CN107895644B - It is a kind of to expand the production line seeped and production method for heavy rare earth crystal boundary - Google Patents
It is a kind of to expand the production line seeped and production method for heavy rare earth crystal boundary Download PDFInfo
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- CN107895644B CN107895644B CN201711194533.8A CN201711194533A CN107895644B CN 107895644 B CN107895644 B CN 107895644B CN 201711194533 A CN201711194533 A CN 201711194533A CN 107895644 B CN107895644 B CN 107895644B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
- H01F41/0293—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets diffusion of rare earth elements, e.g. Tb, Dy or Ho, into permanent magnets
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/02—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity of multiple-track type; of multiple-chamber type; Combinations of furnaces
- F27B9/028—Multi-chamber type furnaces
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
- F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
- F27B9/24—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor
- F27B9/2407—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor the conveyor being constituted by rollers (roller hearth furnace)
Abstract
The present invention provides a kind of production line for expanding infiltration for heavy rare earth crystal boundary, expands including control unit and the material transmission system connecting with control unit, monolithic moulding press, sintering mechanism, wiper mechanism, film-coating mechanism, vacuum and seeps furnace and control unit；Material transmission system includes the first transmission assembly, the second transmission assembly, third transmission assembly and the 4th transmission assembly；Monolithic moulding press discharge port is connect by the first transmission assembly with sintering mechanism feed inlet, sintering mechanism discharge port is connect by the second transmission assembly with wiper mechanism feed inlet, wiper mechanism discharge port is connect by third transmission assembly with film-coating mechanism feed inlet, and film-coating mechanism feed inlet expands infiltration furnace feed inlet with vacuum by the 4th transmission assembly and connect；Monolithic moulding press provides substrate to sintering mechanism one by one, and sintering mechanism is sintered substrate；Wiper mechanism cleans substrate；Film-coating mechanism sputters heavy rare earth to substrate surface, forms heavy rare earth layer；Vacuum, which expands, seeps furnace to substrate heat treatment, realizes that heavy rare earth expands and seeps.
Description
Technical field
The present invention relates to heavy rare earth expand seep technical field, and in particular to it is a kind of for heavy rare earth crystal boundary expand seep production line and
Production method.
Background technique
In order to obtain the product of more high-coercive force, generally use in magnetic material industry industrial production in fusion process at present
Middle doping heavy rare earth material, i.e., be added in fusion process, i.e., heavy rare earth element melting together, such technique makes magnet
Transgranular main phase and crystal boundary all contain heavy rare earth element, and coercivity greatly increases, studies have shown that, only the heavy rare earth of crystal boundary is first
Element is most significant to coercivity effect is improved.More effectively to obtain magnet superior performance, is expanded again using heavy rare earth crystal boundary seep later
Technique, heavy rare earth usage amount can be effectively reduced, exist only in heavy rare earth element in crystal boundary, will be easier to obtain so high
The magnet of performance.It is vapour deposition method and cladding process that common crystal boundary, which expands cementation process method,.
But there are still following defects in above-mentioned technique: 1) fusion process is dilute using weight by the way of adding heavy rare earth
The dosage of soil reaches even higher than 8% or so, with the first work of nature at high cost, that manufacture is difficult, performance boost is limited, consistency is poor
Skill defect.2) cladding process that existing heavy rare earth crystal boundary expands in cementation process uses fluoride or oxide, and coating is uneven, product product
Matter it is difficult to ensure that.Furthermore fluoride has very strong corrosive, and toxic, can all cause adverse effect to human body and equipment.Due to
Heavy rare earth can not be effectively recycled, therefore stock utilization is lower.3) existing heavy rare earth crystal boundary expands the vapour deposition method technique in cementation process
The mode time is long, energy consumption is high, seriously polluted, and product quality is not easy to guarantee.4) lack the condition that heavy industrialization is realized.
Summary of the invention
(1) technical problems to be solved
The present invention is directed to solve at least one of the technical problems existing in the prior art or related technologies.For this purpose, of the invention
A purpose be to propose that a kind of stock utilization height, no pollution to the environment, high production efficiency, be produced on a large scale high-performance
Magnetic material expands the production line seeped and production method for heavy rare earth crystal boundary.
(2) technical solution
Expand the production line seeped, including object for heavy rare earth crystal boundary in order to solve the above technical problem, the present invention provides a kind of
Expect that Transmission system, monolithic moulding press, sintering mechanism, film-coating mechanism, vacuum expand and seeps furnace and control unit；
The material transmission system, monolithic moulding press, sintering mechanism, wiper mechanism, film-coating mechanism and vacuum, which expand, seeps furnace
It is connect respectively with described control unit；
The material transmission system includes the first transmission assembly, the second transmission assembly, third transmission assembly and the 4th transmission
Component；The discharge port of the monolithic moulding press is connect by first transmission assembly with the feed inlet of the sintering mechanism,
The discharge port of the sintering mechanism is connect by second transmission assembly with the feed inlet of the wiper mechanism, the cleaning machine
The discharge port of structure is connected by the feed inlet of the third transmission assembly and film-coating mechanism, and the feed inlet of the film-coating mechanism passes through
4th transmission assembly is connect with the feed inlet that the vacuum expands infiltration furnace；
The monolithic moulding press provides substrate, the burning to the sintering mechanism by first transmission assembly one by one
Knot mechanism is sintered the substrate；Sintered substrate is delivered to the wiper mechanism, institute by second transmission assembly
Wiper mechanism is stated to clean the substrate；Substrate after cleaning is delivered to film-coating mechanism by the third transmission assembly, institute
It states film-coating mechanism and sputters heavy rare earth to the surface of the substrate, form heavy rare earth layer；4th transmission assembly will be after plated film
The vacuum that substrate is delivered to, which expands, seeps furnace, and the vacuum expands infiltration furnace and is heat-treated to the substrate, is seeped with realizing that heavy rare earth expands.
Wherein, the sintering mechanism includes multicell continuous fritting furnace, and the multicell continuous fritting furnace includes trash chamber, sintering
Room, cooling chamber, the first gate valve, the second gate valve, third gate valve and transfer component, first gate valve are set to described remove
The feed inlet of miscellaneous room, the both ends of second gate valve feed inlet with the discharge port of the trash chamber and the agglomerating chamber respectively
Connection, the both ends of the third gate valve are connect with the discharge port of the agglomerating chamber with the feed inlet of the cooling chamber respectively, institute
Transfer component is stated for carrying the substrate, and drives the substrate mobile, make its pass sequentially through the trash chamber, agglomerating chamber with
Cooling chamber.
Wherein, the film-coating mechanism includes coating machine, and the coating machine includes Sample Room, surge chamber, purge chamber, plated film
Room, goes out specimen chamber and transport mechanism at cooling chamber；Between the discharge port of the surge chamber and the feed inlet of purge chamber, the purge chamber
Discharge port and coating chamber feed inlet between, between the discharge port of the coating chamber and the feed inlet of cooling chamber, the cooling
It is connected by slide valve and vacuum sealing components between the feed inlet of the discharge port of room and out specimen chamber, the transport mechanism is used for
Carry the substrate, and drive the substrate mobile, make its pass sequentially through the Sample Room, surge chamber, purge chamber, coating chamber,
Cooling chamber and specimen chamber out, to realize the substrate coating single side.
Wherein, the film-coating mechanism further includes overturning conveyer, the biography between the discharge port and feeding inlet of the coating machine
Be provided with transmission mechanism on defeated path, the inlet port and outlet port of the overturning conveyer by the transmission mechanism respectively with institute
The discharge port for stating coating machine is connected with feed inlet, and the transmission mechanism is described to turn over for transmitting the material containing disk for carrying the substrate
Turn conveyer for overturning the substrate in the material containing disk, so that after substrate carries out front coating single side in the coating machine,
Lay equal stress on via overturning conveyer overturning and newly carries out reverse side coating single side by the coating machine.
Wherein, the overturning conveyer includes the rollover stand that can be overturn along axis, is equipped with Flip Zone, institute in the rollover stand
The two sides for stating Flip Zone are respectively equipped with a pair of of clamp system opposing upper and lower, wherein the superposed clamp system is used for
A material containing disk for being preset at the Flip Zone top is clamped, the clamp system positioned at lower part turns over described in entrance for clamping
Turn another material containing disk in area and drives the material containing disk mobile towards preset material containing disk；So that two material containing disks
Both ends are aligned and clamp；The location swap that the rollover stand passes through the overturning synchronous drive two material containing disks of energy.
Wherein, it includes gas source, vacuum pump group, furnace body and heater box that the vacuum, which expands infiltration furnace, and the gas source passes through air inlet pipe
Road is connect with the furnace body, and the air inlet pipeline is equipped with intake valve；The vacuum pump group passes through exhaust pipe and the furnace
Body connection, and the exhaust pipe is equipped with high vacuum valve；The heater box is set in the furnace body, and is set in the heater box
There is Material support frame, for carrying the substrate；The gas source and the vacuum pump group inflation/deflation into the furnace body respectively, it is described plus
Hot tank is heat-treated the substrate, is seeped with realizing that heavy rare earth expands.
Wherein, the heater box includes heat insulating reflecting screen, braced frame and heater；The heat insulating reflecting screen is laid on institute
It states and constitutes cabinet in braced frame, the heater is set in the cabinet.
Wherein, the vacuum pump group includes low pumping speed pump group and high pumping rate pump group, the low pumping speed pump group, high pumping rate pump group
It is sequentially connected with high vacuum valve, and is equipped with prime between the air inlet of the high vacuum valve and the air inlet of the low pumping speed pump group
Pipeline, the backing line are equipped with pre- pumping valve, and the connecting line between the low pumping speed pump group and high pumping rate pump group is equipped with
Preceding step valve.
Wherein, it further includes charging/discharging device that the vacuum, which expands infiltration furnace, and the charging/discharging device includes transmission mechanism and disengaging
Expect mechanism, the transmission mechanism connect with the 4th transmission assembly, and the 4th transmission assembly passes through transmission mechanism to described
Feeding-discharging mechanism provides substrate one by one；The feeding-discharging mechanism includes guide rail and can be along the car body of guide rail sliding, the vehicle
Body is equipped with spiral lift, and the upside of the spiral lift, which is equipped with, inserts material bar, and the slotting material bar is located at the driver
Below structure, the spiral lift makes on transmission mechanism described in the slotting material bar support for driving the slotting material bar to rise
Substrate, the car body drive the slotting material bar, it is made to pass in and out the furnace body, realize input and output material.
Expand the production method seeped for heavy rare earth crystal boundary the present invention also provides a kind of, specifically includes the following steps:
The substrate is sintered, and sintered substrate is cleaned；
Heavy rare earth is sputtered to the substrate surface after cleaning, forms heavy rare earth layer, to realize the substrate single or double plating
Film；
Substrate after plated film is heat-treated, is seeped with realizing that heavy rare earth expands.
(3) beneficial effect
Compared with prior art, the present invention has the advantage that
The present invention provides a kind of production line and production method, the production line and production method for expanding infiltration for heavy rare earth crystal boundary
It is the new way of an achievable high performance magnetic material production, has overturned the traditional equipment use that heavy rare earth crystal boundary expands cementation process
Method is suitable for large-scale production high performance magnetic material, has stock utilization height, high production efficiency, at low cost, equipment energy
Low and nontoxic and pollution-free technical characterstic is consumed, and the product produced has the advantage of high-performance and high consistency, is entire industry
Industrialized production development opens new route.
Detailed description of the invention
In order to illustrate more clearly of the embodiment of the present disclosure or technical solution in the prior art, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Disclosed some embodiments for those of ordinary skill in the art without creative efforts, can be with
Other attached drawings are obtained according to these figures.
Fig. 1 is a kind of structural schematic diagram for expanding the production line seeped for heavy rare earth crystal boundary in the embodiment of the present invention 1；
Fig. 2 is the structural schematic diagram of multicell continuous fritting furnace in the embodiment of the present invention 2；
Fig. 3 is the main view of multicell continuous fritting furnace in the embodiment of the present invention 2；
Fig. 4 is the top view of multicell continuous fritting furnace in the embodiment of the present invention 2；
Fig. 5 is the structural schematic diagram of the transfer component of multicell continuous fritting furnace in the embodiment of the present invention 2；
Fig. 6 is the structural schematic diagram of wiper mechanism in the embodiment of the present invention 3；
Fig. 7 is the structural schematic diagram of the coating machine of film-coating mechanism in the embodiment of the present invention 4；
Fig. 8 is the structural schematic diagram of film-coating mechanism in the embodiment of the present invention 4；
Fig. 9 is the structural schematic diagram that conveyer is overturn in the embodiment of the present invention 4；
Figure 10 is that vacuum expands the structural schematic diagram for seeping furnace in the embodiment of the present invention 5；
Figure 11 is that vacuum expands the furnace structure schematic diagram for seeping furnace in the embodiment of the present invention 5；
Figure 12 is that vacuum expands the structural schematic diagram for seeping the charging/discharging device of furnace in the embodiment of the present invention 5；
Figure 13 is the structural schematic diagram of the feeding-discharging mechanism of charging/discharging device in the embodiment of the present invention 5；
Figure 14 is the structural schematic diagram of the regulatory mechanism of charging/discharging device in the embodiment of the present invention 5；Description of symbols
1- monolithic moulding press；2- is sintered mechanism；3- wiper mechanism；4- film-coating mechanism；5- vacuum, which expands, seeps furnace；6- material passes
Defeated system；
101- trash chamber；102- agglomerating chamber；103- cooling chamber；104- entrance roller tables vehicle；105- outlet roller trolley；106- is true
Empty pump assembly；The first gate valve of 107-；The second gate valve of 108-；109- third gate valve；110- motor；111- live-roller；
112- sprocket wheel；113- loading bay；114- oil removing groove；115- first clears washing trough fastly；116- etching tank；117- second is cleared fastly to be washed
Slot；118- dry slot；119- discharging platform；120- manipulator；121- guide rail；
201- coating machine；202- discharging conveyer；The commutation conveyer of 203- first；204- first straight line conveyer；205-
Overturn conveyer；206- second straight line conveyer；The commutation conveyer of 207- second；208- feeding conveyor；209- rack；210-
Rollover stand；211- material containing disk；212- clamp system；213- loading bay；214- Sample Room；The first surge chamber of 215-；216- cleaning
Room；217- coating chamber；The second surge chamber of 218-；219- cooling chamber；220- goes out specimen chamber；221- discharging platform；
301- furnace body；302- vacuum pump group；303- heater box；304- Material support frame；305- transmission mechanism；306- is regulatory
Mechanism；307- feeding-discharging mechanism；308- mounting rack；309- inserts material bar；310- goes up and down driving motor；311- spiral lift；
312- car body；313- guide rail；314- pulley；315- connecting plate；316- cylinder；317- gear；318- rack gear；319- baffle；
The regulatory plate of 320-.
Specific embodiment
With reference to the accompanying drawings and examples, specific embodiments of the present invention will be described in further detail.Following instance
For illustrating the present invention, but it is not intended to limit the scope of the invention.
In the description of the present invention, it should be noted that unless otherwise indicated, the meaning of " plurality " is two or two with
On；The orientation of the instructions such as term " on ", "lower", "left", "right", "inner", "outside", " front end ", " rear end ", " head ", " tail portion "
Or positional relationship is to be based on the orientation or positional relationship shown in the drawings, and is merely for convenience of description of the present invention and simplification of the description, and
It is not that the device of indication or suggestion meaning or element must have a particular orientation, be constructed and operated in a specific orientation, therefore
It is not considered as limiting the invention.In addition, term " first ", " second ", " third " etc. are used for description purposes only, and cannot
It is interpreted as indication or suggestion relative importance.
In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " installation ", " phase
Even ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or be integrally connected；It can
To be mechanical connection, it is also possible to be electrically connected；It can be directly connected, can also can be indirectly connected through an intermediary
Connection inside two elements.For the ordinary skill in the art, above-mentioned term can be understood at this with concrete condition
Concrete meaning in invention.
Embodiment 1:
As shown in Figure 1, to expand the production line seeped, including material transferring system for heavy rare earth crystal boundary the present embodiment provides a kind of
System 6, monolithic moulding press 1, sintering mechanism 2, wiper mechanism 3, film-coating mechanism 4, vacuum, which expand, seeps furnace 5 and control unit.
Material transmission system 6, monolithic moulding press 1, sintering mechanism 2, wiper mechanism 3, film-coating mechanism 4 and vacuum, which expand, seeps furnace
5 connect with control unit respectively.
Material transmission system 6 includes the first transmission assembly, the second transmission assembly, third transmission assembly and the 4th transmission group
Part；The discharge port of monolithic moulding press 1 is connect by the first transmission assembly with the feed inlet for being sintered mechanism 2, and sintering mechanism 2 goes out
Material mouth is connect by the second transmission assembly with the feed inlet of wiper mechanism 3, and the discharge port of wiper mechanism 3 passes through third transmission assembly
It is connect with the feed inlet of film-coating mechanism 4, the feed inlet of film-coating mechanism 4 expands the charging for seeping furnace 5 by the 4th transmission assembly and vacuum
Mouth connection；
Monolithic moulding press 1 provides substrate to sintering mechanism by the first transmission assembly one by one, sintering mechanism 2 to substrate into
Row sintering；Sintered substrate is delivered to wiper mechanism 3 by the second transmission assembly, and wiper mechanism 3 cleans substrate；Third
Sintered substrate is delivered to film-coating mechanism 4 by transmission assembly, and film-coating mechanism 4 sputters heavy rare earth to the surface of substrate, forms weight
Rare earth layer；Substrate after plated film is delivered to vacuum and expands infiltration furnace 5 by the 4th transmission assembly, and vacuum, which expands, seeps furnace 5 to the hot place of substrate progress
Reason is seeped with realizing that heavy rare earth expands.
In the present embodiment, Tb heavy rare earth layer or Dy heavy rare earth layer are formed on the surface of substrate.
In the present embodiment, the first transmission assembly, the second transmission assembly, third transmission assembly and the 4th transmission assembly include
Manipulator, transmission belt and/or transfer bogie realize automated production, do not need manually to be participated in, and save employment cost, whole
Production line efficiency is higher, and consumption is less, realizes the reduction of production cost.
Below by the specific course of work, further detailed description.
Neodymium iron boron (no heavy rare earth adds) is pressed into substrate by monolithic moulding press 1；First transmission assembly forms monolithic
Substrate prepared by press 1 is supplied to sintering mechanism one by one, and sintering mechanism 2 is sintered substrate；Second transmission assembly will be sintered
Substrate afterwards is delivered to wiper mechanism 3, and wiper mechanism 3 cleans sintered substrate；After third transmission assembly will be sintered
Substrate be delivered to film-coating mechanism 4, film-coating mechanism 4 is dilute to the surface sputtering weight of the substrate after cleaning by magnetron sputtering technique
Soil forms heavy rare earth layer on the surface of substrate, to realize substrate single or double plated film；4th transmission assembly is by the base after plated film
The vacuum that piece is delivered to, which expands, seeps furnace 5, and vacuum, which expands, seeps furnace 5 to substrate progress high temperature thermal diffusion and tempering, realizes that heavy rare earth expands and seeps.
Expand the production line seeped for heavy rare earth crystal boundary the present embodiment provides a kind of, the production line and production method be one can
It realizes the new way of high performance magnetic material production, is suitable for large-scale production high performance magnetic material, there is stock utilization
Height, high production efficiency, technical characterstic at low cost, equipment energy consumption is low and nontoxic and pollution-free, and the product produced has high-performance
With the advantage of high consistency, opened up a new way for the industrialized production development of entire industry.
Embodiment 2:
The present embodiment is substantially the same manner as Example 1, brief for description, during the description of the present embodiment, no longer
Technical characteristic same as Example 1 is described, only illustrates the present embodiment difference from Example 1:
As in Figure 2-4, in the present embodiment, sintering mechanism 2 includes multicell continuous fritting furnace, and multicell continuous fritting furnace includes
Trash chamber 101, agglomerating chamber 102, cooling chamber 103, the first gate valve 107, the second gate valve 108, third gate valve 109 and transfer
Component, the first gate valve 107 be set to trash chamber 101 feed inlet, the both ends of the second gate valve 108 respectively with trash chamber 101
Discharge port is connect with the feed inlet of agglomerating chamber 102, the both ends of third gate valve 109 respectively with the discharge port of agglomerating chamber 102 with it is cold
But the feed inlet connection of room 103, transfer component are used for carrying substrates, and drive substrate mobile, it is made to pass sequentially through trash chamber
101, agglomerating chamber 102 and cooling chamber 103.
Trash chamber 101 and agglomerating chamber 102 are communicated with vacuum pump component 106, are equipped with evaporator in cooling chamber 103.Substrate
It is dewaxed and is deaerated in trash chamber 101, be sintered in agglomerating chamber 102, is quickly cooled down in cooling chamber 103.
As shown in figure 5, transfer component includes multiple transmissions in trash chamber 101, agglomerating chamber 102 and cooling chamber 103
Roller 111 and motor 110, and one end of the live-roller 111 in trash chamber 101, agglomerating chamber 102 and cooling chamber 103 is equipped with sprocket wheel
112, motor 110 is connect by chain with sprocket wheel 112, and live-roller 111 is driven to rotate, and substrate is made to pass sequentially through trash chamber 101, burn
Tie room 102 and cooling chamber 103.
Further, transfer component further includes entrance roller tables vehicle 104 and outlet roller trolley 105.Entrance roller tables vehicle 104 is set to
At the feed inlet of trash chamber 101, and it is connect with the first transmission assembly；Outlet roller trolley 105 is set to the discharge port of cooling chamber 103
Place, and connect with the second transmission assembly.
Below by specific process, further details of explanation.
First conveying assembly is by substrate transfer to entrance roller tables vehicle 104, and the first gate valve 107 is opened, entrance roller tables vehicle
Substrate is sent into trash chamber 101 by 104；The first gate valve 107 is closed, substrate carries out dewaxing and degassing process in trash chamber 101；
Second gate valve 108 is opened, and motor 110 is opened, and substrate is sent into agglomerating chamber 102 by live-roller 111；Motor 110 with
Second gate valve 108 is closed, and agglomerating chamber 102 is evacuated to 10 by vacuum pump component 106-2Pa opens the heating in agglomerating chamber 102
Device is warming up to 1020-1050 DEG C by certain heating rate, and keeps the temperature 15~20h, and later, filling with inert gas makes in agglomerating chamber 102
Pressure to -0.06MPa.
Third gate valve 109 is opened, and motor 110 is opened, and substrate is sent into cooling chamber Room 103 by live-roller 111；Motor 110
It is closed with third gate valve 109, starts evaporator, rapid cooling is cooled to room temperature or 60 DEG C；After cooling, motor 110 is opened, and is passed
Substrate will be sent to outlet roller trolley 105 by dynamic roller 111, and substrate is sent to the second transmission assembly by outlet roller trolley 105.Second
Sintered substrate is delivered to wiper mechanism 3 by transmission assembly, is cleaned.
The present embodiment provides it is a kind of for heavy rare earth crystal boundary expand seep production line, by multicell continuous fritting furnace to substrate into
Row sintering, and the operation of trash chamber, agglomerating chamber and cooling chamber can be adjusted according to technique；In addition, can it is continuous to substrate into
Row sintering, high production efficiency, equipment energy consumption and production cost are low；Meanwhile keeping the convergence process of production line upstream and downstream more rationally complete
It is kind.
Embodiment 3:
The present embodiment is substantially the same manner as Example 1, brief for description, during the description of the present embodiment, no longer
Technical characteristic same as Example 1 is described, only illustrates the present embodiment difference from Example 1:
As shown in fig. 6, wiper mechanism 3 includes that oil removing groove 114, first clears washing trough 115, etching tank fastly in the present embodiment
116, washing trough 117, dry slot 118 and transfer assembly are cleared second fastly, transfer assembly drive substrate sequentially pass through oil removing groove 114,
First clears washing trough 115 fastly, etching tank 116, second clears washing trough 117 and dry slot 118 fastly, completes cleaning.
In the present embodiment, transfer assembly includes loading bay 113, discharging platform 119, guide rail 121 and can slide along guide rail 121
Manipulator 120.Loading bay 113 is connect with the second transmission assembly, and discharging platform 119 is connect with third transmission assembly.In the present embodiment,
Dry slot 118 includes work nest and cache slot.
Its specific work process is as follows:
Sintered substrate is delivered to loading bay 113 by the second transmission assembly, and substrate is placed in oil removing groove by manipulator 120
In 114；In oil removing groove 114 chemical agent A heating, circulation at the same open ultrasound, wash substrate surface greasy dirt and remaining
Particulate matter.
After deoiling, substrate is placed in first and is cleared in washing trough 115 fastly by manipulator 120；First clears the progress of washing trough 115 fastly
Water filling, spray, nitrogen is bubbled and fast row, rinses out the remaining chemical agent A of substrate surface.
After flushing, substrate is placed in etching tank 116 by manipulator 120；It is rotten by the chemical agent B in etching tank 116
The impurity such as the oxide layer on eating away material block surface.Further, motor is equipped in etching tank 116, motor is for driving carrier or more
It shakes, keeps oxide layer corrosion effect more preferable.
After corrosion, substrate is placed in second and is cleared in washing trough 117 fastly by manipulator 120；Second clears the progress of washing trough 117 fastly
Water filling, spray, nitrogen is bubbled and fast row, rinses out the remaining chemical agent B of substrate surface
After flushing, substrate is placed in the work nest of dry slot 118 by manipulator 120；It is filled in the work nest of dry slot 118
Full IPA (isopropanol) walks the IPA inside dry slot 118 to cache slot by pumping, carries away material block remained on surface using IPA
Water, then pass to hot nitrogen to material block surface liquid be dried.
After drying, substrate is placed in discharging platform 119 by manipulator 120, and is delivered to plated film by third transmission assembly
Mechanism 4.
In the present embodiment, cleaning structure deoils to sintered substrate, oxide layer and drying process, in whole life
Connection sintering mechanism and film-coating mechanism, are suitable for large-scale production high performance magnetic material, high production efficiency, and mention in producing line
The high product quality of production.
Embodiment 4:
The present embodiment is substantially the same manner as Example 1, brief for description, during the description of the present embodiment, no longer
Technical characteristic same as Example 1 is described, only illustrates the present embodiment difference from Example 1:
As shown in fig. 7, film-coating mechanism 4 includes coating machine 201 in the present embodiment, coating machine 201 includes Sample Room 214, delays
It rushes room, purge chamber 216, coating chamber 217, cooling chamber 219, go out specimen chamber 220 and transport mechanism；The discharge port of surge chamber and purge chamber
Between 216 feed inlet, between the discharge port of purge chamber 216 and the feed inlet of coating chamber 217, the discharge port of coating chamber 217 with
Between the feed inlet of cooling chamber 219, the discharge port of cooling chamber 219 and out between the feed inlet of specimen chamber 220 by slide valve and
Vacuum sealing components connection, transport mechanism are used for carrying substrates, and drive substrate mobile, it is made to pass sequentially through Sample Room 214, delay
Room, purge chamber 216, coating chamber 217, cooling chamber 219 and specimen chamber 220 out are rushed, to realize substrate coating single side.
In the present embodiment, surge chamber include the first surge chamber 214 and the second surge chamber 218, the first surge chamber 214 be set into
Between specimen chamber 214 and purge chamber 216；Second surge chamber 218 is set between coating chamber 217 and cooling chamber 219.
In the present embodiment, transport mechanism includes loading bay 213, discharging platform 221, multistage backspin rolls and driving motor charging
Platform 213 is connect with the feed inlet of Sample Room 214, and discharging platform 221 is connect with the discharge port of specimen chamber 220 out, and driving motor is by frequency conversion
Governor control drives multistage transmission carrying roller horizontal synchronization operating, realizes piecewise horizontal feed.
Sample Room: it is made of chamber and rack.Rack is aluminium profile, and chamber is the single layer knot of stainless steel material
Structure.Its feed inlet is connect with loading bay 213 by gate valve.After transport mechanism completes material entrance, gate valve is held by cylinder control
The closed movement of row.
First surge chamber and the second surge chamber: it is made of chamber and rack.Rack is aluminium profile, and chamber is stainless
The single layer structure of steel material.Its chamber is provided with vacuum interface, and matches vacuum system, carries out forvacuum.
Purge chamber: it is made of chamber and rack.Rack is aluminium profile, and chamber is the single layer structure of stainless steel material.
Workpiece is cleaned by the way of inert gas plasma cleaning, and is assigned high vacuum system, guarantee plasma with
Physical reactions (ion bombardment) occurs for substrate surface.Physical reactions mechanism is active particle bombardment surface to be cleaned, makes pollutant
Surface is detached from finally to be siphoned away by vacuum pump.
Coating chamber: being made of chamber and rack, and rack is aluminium profile, and chamber is the double-layer structure of stainless steel material,
Cooling water can be led to.Its cavity is furnished with target assembly, heater, observation window, baffle mechanism, heat screen and vent valve, and coating chamber 217
Inside it is equipped with 3 planar cathodes.In the present embodiment, coating chamber 217 uses magnetron sputtering technique, dilute to substrate surface magnetron sputtering weight
Native Tb forms Tb heavy rare earth layer on the surface of substrate.
Cooling chamber: being made of chamber and rack, and rack is aluminium profile, and chamber is the double-layer structure of stainless steel material,
Cooling water can be led to, as substrate cooling technique execution unit.
It is above-mentioned coating single side or double-sided coating are carried out to substrate before, need to determine the specifications and characteristics requirement of substrate, and count
Calculate plated film (heavy rare earth layer) thickness of substrate (in 2-50 μm of range).
As shown in figure 8, film-coating mechanism 4 further includes overturning conveyer 205, between the discharge port and feeding inlet of coating machine 201
Transmission path on be provided with transmission mechanism, the inlet port and outlet port of overturning conveyer 205 pass through transmission mechanism and coating machine
201 discharge port is connected with feed inlet, and transmission mechanism is used to transmit the material containing disk 211 of carrying substrates, and overturning conveyer 205 is used for
The substrate on material containing disk 211 is overturn, so that after substrate carries out front coating single side in coating machine 201, via overturning conveyer
205 overturnings, which are laid equal stress on, newly carries out reverse side coating single side by coating machine 201.
Above-mentioned transmission mechanism includes feeding conveyor 208, discharging conveyer 202, first straight line conveyer 204, second
The commutation conveyer 203 of linear conveyor 206, first and the second commutation conveyer 207, feeding conveyor 208 and discharging conveyer
202 connect with the inlet port and outlet port of coating machine 201 respectively, and feeding conveyor 208 is connect with third transmission assembly, discharging
Conveyer 202 is connect with the 4th transmission assembly；First straight line conveyer 204 and second straight line conveyer 206 are passed with overturning respectively
The inlet and outlet of defeated machine 205 connects；The conveyer 202 that discharges passes through the first commutation conveyer 203 and first straight line conveyer 204
Connection, feeding conveyor 208 are connect by the second commutation conveyer 207 with second straight line conveyer 206.First commutation conveyer
203 and second commutation conveyer 207 for changing material containing disk 212 direction of transfer and transmission height, thus in coating machine 201
Outside forms the material transferring circulation for the transmission material containing disk 212 that can be recycled.
As shown in figure 9, overturning conveyer 205 includes the rollover stand 210 that can be overturn along axis, it is equipped with and turns in rollover stand 210
Turn area, the two sides of Flip Zone are respectively equipped with a pair of of clamp system 211 opposing upper and lower, and superposed clamp system 211 is used for
A material containing disk 212 for being preset at Flip Zone top is clamped, the clamp system 211 positioned at lower part enters in Flip Zone for clamping
Another material containing disk 212 and drive the material containing disk 212 mobile towards preset material containing disk 212；So that two material containing disks 212
Both ends be aligned and clamp；The location swap that rollover stand 210 passes through overturning energy two material containing disks 212 of synchronous drive.
After the overturning of rollover stand 210, the material containing disk 212 for being preset at Flip Zone top originally is flipped to Flip Zone lower part,
And can directly carry workpiece and enter subsequent processing, and the material containing disk 212 of script supplied materials is then flipped to Flip Zone top, with
As the preset material containing disk 212 in next overturning process, then after each material containing disk 212 enters Flip Zone by feeding inlet, Ke Yitong
The continuous overturning in the same direction for crossing rollover stand 210 replaces preset material containing disk 212 using supplied materials material containing disk 212, to simplify life one by one
Conveying process during production.
In the present embodiment, rollover stand 210 is set in rack 209, so that the height and first straight line of rollover stand feed inlet and outlet
Conveyer 204 is consistent with the height of second straight line conveyer 206.
Below by specific process, further detailed description.
After wiper mechanism 3 cleans substrate, the substrate after cleaning is delivered to feeding conveyor by third transmission assembly
208, substrate is delivered on transmission carrying roller by feeding conveyor 208, and each section of transmission carrying roller drives substrate to sequentially pass through Sample Room, delay
Room, purge chamber, coating chamber, cooling chamber and specimen chamber out are rushed, coating single side processing is carried out.
Substrate after coating single side is delivered to discharging conveyer 202, and changes direction of transfer through the first commutation conveyer 203
With transmission height, substrate is transported to first straight line conveyer 204, substrate is sent into overturning transmission by first straight line conveyer 204
In machine 205, overturn.
Substrate after overturning, into second straight line conveyer 206, and the biography through the second commutation change substrate of conveyer 207
Direction and transmission height are sent, makes it into feeding conveyor 208, and be again introduced into coating machine 201, plated film is carried out to reverse side.
After the completion of double-sided coating, the conveyer 202 that discharged is delivered to the 4th transmission assembly.
Expand the production line seeped for heavy rare earth crystal boundary the present embodiment provides a kind of, going out for coating machine is arranged in overturning conveyer
In transmission path between material mouth and feeding inlet, coating machine is used to carry out coating single side to substrate, and overturning conveyer is for overturning
Substrate, so as to lay equal stress on newly via overturning conveyer overturning by coating machine after substrate carries out front coating single side in coating machine
Reverse side coating single side is carried out, to realize uninterruptedly being continuously conveyed and double-sided coating for substrate, and can be carried out large-scale conveying
Operation improves production efficiency, reduces production cost, to realize a kind of automation and serialization degree is high, energy consumption is few, effect
The high continous way double-sided coating production line of rate.In addition, carrying out magnetron sputtering plating to substrate by coating machine, plating film quality is steady
It is fixed, it is produced into the original magnetic material for obtaining higher performance with lower, while improving the utilization rate of heavy rare earth material, reduces life
Input cost is produced, is reduced environmental pollution, reduces energy consumption, while heavy rare earth crystal boundary is expanded cementation process in industrialized production by coating machine
Application come true, opened up magnetic-controlled sputtering coating equipment in heavy rare earth crystal boundary and expanded the new application form in cementation process field.
Embodiment 5:
The present embodiment is substantially the same manner as Example 1, brief for description, during the description of the present embodiment, no longer
Technical characteristic same as Example 1 is described, only illustrates the present embodiment difference from Example 1:
As shown in figs. 10-11, in the present embodiment, vacuum, which expands, seeps furnace 5 including gas source, vacuum pump group 302, furnace body 301 and adds
Hot tank 303, gas source are connect by air inlet pipeline with furnace body 301, and vacuum pump group 302 is connect by exhaust pipe with furnace body 301；Add
Hot tank is set in furnace body 301, and Material support frame 304 is equipped in heater box, is used for carrying substrates；Gas source and vacuum pump group 302
The inflation/deflation into furnace body 301, heater box 303 are heat-treated substrate respectively, are seeped with realizing that heavy rare earth expands.
Wherein, heater box 303 includes heat insulating reflecting screen, braced frame and heater；Heat insulating reflecting screen is laid on support frame
Cabinet is constituted on frame, heater is set in cabinet.Heater box is constituted by heat insulating reflecting screen, braced frame and heater, is improved
Temperature uniformity can preferably ensure that heavy rare earth crystal boundary expands the consistency of the product of cementation process.
Below by specific process, further detailed description.
After film-coating mechanism 4 carries out plated film to substrate, the 4th transmission assembly is by the substrate transfer after plated film into heater box 303
Material support frame 304 on, furnace body 301 is evacuated to 3 × 10 by vacuum pump group 302-3Pa, heater is started to work, by furnace body
Temperature in 301 is heated to 900 DEG C or so, and keeps the temperature 10~20h.Then, filling with inert gas make the pressure in furnace body 301 to-
0.06MPa, heater stop working, and temperature is cooled to room temperature；After cooling, furnace body 301 is evacuated to 3 by vacuum pump group 302
×10-3Pa；Heater is started to work, and the temperature in furnace body 301 is heated to 500 DEG C, and keep the temperature 4-8h, is completed heavy rare earth and is expanded
It seeps；Later, temperature is cooled to room temperature, takes out substrate.
The present embodiment is a kind of to expand the production line seeped for heavy rare earth crystal boundary, and it is true to expand infiltration furnace pumping to vacuum by vacuum pump group
Sky, and in heat treatment process, gas source and the vacuum pump group inflation/deflation into furnace body flow the gas in furnace body, temperature
Degree distribution is more uniform.And vacuum pump group persistently extracts the exhaust gas of workpiece generation, discharges it vacuum and expands infiltration furnace, improves furnace body
Interior cleanliness.By the way that heater box is arranged, workpiece is heat-treated in heater box, and temperature is maintained in optimum range, is met
The production method of product reduces the discharge quantity of workpiece, improves the quality of finished product.
Further, vacuum pump group includes low pumping speed pump group and high pumping rate pump group, low pumping speed pump group, high pumping rate pump group and height
Vacuum valve is sequentially connected, and backing line, prime pipe are equipped between the air inlet of high vacuum valve and the air inlet of low pumping speed pump group
Road is equipped with pre- pumping valve, and the connecting line between low pumping speed pump group and high pumping rate pump group is equipped with preceding step valve.According to target control
The size of pressure controls the opening and closing of low pumping speed pump group and high pumping rate pump group, the intracorporal pressure of regulating stove.
The present embodiment is empty to furnace body pumping by the way that low pumping speed pump group and the cooperation of high pumping rate pump group is arranged, and realizes the pressure of furnace body
Control, and since pumping speed can be adjusted on a large scale, and then the intracorporal pressure regulation spectrum of furnace is made to become larger.Low pumping speed pump group with
High pumping rate pump group is run simultaneously, and sucking rate becomes larger, and pressure is lower in furnace body；Low pumping speed pump group operation, high pumping rate pump group are closed, are taken out
Tolerance becomes smaller, and pressure becomes larger in furnace body.Meanwhile air inflow is constant, it is at low cost.
As shown in figs. 12-14, it further includes charging/discharging device that vacuum, which expands infiltration furnace 5, and charging/discharging device includes 305 He of transmission mechanism
Feeding-discharging mechanism 307, transmission mechanism 305 are connect with the 4th transmission assembly, and the 4th transmission assembly passes through transmission mechanism 305 to disengaging
Material mechanism 307 provides substrate one by one.Feeding-discharging mechanism 307 includes guide rail 313 and can be along the car body 312 of guide rail sliding, car body 312
It is equipped with spiral lift 311 and lifting driving motor 310, the upside of spiral lift 311, which is equipped with, inserts material bar 309, and inserts material
Bar 309 is located at 305 lower section of transmission mechanism, and lifting driving motor 310 drives for driving spiral lift 311 to go up and down and inserts material 309
Bar rises, so as to insert the substrate on material 309 support transmission mechanism 305 of bar, car body 312, which drives, inserts material bar 309, it is made to pass in and out furnace body
301, realize input and output material.
Transmission mechanism 305 includes drive roller and driving motor, and one end of drive roller is equipped with sprocket wheel, and sprocket wheel passes through chain
It is connect with the driving end of driving motor, to realize that driving motor driving drive roller rotates synchronously.
Charging/discharging device further includes regulatory mechanism 306, and regulatory mechanism 306 is located on the upside of drive roller, including 316 He of cylinder
Regulatory plate 320, the driving end of cylinder 316 are connected with connecting plate 315, and regulatory plate 320 is fixed on the end of connecting plate 315, even
The other end of fishplate bar 315 is connected with gear 317, is equipped with the rack gear 318 engaged with gear 317, rack gear 318 on the downside of gear 317
End be connected with the baffle opposite with regulatory plate 320.
Charging/discharging device further includes mounting rack 308.Transmission mechanism 305 and feeding-discharging mechanism 307 are set to mounting rack 308
On.
Its specific process is as follows:
Substrate after plated film is sent on drive roller by the 4th transmission assembly, is opened driving motor, is kept drive roller same
Step rotates forward；When substrate is located at regulatory 306 lower section of mechanism, cylinder 316 is shunk, and drives connecting plate 315 and regulatory plate 320 inwardly
Sliding, connecting plate 315 are rotated with moving gear 317, and gear 317 is engaged with rack gear 318, are driven baffle 319 close to centre, are made to advise
Position of the positive plate 320 with the regulatory substrate of baffle 319 on dynamic roller；Lifting driving motor 310 is opened, spiral lift is driven
311 rise, and insert material bar 309 picking-up substrate and rise to after vacuum expands the fire door height for seeping furnace 5 and close lifting driving motor 310,
Open driving motor, driving car body 312 advance on guide rail 313, substrate is delivered in Material support frame 304, to substrate into
The thermal diffusion of row high temperature and tempering.
After the completion of expanding infiltration, inserts material bar 309 and hold up substrate from Material support frame 304, open driving motor, drive vehicle
Body 312 retreats on guide rail 313, inserts material bar 309 and the substrate completed the process is driven to withdraw from vacuum expansion infiltration furnace 5 completely, open lifting
Driving motor 310, driving spiral lift 311 decline, and drop down onto substrate on drive roller, and regulatory mechanism 306 is regulatory again, rule
After just, driving motor is opened, drives drive roller reversion, the substrate after processing is delivered to finished product box, completes input and output material.
Substrate is sent to fire door by the drive roller of transmission mechanism by the present embodiment, after regulatory mechanism is regulatory, through into
Substrate is sent into furnace body by slotting material bar and the car body cooperation of discharging mechanism, and after completing processing, car body drives slotting material bar to withdraw from furnace body, real
Production automation is showed, human assistance work is few, saves the time, and serialization degree is high, reduces production safety hidden danger, improves production
Efficiency.
Embodiment 6:
Expand the production method seeped for heavy rare earth crystal boundary the present embodiment provides a kind of, specifically includes the following steps:
S1, substrate is sintered, and sintered substrate is cleaned；
Specifically, agglomerating chamber is evacuated to 10-2Pa, and it is warming up to 1020-1050 DEG C by certain heating rate, heat preservation 15
~20h, later, filling with inert gas make to be sintered indoor pressure to -0.06MPa.After cooling, sintered substrate is carried out clear
It washes.
Further, before being sintered to substrate, dewaxing and degassing process are carried out to substrate.
S2, heavy rare earth is sputtered to the substrate surface after cleaning, heavy rare earth layer is formed, to realize the substrate single or double
Plated film；
It after cleaning, determines the specifications and characteristics requirement of substrate, and calculates the coating film thickness of substrate (in 2-50 μm of range).It
Afterwards, sputtering heavy rare earth is carried out to the surface of substrate, forms heavy rare earth layer, complete single or double plated film.In the present embodiment, pass through
Magnetron sputtering technique sputters heavy rare earth Dy to substrate front and back sides, forms Tb heavy rare earth layer.
S3, the substrate after plated film is heat-treated, is seeped with realizing that heavy rare earth expands.
900 DEG C or so are heated to by vacuum expansion infiltration stove evacuation to 3 × 10-3Pa, and by the intracorporal temperature of furnace, heat preservation 10
~20h.Then, filling with inert gas makes the intracorporal pressure of furnace to -0.06MPa, stops heating, temperature is cooled to room temperature；It is cooling
Afterwards, furnace body is evacuated to 3 × 10-3Pa, and the intracorporal temperature of furnace is heated to 500 DEG C, and keep the temperature 4-8h, complete heavy rare earth
Expand and seeps.
Expand the production method seeped for heavy rare earth crystal boundary the present embodiment provides a kind of, which, which is one, can be achieved height
The new process of performance magnetic materials production has overturned heavy rare earth crystal boundary and has expanded the traditional handicraft seeped, has been suitable for the high property of large-scale production
Energy magnetic material has stock utilization height, high production efficiency, technical characterstic at low cost and nontoxic and pollution-free, and produce
Product has the advantage of high-performance and high consistency, opens up new way for the industrialized production development of entire industry.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all in essence of the invention
Within mind and principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
Claims (9)
1. a kind of expand the production line seeped for heavy rare earth crystal boundary, which is characterized in that including material transmission system, monolithic molding pressure
Machine, sintering mechanism, wiper mechanism, film-coating mechanism, vacuum, which expand, seeps furnace and control unit；
The material transmission system, monolithic moulding press, sintering mechanism, wiper mechanism, film-coating mechanism and vacuum, which expand, seeps furnace difference
It is connect with described control unit；
The material transmission system includes the first transmission assembly, the second transmission assembly, third transmission assembly and the 4th transmission assembly；
The discharge port of the monolithic moulding press is connect by first transmission assembly with the feed inlet of the sintering mechanism, the burning
The discharge port of knot mechanism is connect by second transmission assembly with the feed inlet of the wiper mechanism, and the wiper mechanism goes out
Material mouth is connected by the feed inlet of the third transmission assembly and film-coating mechanism, and the feed inlet of the film-coating mechanism passes through described the
Four transmission assemblies are connect with the feed inlet that the vacuum expands infiltration furnace；
The monolithic moulding press provides substrate, the sintering machine to the sintering mechanism by first transmission assembly one by one
Structure is sintered the substrate；Sintered substrate is delivered to the wiper mechanism by second transmission assembly, described clear
Washing machine structure cleans the substrate；Substrate after cleaning is delivered to film-coating mechanism, the plating by the third transmission assembly
Film mechanism sputters heavy rare earth to the surface of the substrate, forms heavy rare earth layer；4th transmission assembly is by the substrate after plated film
It is delivered to vacuum and expands infiltration furnace, the vacuum expands infiltration furnace and is heat-treated to the substrate, is seeped with realizing that heavy rare earth expands；
The sintering mechanism includes multicell continuous fritting furnace, and the multicell continuous fritting furnace includes trash chamber, agglomerating chamber, cooling
Room, the first gate valve, the second gate valve, third gate valve and transfer component, first gate valve are set to the trash chamber
The both ends of feed inlet, second gate valve are connect with the discharge port of the trash chamber with the feed inlet of the agglomerating chamber respectively,
The both ends of the third gate valve are connect with the discharge port of the agglomerating chamber with the feed inlet of the cooling chamber respectively, the transfer
Component drives the substrate mobile for carrying the substrate, it is made to pass sequentially through the trash chamber, agglomerating chamber and cooling
Room.
2. production line according to claim 1, which is characterized in that the film-coating mechanism includes coating machine, the coating machine
Including Sample Room, surge chamber, purge chamber, coating chamber, cooling chamber, go out specimen chamber and transport mechanism；The discharge port of the surge chamber with
Between the feed inlet of purge chamber, between the discharge port of the purge chamber and the feed inlet of coating chamber, the discharge port of the coating chamber
Between the feed inlet of cooling chamber, the discharge port of the cooling chamber and out between the feed inlet of specimen chamber pass through slide valve and vacuum
Seal assembly connection, the transport mechanism drive the substrate mobile, pass sequentially through it described for carrying the substrate
Sample Room, surge chamber, purge chamber, coating chamber, cooling chamber and specimen chamber out, to realize the substrate coating single side.
3. production line according to claim 2, which is characterized in that the film-coating mechanism further includes overturning conveyer, described
Be provided with transmission mechanism in transmission path between the discharge port and feeding inlet of coating machine, the feed inlet of the overturning conveyer and
Discharge port is connect with the discharge port of the coating machine and feed inlet respectively by the transmission mechanism, and the transmission mechanism is for passing
The material containing disk for carrying the substrate is sent, the overturning conveyer is used to overturn the substrate in the material containing disk, so that substrate is in institute
It states after carrying out front coating single side in coating machine, laying equal stress on via overturning conveyer overturning, it is anti-newly to carry out by the coating machine
Face coating single side.
4. production line according to claim 3, which is characterized in that the overturning conveyer includes that can turn over along what axis was overturn
Pivoted frame, the rollover stand is interior to be equipped with Flip Zone, and the two sides of the Flip Zone are respectively equipped with a pair of of clamp system opposing upper and lower,
In, the superposed clamp system is for clamping a material containing disk for being preset at the Flip Zone top, positioned at lower part
The clamp system is used to clamp another material containing disk entered in the Flip Zone and drives the material containing disk towards preset load
Charging tray is mobile；So that the both ends of two material containing disks are aligned and clamp；The rollover stand can be synchronous drive two by overturning
The location swap of the material containing disk.
5. production line according to claim 1, which is characterized in that it includes gas source, vacuum pump group, furnace that the vacuum, which expands infiltration furnace,
Body and heater box, the gas source are connect by air inlet pipeline with the furnace body, and the air inlet pipeline is equipped with intake valve；It is described
Vacuum pump group is connect by exhaust pipe with the furnace body, and the exhaust pipe is equipped with high vacuum valve；The heater box is set
In in the furnace body, and Material support frame is equipped in the heater box, for carrying the substrate；The gas source and vacuum pump group
The inflation/deflation into the furnace body, the heater box are heat-treated the substrate respectively, are seeped with realizing that heavy rare earth expands.
6. production line according to claim 5, which is characterized in that the heater box includes heat insulating reflecting screen, braced frame
And heater；The heat insulating reflecting screen, which is laid in the braced frame, constitutes cabinet, and the heater is set in the cabinet.
7. production line according to claim 5, which is characterized in that the vacuum pump group includes low pumping speed pump group and high pumping rate
Pump group, the low pumping speed pump group, high pumping rate pump group and high vacuum valve are sequentially connected, and the air inlet of the high vacuum valve with it is described
Be equipped with backing line between the air inlet of low pumping speed pump group, the backing line be equipped with it is pre- take out valve, the low pumping speed pump group with
Connecting line between high pumping rate pump group is equipped with preceding step valve.
8. according to the described in any item production lines of claim 5-7, which is characterized in that it further includes input and output material that the vacuum, which expands infiltration furnace,
Device, the charging/discharging device include transmission mechanism and feeding-discharging mechanism, and the transmission mechanism and the 4th transmission assembly connect
It connects, the 4th transmission assembly provides substrate to the feeding-discharging mechanism by transmission mechanism one by one；The feeding-discharging mechanism packet
The car body that includes guide rail and can slide along the guide rail, the car body are equipped with spiral lift, the upside of the spiral lift
Equipped with slotting material bar, and the slotting material bar is located at below the transmission mechanism, and the spiral lift is for driving the slotting material bar
Rise, make the substrate on transmission mechanism described in the slotting material bar support, the car body drives the slotting material bar, makes described in its disengaging
Furnace body realizes input and output material.
9. a kind of production method according to claim 1-8 for expanding the production line seeped for heavy rare earth crystal boundary,
It is characterized in that, specifically includes the following steps:
The substrate is sintered, and sintered substrate is cleaned；
Heavy rare earth is sputtered to the substrate surface after cleaning, heavy rare earth layer is formed, to realize the substrate single or double plated film；
Substrate after plated film is heat-treated, is seeped with realizing that heavy rare earth expands.
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| CN112071611A (en) * | 2020-08-10 | 2020-12-11 | 北京北方华创磁电科技有限公司 | Automatic generation method and system for heavy rare earth grain boundary diffusion production line process |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| DE3239964A1 (en) * | 1982-10-28 | 1984-05-03 | Varta Batterie Ag, 3000 Hannover | High-temperature voltaic cell with a hermetically sealed metal housing and fixed fused electrolyte |
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| KR20130070657A (en) * | 2005-03-18 | 2013-06-27 | 가부시키가이샤 알박 | Method of film formation, film formation apparatus, permanent magnet, and process for producing permanent magnet |
| EP2544199A4 (en) * | 2010-03-04 | 2017-11-29 | TDK Corporation | Sintered rare-earth magnet and motor |
| CN104032263B (en) * | 2013-12-27 | 2016-04-06 | 厦门钨业股份有限公司 | A kind of method of vacuum vapor plating and a kind of rare-earth magnet covering evaporation coating |
| CN106282948B (en) * | 2016-07-28 | 2017-12-01 | 北京中科三环高技术股份有限公司 | A kind of preparation method of film plating process and coating system and rare-earth magnet |
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| DE3239964A1 (en) * | 1982-10-28 | 1984-05-03 | Varta Batterie Ag, 3000 Hannover | High-temperature voltaic cell with a hermetically sealed metal housing and fixed fused electrolyte |
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