CN114450587A - 成像质量分析装置 - Google Patents

成像质量分析装置 Download PDF

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Publication number
CN114450587A
CN114450587A CN202080067563.6A CN202080067563A CN114450587A CN 114450587 A CN114450587 A CN 114450587A CN 202080067563 A CN202080067563 A CN 202080067563A CN 114450587 A CN114450587 A CN 114450587A
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CN
China
Prior art keywords
sample
unit
irradiation
confirmation
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202080067563.6A
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English (en)
Chinese (zh)
Inventor
三嶋贤一
竹下建悟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
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Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Publication of CN114450587A publication Critical patent/CN114450587A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/64—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode using wave or particle radiation to ionise a gas, e.g. in an ionisation chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/0004—Imaging particle spectrometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
    • H01J49/161—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission using photoionisation, e.g. by laser
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/622—Ion mobility spectrometry
    • G01N27/623—Ion mobility spectrometry combined with mass spectrometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
    • H01J49/161—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission using photoionisation, e.g. by laser
    • H01J49/164—Laser desorption/ionisation, e.g. matrix-assisted laser desorption/ionisation [MALDI]

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Toxicology (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
  • Molecular Biology (AREA)
CN202080067563.6A 2019-10-16 2020-09-29 成像质量分析装置 Pending CN114450587A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019189191 2019-10-16
JP2019-189191 2019-10-16
PCT/JP2020/036855 WO2021075254A1 (ja) 2019-10-16 2020-09-29 イメージング質量分析装置

Publications (1)

Publication Number Publication Date
CN114450587A true CN114450587A (zh) 2022-05-06

Family

ID=75537957

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080067563.6A Pending CN114450587A (zh) 2019-10-16 2020-09-29 成像质量分析装置

Country Status (4)

Country Link
US (1) US12154772B2 (https=)
JP (1) JP7215591B2 (https=)
CN (1) CN114450587A (https=)
WO (1) WO2021075254A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121367112A (zh) * 2025-12-23 2026-01-20 联影越质科学仪器(武汉)有限公司 检测设备的参数调整方法、装置、设备、介质和程序产品

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7147990B2 (ja) * 2019-07-29 2022-10-05 株式会社島津製作所 イオン化装置

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007097023A1 (ja) * 2006-02-27 2007-08-30 Shimadzu Corporation 質量分析装置
JP2007257851A (ja) * 2006-03-20 2007-10-04 Shimadzu Corp 質量分析装置
CN102194642A (zh) * 2010-02-18 2011-09-21 株式会社岛津制作所 质谱仪
CN103499335A (zh) * 2013-09-10 2014-01-08 紫光股份有限公司 一种三维测距方法及其装置
CN104254426A (zh) * 2013-04-26 2014-12-31 三菱电机株式会社 曲率控制装置及激光加工机
CN104765128A (zh) * 2015-04-21 2015-07-08 长春理工大学 机载激光通信系统环境离焦自适应补偿方法
CN109073593A (zh) * 2016-04-18 2018-12-21 株式会社岛津制作所 质谱分析装置
CN109961438A (zh) * 2019-04-08 2019-07-02 武汉华工激光工程有限责任公司 一种光斑图像分析方法及装置
CN110132150A (zh) * 2019-05-10 2019-08-16 公安部第三研究所 可见光源光斑尺寸测试的系统及其方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7846152B2 (en) * 2004-03-24 2010-12-07 Amo Manufacturing Usa, Llc. Calibrating laser beam position and shape using an image capture device
JP4775821B2 (ja) * 2005-08-12 2011-09-21 株式会社島津製作所 質量分析装置
JP5502717B2 (ja) * 2010-12-20 2014-05-28 株式会社東芝 重粒子線治療用重粒子イオン発生装置
US9673029B2 (en) 2013-03-15 2017-06-06 Micromass Uk Limited Automated tuning for MALDI ion imaging
AU2017207276A1 (en) * 2016-01-11 2018-07-26 Elemental Scientific Lasers, Llc Simultaneous pattern-scan placement during sample processing
CN109642889B (zh) 2016-08-24 2021-08-10 株式会社岛津制作所 成像质谱分析装置

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007097023A1 (ja) * 2006-02-27 2007-08-30 Shimadzu Corporation 質量分析装置
JP2007257851A (ja) * 2006-03-20 2007-10-04 Shimadzu Corp 質量分析装置
CN102194642A (zh) * 2010-02-18 2011-09-21 株式会社岛津制作所 质谱仪
CN104254426A (zh) * 2013-04-26 2014-12-31 三菱电机株式会社 曲率控制装置及激光加工机
CN103499335A (zh) * 2013-09-10 2014-01-08 紫光股份有限公司 一种三维测距方法及其装置
CN104765128A (zh) * 2015-04-21 2015-07-08 长春理工大学 机载激光通信系统环境离焦自适应补偿方法
CN109073593A (zh) * 2016-04-18 2018-12-21 株式会社岛津制作所 质谱分析装置
CN109961438A (zh) * 2019-04-08 2019-07-02 武汉华工激光工程有限责任公司 一种光斑图像分析方法及装置
CN110132150A (zh) * 2019-05-10 2019-08-16 公安部第三研究所 可见光源光斑尺寸测试的系统及其方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121367112A (zh) * 2025-12-23 2026-01-20 联影越质科学仪器(武汉)有限公司 检测设备的参数调整方法、装置、设备、介质和程序产品

Also Published As

Publication number Publication date
JPWO2021075254A1 (https=) 2021-04-22
US20220326181A1 (en) 2022-10-13
US12154772B2 (en) 2024-11-26
WO2021075254A1 (ja) 2021-04-22
JP7215591B2 (ja) 2023-01-31

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