove the carbon film on the surface of the metal piece, has no damage to the metal piece, does not influence the tolerance size of the metal piece, and simultaneously adopts inert gas without any pollution to the environment, thereby being suitable for large-scale use.
Detailed Description
The present invention is further illustrated below with reference to specific examples, which are not intended to limit the invention in any way. Unless specifically stated otherwise, the reagents, methods and apparatus employed in the present invention are those conventional in the art.
Reagents and materials used in the following examples are commercially available unless otherwise specified.
EXAMPLE 1 removal of carbon film from the surface of Metal workpiece
S1, cleaning a metal workpiece of which a carbon film is to be removed, drying, and loading the metal workpiece on a workpiece carrying table of a vacuum chamber, wherein the workpiece carrying table is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is arranged in the vacuum chamber, vacuumizing the vacuum chamber, and when the vacuum degree reaches 5 multiplied by 10 -3 Ar and N are introduced during Pa 2 The vacuum degree is controlled at 1Pa;
s3, connecting the metal workpiece with a high-frequency electric field, controlling the voltage of the electric field at 800V, controlling the duty ratio (the power-on time and the total pulse width ratio) at 10%, controlling the frequency at 100KHz, exciting plasma, and immersing the metal workpiece in the plasma to remove the film, wherein the film removing time is 180min;
and S4, after the removal is finished, opening the vacuum chamber, and taking out the metal workpiece.
EXAMPLE 2 removal of carbon film from surface of Metal workpiece
S1, cleaning a metal workpiece of which a carbon film is to be removed, drying, and loading the metal workpiece on a workpiece carrying table of a vacuum chamber, wherein the workpiece carrying table is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is arranged in the vacuum chamber, vacuumizing the vacuum chamber, and when the vacuum degree reaches 5 multiplied by 10 -3 Ar and N are introduced during Pa 2 The vacuum degree is controlled at 2Pa;
s3, connecting the metal workpiece with a power supply, controlling the voltage at 600V, starting an anode layer ion source to excite plasma, and immersing the metal workpiece in the plasma to remove the film, wherein the film removing time is 120min;
and S4, after the removal is finished, opening the vacuum chamber, and taking out the metal workpiece.
EXAMPLE 3 removal of carbon film from the surface of Metal workpiece
S1, cleaning a metal piece to be subjected to carbon film removal, drying, and loading the metal piece on a workpiece carrying platform of a vacuum chamber, wherein the workpiece carrying platform is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is arranged in the vacuum chamber, vacuumizing the vacuum chamber, and when the vacuum degree reaches 5 multiplied by 10 -3 Ar and N2 are introduced during Pa, and the vacuum degree is controlled to be 1Pa;
s3, connecting the metal workpiece with a high-frequency electric field, controlling the voltage of a power supply at 400V, controlling the duty ratio at 5%, controlling the frequency at 10MHz, exciting plasma, and immersing the metal workpiece in the plasma to perform film stripping for 240min;
and S4, after film removal, opening the vacuum chamber, and taking out the metal workpiece.
The difference from example 1 is that in step S3, the duty ratio in example 1 is controlled to be 10% and 5% and the frequency is controlled to be 100KHz and 10MHz, respectively, the film removing time is 180min and 240min, and the other conditions and methods are the same as those in example 1.
EXAMPLE 4 removal of carbon film from the surface of Metal workpiece
S1, cleaning a metal piece to be subjected to carbon film removal, drying, and loading the metal piece on a workpiece carrying platform of a vacuum chamber, wherein the workpiece carrying platform is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is arranged in the vacuum chamber, vacuumizing the vacuum chamber, and when the vacuum degree reaches5×10 -3 Ar and N2 are introduced during Pa, and the vacuum degree is controlled to be 1Pa;
s3, connecting the metal workpiece with a high-frequency electric field, controlling the voltage of a power supply at 400V, controlling the duty ratio at 25%, controlling the frequency at 120KHz, exciting plasma, and immersing the metal workpiece in the plasma to perform film stripping for 200min;
and S4, after film removal, opening the vacuum chamber, and taking out the metal workpiece.
The difference from example 1 is that in step S3, the duty ratio in example 1 is controlled to be 10% and 25% and the frequency is controlled to be 100KHz and 120KHz, and the film removing time is 180min and 200min, and the other conditions and methods are the same as those in example 1.
EXAMPLE 5 removal of carbon film from surface of Metal workpiece
S1, cleaning a metal workpiece of which a carbon film is to be removed, drying, and loading the metal workpiece on a workpiece carrying table of a vacuum chamber, wherein the workpiece carrying table is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is arranged in the vacuum chamber, vacuumizing the vacuum chamber, and when the vacuum degree reaches 5 multiplied by 10 -3 Ar and N are introduced during Pa 2 The vacuum degree is controlled at 4Pa;
s3, connecting the metal workpiece with a high-frequency electric field, controlling the voltage of the electric field at 800V, controlling the duty ratio at 10%, controlling the frequency at 100KHz, exciting plasma, and immersing the metal workpiece in the plasma to remove the film for 180min;
and S4, after the removal is finished, opening the vacuum chamber, and taking out the metal workpiece.
The difference from example 1 is that in step S2, the vacuum degree in example 1 was controlled to be 1Pa and the vacuum degree was controlled to be 4Pa, and the other conditions and methods were the same as those in example 1.
EXAMPLE 6 removal of carbon film from surface of Metal workpiece
S1, cleaning a metal workpiece of which a carbon film is to be removed, drying, and loading the metal workpiece on a workpiece carrying table of a vacuum chamber, wherein the workpiece carrying table is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is put into the vacuum chamberVacuumizing the vacuum chamber until the vacuum degree reaches 5×10 -3 Ar and N are introduced during Pa 2 The vacuum degree is controlled at 2Pa;
s3, connecting the metal workpiece with a power supply, controlling the voltage at 600V, starting an arc ion source to excite plasma, and immersing the metal workpiece in the plasma to remove the film, wherein the film removing time is 120min;
and S4, after the removal is finished, opening the vacuum chamber, and taking out the metal workpiece.
The difference from example 2 is that in step S3, the anode layer ion source in example 2 is changed to an arc ion source, and the other conditions and methods are the same as those in example 2.
Comparative example 1 removal of carbon film from surface of Metal workpiece
S1, cleaning a metal workpiece of which a carbon film is to be removed, drying, and loading the metal workpiece on a workpiece carrying table of a vacuum chamber, wherein the workpiece carrying table is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is arranged in the vacuum chamber, vacuumizing the vacuum chamber, and when the vacuum degree reaches 5 multiplied by 10 -3 Ar and N are introduced during Pa 2 The vacuum degree is controlled at 6Pa;
s3, connecting the metal workpiece with a high-frequency electric field, controlling the voltage of the electric field at 800V, controlling the duty ratio at 10%, controlling the frequency at 100KHz, exciting plasma, and immersing the metal workpiece in the plasma to remove the film for 180min;
and S4, after the removal is finished, opening the vacuum chamber, and taking out the metal workpiece.
The difference from example 1 is that in step S2, the vacuum degree in example 1 was controlled to be 1Pa and the vacuum degree was controlled to be 6Pa, and the other conditions and methods were the same as those in example 1.
Comparative example 2 removal of carbon film from surface of Metal workpiece
S1, cleaning a metal workpiece of which a carbon film is to be removed, drying, and loading the metal workpiece on a workpiece carrying table of a vacuum chamber, wherein the workpiece carrying table is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is arranged in the vacuum chamber, vacuumizing the vacuum chamber, and when the vacuum degree reaches 5 multiplied by 10 -3 Ar and N are introduced during Pa 2 The vacuum degree is controlled at 0.1Pa;
s3, connecting the metal workpiece with a high-frequency electric field, controlling the voltage of the electric field at 800V, controlling the duty ratio at 10%, controlling the frequency at 100KHz, exciting plasma, and immersing the metal workpiece in the plasma to remove the film for 180min;
and S4, after the removal is finished, opening the vacuum chamber, and taking out the metal workpiece.
The difference from example 1 is that in step S2, the vacuum degree in example 1 was controlled to be 1Pa and the vacuum degree was controlled to be 0.1Pa, and the other conditions and methods were the same as those in example 1.
Comparative example 3 removal of carbon film from surface of Metal workpiece
S1, cleaning a metal workpiece of which a carbon film is to be removed, drying, and loading the metal workpiece on a workpiece carrying table of a vacuum chamber, wherein the workpiece carrying table is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is arranged in the vacuum chamber, vacuumizing the vacuum chamber, and when the vacuum degree reaches 5 multiplied by 10 -3 Ar and N are introduced during Pa 2 The vacuum degree is controlled at 1Pa;
s3, connecting the metal workpiece with a high-frequency electric field, controlling the voltage of the electric field at 800V, controlling the duty ratio at 3%, controlling the frequency at 100KHz, exciting plasma, and immersing the metal workpiece in the plasma to remove the film for 180min;
and S4, after the removal is finished, opening the vacuum chamber, and taking out the metal workpiece.
The difference from example 1 is that in step S3, the duty ratio in example 1 is controlled to 10% and the duty ratio is controlled to 3%, and the other conditions and methods are the same as those in example 1.
Comparative example 4 removal of carbon film from surface of Metal workpiece
S1, cleaning a metal workpiece of which a carbon film is to be removed, drying, and loading the metal workpiece on a workpiece carrying table of a vacuum chamber, wherein the workpiece carrying table is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is arranged in the vacuum chamber, vacuumizing the vacuum chamber, and when the vacuum degree reaches 5 multiplied by 10 -3 Ar and N are introduced during Pa 2 The vacuum degree is controlled at 1Pa；
S3, connecting the metal workpiece with a high-frequency electric field, controlling the voltage of the electric field at 800V, controlling the duty ratio at 35%, controlling the frequency at 100KHz, exciting plasma, and immersing the metal workpiece in the plasma to remove the film for 180min;
and S4, after the removal is finished, opening the vacuum chamber, and taking out the metal workpiece.
The difference from example 1 is that in step S3, the duty ratio in example 1 is controlled to 10% and the duty ratio is controlled to 35%, and the other conditions and methods are the same as those in example 1.
Comparative example 5 removal of carbon film from surface of Metal workpiece
S1, cleaning a metal workpiece of which a carbon film is to be removed, drying, and loading the metal workpiece on a workpiece carrying table of a vacuum chamber, wherein the workpiece carrying table is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is arranged in the vacuum chamber, vacuumizing the vacuum chamber, and when the vacuum degree reaches 5 multiplied by 10 -3 Ar and N are introduced during Pa 2 The vacuum degree is controlled at 2Pa;
s3, connecting the metal workpiece with a high-frequency electric field, controlling the voltage of the electric field to be 1000V, starting an ion source to excite plasma, and immersing the metal workpiece in the plasma to remove the film, wherein the film removing time is 120min;
and S4, after the removal is finished, opening the vacuum chamber, and taking out the metal workpiece.
The difference from example 2 is that in step S3, the electric field voltage in example 2 was changed to 600V and 1000V, and the other conditions and methods were the same as those in example 2.
Comparative example 6 removal of carbon film from surface of Metal workpiece
S1, cleaning a metal workpiece of which a carbon film is to be removed, drying, and loading the metal workpiece on a workpiece carrying table of a vacuum chamber, wherein the workpiece carrying table is insulated from a vacuum cavity and connected with a cathode;
s2, after the metal workpiece is arranged in the vacuum chamber, vacuumizing the vacuum chamber, and when the vacuum degree reaches 5 multiplied by 10 -3 Ar and N are introduced during Pa 2 The vacuum degree is controlled at 2Pa;
s3, connecting the metal workpiece with a high-frequency electric field, controlling the voltage of the electric field to be 150V, starting an ion source to excite plasma, and immersing the metal workpiece in the plasma to remove the film, wherein the film removing time is 120min;
and S4, after the removal is finished, opening the vacuum chamber, and taking out the metal workpiece.
The difference from example 2 is that in step S3, the electric field voltage in example 2 was changed to 600V and 150V, and the other conditions and methods were the same as those in example 2.
Experimental example 1 study of the removal Rate of the carbon film of the Metal workpiece
Recording the metal workpiece before and after treatment.
The removal rates of the carbon films treated in examples 1 to 5 and comparative examples 1 to 6 are shown in Table 1: the removal rate of the carbon film treated in examples 1 to 5 is above 10nm/min, wherein the removal rate of the carbon film in example 5 is best and reaches 15nm/min. The carbon film removal rates of comparative examples 1 to 6 were only 2 to 5nm/min, which are lower than those of examples, demonstrating that the method of the present invention can effectively improve the carbon film removal rate on the surface of the metal workpiece.
Table 1: carbon film removal rate after treatment of examples 1 to 5 and comparative examples 1 to 6
The above examples are preferred embodiments of the present invention, but the embodiments of the present invention are not limited to the above examples, and any other changes, modifications, substitutions, combinations, and simplifications that do not depart from the spirit and principle of the present invention should be made in the equivalent manner, and the embodiments are included in the protection scope of the present invention.
Claims (6)
1. A method for removing a carbon film on the surface of a metal workpiece, comprising the steps of:
after pretreating a metal workpiece of which the carbon film is removed, introducing inert gas, and demolding for 30-240 min under vacuum and in an inert gas plasma atmosphere;
the inert gas is rare gas and N 2 ；
The vacuum degree of the vacuum condition is 0.5-5 Pa;
the inert gas plasma is obtained under the conditions of 400-1000V electric field voltage and 50 KHz-10 MHz frequency;
the duty ratio of the electric field is 4-30%;
the inert gas plasma is obtained under the condition of 200-800V direct current voltage and starting an ion source.
2. The method according to claim 1, wherein the vacuum condition has a vacuum degree of 1 to 3Pa.
3. The method according to claim 1, wherein the inert gas is introduced and the vacuum is applied before the vacuum is applied, when the vacuum is higher than 1X 10 -2 And (5) introducing inert gas during Pa.
4. The method of claim 1, wherein the inert gas plasma is obtained at an electric field voltage of 600-800V and a frequency of 60-1 MHz.
5. The method of claim 1, wherein the ion source comprises an anode layer ion source, a hot wire arc ion source, an arc ion source, a radio frequency ion source, or a hollow cathode ion source.
6. The method of claim 1, wherein the metal workpiece acts as a cathode during demolding.
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| FT-IR Characterization of EPDM Rubber Surface Treated By Microwave Plasma Caracterização por FT-IR da superfície de borracha EPDM tratada via plasma por micro-ondas;dos Santos, Renata P.等;《POLIMEROS-CIENCIA E TECNOLOGIA 》;第22卷(第5期);全文 * |
| 等离子体射流特性及在金属表面清洗中的应用;金英;《中国博士学位论文全文数据库 基础科学辑》(第3期);\"1.1.2干法清洗\"、\"1.2等离子体清洗的机理\"、\"1.3等离子体清洗源\"、\"1.3等离子体清洗源\" * |
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