CN114059034A - Special vacuum continuous beat type coating system - Google Patents
Special vacuum continuous beat type coating system Download PDFInfo
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- CN114059034A CN114059034A CN202111218251.3A CN202111218251A CN114059034A CN 114059034 A CN114059034 A CN 114059034A CN 202111218251 A CN202111218251 A CN 202111218251A CN 114059034 A CN114059034 A CN 114059034A
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- 238000000576 coating method Methods 0.000 title claims description 28
- 239000011248 coating agent Substances 0.000 title claims description 26
- 238000000034 method Methods 0.000 claims abstract description 25
- 230000008569 process Effects 0.000 claims abstract description 25
- 230000005540 biological transmission Effects 0.000 claims abstract description 21
- 238000000151 deposition Methods 0.000 claims abstract description 17
- 230000008021 deposition Effects 0.000 claims abstract description 17
- 230000007246 mechanism Effects 0.000 claims abstract description 17
- 238000004544 sputter deposition Methods 0.000 claims abstract description 16
- 238000010849 ion bombardment Methods 0.000 claims abstract description 11
- 238000007789 sealing Methods 0.000 claims abstract description 9
- 239000007888 film coating Substances 0.000 claims abstract description 5
- 238000009501 film coating Methods 0.000 claims abstract description 5
- 238000005086 pumping Methods 0.000 claims abstract description 5
- 238000010438 heat treatment Methods 0.000 claims abstract description 4
- 239000013077 target material Substances 0.000 claims abstract description 4
- 238000003466 welding Methods 0.000 claims abstract description 4
- 238000005070 sampling Methods 0.000 claims description 15
- 238000004140 cleaning Methods 0.000 claims description 8
- 239000010963 304 stainless steel Substances 0.000 claims description 6
- 229910000589 SAE 304 stainless steel Inorganic materials 0.000 claims description 6
- 239000003638 chemical reducing agent Substances 0.000 claims description 3
- 238000009826 distribution Methods 0.000 claims description 3
- 238000002955 isolation Methods 0.000 claims description 3
- 239000011553 magnetic fluid Substances 0.000 claims description 3
- 230000001020 rhythmical effect Effects 0.000 claims description 2
- 238000012423 maintenance Methods 0.000 claims 1
- 238000013461 design Methods 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 239000002184 metal Substances 0.000 abstract description 3
- 238000012827 research and development Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 2
- 238000007599 discharging Methods 0.000 description 5
- 238000001771 vacuum deposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 210000001503 joint Anatomy 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
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- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a special vacuum continuous beat type film coating system, which comprises a sample chamber, a tray lifting subsystem, a film coating system and a film coating system, wherein the sample chamber consists of a molecular pump and a backing dry pump; the process vacuum chamber consists of a molecular pump and a preceding stage dry pump, the back end of the process vacuum chamber is provided with an ion bombardment assembly, and a jacking mechanism is arranged in the process vacuum chamber; the tray lifting subsystem consists of a double-layer tray frame, a sealing valve plate, a main shaft, a lifting screw rod, a guide rod, a welding corrugated pipe and a servo driving subsystem; the tray transmission subsystem comprises a tray and a tray transmission vehicle; the bottom of the cavity of the sputtering deposition chamber is provided with a high pumping pipeline and guide rails at two sides, the rear end of the cavity is a heating bombardment area, and the bottom surface is provided with a workpiece tray lifting mechanism and a radio frequency power supply. The invention can realize high sputtering, high uniformity and high effective utilization rate of the target material by adopting a unique horizontal structural design and a cathode with a special structure, is suitable for being applied to mass production from research and development, and can deposit materials such as dielectric films, metal films and the like.
Description
Technical Field
The invention relates to the technical field of coating processes, in particular to a vacuum special continuous beat type coating system.
Background
In recent years, with the environmental protection importance of government departments, various high-pollution, high-energy-consumption and high-emission enterprises are shut down and turned on successively. Many enterprises engaged in hardware decoration coating gradually change the original high-pollution water coating process into a vacuum coating process without pollution and with low emission, and a continuous coating production line with high beat and high yield is developed dramatically and is gradually favored by various enterprises.
Among the existing continuous beat type coating equipment, a continuous beat type coating system is mostly a subsystem of a multi-vacuum chamber and comprises a feeding chamber with a feeding hole, a discharging chamber with a discharging hole and a vacuum coating chamber, wherein two ends of the vacuum coating chamber are respectively connected with the feeding chamber and the discharging chamber in a sealing mode, namely, a workpiece enters from one end of the equipment and enters the coating chamber after being pretreated before coating, the workpiece comes out from the discharging chamber after coating is finished, and the feeding chamber, the discharging chamber and the vacuum coating chamber are formed by sealing connection of two sets of vacuum conveying sections and are used for conveying the workpiece inside each vacuum chamber. The whole equipment mechanism is complex and expensive, and great challenges are presented in both the supply period of the equipment and the energy input of designers, and under the background, a novel continuous beat type coating system capable of solving the problems is needed.
Disclosure of Invention
Aiming at the technical problems in the related art, the invention provides a vacuum special continuous beat type coating system which can overcome the defects of the prior art.
In order to achieve the technical purpose, the technical scheme of the invention is realized as follows:
a vacuum special continuous beat type film coating system comprises a sample chamber, a process vacuum chamber, a tray lifting subsystem, a tray transmission subsystem, a magnetron target and a sputtering deposition chamber, wherein,
the sampling chamber consists of a molecular pump and a backing dry pump, a tray lifting subsystem is arranged in the chamber and is butted with a conveying vehicle of the tray conveying subsystem, and a special flow limiting structure is arranged, so that the cross section of the chamber can obtain uniform gas distribution during air suction and inflation;
the process vacuum chamber consists of a molecular pump and a preceding stage dry pump, an ion bombardment assembly is arranged at the rear end of the process vacuum chamber, a jacking mechanism is arranged in the chamber, and a radio frequency bias power supply is connected to the jacking mechanism and used for cleaning a workpiece by ion bombardment;
the tray lifting subsystem consists of a double-layer tray frame, a sealing valve plate, a main shaft, a lifting screw rod, a guide rod, a welding corrugated pipe and a servo driving subsystem, wherein the sealing valve plate completes pressure isolation between a sampling chamber and a process chamber, the movement and repeated positioning precision of the tray is +/-0.5 mm, and a servo motor is controlled by a torque mode and is used for carrying the lifting of the workpiece tray and butting with the tray transmission subsystem;
the tray transmission subsystem comprises a tray and a tray transmission vehicle, wherein a plated workpiece is placed on the workpiece tray in a certain direction, the tray is placed on the tray transmission vehicle, the transmission vehicle is pulled by a chain to move linearly along a rail, and the repeated positioning precision of the tray transmission subsystem is +/-1 mm;
the magnetic control target works by being connected with a magnetic control power supply and is arranged at the top of the chamber of the process vacuum chamber;
the sputtering deposition chamber is characterized in that a high-pumping pipeline is arranged at the bottom of a cavity and used for installing a DN200 electric adjustable gate valve, two side guide rails are arranged on the bottom surface of the cavity and used for guiding a tray transport vehicle, the rear end of the cavity is a heating bombardment area, a workpiece tray lifting mechanism and a radio frequency power supply are arranged on the bottom surface and used for cleaning through ion bombardment, then the workpiece tray lifting mechanism and the radio frequency power supply enter a coating area for coating, and finally the set deposition thickness is finished.
Furthermore, the size of the inner cavity of the sampling chamber is phi 450x300mm, the sampling chamber is a cylindrical structure made of 304 stainless steel and is provided with an observation window, and the top of the cavity is provided with a DN200 pneumatic gate valve and a DN200 molecular pump.
Furthermore, the sputtering deposition chamber has an inner cavity with the size of 1795mm 590mm 210mm and is a rectangular structure of 304 stainless steel, the side surface is provided with an observation window, and the top surface is provided with 3 rectangular magnetron targets of 450x 100.
Furthermore, the tray conveying vehicle is of a horizontal U-shaped structure, two sides of the tray conveying vehicle are respectively provided with a V-shaped wheel and a flat roller, and the V-shaped wheels are used for positioning the flat roller on the other side.
Furthermore, the tray conveying vehicle is driven by a single-side chain to run and convey, the traction chain is driven by a servo motor to be transmitted into the vacuum chamber through a speed reducer and a magnetic fluid to be driven, and an encoder in the servo motor monitors the position of the conveying vehicle in real time.
Furthermore, electric flip devices are arranged in the sampling chamber, the process vacuum chamber and the sputtering deposition chamber and are used for maintaining equipment and replacing the target material.
The invention has the beneficial effects that: by adopting a unique horizontal structural design and a cathode with a special structure, high sputtering, high uniformity and high effective utilization rate of the target can be realized, the sputtering target is suitable for being applied to mass production from research and development, and materials such as dielectric films, metal films and the like can be deposited; through work piece tray jacking structure, vacuum seal mode and transmission mode, simplified structural design, shortened cavity length size, reduced equipment area, and this system degree of automation is higher.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a lifting device of a vacuum dedicated continuous-beat coating system according to an embodiment of the invention.
Fig. 2 is a schematic structural diagram of a conveying vehicle of a vacuum dedicated continuous rhythmic coating system according to an embodiment of the present invention.
In the figure: 1. the device comprises a cold pump, a gate valve 2, a lifting gate 3, a heater 4, a tray 5, a lifter 6, a tray transport vehicle 7, a flat roller 8 and a V-shaped wheel 9.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present invention belong to the protection scope of the present invention, and for the convenience of understanding the above technical solutions of the present invention, the above technical solutions of the present invention are described in detail below by specific use modes.
The special vacuum continuous beat type coating system comprises a sample chamber, a process vacuum chamber, a tray lifting subsystem, a tray transmission subsystem, a magnetron target and a sputtering deposition chamber.
Firstly, a plated workpiece and a workpiece tray 5 enter the sampling chamber, a gate of the sampling chamber is closed, the sampling chamber is evacuated at a slow pumping speed, when the vacuum pressure reaches 10Pa, the rectangular gate valve 2 and the lifting door 3 are opened, the plated workpiece is heated by the heater 4, the cold pump 1 works to the background vacuum, then the gate valve 2 and the lifting door 3 are closed, and the tray 5 is lifted by the lifter 6. After the pressure of process gas and the pressure of the process chamber are balanced, the jacking mechanism descends to the first position, the transport vehicle unloads the plated workpiece parts to the bottom layer of the tray frame, the jacking mechanism descends to the second position, the workpiece parts to be plated on the top layer of the tray frame are conveyed to the tray transport vehicle 7, the tray frame ascends to be sealed with the process chamber, the workpiece parts to be plated enter an ion bombardment area for cleaning, the workpiece parts to be plated are conveyed to a film plating area for film plating after the cleaning is finished, the specified deposition thickness is finished, meanwhile, the sample inlet chamber is slowly inflated to the atmospheric pressure, a front door is opened, the workpiece is unloaded, a new tray is installed on the upper layer, and the next cycle is continued.
The sampling chamber consists of a molecular pump and a backing dry pump, a tray lifting subsystem is arranged in the chamber and is in butt joint with a tray conveying vehicle 7 of the tray conveying subsystem, and a special flow limiting structure is arranged to enable the cross section of the chamber to obtain uniform gas distribution during air suction and inflation. The size of the inner cavity of the sampling chamber is phi 450x300mm, the sampling chamber is a cylindrical structure made of 304 stainless steel and is provided with an observation window, and the top of the cavity is provided with a DN200 pneumatic gate valve and a DN200 molecular pump.
The process vacuum chamber consists of a molecular pump and a preceding stage dry pump, an ion bombardment assembly is arranged at the rear end of the process vacuum chamber, a jacking mechanism is arranged in the chamber, and a radio frequency bias power supply is connected to the jacking mechanism and used for cleaning a workpiece by ion bombardment.
The tray lifting subsystem is composed of a double-layer tray frame, a sealing valve plate, a main shaft, a lifting screw rod, a guide rod, a welding corrugated pipe and a servo driving subsystem, wherein the sealing valve plate completes pressure isolation between a sampling chamber and a process room, the movement and repeated positioning precision of the tray is +/-0.5 mm, and a servo motor is controlled in a torque mode and is used for carrying the lifting of a workpiece tray 5 and is in butt joint with the tray transmission subsystem.
As shown in figure 1, the tray conveying subsystem comprises a tray 5 and a tray conveying vehicle 7, a plated workpiece is placed on the workpiece tray 5 according to a certain direction, the tray 5 is placed on the tray conveying vehicle 7, the tray conveying vehicle 7 is pulled by a chain to move linearly along a track, and the system is repeatedly positioned with the precision of +/-1 mm.
As shown in fig. 2, the pallet conveying vehicle 7 is of a horizontal U-shaped structure, two sides of the pallet conveying vehicle are respectively provided with a V-shaped wheel 9 and a flat roller 8, and the V-shaped wheel 9 is used for positioning the flat roller 8 on the other side. The tray transmission vehicle 7 is driven by a single-side chain to run and transmit, the traction chain is driven by a servo motor to be transmitted into the vacuum chamber through a speed reducer and a magnetic fluid, and an encoder in the servo motor monitors the position of the transport vehicle in real time.
The magnetic control target works by being connected with a magnetic control power supply and is arranged at the top of the chamber of the process vacuum chamber.
The sputtering deposition chamber is provided with a high-pumping pipeline at the bottom of the cavity for installing a DN200 electric adjustable gate valve, the bottom surface of the cavity is provided with two side guide rails for guiding the tray transport vehicle 7, the rear end of the cavity is a heating bombardment area, a workpiece tray lifting mechanism and a radio frequency power supply are arranged on the bottom surface for cleaning through ion bombardment, and then the workpiece tray lifting mechanism and the radio frequency power supply enter a coating area for coating, and finally the set deposition thickness is finished. The sputtering deposition chamber has an inner cavity with the size of 1795mm 590mm 210mm, is in a rectangular structure of 304 stainless steel, is provided with an observation window on the side surface, and is provided with 3 rectangular magnetron targets of 450x100 on the top surface.
And electric flip devices are arranged in the sampling chamber, the process vacuum chamber and the cavity of the sputtering deposition chamber and are used for maintaining equipment and replacing the target material.
In conclusion, by means of the technical scheme, the cathode with the unique horizontal structure design and the special structure is adopted, so that high sputtering, high uniformity and high effective utilization rate of the target can be realized, the sputtering target is suitable for being applied to mass production from research and development, and dielectric films, metal films and the like can be deposited; through work piece tray jacking structure, vacuum seal mode and transmission mode, simplified structural design, shortened cavity length size, reduced equipment area, and this system degree of automation is higher.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (6)
1. A vacuum special continuous beat type film coating system is characterized by comprising a sample chamber, a process vacuum chamber, a tray lifting subsystem, a tray transmission subsystem, a magnetron target and a sputtering deposition chamber, wherein,
the sampling chamber consists of a molecular pump and a backing dry pump, a tray lifting subsystem is arranged in the chamber and is butted with a conveying vehicle of the tray conveying subsystem, and a special flow limiting structure is arranged, so that the cross section of the chamber can obtain uniform gas distribution during air suction and inflation;
the process vacuum chamber consists of a molecular pump and a preceding stage dry pump, an ion bombardment assembly is arranged at the rear end of the process vacuum chamber, a jacking mechanism is arranged in the chamber, and a radio frequency bias power supply is connected to the jacking mechanism and used for cleaning a workpiece by ion bombardment;
the tray lifting subsystem consists of a double-layer tray frame, a sealing valve plate, a main shaft, a lifting screw rod, a guide rod, a welding corrugated pipe and a servo driving subsystem, wherein the sealing valve plate completes pressure isolation between a sampling chamber and a process chamber, the movement and repeated positioning precision of the tray is +/-0.5 mm, and a servo motor is controlled by a torque mode and is used for carrying the lifting of the workpiece tray and butting with the tray transmission subsystem;
the tray transmission subsystem comprises a tray and a tray transmission vehicle, wherein a plated workpiece is placed on the workpiece tray in a certain direction, the tray is placed on the tray transmission vehicle, the transmission vehicle is pulled by a chain to move linearly along a track, and the repeated positioning precision of the transmission subsystem is +/-1 mm;
the magnetic control target works by being connected with a magnetic control power supply and is arranged at the top of the chamber of the process vacuum chamber;
the sputtering deposition chamber is characterized in that a high-pumping pipeline is arranged at the bottom of a cavity and used for installing a DN200 electric adjustable gate valve, two side guide rails are arranged on the bottom surface of the cavity and used for guiding a tray transport vehicle, the rear end of the cavity is a heating bombardment area, a workpiece tray lifting mechanism and a radio frequency power supply are arranged on the bottom surface and used for cleaning through ion bombardment, then the workpiece tray lifting mechanism and the radio frequency power supply enter a coating area for coating, and finally the set deposition thickness is finished.
2. The vacuum special continuous beat type coating system according to claim 1, wherein the size of the inner cavity of the sample chamber is phi 450x300mm, the sample chamber is a cylindrical structure made of 304 stainless steel, an observation window is arranged on the cylindrical structure, and a DN200 pneumatic gate valve and a DN200 molecular pump are arranged on the top of the sample chamber.
3. The vacuum dedicated continuous beat type coating system according to claim 1, wherein the sputtering deposition chamber has an inner cavity with a size of 1795mm 590mm 210mm, and is a rectangular structure of 304 stainless steel, and has a side surface provided with a viewing window and a top surface provided with 3 rectangular magnetron targets of 450x 100.
4. The vacuum dedicated continuous beat type coating system according to claim 1, wherein the tray conveying vehicle is a horizontal U-shaped structure, and both sides of the tray conveying vehicle are respectively provided with a V-shaped wheel and a flat roller, and the V-shaped wheel is used for positioning the flat roller on the other side.
5. The vacuum special continuous beat type coating system according to claim 4, wherein the pallet transport vehicle is driven by a single-side chain for traveling and transporting, the traction chain is driven by a servo motor which is transmitted into the vacuum chamber through a speed reducer and a magnetic fluid, and an encoder in the servo motor monitors the position of the transport vehicle in real time.
6. The special continuous rhythmic coating system for vacuum of claim 1, wherein the sample chamber, the process vacuum chamber and the sputtering deposition chamber are provided with electric cover-turning devices for equipment maintenance and target material replacement.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111218251.3A CN114059034A (en) | 2021-10-20 | 2021-10-20 | Special vacuum continuous beat type coating system |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202111218251.3A CN114059034A (en) | 2021-10-20 | 2021-10-20 | Special vacuum continuous beat type coating system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117512524A (en) * | 2024-01-08 | 2024-02-06 | 江苏吉美新材料科技有限公司 | High intelligent vacuum coating machine |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106637112A (en) * | 2016-11-16 | 2017-05-10 | 上海交通大学 | Horizontal type magnetron sputtering system used for fuel cell metal bipolar plates and coating process |
| CN106987822A (en) * | 2017-05-04 | 2017-07-28 | 北京创世威纳科技有限公司 | Continous way line style magnetron sputtering coater based on segmentation transmission |
| CN108385075A (en) * | 2018-05-14 | 2018-08-10 | 成都华聚科技有限公司 | A kind of realization wafer picks and places and pinpoint rotary heating mechanism with MASK |
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- 2021-10-20 CN CN202111218251.3A patent/CN114059034A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106637112A (en) * | 2016-11-16 | 2017-05-10 | 上海交通大学 | Horizontal type magnetron sputtering system used for fuel cell metal bipolar plates and coating process |
| CN106987822A (en) * | 2017-05-04 | 2017-07-28 | 北京创世威纳科技有限公司 | Continous way line style magnetron sputtering coater based on segmentation transmission |
| CN108385075A (en) * | 2018-05-14 | 2018-08-10 | 成都华聚科技有限公司 | A kind of realization wafer picks and places and pinpoint rotary heating mechanism with MASK |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117512524A (en) * | 2024-01-08 | 2024-02-06 | 江苏吉美新材料科技有限公司 | High intelligent vacuum coating machine |
| CN117512524B (en) * | 2024-01-08 | 2024-03-29 | 江苏吉美新材料科技有限公司 | High intelligent vacuum coating machine |
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