CN114163672A - 一种低析出聚酯薄膜及其制备方法 - Google Patents
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Abstract
一种低析出聚酯薄膜，所述聚酯薄膜包括聚酯基膜和涂布在所述聚酯基膜表面的低析出涂层，所述低析出涂层为水溶性涂布液经涂布、固化得到，一百质量分数的所述水溶性涂布液包括4‑12质量份数的水溶性树脂、85‑95质量份数的去离子水、0.5‑3质量份数的交联剂和0.1‑0.3质量份数的表面活性剂。本发明在聚酯基膜上涂布低析出涂层，有效减少聚酯基膜内部低分子量物质的析出，防止聚酯薄膜在后续的加工过程中透光率下降和雾度增加。
Description
技术领域
本发明涉及一种低析出聚酯薄膜及其制备方法，属于高分子材料技术领域。
背景技术
聚酯薄膜在其生产和使用过程中，因加工工艺会造成低分子量物质析出。这些低分子量物质析出主要由以下四个方面造成的：1、聚酯薄膜主要采用熔融共挤的方式生产，在挤出过程中，挤出机的温度较高，聚酯切片分子链会发生断裂产生低分子量链段；2、使用回收料会导致较多的低分子量链段产生；3、为了提高被贴合物质的附着力，聚酯薄膜需要进行电晕处理，电晕处理过程中聚酯分子容易降解成低分子量物质；4、聚酯薄膜使用过程中基本都要经过老化测试，高温高湿的测试环境会加速低分子量物质的产生和析出。这些低分子量物质从聚酯薄膜内部迁移到表面，导致聚酯薄膜表面产生发白、模糊等现象，造成聚酯薄膜的透光率下降，雾度增加，严重影响薄膜的使用。特别是当聚酯薄膜作为ITO导电膜的基膜或者作为高温保护膜时，低分子物质在薄膜表面析出将污染相关部件，甚至工作环境。
在现有技术中，可以通过控制聚酯切片合成工艺，制备低析出聚酯切片，避免低分子量物质产生，但工艺复杂，成本较高。也有通过在聚酯薄膜的两侧增加涂层的方式来改善析出的问题。例如申请号为201911127311.3的发明专利，通过在聚酯薄膜两侧涂布含有不同基团的第一硅烷和第二硅烷的双组分，经烘干得到低析出的聚酯薄膜。但是该技术在实现过程中使用的涂料含有大量有机溶剂，对环境不友好。
发明内容
本发明为克服现有技术弊端，提供一种低析出聚酯薄膜及其制备方法，在聚酯基膜上涂布低析出涂层，有效减少聚酯基膜内部低分子量物质的析出，防止聚酯薄膜在后续的加工过程中透光率下降和雾度增加。
本发明解决其技术问题所采用的技术方案是：
一种低析出聚酯薄膜，所述聚酯薄膜包括聚酯基膜和涂布在所述聚酯基膜表面的低析出涂层，所述低析出涂层为水溶性涂布液经涂布、固化得到，一百质量分数的所述水溶性涂布液包括4-12质量份数的水溶性树脂、85-95质量份数的去离子水、0.5-3质量份数的交联剂和0.1-0.3质量份数的表面活性剂。
上述低析出聚酯薄膜，所述水溶性树脂为水性聚氨酯、水性丙烯酸酯或水性聚酯中的一种或多种。
上述低析出聚酯薄膜，所述交联剂为异氰酸酯类、多功能碳化二亚胺类、多官能团氮丙啶中的一种或多种。
上述低析出聚酯薄膜，所述表面活性剂为十二烷基磺酸钠、二丁基萘磺酸钠和改性聚硅氧烷中的一种或多种。
上述低析出聚酯薄膜，所述低析出涂层的涂层厚度为0.1-5μm，涂布在所述聚酯基膜的单面或双面。
上述低析出聚酯薄膜，所述聚酯基膜为聚对苯二甲酸乙二醇酯薄膜、聚对苯二甲酸丁二醇酯薄膜、聚萘二甲酸乙二醇酯薄膜和聚碳酸酯薄膜中的一种。
一种低析出聚酯薄膜的制备方法，所述制备方法为将水溶性涂布液均匀涂覆在所述聚酯基膜的表面，在120℃下热烘1min，得到低析出聚酯薄膜。
上述低析出聚酯薄膜的制备方法，所述水溶性涂布液在聚酯基膜拉伸前或拉伸后进行涂布。
上述低析出聚酯薄膜的制备方法，所述涂布包括但不仅限于辊涂、喷涂、丝棒涂布、狭缝涂布、刮刀涂布、挤压涂布或微凹版涂布的方式。
本发明的有益效果是：
本发明通过将水溶性涂布液涂敷在聚酯薄膜表面，经烘干后制得低析出聚酯薄膜。该薄膜可以减少薄膜内部低分子量物质析出，无需对挤出工艺及聚酯切片提出过高的要求，即可降低聚酯薄膜在150℃下，烘烤3小时后的低分子物质析出，防止聚酯薄膜在后续的加工过程中透光率下降和雾度增加，得到高质量的聚酯薄膜，扩大了聚酯薄膜的应用范围。本发明制备方法简单，无污染。
具体实施方式
本发明水溶性涂布液中，利用水溶性树脂和交联剂在一定温度下发生交联反应，涂布在聚酯基膜表面上120℃热烘后形成致密的网状结构，能够有效阻止小分子物质的析出及向薄膜表面的迁移。低析出涂层的致密程度决定低析出效果，本发明通过调整水溶性树脂与交联剂的添加比例，控制低析出涂层的致密程度。
下面结合实施例对本发明作进一步说明。
实施例1
水溶性涂布液配方为：5.0份的水性聚氨酯、0.5份的多异氰酸酯、0.1份的二丁基萘磺酸钠、0.1份的改性聚硅氧烷和94.3份的去离子水，将水溶性涂布液涂敷于经过电晕处理后的厚度为125μm的聚对苯二甲酸乙二醇酯基膜的上下表面，120℃下热烘1min，得到具有聚酯基膜和粘附于聚酯基膜表面上的低析出涂层的薄膜，其中低析出涂层的厚度为2μm。
实施例2
水溶性涂布液配方为：4.0份的水性丙烯酸酯、0.9份的多功能碳化二亚胺、0.1份的十二烷基磺酸钠和95.0份的去离子水，将水溶性涂布液涂敷于经过电晕处理后的厚度为125μm的聚对苯二甲酸乙二醇酯基膜的上下表面，120℃下热烘1min，得到具有聚酯基膜和粘附于聚酯基膜表面上的低析出涂层的薄膜，其中低析出涂层的厚度为2μm。
实施例3
水溶性涂布液配方为：4.0份的水性聚氨酯、4.0份的水性聚酯、1.0份的多异氰酸酯、0.5份的多官能团氮丙啶、0.3份的改性聚硅氧烷和91.2份的去离子水，将水溶性涂布液涂敷于经过电晕处理后的厚度为125μm的聚对苯二甲酸乙二醇酯基膜的上下表面，120℃下热烘1min，得到具有聚酯基膜和粘附于聚酯基膜表面上的低析出涂层的薄膜，其中低析出涂层的厚度为2μm。
实施例4
水溶性涂布液配方为：3.0份的水性聚氨酯、6.0份的水性丙烯酸酯、3.0份的水性聚酯、1.0份的多异氰酸酯、1.3份的多功能碳化二亚胺、0.5份的多官能团氮丙啶、0.1份的十二烷基磺酸钠、0.1份的二丁基萘磺酸钠和85.0份的去离子水，将水溶性涂布液涂敷于经过电晕处理后的厚度为125μm的聚对苯二甲酸乙二醇酯基膜的上下表面，120℃下热烘1min，得到具有聚酯基膜和粘附于聚酯基膜表面上的低析出涂层的薄膜，其中低析出涂层的厚度为2μm。
实施例5
水溶性涂布液配方为：3.0份的水性丙烯酸酯、3.0份的水性聚酯、0.5份的多功能碳化二亚胺、0.5份的多官能团氮丙啶、0.2份的改性聚硅氧烷和92.8份的去离子水，将水溶性涂布液涂敷于经过电晕处理后的厚度为125μm的聚对苯二甲酸乙二醇酯基膜的上下表面，120℃下热烘1min，得到具有聚酯基膜和粘附于聚酯基膜表面上的低析出涂层的薄膜，其中低析出涂层的厚度为2μm。
实施例6
水溶性涂布液配方为：6.0份的水性聚氨酯、3.0份的水性丙烯酸酯、1.0份的多异氰酸酯、0.5份的多官能团氮丙啶、0.2份的十二烷基磺酸钠和89.3份的去离子水，将水溶性涂布液涂敷于经过电晕处理后的厚度为100μm的聚对苯二甲酸丁二醇酯基膜的上下表面，120℃下热烘1min，得到具有聚酯基膜和粘附于聚酯基膜表面上的低析出涂层的薄膜，其中低析出涂层的厚度为2μm。
实施例7
水溶性涂布液配方为：5.0份的水性丙烯酸酯、5.0份的水性聚酯、2.0份的多功能碳化二亚胺、1.0份的多官能团氮丙啶、0.1份的二丁基萘磺酸钠、0.1份的改性聚硅氧烷和86.8份的去离子水，将水溶性涂布液涂敷于经过电晕处理后的厚度为100μm的聚萘二甲酸乙二醇酯基膜的上下表面，120℃下热烘1min，得到具有聚酯基膜和粘附于聚酯基膜表面上的低析出涂层的薄膜，其中低析出涂层的厚度为2μm。
实施例8
水溶性涂布液配方为：3.5份的水性聚氨酯、2.5份的水性聚酯、1.0份的多异氰酸酯、1.0份的多功能碳化二亚胺、0.1份的十二烷基磺酸钠、0.1改性聚硅氧烷和91.8份的去离子水，将水溶性涂布液涂敷于经过电晕处理后的厚度为100μm的聚碳酸酯基膜的上下表面，120℃下热烘1min，得到具有聚酯基膜和粘附于聚酯基膜表面上的低析出涂层的薄膜，其中低析出涂层的厚度为2μm。
对比例1
取未处理的125μm的聚对苯二甲酸乙二醇酯薄膜作为对比例。
性能测试
表征聚酯薄膜在高温下低分子物质析出性能最直观的方法是测试聚酯薄膜高温烘烤前后透光率和雾度变化，使用上海精密科学仪器有限公司WGT-S透光率/雾度测定仪测试。
首先测试实施例1-8制得的聚酯薄膜和对比例的聚酯薄膜初始雾度和初始透光率，然后将实施例1-8制得的聚酯光学薄膜和对比例的聚酯光学基膜分别放入150℃的烘箱中，烘烤3h后，再测试各薄膜的透光率和雾度。测试结果如表1所示：
表1透光率和雾度测试结果
由表1可知，实施例1-5的聚酯薄膜相对于对比例1的聚酯基膜的初始透光率高，初始雾度低，这是粘附在聚酯基膜表面的低析出涂层对其光学性能的提升。经过烘烤后，对比例1的聚酯薄膜的雾度相对于初始雾度明显增大，透光率下降；实施例1至实施例5的聚酯薄膜烘烤前后雾度和透光率变化都不大，较对比例1抑制低分子物质析出均有明显的效果。实施例6至实施例8是将低析出涂层涂敷在其它材质基膜上，从热烘前后雾度和透光率数据对比可以看出，该涂层对聚对苯二甲酸丁二醇酯薄膜、聚萘二甲酸乙二醇酯薄膜和聚碳酸酯薄膜均具有明显的抑制低分子物质析出的作用。
Claims (9)
1.一种低析出聚酯薄膜，其特征在于：所述聚酯薄膜包括聚酯基膜和涂布在所述聚酯基膜表面的低析出涂层，所述低析出涂层为水溶性涂布液经涂布、固化得到，一百质量分数的所述水溶性涂布液包括4-12质量份数的水溶性树脂、85-95质量份数的去离子水、0.5-3质量份数的交联剂和0.1-0.3质量份数的表面活性剂。
2.根据权利要求1所述的低析出聚酯薄膜，其特征在于：所述水溶性树脂为水性聚氨酯、水性丙烯酸酯或水性聚酯中的一种或多种。
3.根据权利要求2所述的低析出聚酯薄膜，其特征在于：所述交联剂为异氰酸酯类、多功能碳化二亚胺类和多官能团氮丙啶中的一种或多种。
4.根据权利要求3所述的低析出聚酯薄膜，其特征在于：所述表面活性剂为十二烷基磺酸钠、二丁基萘磺酸钠和改性聚硅氧烷中的一种或多种。
5.根据权利要求4所述的低析出聚酯薄膜，其特征在于：所述低析出涂层的涂层厚度为0.1-5μm，涂布在所述聚酯基膜的单面或双面。
6.根据权利要求5所述的低析出聚酯薄膜，其特征在于：所述聚酯基膜为聚对苯二甲酸乙二醇酯薄膜、聚对苯二甲酸丁二醇酯薄膜、聚萘二甲酸乙二醇酯薄膜和聚碳酸酯薄膜中的一种。
7.一种权利要求1-6任一项所述的低析出聚酯薄膜的制备方法，其特征在于：所述制备方法为将水溶性涂布液均匀涂覆在所述聚酯基膜的表面，在120℃下热烘1min，得到低析出聚酯薄膜。
8.根据权利要求7所述的低析出聚酯薄膜的制备方法，其特征在于：所述水溶性涂布液在聚酯基膜拉伸前或拉伸后进行涂布。
9.根据权利要求8所述的低析出聚酯薄膜的制备方法，其特征在于：所述涂布包括但不仅限于辊涂、喷涂、丝棒涂布、狭缝涂布、刮刀涂布、挤压涂布或微凹版涂布的方式。
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