CN114200564B - 曲面贴合光栅偏振膜片及其制造方法与金属栅模具 - Google Patents
曲面贴合光栅偏振膜片及其制造方法与金属栅模具 Download PDFInfo
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- CN114200564B CN114200564B CN202111516178.8A CN202111516178A CN114200564B CN 114200564 B CN114200564 B CN 114200564B CN 202111516178 A CN202111516178 A CN 202111516178A CN 114200564 B CN114200564 B CN 114200564B
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- grating
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- included angle
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 83
- 239000002184 metal Substances 0.000 title claims abstract description 83
- 230000010287 polarization Effects 0.000 title claims abstract description 58
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 238000005530 etching Methods 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims description 44
- 239000000463 material Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 22
- 229920002120 photoresistant polymer Polymers 0.000 claims description 16
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 238000004378 air conditioning Methods 0.000 claims description 6
- 238000009713 electroplating Methods 0.000 claims description 6
- 239000012528 membrane Substances 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 238000000206 photolithography Methods 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 230000003667 anti-reflective effect Effects 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 238000011161 development Methods 0.000 claims description 3
- 239000003989 dielectric material Substances 0.000 claims description 3
- 238000004070 electrodeposition Methods 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229920003023 plastic Polymers 0.000 claims description 3
- 239000004033 plastic Substances 0.000 claims description 3
- 239000002861 polymer material Substances 0.000 claims description 3
- 239000002096 quantum dot Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 239000002086 nanomaterial Substances 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 238000010023 transfer printing Methods 0.000 abstract description 6
- 238000002834 transmittance Methods 0.000 abstract description 3
- 238000010884 ion-beam technique Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 46
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 230000008033 biological extinction Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000009467 reduction Effects 0.000 description 7
- 230000008021 deposition Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000013041 optical simulation Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000000016 photochemical curing Methods 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000000992 sputter etching Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910001423 beryllium ion Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/44—Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Thermal Sciences (AREA)
- Polarising Elements (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
Description
Claims (18)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202111516178.8A CN114200564B (zh) | 2021-12-07 | 2021-12-07 | 曲面贴合光栅偏振膜片及其制造方法与金属栅模具 |
TW110147284A TWI786998B (zh) | 2021-12-07 | 2021-12-16 | 曲面貼合光柵偏振膜片及其製造方法與金屬柵模具 |
Applications Claiming Priority (1)
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---|---|---|---|
CN202111516178.8A CN114200564B (zh) | 2021-12-07 | 2021-12-07 | 曲面贴合光栅偏振膜片及其制造方法与金属栅模具 |
Publications (2)
Publication Number | Publication Date |
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CN114200564A CN114200564A (zh) | 2022-03-18 |
CN114200564B true CN114200564B (zh) | 2023-05-05 |
Family
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Family Applications (1)
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CN202111516178.8A Active CN114200564B (zh) | 2021-12-07 | 2021-12-07 | 曲面贴合光栅偏振膜片及其制造方法与金属栅模具 |
Country Status (2)
Country | Link |
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CN (1) | CN114200564B (zh) |
TW (1) | TWI786998B (zh) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102866445A (zh) * | 2012-10-15 | 2013-01-09 | 上海理工大学 | 一种凹面闪耀光栅的设计方法 |
CN104335082A (zh) * | 2012-06-08 | 2015-02-04 | 株式会社日立高新技术 | 曲面衍射光栅的制造方法、曲面衍射光栅的模具以及使用该曲面衍射光栅的模具的曲面衍射光栅 |
TW201738585A (zh) * | 2016-04-15 | 2017-11-01 | 中央研究院 | 曲面繞射光柵、光譜儀及曲面繞射光柵製造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4250906B2 (ja) * | 2002-04-23 | 2009-04-08 | コニカミノルタホールディングス株式会社 | 光学素子 |
JP2004344994A (ja) * | 2003-05-20 | 2004-12-09 | Sankyo Seiki Mfg Co Ltd | 段差形成方法、レンズ成形用金型、およびレンズ |
WO2010005059A1 (ja) * | 2008-07-10 | 2010-01-14 | 旭硝子株式会社 | ワイヤグリッド型偏光子およびその製造方法 |
JP5273248B2 (ja) * | 2009-07-01 | 2013-08-28 | 旭硝子株式会社 | 微細凹凸構造を表面に有する物品の製造方法およびワイヤグリッド型偏光子の製造方法 |
EP3054455A4 (en) * | 2013-10-25 | 2017-06-21 | Konica Minolta, Inc. | Curved grating manufacturing method, curved grating, grating unit, and x-ray imaging device |
CN103645532B (zh) * | 2013-11-29 | 2016-02-17 | 东莞市金达照明有限公司 | 一种用于制作凹面闪耀光栅的基材结构及凹面闪耀光栅制作方法 |
CN107209304B (zh) * | 2015-01-19 | 2020-06-16 | Agc株式会社 | 光学装置及光学构件 |
CN106482832B (zh) * | 2015-08-24 | 2021-05-25 | 台湾超微光学股份有限公司 | 光谱仪、单光仪、绕射光栅及其制造方法与母模制造方法 |
CN105388546B (zh) * | 2015-12-21 | 2017-09-05 | 中国工程物理研究院流体物理研究所 | 一种凹面体全息光栅 |
CN109212655B (zh) * | 2017-06-30 | 2020-01-24 | 京东方科技集团股份有限公司 | 背光源及其制造方法、显示装置 |
CN109709636A (zh) * | 2018-12-12 | 2019-05-03 | 深圳先进技术研究院 | 一种曲面光栅的加工装置及加工方法 |
CN111564119B (zh) * | 2020-05-12 | 2023-03-28 | Oppo广东移动通信有限公司 | 显示屏组件及其制造方法,以及电子设备 |
-
2021
- 2021-12-07 CN CN202111516178.8A patent/CN114200564B/zh active Active
- 2021-12-16 TW TW110147284A patent/TWI786998B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104335082A (zh) * | 2012-06-08 | 2015-02-04 | 株式会社日立高新技术 | 曲面衍射光栅的制造方法、曲面衍射光栅的模具以及使用该曲面衍射光栅的模具的曲面衍射光栅 |
CN102866445A (zh) * | 2012-10-15 | 2013-01-09 | 上海理工大学 | 一种凹面闪耀光栅的设计方法 |
TW201738585A (zh) * | 2016-04-15 | 2017-11-01 | 中央研究院 | 曲面繞射光柵、光譜儀及曲面繞射光柵製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TW202323867A (zh) | 2023-06-16 |
TWI786998B (zh) | 2022-12-11 |
CN114200564A (zh) | 2022-03-18 |
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Effective date of registration: 20240112 Address after: 518109, Building E4, 101, Foxconn Industrial Park, No. 2 East Ring 2nd Road, Fukang Community, Longhua Street, Longhua District, Shenzhen City, Guangdong Province (formerly Building 1, 1st Floor, G2 District), H3, H1, and H7 factories in K2 District, North Shenchao Optoelectronic Technology Park, Minqing Road, Guangdong Province Patentee after: INTERFACE OPTOELECTRONICS (SHENZHEN) Co.,Ltd. Patentee after: Interface Technology (Chengdu) Co., Ltd. Patentee after: GENERAL INTERFACE SOLUTION Ltd. Address before: No.689 Hezuo Road, West District, high tech Zone, Chengdu City, Sichuan Province Patentee before: Interface Technology (Chengdu) Co., Ltd. Patentee before: INTERFACE OPTOELECTRONICS (SHENZHEN) Co.,Ltd. Patentee before: Yicheng Photoelectric (Wuxi) Co.,Ltd. Patentee before: GENERAL INTERFACE SOLUTION Ltd. |