TWI802026B - 核-殼化合物、包括其的感光性樹脂組成物、感光性樹脂層、彩色濾光片及cmos影像感測器 - Google Patents
核-殼化合物、包括其的感光性樹脂組成物、感光性樹脂層、彩色濾光片及cmos影像感測器 Download PDFInfo
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- TWI802026B TWI802026B TW110136066A TW110136066A TWI802026B TW I802026 B TWI802026 B TW I802026B TW 110136066 A TW110136066 A TW 110136066A TW 110136066 A TW110136066 A TW 110136066A TW I802026 B TWI802026 B TW I802026B
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- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- CWHJLNJICCBAOK-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-6-yl)ethyl]silane Chemical compound C1CCCC2OC21CC[Si](OC)(OC)OC CWHJLNJICCBAOK-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- MZIGEXAGOVUGIC-UHFFFAOYSA-N trimethyl (5-methyl-4-oxohex-5-enyl) silicate Chemical compound CO[Si](OC)(OC)OCCCC(=O)C(C)=C MZIGEXAGOVUGIC-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
- H10F39/8053—Colour filters
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Engineering & Computer Science (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Optical Filters (AREA)
- Epoxy Resins (AREA)
- Graft Or Block Polymers (AREA)
- Silicon Polymers (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020200127362A KR102761651B1 (ko) | 2020-09-29 | 2020-09-29 | 코어-쉘 화합물, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 cmos 이미지 센서 |
| KR10-2020-0127362 | 2020-09-29 | ||
| KR1020200127363A KR102670556B1 (ko) | 2020-09-29 | 2020-09-29 | 코어-쉘 화합물, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 cmos 이미지 센서 |
| KR10-2020-0127363 | 2020-09-29 |
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|---|---|
| TW202212327A TW202212327A (zh) | 2022-04-01 |
| TWI802026B true TWI802026B (zh) | 2023-05-11 |
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| TW110136066A TWI802026B (zh) | 2020-09-29 | 2021-09-28 | 核-殼化合物、包括其的感光性樹脂組成物、感光性樹脂層、彩色濾光片及cmos影像感測器 |
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| US (1) | US12055851B2 (enExample) |
| JP (1) | JP7220267B2 (enExample) |
| CN (1) | CN114326310B (enExample) |
| TW (1) | TWI802026B (enExample) |
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| KR102883277B1 (ko) * | 2021-09-28 | 2025-11-06 | 삼성에스디아이 주식회사 | 코어-쉘 염료, 이를 포함하는 감광성 수지 조성물 및 컬러 필터 |
| JP2023167345A (ja) * | 2022-05-11 | 2023-11-24 | Jsr株式会社 | 色素多量体、着色組成物、カラーフィルター及び表示素子 |
Citations (3)
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| US12055851B2 (en) | 2024-08-06 |
| US20220100085A1 (en) | 2022-03-31 |
| TW202212327A (zh) | 2022-04-01 |
| JP7220267B2 (ja) | 2023-02-09 |
| CN114326310B (zh) | 2025-06-03 |
| CN114326310A (zh) | 2022-04-12 |
| JP2022056406A (ja) | 2022-04-08 |
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