CN109722639A - A kind of horizontal magnetic control film coating production line - Google Patents
A kind of horizontal magnetic control film coating production line Download PDFInfo
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- CN109722639A CN109722639A CN201910091089.XA CN201910091089A CN109722639A CN 109722639 A CN109722639 A CN 109722639A CN 201910091089 A CN201910091089 A CN 201910091089A CN 109722639 A CN109722639 A CN 109722639A
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Abstract
The present invention relates to coating thin film product technical fields, horizontal magnetic control film coating production line is specifically disclosed, including chassis and several vacuum chambers being mounted on chassis, the vacuum chamber includes hot donut, several plated film vacuum chambers and the pumping unit vacuumized to each vacuum chamber before clean vacuum chambers, plated film before plated film, it is also correspondingly provided with the coating clamp loading and unloading platform with elevating function in the rear and front end portion of production line, the plated film internal vacuum chamber is equipped at least two pairs of magnetic controlled sputtering targets.The horizontal magnetic control film coating production line automatically can carry out prerinse and preheating to workpiece to be plated, and can effectively adjust plated film when vacuumizes air-flow size, and coating effects are good, and plated film production efficiency greatly improves.
Description
Technical field
The present invention relates to coated product technical field, in particular to horizontal magnetic control film coating production line.
Background technique
In the prior art, it in common filming equipment, needs individually to carry out pre-treatment to workpiece in advance, removes the table of workpiece
Face impurity, is then heat-treated again, causes production efficiency low in this way, and adhesion of coating film is poor.
In addition, being usually only equipped with a target in a coating chamber, target need to be frequently replaced, target utilization is lower, and
Replacement difficulty is big, and coated product is single, furthermore can take a large amount of reaction gas away in pumping, influence coating effects.Meanwhile
Coating clamp, which goes to behind the other side to decline to go in reversing frame automatically, returns to equipment feed side；When coating clamp goes to plated film
It behind room, can only unidirectionally be moved along, therefore cause coating film thickness inadequate.
Therefore it is raw to research and develop a kind of horizontal magnetic control film coating that can be effectively improved plated film production efficiency, improve coated product adhesive force
Producing line is extremely urgent.
Summary of the invention
The purpose of the present invention is overcoming above-mentioned the deficiencies in the prior art, a kind of horizontal magnetic control film coating production line is specifically disclosed,
The horizontal magnetic control film coating production line automatically can carry out prerinse and preheating to workpiece to be plated, and when can effectively adjust plated film
Air-flow size is vacuumized, coating effects are good, and plated film production efficiency greatly improves.
In order to reach above-mentioned technical purpose, the present invention is achieved according to following technical scheme:
Horizontal magnetic control film coating production line of the present invention, including chassis and several vacuum chambers being mounted on chassis, institute
State the direction that vacuum chamber advances along workpiece to be plated successively include hot donut before clean vacuum chambers, plated film before plated film, it is several
Plated film vacuum chamber and the pumping unit vacuumized to each vacuum chamber are also correspondingly provided with tool in the rear and front end portion of production line
There is the coating clamp loading and unloading platform of elevating function, the plated film internal vacuum chamber is equipped at least two pairs of magnetic controlled sputtering targets.
As the further improvement of above-mentioned technology, heating device, the heating are equipped with before the plated film in heating, vacuum room
Quartz burner is installed in device, is effectively heated by quartz burner.
As the further improvement of above-mentioned technology, clean vacuum chambers are equipped with ion launcher before the plated film, should be from
Transmitting plate body is installed on sub- emitter.
As the further improvement of above-mentioned technology, the transmitting plate body is inputted after high frequency voltage by RF power supply to be plated
Workpiece carries out Ion Cleaning, and the cleaning film-coating workpiece surface of energy large area, cleaning effect is good, and cleaning efficiency is high.
As the further improvement of above-mentioned technology, the plated film vacuum chamber be equipped with two cylindric magnetic controlled sputtering targets, two
The partition for obstructing target contamination is equipped between magnetic controlled sputtering target, by enabling the fixture of workpiece to be plated to exist after process control
It is back and forth moved back and forth in plated film vacuum chamber.
As the further improvement of above-mentioned technology, the pumping unit is equipped with throttle valve, and the throttle valve is equipped with
The butterfly mechanism that air-flow size is vacuumized when for adjusting plated film, by adjusting butterfly angle come pumping when adjusting plated film
Vacuum pneumatic size can effectively reduce reaction gas and be pumped.
As the further improvement of above-mentioned technology, the coating clamp loading and unloading platform is equipped with elevating mechanism, the lifting
Mechanism is equipped with self lubrication bearing, guarantees that guide rod can slide freely up and down.
As the further improvement of above-mentioned technology, the production line is further equipped with coating clamp transfer cart, facilitates plated film
Fixture transports, and improves production efficiency.
Compared with prior art, the beneficial effects of the present invention are:
(1) magnetic control film coating production line of the present invention, by clean vacuum chambers before hot donut before plated film and plated film,
Automatic cleaning and pre-add heated work pieces reduce target replacement time then by being mounted on the indoor several pairs of sputtering targets of plated film vacuum
Number, is convenient to mount and dismount, and improves target utilization, saves the advantages such as maintenance time to reduce machine stop times and reach；
(2) in the present invention, increase throttle valve in pumping unit, can be reduced reaction gas and be pumped, can effectively enhance
The uniformity of plated film；
(3) in the present invention, coating clamp can be sent automatically back to revolution conveyer frames by coating clamp loading and unloading platform energy automatic lifting
In, so that production line is realized full-automatic filming process, high degree of automation, plating membrane efficiency is greatly improved.
Detailed description of the invention
Fig. 1 is the positive structure schematic of horizontal film coating production line of the present invention；
Fig. 2 is the top view of horizontal film coating production line of the present invention；
Fig. 3 is the side view of hot donut before plated film in the present invention；
Fig. 4 is the side view of clean vacuum chambers before plated film in the present invention；
Fig. 5 is the top view of plated film vacuum chamber in the present invention；
Fig. 6 is the side view of throttle valve in the present invention；
Fig. 7 is enlarged diagram at A in Fig. 1.
Specific embodiment
As shown in Figures 1 to 5, horizontal magnetic control film coating production line of the present invention, including chassis 1, and it is mounted on chassis 1
On several vacuum chambers, the direction that the vacuum chamber advances along workpiece to be plated successively includes clean vacuum chambers 3, plated film before plated film
Preceding hot donut 2, several plated film vacuum chambers 4 and the pumping unit 5 that vacuum chamber is vacuumized, in addition, in production line
Rear and front end portion be also correspondingly provided with the coating clamp loading and unloading platform 6 with elevating function, be equipped with inside the plated film vacuum chamber 4
At least two magnetic controlled sputtering targets.
As shown in figure 3, being equipped with heating device 8 before the plated film in hot donut 2, it is equipped in the heating device 8
Quartz burner is effectively heated by quartz burner.
As shown in figure 4, clean vacuum chambers 3 are equipped with ion launcher 9 before the plated film, pacify on the ion launcher 9
Equipped with transmitting plate body 10, and the transmitting plate body 10 is clear by carrying out ion to workpiece to be plated after RF power supply input high frequency voltage
It washes, the cleaning film-coating workpiece surface of energy large area, cleaning effect is good, and cleaning efficiency is high.
As shown in figure 5, the plated film vacuum chamber 4 is equipped with two cylindric magnetic controlled sputtering targets 11, two magnetic controlled sputtering target 11
Between be equipped with partition 12 for obstructing target contamination, by enabling the fixture of workpiece to be plated in plated film vacuum after process control
It is back and forth moved back and forth in room.
As shown in Fig. 2, Fig. 6, the pumping unit 5 is equipped with throttle valve 13, is equipped on the throttle valve 13 for adjusting
The butterfly mechanism 14 that air-flow size is vacuumized when saving plated film, by adjusting the angle of butterfly 14 come pumping when adjusting plated film
Vacuum pneumatic size can effectively reduce reaction gas and be pumped.
As shown in fig. 7, the coating clamp loading and unloading platform 6 is equipped with elevating mechanism 15, the elevating mechanism 15 is equipped with certainly
Lubricative axle sleeve, to guarantee that guide rod can slide freely up and down.
As shown in Figure 1 and Figure 2, the production line is further equipped with coating clamp transfer cart 7, facilitates the transport of coating clamp, mentions
High efficiency.
The course of work of detailed description below horizontal continuous sputtering coating equipment of the invention:
(1) firstly, cleaning finishes as shown in Figure 1, clean vacuum chambers 4 carry out workpiece cleaning before coating clamp enters plated film
Hot donut 2 is heated before entering plated film afterwards, after entering plated film vacuum chamber 4, the rotation of throttle valve 13 90 of pumping unit 5
Degree, is filled with reaction gas, and then two magnetic controlled sputtering targets 11 carry out sputter coating to workpiece；
(2) then, after coating film treatment, coating clamp can will plate workpiece and be transported to coating clamp loading and unloading platform 6, rise
Descending mechanism 15 is dropped in revolution gear frame, is risen to initially after being then return to the coating clamp loading and unloading platform 6 of the other side
Position；
(3) it finally, coating clamp is transported to subsequent processing by coating clamp transfer cart 8 handles, so recycles.
Production line of the present invention is able to achieve full-automatic filming process, high degree of automation, plated film production efficiency pole
It is big to improve.
It is all that the present invention is not departed to various changes or modifications of the invention the invention is not limited to above embodiment
Spirit and scope, if these modification and variations belong within the scope of claim and equivalent technologies of the invention, then this hair
It is bright also to mean comprising these modification and variations.
Claims (8)
1. a kind of horizontal magnetic control film coating production line, it is characterised in that: including chassis and several vacuum chambers being mounted on chassis, institute
State the direction that vacuum chamber advances along workpiece to be plated successively include hot donut before clean vacuum chambers, plated film before plated film, it is several
Plated film vacuum chamber and the pumping unit vacuumized to each vacuum chamber are also correspondingly provided with tool in the rear and front end portion of production line
There is the coating clamp loading and unloading platform of elevating function, the plated film internal vacuum chamber is equipped at least two magnetic controlled sputtering targets.
2. horizontal magnetic control film coating production line according to claim 1, it is characterised in that: before the plated film in heating, vacuum room
Equipped with heating device, quartz burner is installed in the heating device.
3. horizontal magnetic control film coating production line according to claim 1, it is characterised in that: clean vacuum chambers are set before the plated film
There is ion launcher, transmitting plate body is installed on the ion launcher.
4. horizontal magnetic control film coating production line according to claim 3, it is characterised in that: the transmitting plate body passes through RF power supply
It inputs after high frequency voltage and Ion Cleaning is carried out to workpiece to be plated.
5. horizontal magnetic control film coating production line according to claim 1, it is characterised in that: the plated film vacuum chamber is equipped with two
Columned magnetic controlled sputtering target is equipped with the partition for obstructing target contamination between two magnetic controlled sputtering targets.
6. horizontal magnetic control film coating production line according to claim 1, it is characterised in that: the pumping unit is equipped with throttling
Valve, the throttle valve vacuumize the butterfly mechanism of air-flow size when being equipped with for adjusting plated film.
7. horizontal continuous sputtering coating equipment according to claim 1, it is characterised in that: the coating clamp loading and unloading platform
Equipped with elevating mechanism, the elevating mechanism is equipped with self lubrication bearing.
8. horizontal continuous sputtering coating equipment according to claim 1, it is characterised in that: the production line is further equipped with plating
Film fixture transfer cart.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910091089.XA CN109722639A (en) | 2019-01-30 | 2019-01-30 | A kind of horizontal magnetic control film coating production line |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910091089.XA CN109722639A (en) | 2019-01-30 | 2019-01-30 | A kind of horizontal magnetic control film coating production line |
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| Publication Number | Publication Date |
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| CN109722639A true CN109722639A (en) | 2019-05-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| CN201910091089.XA Pending CN109722639A (en) | 2019-01-30 | 2019-01-30 | A kind of horizontal magnetic control film coating production line |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116770257A (en) * | 2023-06-25 | 2023-09-19 | 广州市博泰光学科技有限公司 | Optical lens coating film manufacturing system and manufacturing method thereof |
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| CN105970172A (en) * | 2016-06-14 | 2016-09-28 | 肇庆市大力真空设备有限公司 | Simple horizontal magnetic-control coating equipment and coating method thereof |
| CN107541712A (en) * | 2017-10-11 | 2018-01-05 | 广东腾胜真空技术工程有限公司 | A kind of glass coating equipment of both-end disengaging |
| CN107808768A (en) * | 2017-10-20 | 2018-03-16 | 包头天和磁材技术有限责任公司 | Magnet coating apparatus and method |
| EP3089196B1 (en) * | 2015-04-27 | 2018-06-27 | Advanced Energy Industries, Inc. | Rate enhanced pulsed dc sputtering system |
| CN208121195U (en) * | 2018-04-11 | 2018-11-20 | 深圳市正和忠信股份有限公司 | A kind of medium frequency magnetron sputtering deposition deep space ash membrane equipment |
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2019
- 2019-01-30 CN CN201910091089.XA patent/CN109722639A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3089196B1 (en) * | 2015-04-27 | 2018-06-27 | Advanced Energy Industries, Inc. | Rate enhanced pulsed dc sputtering system |
| CN105970172A (en) * | 2016-06-14 | 2016-09-28 | 肇庆市大力真空设备有限公司 | Simple horizontal magnetic-control coating equipment and coating method thereof |
| CN107541712A (en) * | 2017-10-11 | 2018-01-05 | 广东腾胜真空技术工程有限公司 | A kind of glass coating equipment of both-end disengaging |
| CN107808768A (en) * | 2017-10-20 | 2018-03-16 | 包头天和磁材技术有限责任公司 | Magnet coating apparatus and method |
| CN208121195U (en) * | 2018-04-11 | 2018-11-20 | 深圳市正和忠信股份有限公司 | A kind of medium frequency magnetron sputtering deposition deep space ash membrane equipment |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116770257A (en) * | 2023-06-25 | 2023-09-19 | 广州市博泰光学科技有限公司 | Optical lens coating film manufacturing system and manufacturing method thereof |
| CN116770257B (en) * | 2023-06-25 | 2024-02-06 | 广州市博泰光学科技有限公司 | Optical lens coating film manufacturing system and manufacturing method thereof |
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Application publication date: 20190507 |
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