CN201793722U - Vacuum multi-arc ion plating machine - Google Patents

Vacuum multi-arc ion plating machine Download PDF

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Publication number
CN201793722U
CN201793722U CN2010205394825U CN201020539482U CN201793722U CN 201793722 U CN201793722 U CN 201793722U CN 2010205394825 U CN2010205394825 U CN 2010205394825U CN 201020539482 U CN201020539482 U CN 201020539482U CN 201793722 U CN201793722 U CN 201793722U
Authority
CN
China
Prior art keywords
magnet
vacuum
arc
vacuum chamber
water jacket
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2010205394825U
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Chinese (zh)
Inventor
林锡强
陈孝田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Vakia Coating Technology Co., Ltd.
Original Assignee
WENZHOU JIANENG VACUUM PLATING EQUIPMENT TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WENZHOU JIANENG VACUUM PLATING EQUIPMENT TECHNOLOGY Co Ltd filed Critical WENZHOU JIANENG VACUUM PLATING EQUIPMENT TECHNOLOGY Co Ltd
Priority to CN2010205394825U priority Critical patent/CN201793722U/en
Application granted granted Critical
Publication of CN201793722U publication Critical patent/CN201793722U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model relates to a vacuum multi-arc ion plating machine which comprises a vacuum pumping system, a vacuum chamber, a vacuum chamber door, a work piece rotating frame arranged inside the vacuum chamber and a plurality of arc source devices arranged on the vacuum chamber. Each arc source device comprises a flange fixedly connected with the vacuum chamber, an arc ignition device and a cathode water jacket arranged on the flange, a target material arranged on the cathode water jacket and a magnet arranged above the target material; wherein a magnetic cylinder is inserted and fixed on the cathode water jacket, a magnetic cylinder adjusting sleeve is fixedly connected at the upper end of the magnetic cylinder, an adjusting screw rod is in threaded connection on the magnetic cylinder adjusting sleeve, the magnet is fixedly connected with the inner end of the adjusting screw rod, and the magnet is arranged inside the magnetic cylinder. The utility model has the benefits that the magnetic intensity in the vacuum chamber is changed by adjusting the relative position of the magnet and the target material, and the ion plating machine has the advantages of achieving the optimum operating state in case of different target materials and working conditions.

Description

Vacuum arc deposition film machine
Technical field
The utility model relates to a kind of coating equipment, relates in particular to a kind of vacuum arc deposition film machine.
Background technology
At present, vacuum arc deposition film machine is the specific equipment that the metallic surface is carried out plated film, is applicable to be coated with decorating film and superhard wear film.The vacuum arc deposition film machine of prior art, comprise vacuum-pumping system, vacuum chamber, door for vacuum chamber, be arranged on the workpiece pivoted frame in the vacuum chamber and be arranged on several arc source apparatus on the vacuum chamber body, the arc source apparatus comprises the flange of fixedlying connected with the vacuum chamber body, be located at arc initiation device and negative electrode water jacket on the flange, be contained in target on the negative electrode water jacket, be located at the magnet of target top, the fixed distance of magnet and target is constant, existence can not be regulated magneticstrength and make plated film reach the shortcoming of optimum Working under different targets and the operating mode.
The utility model content
Technical problem to be solved in the utility model overcomes the deficiencies in the prior art exactly, provides a kind of at the adjustable vacuum arc deposition film machine of magneticstrength under different targets and the operating mode.
The technical scheme that the utility model adopted is: vacuum arc deposition film machine, comprise vacuum-pumping system, vacuum chamber, door for vacuum chamber, be arranged on the workpiece pivoted frame in the vacuum chamber and be arranged on several arc source apparatus on the vacuum chamber body, the arc source apparatus comprises the flange of fixedlying connected with the vacuum chamber body, be located at arc initiation device and negative electrode water jacket on the flange, be contained in the target on the negative electrode water jacket, be located at the magnet of target top, on the negative electrode water jacket, insert fixedly connected magnet cylinder body, the upper end of magnet cylinder body fixedly connected magnetic cylinder regulating sleeve, magnetic cylinder regulating sleeve is provided with the adjusting screw(rod) that is threaded, magnet is fixedlyed connected with the inner end of adjusting screw(rod), and magnet places the magnet cylinder body.
As further improvement, described magnet is spaced by some permanent magnet annulars and forms.
The utility model beneficial technical effects is: because the magnet in the arc source apparatus is fixedlyed connected with the inner end of adjusting screw(rod), but the rotation adjusting screw(rod) is with regard to the relative position of regulating magnet and target, thereby the magneticstrength in the vacuum chamber is changed, coating equipment has and can reach the advantage of optimum Working under different targets and the operating mode.
Description of drawings
Fig. 1: be structural representation of the present utility model;
Fig. 2: be the left view of Fig. 1;
Fig. 3: be the structural representation of arc source apparatus;
Fig. 4: for the A of Fig. 3 to enlarged view (structural representation of ring-shaped magnet).
Embodiment
Below in conjunction with drawings and Examples the utility model is further described:
As Figure 1-3, vacuum arc deposition film machine, comprise vacuum-pumping system, vacuum chamber, door for vacuum chamber 1, be arranged on the workpiece pivoted frame 2 in the vacuum chamber and be arranged on arc source apparatus 3 on the vacuum chamber body 9, arc source apparatus 3 comprises the flange 10 of fixedlying connected with vacuum chamber body 9, be located at arc initiation device 12 and negative electrode water jacket 13 on the flange 10, be contained in the target 14 on the negative electrode water jacket 13, be located at the magnet 15 of target 14 tops, on negative electrode water jacket 13, insert fixedly connected magnet cylinder body 16, the upper end of magnet cylinder body 16 fixedly connected magnetic cylinder regulating sleeve 17, magnetic cylinder regulating sleeve 17 is provided with the adjusting screw(rod) 18 that is threaded, magnet 15 is fixedlyed connected with the inner end of adjusting screw(rod) 18, and magnet 15 places magnet cylinder body 16.Be provided with heating unit 11 in vacuum chamber, vacuum chamber is heated, the temperature of heating can be provided with according to the different process of product.On door for vacuum chamber 1, be provided with viewing window 8, be convenient to observe the plated film situation.As shown in Figure 4, described magnet 15 is arranged by some permanent magnets 19 annular space and is formed, and has the Distribution of Magnetic Field advantage of uniform.
Described negative electrode water jacket 13 is radially fixedlyed connected with flange 10, axially flexibly connects, and the target 14 that is contained on the negative electrode water jacket 13 can be according to the requirement of different operating modes, and the turnover position can be regulated.
Water coolant in the described negative electrode water jacket 13 directly contacts with target 14, has the better advantage of cooling performance.Described arc initiation device 12 comprises striking cylinder 20, insulation covering 21 and arc ignition bar 22, striking cylinder 20 is fixedlyed connected with flange 10 with insulation covering 21, arc ignition bar 22 is radially fixedlyed connected with insulation covering 21, axially flexibly connects, and arc ignition bar 22 is fixedlyed connected with the piston rod of striking cylinder 20.20 actions of striking cylinder directly drive arc ignition bar 22 actions, and the pneumatic type striking is shorter than the electromagnetic type striking time.The power supply of described arc source apparatus 12 is the pulse power, makes electric current littler, has plasma sputter particle exquisiteness, the advantage that plated film product surface glossiness is strong.
Described vacuum-pumping system comprises low vacuum pumping device and fine pumping device.Described low vacuum pumping device comprises Roots vaccum pump 5 and oil-sealed rotary pump 7, and the fine pumping device comprises holding vacuum pump 6 and vacuum diffusion pump 4.Its working process is as follows: open Roots vaccum pump 5 and oil-sealed rotary pump 7 earlier, carry out rough vacuum and bleed, when treating that vacuum tightness is evacuated to a certain degree, enter fine pumping, bleed by holding vacuum pump 6 and vacuum diffusion pump 4, treat that the vacuum tightness of vacuum chamber is evacuated to 8.0 * 10 -3During Pa, the plated film product that utilizes 3 pairs of arc source apparatus to be loaded on the workpiece pivoted frame 2 carries out ion film plating.

Claims (6)

1. vacuum arc deposition film machine, comprise vacuum-pumping system, vacuum chamber, door for vacuum chamber, be arranged on the workpiece pivoted frame in the vacuum chamber and be arranged on several arc source apparatus on the vacuum chamber body, the arc source apparatus comprises the flange of fixedlying connected with the vacuum chamber body, be located at arc initiation device and negative electrode water jacket on the flange, be contained in the target on the negative electrode water jacket, be located at the magnet of target top, it is characterized in that: on the negative electrode water jacket, insert fixedly connected magnet cylinder body, the upper end of magnet cylinder body fixedly connected magnetic cylinder regulating sleeve, magnetic cylinder regulating sleeve is provided with the adjusting screw(rod) that is threaded, magnet is fixedlyed connected with the inner end of adjusting screw(rod), and magnet places the magnet cylinder body.
2. vacuum arc deposition film machine according to claim 1 is characterized in that: described magnet is spaced by some permanent magnet annulars and forms.
3. vacuum arc deposition film machine according to claim 1 and 2 is characterized in that: described negative electrode water jacket is radially fixedlyed connected with flange, axially flexibly connects.
4. vacuum arc deposition film machine according to claim 1 and 2 is characterized in that: the water coolant in the described negative electrode water jacket directly contacts with target.
5. vacuum arc deposition film machine according to claim 1 and 2, it is characterized in that: described arc initiation device comprises striking cylinder, insulation covering and arc ignition bar, the striking cylinder is fixedlyed connected with flange with insulation covering, arc ignition bar is radially fixedlyed connected with insulation covering, axially flexibly connect, arc ignition bar is fixedlyed connected with the piston rod of striking cylinder.
6. vacuum arc deposition film machine according to claim 1 and 2 is characterized in that: the power supply of described arc source apparatus is the pulse power.
CN2010205394825U 2010-09-17 2010-09-17 Vacuum multi-arc ion plating machine Expired - Fee Related CN201793722U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010205394825U CN201793722U (en) 2010-09-17 2010-09-17 Vacuum multi-arc ion plating machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2010205394825U CN201793722U (en) 2010-09-17 2010-09-17 Vacuum multi-arc ion plating machine

Publications (1)

Publication Number Publication Date
CN201793722U true CN201793722U (en) 2011-04-13

Family

ID=43848642

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010205394825U Expired - Fee Related CN201793722U (en) 2010-09-17 2010-09-17 Vacuum multi-arc ion plating machine

Country Status (1)

Country Link
CN (1) CN201793722U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107227445A (en) * 2017-07-24 2017-10-03 曲士广 A kind of arc ion plating apparatus of deposited tube inside coating
CN107805786A (en) * 2017-12-07 2018-03-16 北京泰科诺科技有限公司 Multi sphere ion vacuum coating machine
CN109930117A (en) * 2017-12-15 2019-06-25 湘潭宏大真空技术股份有限公司 Ion plating film device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107227445A (en) * 2017-07-24 2017-10-03 曲士广 A kind of arc ion plating apparatus of deposited tube inside coating
CN107227445B (en) * 2017-07-24 2019-01-25 曲士广 A kind of arc ion plating apparatus of deposited tube inside coating
CN107805786A (en) * 2017-12-07 2018-03-16 北京泰科诺科技有限公司 Multi sphere ion vacuum coating machine
CN107805786B (en) * 2017-12-07 2023-12-08 北京泰科诺科技有限公司 Multi-arc ion vacuum coating machine
CN109930117A (en) * 2017-12-15 2019-06-25 湘潭宏大真空技术股份有限公司 Ion plating film device

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: SHANGHAI VAKIA COATING TECHNOLOGY CO., LTD.

Free format text: FORMER OWNER: WENZHOU JIANENG VACUUM PLATING EQUIPMENT TECHNOLOGY CO., LTD.

Effective date: 20120428

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: 325000 WENZHOU, ZHEJIANG PROVINCE TO: 201614 SONGJIANG, SHANGHAI

TR01 Transfer of patent right

Effective date of registration: 20120428

Address after: 201614, light industrial zone, No. 888, Kunming Port Road, little Kunshan Town, Shanghai, Songjiang District

Patentee after: Shanghai Vakia Coating Technology Co., Ltd.

Address before: 325000, No. 5, No. 1-2, West Road, Ouhai Economic Development Zone, Zhejiang, Wenzhou

Patentee before: Wenzhou Jianeng Vacuum Plating Equipment Technology Co., Ltd.

DD01 Delivery of document by public notice
DD01 Delivery of document by public notice

Addressee: Shanghai Vakia Coating Technology Co., Ltd.

Document name: Notification to Pay the Fees

DD01 Delivery of document by public notice
DD01 Delivery of document by public notice

Addressee: Shanghai Vakia Coating Technology Co., Ltd.

Document name: Notification of Termination of Patent Right

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20110413

Termination date: 20170917