CN114326310B - 芯-壳化合物、感光性树脂组合物、感光性树脂层、彩色滤光片及cmos图像传感器 - Google Patents

芯-壳化合物、感光性树脂组合物、感光性树脂层、彩色滤光片及cmos图像传感器 Download PDF

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Publication number
CN114326310B
CN114326310B CN202111154046.5A CN202111154046A CN114326310B CN 114326310 B CN114326310 B CN 114326310B CN 202111154046 A CN202111154046 A CN 202111154046A CN 114326310 B CN114326310 B CN 114326310B
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CN114326310A (zh
Inventor
李英
金善大
杨叡知
高埰赫
金二柱
柳娥凛
赵明镐
冯新惠
李贞璇
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Samsung SDI Co Ltd
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Samsung SDI Co Ltd
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Priority claimed from KR1020200127362A external-priority patent/KR102761651B1/ko
Priority claimed from KR1020200127363A external-priority patent/KR102670556B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8053—Colour filters
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/806—Optical elements or arrangements associated with the image sensors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Silicon Polymers (AREA)
  • Graft Or Block Polymers (AREA)
CN202111154046.5A 2020-09-29 2021-09-29 芯-壳化合物、感光性树脂组合物、感光性树脂层、彩色滤光片及cmos图像传感器 Active CN114326310B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020200127362A KR102761651B1 (ko) 2020-09-29 2020-09-29 코어-쉘 화합물, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 cmos 이미지 센서
KR1020200127363A KR102670556B1 (ko) 2020-09-29 2020-09-29 코어-쉘 화합물, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 cmos 이미지 센서
KR10-2020-0127363 2020-09-29
KR10-2020-0127362 2020-09-29

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Publication Number Publication Date
CN114326310A CN114326310A (zh) 2022-04-12
CN114326310B true CN114326310B (zh) 2025-06-03

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Country Status (4)

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US (1) US12055851B2 (enExample)
JP (1) JP7220267B2 (enExample)
CN (1) CN114326310B (enExample)
TW (1) TWI802026B (enExample)

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KR102883277B1 (ko) * 2021-09-28 2025-11-06 삼성에스디아이 주식회사 코어-쉘 염료, 이를 포함하는 감광성 수지 조성물 및 컬러 필터
JP2023167345A (ja) * 2022-05-11 2023-11-24 Jsr株式会社 色素多量体、着色組成物、カラーフィルター及び表示素子

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CN114326310A (zh) 2022-04-12
JP7220267B2 (ja) 2023-02-09
US20220100085A1 (en) 2022-03-31
US12055851B2 (en) 2024-08-06
JP2022056406A (ja) 2022-04-08
TW202212327A (zh) 2022-04-01
TWI802026B (zh) 2023-05-11

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